Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)最新文献

{"title":"Fabrication of gated field emitter from wedge array prepared by stamp technology","authors":"A. Baba, K. Tsubaki, M. Iwamoto, T. Asano","doi":"10.1109/IMNC.2000.872655","DOIUrl":"https://doi.org/10.1109/IMNC.2000.872655","url":null,"abstract":"Ion-beam modified polyimide is very attractive material for use in field emitters because it can emit electrons at relatively low electric fields with a stable emission rate. The use of organic material as the starting material makes it possible to prepare emitter arrays using the stamp technology. The stamp technology is able to prepare uniform emitter arrays with high geometrical accuracy. In the previous study, a long wedge-type emitter array has been fabricated using the stamp technology. In order to increase emission current density and decrease operating voltage, it highly required to shorten the length of the wedge and to fabricate gated device structure. In this work, we demonstrate successful preparation of short-wedge emitter arrays using a modified stamp process. Fabrication of the gated field emitter arrays from the short-wedge emitters is also demonstrated.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"31 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129860970","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Environmentally harmonized plasma etching processes of amorphous silicon and tungsten","authors":"M. Hori, K. Fujita, S. Kobayashi, M. Ito, T. Goto","doi":"10.1109/IMNC.2000.872754","DOIUrl":"https://doi.org/10.1109/IMNC.2000.872754","url":null,"abstract":"A novel etching process of a-Si and W for cleaning the CVD chamber employing ECR O/sub 2/ plasma with injecting fluorocarbon radicals generated from a fluorocarbon radical source was developed for replacing green house gases such as SF/sub 6/ gas and PFC gases. We proposed a new radical control method where the generated high order fluorocarbon radicals introduced into the plasma reactor are controlled through the radical filter heated by ceramic heater. As a result, high etching rates of 104 nm/min (a-Si) and 141 nm/min (W) were obtained by controlling heater temperature in the radical filter. These results indicated that this technique has a great potential to be applicable to a novel chamber cleaning process for replacing the conventional process with green house gases.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"76 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116265588","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"In situ monitoring of hydrogen etching of Si surfaces by infrared reflection absorption spectroscopy","authors":"H. Noda, T. Urisu, Y. Kobayashi, T. Ogino","doi":"10.1109/IMNC.2000.872714","DOIUrl":"https://doi.org/10.1109/IMNC.2000.872714","url":null,"abstract":"Etching of Si(100) and Si(111) surfaces by hydrogen atoms was investigated by BML-IRRAS. From the crystal structures, it is shown that the appearance of the SiH/sub 3/ vibration peaks indicates the occurrence of the etching (Si-Si back bond breaking) in the case of the Si(100) surface. Similarly, for the Si(111) surface, the appearances of SiH/sub 2/ and/or SiH/sub 3/ symmetric stretching and symmetric bending vibration peaks indicate the etching of Si adatoms, and the SiH/sub 2/ and SiH/sub 3/ degenerate stretching and bending vibrations indicate the etching of rest atoms. (Here the contribution of the step edges and adatom islands are ignored). Properties of these marker peaks depending on the exposure dose and temperatures are investigated here.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"1987 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125483012","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Biochemical IC using micro stereolithography-towards artificial cellular device","authors":"K. Ikuta","doi":"10.1109/IMNC.2000.872605","DOIUrl":"https://doi.org/10.1109/IMNC.2000.872605","url":null,"abstract":"New types of micro fluidic device named \"Biochemical IC Family\" were developed and basic performances of each chip as well as overall ability of combined chips were verified experimentally. The original concept of the biochemical IC has been proposed by Ikuta. Each chemical IC chip in a disk shape (or cell shape) contains different functional devices such as multiple micro pumps, valves, micro concentrators and micro reactors etc. This chip is constructed by two kinds of materials. Upper part of the chip including micro fluid system is made of UV curable polymer because 3D micro fabrication is employed to make it. Bottom part of the chip is made of silicon circuit for electrical interaction among the chips. The biochemical IC introduces the strong point of today's IC/LSI family such as C-MOS/TTL chip-set.. Therefore, various kind of micro chemical apparatus can be assembled by the user.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"24 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122244373","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Selective growth of InAs quantum dots on patterned Si/SiO2 substrates","authors":"B. Choi, C. Park, S. Song, S. Hwang, B. Min, M. Son, D. Ahn, Y.J. Park, E. Kim, S. Min","doi":"10.1109/IMNC.2000.872688","DOIUrl":"https://doi.org/10.1109/IMNC.2000.872688","url":null,"abstract":"There have been considerable efforts for the growth of InAs self-assembled quantum dots (QDs), and recently, many interesting works of selective growth on patterned substrates are under progress. Most of the works so far have been concentrated on the growth of QDs on GaAs substrates. On the other hand, the growth of InAs QDs on silicon substrates is expected to provide interesting growth mechanisms and new zero-dimensional states. We would like to present that InAs QDs are successfully grown on silicon substrates. The position control of QDs is also shown to be possible by utilizing patterned silicon/silicon dioxide (Si/SiO/sub 2/) substrates.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"33 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133313567","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Aluminum quantum dots fabrication by nano-imprint lithography","authors":"Y. Hirai, S. Yoshida, H. Okuno, M. Fujiwara, Y. Tanaka","doi":"10.1109/IMNC.2000.872769","DOIUrl":"https://doi.org/10.1109/IMNC.2000.872769","url":null,"abstract":"We have demonstrated the fabrication of Aluminum quantum dots by nano imprint lithography using dimpled mold. We believe that the fabricated structure would be a first step to realize mass production of an ultra large scaled quantum dots memory.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125986848","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Emotion Engine and its impact on semiconductor industry","authors":"M. Saito","doi":"10.1109/IMNC.2000.872596","DOIUrl":"https://doi.org/10.1109/IMNC.2000.872596","url":null,"abstract":"At first, the relationship between system and semiconductor technology is discussed from the historical point of view. Then the positioning of the Emotion Engine and, the impact of the Emotion Engine to the both system and semiconductor industry is mentioned. Finally, by considering next generation leading edge LSI forecasts, the future process technology requirement for the expected performance range and the desirable semiconductor industry structure is mainly discussed.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"16 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114971482","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Diamond mold for nanoimprint lithography","authors":"J. Taniguchi, Y. Tokano, I. Miyamoto, M. Komuro, H. Hiroshima, K. Kobayashi, T. Miyazaki, H. Ohyi","doi":"10.1109/IMNC.2000.872699","DOIUrl":"https://doi.org/10.1109/IMNC.2000.872699","url":null,"abstract":"Nanoimprint lithography (NIL) is a major breakthrough in nano-patterning because it can produce sub-10 nm feature size over a large area with a high throughput and low cost. NIL fabricates a resist pattern by deforming the resist shape on the substrate using mold compression. In order to obtain high productivity the mold requires durability for repeatedly NIL process. Diamond is a candidate material for high productivity because it is the hardest material. Therefore, we fabricate diamond mold using electron beam lithography. Furthermore, using a diamond mold instead of diamond indenter of conventional hardness tester, direct nanoimprint becomes possible, in this case, nanoimprint experiment carries out very readily.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123747480","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Microtechnologies for nucleic acid analysis: from concept to commercialization","authors":"M. A. Northrup","doi":"10.1109/IMNC.2000.872607","DOIUrl":"https://doi.org/10.1109/IMNC.2000.872607","url":null,"abstract":"Current commercial instruments for amplification of nucleic acids via the polymerase chain reaction (PCR) have provided the technical requirements to prove the viability and potential of this powerful biotechnological technique. However, there are significant opportunities to advance the instrumentation technology to allow for the extension of the PCR technique beyond the laboratory and make it low-cost, rapid, flexible, and automated. As well, similar improvement opportunities in sample purification and processing techniques exist. Speeding up the ramping rates between denature, extension, and anneal temperatures has been shown to augment the PCR process, and this concept has developed into a commercial product. As well, the ability to perform homogeneous assay with PCR has also been incorporated into commercial products. Thusly, some of the recent advances in the chemistry such as the Taqman or molecular beacons technique have been exploited with these new commercial thermal cycling products that contain fluorescence detection and product quantitation capabilities. In spite of these advances in instrument technologies, there are still limitations in functionality, and therefore opportunities for improvements. Some of these new commercial opportunities for technological improvements include: independent control of the thermal cycling and optical systems at each reaction site, rapid thermal cycling of the large volumes (100 /spl mu/L or greater) required for clinical analyses of infectious diseases, low power consumption, use of solid state optical components (which can lower cost), modularity, ease of serviceability, and portability. Although it has been shown that quantitative, homogeneous PCR assays can be performed in both large bench-top instruments and in a portable format, pre-PCR sample preparation remains the significant bottleneck in terms of the need for human intervention, complexity, and lack of automation. Sample preparation routines range from a simple dilution of inhibitors to complex filtering, centrifuging, lysing, mixing, solid phase extraction, etc. Automation of some of these procedures has typically taken the form of robots replacing human-mediated steps, and several solid phase extraction techniques. As with the analytical thermal cyclers for PCR, opportunities exist for improvements that will augment the distribution and applicability of the PCR technique. Specific examples of these technological improvements include replacing human mediated fluid handling steps with microfluidic devices that are self-contained and automated, combining process steps in a flow-through disposable cartridge format, and speeding up the steps with micromachined, electronically controlled \"chips\". In this presentation, I will describe the development of the concepts, history, and the commercialization of new instrument systems and devices that take advantage of the improvements afforded by implementing these technological advances.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132382535","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Proposal of atom lithography for silicon quantum dots","authors":"Y. Asakawa, H. Kumagai, M. Obara","doi":"10.1109/IMNC.2000.872683","DOIUrl":"https://doi.org/10.1109/IMNC.2000.872683","url":null,"abstract":"Recently so called \"atom lithography\", which makes the most use of atom deposition techniques with an optical mask, has been studied. This technique has been enable to fabricate nanometer-size structure. To apply this technique to silicon, it is necessary to develop the laser system that emits deep ultraviolet light resonant to it.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"29 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131895205","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}