J. Taniguchi, Y. Tokano, I. Miyamoto, M. Komuro, H. Hiroshima, K. Kobayashi, T. Miyazaki, H. Ohyi
{"title":"用于纳米压印的金刚石模具","authors":"J. Taniguchi, Y. Tokano, I. Miyamoto, M. Komuro, H. Hiroshima, K. Kobayashi, T. Miyazaki, H. Ohyi","doi":"10.1109/IMNC.2000.872699","DOIUrl":null,"url":null,"abstract":"Nanoimprint lithography (NIL) is a major breakthrough in nano-patterning because it can produce sub-10 nm feature size over a large area with a high throughput and low cost. NIL fabricates a resist pattern by deforming the resist shape on the substrate using mold compression. In order to obtain high productivity the mold requires durability for repeatedly NIL process. Diamond is a candidate material for high productivity because it is the hardest material. Therefore, we fabricate diamond mold using electron beam lithography. Furthermore, using a diamond mold instead of diamond indenter of conventional hardness tester, direct nanoimprint becomes possible, in this case, nanoimprint experiment carries out very readily.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Diamond mold for nanoimprint lithography\",\"authors\":\"J. Taniguchi, Y. Tokano, I. Miyamoto, M. Komuro, H. Hiroshima, K. Kobayashi, T. Miyazaki, H. Ohyi\",\"doi\":\"10.1109/IMNC.2000.872699\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Nanoimprint lithography (NIL) is a major breakthrough in nano-patterning because it can produce sub-10 nm feature size over a large area with a high throughput and low cost. NIL fabricates a resist pattern by deforming the resist shape on the substrate using mold compression. In order to obtain high productivity the mold requires durability for repeatedly NIL process. Diamond is a candidate material for high productivity because it is the hardest material. Therefore, we fabricate diamond mold using electron beam lithography. Furthermore, using a diamond mold instead of diamond indenter of conventional hardness tester, direct nanoimprint becomes possible, in this case, nanoimprint experiment carries out very readily.\",\"PeriodicalId\":270640,\"journal\":{\"name\":\"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)\",\"volume\":\"9 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-07-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMNC.2000.872699\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.2000.872699","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Nanoimprint lithography (NIL) is a major breakthrough in nano-patterning because it can produce sub-10 nm feature size over a large area with a high throughput and low cost. NIL fabricates a resist pattern by deforming the resist shape on the substrate using mold compression. In order to obtain high productivity the mold requires durability for repeatedly NIL process. Diamond is a candidate material for high productivity because it is the hardest material. Therefore, we fabricate diamond mold using electron beam lithography. Furthermore, using a diamond mold instead of diamond indenter of conventional hardness tester, direct nanoimprint becomes possible, in this case, nanoimprint experiment carries out very readily.