Aluminum quantum dots fabrication by nano-imprint lithography

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) Pub Date : 2000-07-11 DOI:10.1109/IMNC.2000.872769

Y. Hirai, S. Yoshida, H. Okuno, M. Fujiwara, Y. Tanaka

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Abstract

We have demonstrated the fabrication of Aluminum quantum dots by nano imprint lithography using dimpled mold. We believe that the fabricated structure would be a first step to realize mass production of an ultra large scaled quantum dots memory.

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纳米压印技术制备铝量子点

我们演示了利用凹模纳米压印光刻技术制备铝量子点。我们相信，该结构将是实现超大规模量子点存储器大规模生产的第一步。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)

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