Diamond mold for nanoimprint lithography

Abstract

Nanoimprint lithography (NIL) is a major breakthrough in nano-patterning because it can produce sub-10 nm feature size over a large area with a high throughput and low cost. NIL fabricates a resist pattern by deforming the resist shape on the substrate using mold compression. In order to obtain high productivity the mold requires durability for repeatedly NIL process. Diamond is a candidate material for high productivity because it is the hardest material. Therefore, we fabricate diamond mold using electron beam lithography. Furthermore, using a diamond mold instead of diamond indenter of conventional hardness tester, direct nanoimprint becomes possible, in this case, nanoimprint experiment carries out very readily.