硅量子点原子光刻技术的构想

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) Pub Date : 2000-07-11 DOI:10.1109/IMNC.2000.872683

Y. Asakawa, H. Kumagai, M. Obara

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摘要

最近，人们开始研究所谓的“原子光刻”技术，它最大限度地利用了带有光学掩膜的原子沉积技术。该技术已被用于制造纳米尺寸的结构。为了将该技术应用到硅上，必须开发出能够发射与硅谐振的深紫外光的激光系统。

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Proposal of atom lithography for silicon quantum dots

Recently so called "atom lithography", which makes the most use of atom deposition techniques with an optical mask, has been studied. This technique has been enable to fabricate nanometer-size structure. To apply this technique to silicon, it is necessary to develop the laser system that emits deep ultraviolet light resonant to it.

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Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)

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