{"title":"140GHz SiGe HBT and 100GHz InP DHBT Broadband Triple-Stacked Distributed Amplifiers with Active Bias Terminations","authors":"K. Kobayashi, Ying Z. McCleary","doi":"10.1109/BCICTS45179.2019.8972768","DOIUrl":"https://doi.org/10.1109/BCICTS45179.2019.8972768","url":null,"abstract":"This paper reports on the design and linearity performance characteristics of a DC-140GHz SiGe and a DC- 100GHz InP triple stacked HBT distributed amplifier with active bias terminations. The active bias topology is configured to extend the practical low frequency operation while maintaining gain- flatness and linearity. Triple stacked HBTs are used to increase the supply and linear output capability. The SiGe design is based on HBTs with an fT/fmax of 300/350GHz and achieves 11.7 dB and bandwidth from baseband to 140GHz. The InP HBT amplifier is based on DHBTs with fT/fmax of 250/250GHz and achieves a gain of 10.8dB and a bandwidth of 100GHz. While the SiGe design achieves 1.5 higher gain-BW, the InP DHBT MMIC achieves ~3- 4.5dB greater IP3, P1dB, and P3dB while consuming only ~ 23% higher dc power. This is believed to be the first broadband linearity benchmark comparison reported between SiGe and InP HBT technologies using near identical DA designs. Although there are previous reports of larger bandwidth distributed amplifiers in both InP and SiGe technologies demonstrated up through 200GHz and summarized in [8], the InP and SiGe MMICs of this work are believe to be the highest bandwidths reported for triple stacked HBT DAs using practical on-chip active bias terminations.","PeriodicalId":243314,"journal":{"name":"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129906145","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Tomohiro Otsuka, Y. Yamaguchi, S. Shinjo, T. Oishi
{"title":"Study of Self-heating Effect of GaN HEMTs with Buffer Traps by Low Frequency S-parameters Measurements and TCAD Simulation","authors":"Tomohiro Otsuka, Y. Yamaguchi, S. Shinjo, T. Oishi","doi":"10.1109/BCICTS45179.2019.8972751","DOIUrl":"https://doi.org/10.1109/BCICTS45179.2019.8972751","url":null,"abstract":"The effect of self-heating of GaN HEMTs on low frequency S-parameters has been studied by using TCAD simulation. The Im(Y22) for low frequency S-parameters measurement is useful to study buffer trap in GaN HEMTs. The self-heating effect affects a peak indicated trap in Im(Y22) depending on measurement frequency. The frequency of peak by trap shifts toward higher as channel temperature increase. Moreover, the self-heating effect generates a peak in Im(Y22) vs. frequency. The frequency of peak generated by self-heating effect only is almost constant as channel temperature increase. Furthermore, this TCAD results show good agreement with the measurement results.","PeriodicalId":243314,"journal":{"name":"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)","volume":"87 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121488778","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Omar, A. Mukherjee, W. Liang, Yaxin Zhang, P. Sakalas, M. Schröter
{"title":"82 GHz direct up-converter mixer using double-balanced Gilbert cell with sensitivity analysis at mm-wave frequency","authors":"A. Omar, A. Mukherjee, W. Liang, Yaxin Zhang, P. Sakalas, M. Schröter","doi":"10.1109/BCICTS45179.2019.8972765","DOIUrl":"https://doi.org/10.1109/BCICTS45179.2019.8972765","url":null,"abstract":"This paper presents a 82 GHz direct up-converter mixer fabricated in a 130 nm SiGe BiCMOS technology as a part of a complete 82 GHz transmitter operating at mm-wave frequency. The mixer is based on a double-balanced Gilbert cell topology. Two broadband baluns are employed to differentiate the single-ended input signals of the mixer: one on-chip balun operates at 82 GHz at the LO port, and one off-chip balun at the IF port operates at 0.5 GHz. With 2.2 V supply voltage, −5 dBm local oscillator pumping power, and −30 dBm IF power, the measured mixer achieves a double-sideband conversion gain of 9 dB over the RF frequency range from 76 to 84 GHz, consuming just 23 mW static DC power (including output buffer). Isolation between LO-RF signals and IF-RF signals at the RF output port is larger than 34 dB and 52 dB, respectively. The sensitivity of the relevant circuit figures of merit with respect to important transistor parameters has also been investigated.","PeriodicalId":243314,"journal":{"name":"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130766108","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Ultra-fast Thermoreflectance Imaging for Electronic, Optoelectronic, and Thermal Devices","authors":"J. Bahk, A. Shakouri","doi":"10.1109/BCICTS45179.2019.8972732","DOIUrl":"https://doi.org/10.1109/BCICTS45179.2019.8972732","url":null,"abstract":"We review the recent advances in thermal characterization of micro/nanoscale electronic, optoelectronic, thermal devices based on thermoreflectance imaging. Thermoreflectance imaging is a non-invasive optical technique that can visualize surface thermal response of devices and integrated circuits (IC). Recent advances of the technique have enabled high-resolution, ultra-fast transient thermal imaging with 800 ps temporal resolution. Using visible or UV illumination, spatial resolution of about 200-250 nm can be achieved. Many IC substrates, e.g. Si, GaAs, are transparent to near IR illumination in 1-1.5 μm wavelength range. Through-substrate thermal imaging of flip-chip bonded ICs with micron spatial resolution has been demonstrated. We provide key examples of various devices characterized by the technique such as CMOS ICs, GaN HEMT, nanowire transistors, thin-film solar cells, and micro-thermal cloaking devices. In addition to the validation of electrothermal models, material and fabrication defects can be identified. Finally we discuss the advantages/limitations, and perspective of thermoreflectance imaging technique.","PeriodicalId":243314,"journal":{"name":"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126855487","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pilsoon Choi, Annie Kumar, S. Yadav, X. Gong, D. Antoniadis, E. Fitzgerald
{"title":"Implementation of InGaAs-OI Passive Devices and Its Application to 5G Millimeter-Wave Phase Shifter","authors":"Pilsoon Choi, Annie Kumar, S. Yadav, X. Gong, D. Antoniadis, E. Fitzgerald","doi":"10.1109/BCICTS45179.2019.8972758","DOIUrl":"https://doi.org/10.1109/BCICTS45179.2019.8972758","url":null,"abstract":"In this work, inductors and capacitors are designed and fabricated on an InGaAs-on-Insulator (InGaAs-OI) wafer that enables millimeter-wave (mmWave) integrated circuits design together with InGaAs high electron mobility transistors (HEMTs) for 5G mobile devices. Wafer bonding process between an InGaAs wafer and a high resistive substrate is developed and optimized for high frequency operation. Fabricated passive components are measured and compared against the electro-magnetic (EM) simulation data. A phase shifter circuit which is essential for directional beamforming in 5G mmWave communications is designed based on the measured data, which demonstrates the feasibility of integrated mmWave circuits design on an InGaAs-OI wafer for high data rates and small form factor 5G mobile devices.","PeriodicalId":243314,"journal":{"name":"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)","volume":"102 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123583870","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Dong Liu, J. Papapolymerou, P. Mohseni, M. Becker, Jung‐Hun Seo, J. Albrecht, T. Grotjohn, Z. Ma, S. Cho, A. Hardy, Jisoo Kim, Cristian J. Herrera-Rodriguez, Edward Swinnich, Mohadeseh A. Baboli, Jiarui Gong, Xenofon Konstantinou
{"title":"Toward Diamond-Collector Heterojunction Bipolar Transistors via grafted GaAs-Diamond n-p junction","authors":"Dong Liu, J. Papapolymerou, P. Mohseni, M. Becker, Jung‐Hun Seo, J. Albrecht, T. Grotjohn, Z. Ma, S. Cho, A. Hardy, Jisoo Kim, Cristian J. Herrera-Rodriguez, Edward Swinnich, Mohadeseh A. Baboli, Jiarui Gong, Xenofon Konstantinou","doi":"10.1109/BCICTS45179.2019.8972766","DOIUrl":"https://doi.org/10.1109/BCICTS45179.2019.8972766","url":null,"abstract":"We demonstrated GaAs/diamond (GaAs-Csp3) np diodes via lattice-mismatched semiconductor grafting: forming heterostructures with an ultrathin oxide (UO) layer at the interface. High-performance rectifying characteristics were measured from the GaAs/Csp3 diodes with sharp reverse breakdown voltage (Vb) of -44.5 V. Capacitance-voltage (CV) measurements were carried out and the measurement results were used to construct the band diagram of the pn junction. Furthermore, an AlGaAs/GaAs/Csp3 pnp structure was fabricated and both junctions were characterized for their I-V characteristics. The results show the prospect of realization of pnp AlGaAs/GaAs/Csp3 HBTs in the future.","PeriodicalId":243314,"journal":{"name":"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)","volume":"136 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115172147","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Chakraborty, M. Hamouda, Yi-jue Chen, Claus Lautenschlager, D. Englisch, M. Qureshi, N. Huynh, Klaus Hoenninger, H. Forstner
{"title":"A Scalable Multimode 24-GHz Radar Transceiver for Industrial and Consumer Applications in a 0.13µm SiGe BiCMOS Technology","authors":"A. Chakraborty, M. Hamouda, Yi-jue Chen, Claus Lautenschlager, D. Englisch, M. Qureshi, N. Huynh, Klaus Hoenninger, H. Forstner","doi":"10.1109/BCICTS45179.2019.8972767","DOIUrl":"https://doi.org/10.1109/BCICTS45179.2019.8972767","url":null,"abstract":"This paper presents a 24-GHz radar system based on a low-power, low-noise, multichannel, scalable transceiver (TRX) monolithic microwave integrated circuit (MMIC). The MMIC features two homodyne quadrature downconversion receivers with a single-sideband noise figure (NFssb) of 8 dB and an adjustable conversion gain (CG) of up to 87dB using integrated programmable analog baseband (ABB) amplifiers. Integrated baseband bypass feature allows using the same MMIC for Doppler as well as Frequency-Modulated Continuous-Wave (FMCW) radar applications. The transmit section features a fundamental frequency voltage controlled oscillator (VCO) and two transmitters with bidirectional RF ports. The transmitter delivers a maximum output power of +5 dBm. The measured phase noise at 100kHz offset was -90 dBc/Hz. Designed in a production ready 0.13µm SiGe:C BiCMOS technology, the chip consumes 165 mA from a 1.5V power supply with all blocks turned ON and consumes less than 100µA in the standby mode.","PeriodicalId":243314,"journal":{"name":"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129451124","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Xi Zhang, Xiao Liu, M. Spiegelberg, A. R. van Dommele, M. Matters-Kammerer
{"title":"A DC-51.5 GHz Electro-Absorption Modulator Driver with Tunable Differential DC Coupling for 3D Wafer Scale Packaging","authors":"Xi Zhang, Xiao Liu, M. Spiegelberg, A. R. van Dommele, M. Matters-Kammerer","doi":"10.1109/BCICTS45179.2019.8972717","DOIUrl":"https://doi.org/10.1109/BCICTS45179.2019.8972717","url":null,"abstract":"This paper presents a DC-51.5 GHz PAM-4 dual-channel electro-absorption modulator (EAM) driver realized in a 0.25-µm SiGe:C BiCMOS technology. The EAM driver is designed for 3D wafer scale packaging which integrates silicon electronics IC and InP photonics IC at wafer scale. A new asymmetric-load differential driver topology is proposed to achieve a tunable DC biasing for the EAM without extra off-chip bias-T, which significantly reduces the packaging complexity and cost. Moreover, the driver uses differential outputs to drive a single-ended EAM, which reduces the voltage swing by a factor two and reduces the power consumption. The driver has 9.4 dB gain with a 3 dB bandwidth of 51.5 GHz and −0.2 ~ −2 V tunable output DC biasing range. It delivers a differential output voltage swing of 2 Vppd at 56 Gb/s PAM-4 and consumes 219 mW per channel, resulting in a figure of merit of 3.9 pJ/bit.","PeriodicalId":243314,"journal":{"name":"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131245069","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"D-band Transceiver Utilizing 70-nm GaAs-mHEMT Technology for FDD System","authors":"M. Ito, T. Okawa, T. Marumoto","doi":"10.1109/BCICTS45179.2019.8972754","DOIUrl":"https://doi.org/10.1109/BCICTS45179.2019.8972754","url":null,"abstract":"This paper presents a D-band transceiver utilizing a 70-nm GaAs metamorphic high electron mobility transistor (mHEMT) technology for a frequency division duplex (FDD) system. The transceiver includes a duplexer, transmitter and receiver modules, an LO and IF circuit board, and a real-time modem. Each module comprises a silica-based package on which D-band converter and E-band multiplier monolithic microwave integrated circuits (MMICs) are mounted using a flip-chip bonding technique. Real-time communication tests are performed at 142- and 157-GHz duplex frequencies. A 10-Gbps transmission with a high spectral efficiency are achieved using a 128 quadrature amplitude modulation (QAM) signal.","PeriodicalId":243314,"journal":{"name":"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)","volume":"86 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122948694","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Device Architectures for High-speed SiGe HBTs","authors":"H. Rücker, B. Heinemann","doi":"10.1109/BCICTS45179.2019.8972757","DOIUrl":"https://doi.org/10.1109/BCICTS45179.2019.8972757","url":null,"abstract":"This paper reviews recent developments in process technology of high-speed SiGe HBTs at IHP. Two device concepts, one with selective epitaxial growth and one with non-selective epitaxial growth of the base, are analyzed with respect to their impact on radio frequency performance. Both device architectures take advantage of a low-resistive base link formed by selective epitaxial growth of extrinsic base regions after emitter structuring. As an intermediate result of the European project TARANTO, HBTs with fT values of 470 GHz and fMAX values of 610 GHz are demonstrated in a 130 nm BiCMOS process.","PeriodicalId":243314,"journal":{"name":"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121909273","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}