J. Kaushik, V. R. Balakrishnan, B. Panwar, R. Muralidharan
{"title":"Analysis of fast and slow trap states on electrical performance of AlGaN/GaN HEMTs","authors":"J. Kaushik, V. R. Balakrishnan, B. Panwar, R. Muralidharan","doi":"10.1109/ICEMELEC.2014.7151145","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151145","url":null,"abstract":"Experimental observations of simultaneous existence of fast and slow trap states in AlGaN/GaN HEMTs are presented here. The presence of traps with time constants (0.1 ms ~ 0.1 s) and activation energies (0.3 eV~0.54 eV) was detected from transconductance dispersion and admittance curves. These fast traps may assist the high gate leakage currents in AlGaN/GaN HEMTs. The slower traps having the time constants of more than 0.1 s, along with faster traps, may be responsible for hysteresis in the observed output I-V characteristics.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129742721","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"A novel back gated GaN/AlGaN HEMT structure for biological sensing applications","authors":"Shruti Kejriwal, R. Vishnoi, A. Dhawan","doi":"10.1109/ICEMELEC.2014.7151151","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151151","url":null,"abstract":"In this paper, a novel back gated AlGaN/GaN High Electron Mobility Transistor (HEMT) structure is proposed for detection of biological molecules such as nucleic acids (DNAs, RNAs). The proposed device consists of a thin film layer of AlGaN on top of a GaN thin film layer grown on a substrate such as sapphire or silicon, wherein the substrate is completely back etched exposing the GaN surface for attachment of nucleic acid molecules. Numerical study of this proposed device was carried out using TCAD Silvaco ATLAS to study the effect of attachment of nucleic acid molecules on the GaN surface. As the single-stranded and double-stranded DNA and RNA molecules are negatively charged, their attachment on the GaN surface leads to a variation of 2DEG gas on the AlGaN/GaN interface and therefore on the drain current. The performance of this structure is compared with an equivalent silicon MOS transistor and also with a conventional front gated HEMT structure. The proposed device shows a better sensitivity to presence of nucleic acid molecules in both the cases.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122325997","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Simulation study of the electrical behavior of bottom contact organic thin film transistors","authors":"F. Ana, Najeeb ud din HAKIM","doi":"10.1109/ICEMELEC.2014.7151133","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151133","url":null,"abstract":"Organic thin-film transistors (OTFTs) are making significant inroads into various large-area applications. Organic materials provide a low-cost alternative to silicon in the electronics industry as they can be fabricated at low temperatures and with high throughput on a wide range of unconventional substrates, such as glass, plastic, fabric and paper. This paper presents a simple 2D simulation study of the electrical characteristics of bottom-contact OTFTs. The pentacene has been used as the organic semiconductor in the active film. It has been demonstrated that the trap-density of states plays an important role in the device conduction mechanism and hence degrades the performance. The simulated results show similar trends with the experimental results which verify the accuracy of the models used for simulation of OTFTs. It is demonstrated that the field-dependent mobility behavior of OTFTs is correctly modeled by the Poole-Frenkel mobility model. Also, the band theory used for conventional MOS devices satisfies the charge transport mechanism in OTFTs.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114105039","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Growth of high quality InN films and nano-rods grown on GaN nano wall network","authors":"Malleswararao Tangi, Arpan De, S. M. Shivaprasad","doi":"10.1109/ICEMELEC.2014.7151191","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151191","url":null,"abstract":"A two step kinetically controlled single-growth process for the formation of InN 2D flat films and an array of nano rods (NRs) on GaN nano wall network (NWN) template by Plasma Assisted Molecular Beam Epitaxy (PAMBE) is demonstrated here. Surface and bulk diffraction studies reveal that the rods and film exhibit high quality structural and optical properties, in comparison to those formed on bare sapphire or GaN epilayer.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"53 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115621319","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Rahul Kumar, P. Mukhopadhyay, S. Jana, A. Bag, S. Ghosh, S. Das, M. K. Mahata, D. Biswas
{"title":"Comprehensive study of AlGaAs/GaAs heterostructures grown by MBE: Structural and compositional analysis","authors":"Rahul Kumar, P. Mukhopadhyay, S. Jana, A. Bag, S. Ghosh, S. Das, M. K. Mahata, D. Biswas","doi":"10.1109/ICEMELEC.2014.7151137","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151137","url":null,"abstract":"AlGaAs/GaAs heterostructures having different thicknesses of AlGaAs layers have been grown by Molecular Beam Epitaxy. Detailed Structural characterization of these structures has been performed and discussed in this report. AlGaAs layer thicknesses have been measured by an electrochemical Capacitance-Voltage profiler by etch profiling and confirmed by field emission scanning electron eicroscopy and RADS-fitted data of high-resolution X-ray diffraction scans. Compositional analysis have been performed by photoluminescence and high-resolution X-ray diffraction and discussed here. The Poisson's ratio of AlGaAs layers has been calculated by considering linear dependence on Al mole fraction to get the estimate of the critical thickness of the AlGaAs layer. Out-of-plane strain has been calculated from the triple axis symmetric (ω-2θ) diffraction profile and compared with RADS-itted data.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133297283","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Nigam, G. Schwabegger, Rizwan Ahmed, C. Simbrunner, H. Sitter, M. Premaratne, V. Rao
{"title":"Impact of morphology on charge carrier mobility in top gate C60 organic field effect transistors","authors":"A. Nigam, G. Schwabegger, Rizwan Ahmed, C. Simbrunner, H. Sitter, M. Premaratne, V. Rao","doi":"10.1109/ICEMELEC.2014.7151134","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151134","url":null,"abstract":"Charge carrier mobility is a critical parameter in organic field effect transistors and it is strongly influenced by morphology and structure of the involved organic materials. In this work, we present a study on impact of grain size and surface roughness of the active layer on the mobility in top gate n-type C60 organic field effect transistors. The morphology was varied by changing the substrate temperature during C60 deposition from 100 °C to 200 °C. It is found that for the investigated top gate devices, the mobility does not strictly increase with increasing grain size, which is in disagreement with the trends reported for bottom gate OFETs. The observation is explained by the fact that the increasing grain size of C60 leads to a concurrent increase in the surface roughness, which negatively impacts the charge carrier mobility in the active channel of the OFET. As a result an optimum of the mobility is reached at 150 °C of substrate temperature where grains are already quite big, but surface roughness is still not hindering the transport.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"94 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123124232","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Shetty, Kamal John Sundar, B. Roul, S. Mukundan, G. Chandan, L. Mohan, Ambarish Ghosh, K. Vinoy, S. .. Krupanidhi
{"title":"Plasmonic enhancement of photocurrent in GaN based UV photodetectors","authors":"A. Shetty, Kamal John Sundar, B. Roul, S. Mukundan, G. Chandan, L. Mohan, Ambarish Ghosh, K. Vinoy, S. .. Krupanidhi","doi":"10.1109/ICEMELEC.2014.7151138","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151138","url":null,"abstract":"200 nm thick films of gallium nitride were grown on sapphire substrate using molecular beam epitaxy. Gold nanoparticles were fabricated on the grown films by thermal evaporation followed by annealing. Aluminium nanostructures were fabricated on another set of films using nanosphere lithography. Interdigited electrodes were fabricated using standard lithography to form metal-semiconductor-metal photodetectors. The performance of bare gallium nitride films were compared with the samples that had Au nanoparticles and Al nanostructures. An enhancement of the photocurrent with negligible change in dark current was observed in both cases.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124515486","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Sibani Bisoyi, S. P. Tiwari, U. Zschieschang, H. Klauk
{"title":"Influence of gate and drain bias on the bias-stress stability of flexible organic thin-film transistors","authors":"Sibani Bisoyi, S. P. Tiwari, U. Zschieschang, H. Klauk","doi":"10.1109/ICEMELEC.2014.7151183","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151183","url":null,"abstract":"In this paper, the influence of gate-source and drain-source bias on the bias-stress stability and lifetime of pentacene-based low-voltage (-3 V) organic thin-film transistors (TFTs) built on plastic substrate has been investigated. The 10%-current-decay lifetime is used for analyzing the influence of applied bias on the bias-stress stability of TFTs, and to compare various biasing conditions. Our results show a 3 to 4 times higher 10%-current-decay lifetime when magnitude of gate-source and drain-source voltage are equal and less than 2.5 V during bias stress, compared to that when drain-source voltage is kept at -3.0 V.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"51 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123011273","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
H. Singh, K. Sandeep, Mallikarjuna Chary, A. Balraj, Pratibha Sharma, C. Solanki
{"title":"Investigation on silver nanoparticles-based plasmonic antireflection and its impact on electrical performance of mono c-Si solar cells","authors":"H. Singh, K. Sandeep, Mallikarjuna Chary, A. Balraj, Pratibha Sharma, C. Solanki","doi":"10.1109/ICEMELEC.2014.7151167","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151167","url":null,"abstract":"Silver nanoparticles (NP's) were fabricated from silver ultrathin film deposited by e-beam evaporation using an optimized process, followed by rapid thermal annealing (RTP) done at 4000C for 1 minute on mono c-Si solar cells. The optical reflection and the electrical performance of the solar cells with and without silver nanoparticles were studied and analyzed. Incorporating Ag NP's improves the antireflection in IR wavelength range (700 nm-1200 nm) which is reflected as 7-8 % improvement in external quantum efficiency (EQE) in this range with weighted total reflectance (TWR) of 7 %. However, the high backscattering from NP's which results in high reflection in UV-Visible range, reduces the EQE in this wavelength range. The short circuit current density (extracted from EQE) is reduced from 35.5 mA/cm2 to 31.4 mA/cm2 though the Sun's Voc measurement suggests that there is relatively no impact on open circuit voltage and pseudo FF due to SiNx + NP's-based antireflection. This investigation suggests that the NP's combined with SiNx ARC is good for solar cell performance improvement in the IR range but not for broad wavelength range (300 nm-1200 nm) which is important for c-Si solar cells. Thus, the use of nanoparticles on the front surface of the solar cells cannot be utilized efficiently; however its back scattering property may be utilized using NP's at the back surface of the mono c-Si-based solar cell.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"74 5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126211073","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
B. Shankar, Sanjeev K. Gupta, W. R. Taube, J. Akhtar
{"title":"Dependence of field plate parameters on dielectric constant in a 4H-SiC Schottky diode","authors":"B. Shankar, Sanjeev K. Gupta, W. R. Taube, J. Akhtar","doi":"10.1109/ICEMELEC.2014.7151146","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151146","url":null,"abstract":"In this work, we report the dependence of optimum value of field plate parameters, viz., overlap length and dielectric thickness, on dielectric constant of field-plate dielectric in a 1900V, Ni/4H-SiC Schottky diode. Field plate overlap length and dielectric thickness are optimized for different device processing-compatible dielectric materials: SiO<sub>2</sub>, Si<sub>3</sub>N<sub>4</sub>, Al<sub>2</sub>O<sub>3</sub> and HfO<sub>2</sub>. The results show that the optimum field plate overlap length decreases and dielectric thickness increases in the presence of higher-k field plate dielectrics.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129603132","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}