2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)最新文献

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Dependence of field plate parameters on dielectric constant in a 4H-SiC Schottky diode 4H-SiC肖特基二极管中场极板参数与介电常数的关系
2014 IEEE 2nd International Conference on Emerging Electronics (ICEE) Pub Date : 2014-12-01 DOI: 10.1109/ICEMELEC.2014.7151146
B. Shankar, Sanjeev K. Gupta, W. R. Taube, J. Akhtar
{"title":"Dependence of field plate parameters on dielectric constant in a 4H-SiC Schottky diode","authors":"B. Shankar, Sanjeev K. Gupta, W. R. Taube, J. Akhtar","doi":"10.1109/ICEMELEC.2014.7151146","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151146","url":null,"abstract":"In this work, we report the dependence of optimum value of field plate parameters, viz., overlap length and dielectric thickness, on dielectric constant of field-plate dielectric in a 1900V, Ni/4H-SiC Schottky diode. Field plate overlap length and dielectric thickness are optimized for different device processing-compatible dielectric materials: SiO<sub>2</sub>, Si<sub>3</sub>N<sub>4</sub>, Al<sub>2</sub>O<sub>3</sub> and HfO<sub>2</sub>. The results show that the optimum field plate overlap length decreases and dielectric thickness increases in the presence of higher-k field plate dielectrics.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129603132","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Plasmonic enhancement of photocurrent in GaN based UV photodetectors 氮化镓基紫外光电探测器中光电流的等离子体增强
2014 IEEE 2nd International Conference on Emerging Electronics (ICEE) Pub Date : 2014-12-01 DOI: 10.1109/ICEMELEC.2014.7151138
A. Shetty, Kamal John Sundar, B. Roul, S. Mukundan, G. Chandan, L. Mohan, Ambarish Ghosh, K. Vinoy, S. .. Krupanidhi
{"title":"Plasmonic enhancement of photocurrent in GaN based UV photodetectors","authors":"A. Shetty, Kamal John Sundar, B. Roul, S. Mukundan, G. Chandan, L. Mohan, Ambarish Ghosh, K. Vinoy, S. .. Krupanidhi","doi":"10.1109/ICEMELEC.2014.7151138","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151138","url":null,"abstract":"200 nm thick films of gallium nitride were grown on sapphire substrate using molecular beam epitaxy. Gold nanoparticles were fabricated on the grown films by thermal evaporation followed by annealing. Aluminium nanostructures were fabricated on another set of films using nanosphere lithography. Interdigited electrodes were fabricated using standard lithography to form metal-semiconductor-metal photodetectors. The performance of bare gallium nitride films were compared with the samples that had Au nanoparticles and Al nanostructures. An enhancement of the photocurrent with negligible change in dark current was observed in both cases.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124515486","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Investigation on silver nanoparticles-based plasmonic antireflection and its impact on electrical performance of mono c-Si solar cells 纳米银基等离子体增透及其对单晶硅太阳能电池电性能影响的研究
2014 IEEE 2nd International Conference on Emerging Electronics (ICEE) Pub Date : 2014-12-01 DOI: 10.1109/ICEMELEC.2014.7151167
H. Singh, K. Sandeep, Mallikarjuna Chary, A. Balraj, Pratibha Sharma, C. Solanki
{"title":"Investigation on silver nanoparticles-based plasmonic antireflection and its impact on electrical performance of mono c-Si solar cells","authors":"H. Singh, K. Sandeep, Mallikarjuna Chary, A. Balraj, Pratibha Sharma, C. Solanki","doi":"10.1109/ICEMELEC.2014.7151167","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151167","url":null,"abstract":"Silver nanoparticles (NP's) were fabricated from silver ultrathin film deposited by e-beam evaporation using an optimized process, followed by rapid thermal annealing (RTP) done at 4000C for 1 minute on mono c-Si solar cells. The optical reflection and the electrical performance of the solar cells with and without silver nanoparticles were studied and analyzed. Incorporating Ag NP's improves the antireflection in IR wavelength range (700 nm-1200 nm) which is reflected as 7-8 % improvement in external quantum efficiency (EQE) in this range with weighted total reflectance (TWR) of 7 %. However, the high backscattering from NP's which results in high reflection in UV-Visible range, reduces the EQE in this wavelength range. The short circuit current density (extracted from EQE) is reduced from 35.5 mA/cm2 to 31.4 mA/cm2 though the Sun's Voc measurement suggests that there is relatively no impact on open circuit voltage and pseudo FF due to SiNx + NP's-based antireflection. This investigation suggests that the NP's combined with SiNx ARC is good for solar cell performance improvement in the IR range but not for broad wavelength range (300 nm-1200 nm) which is important for c-Si solar cells. Thus, the use of nanoparticles on the front surface of the solar cells cannot be utilized efficiently; however its back scattering property may be utilized using NP's at the back surface of the mono c-Si-based solar cell.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"74 5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126211073","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Charge-based modeling of channel material-engineered P-type double gate MOSFET 通道材料工程p型双栅MOSFET的电荷建模
2014 IEEE 2nd International Conference on Emerging Electronics (ICEE) Pub Date : 2014-12-01 DOI: 10.1109/ICEMELEC.2014.7151141
V. Kumari, Aravindan Ilango, M. Saxena, Mridula Gupta
{"title":"Charge-based modeling of channel material-engineered P-type double gate MOSFET","authors":"V. Kumari, Aravindan Ilango, M. Saxena, Mridula Gupta","doi":"10.1109/ICEMELEC.2014.7151141","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151141","url":null,"abstract":"A physics-based, charge-based model for P-type Gaussian doped DG MOSFET is presented in this work. The developed model is also applicable to the investigation of the impact of channel material on the performance of p-type DG MOSFET. The reliability issues of the p-type MOSFET have also been demonstrated using both developed analytical model and simulated results. The performance degradation due to unwanted interface trap density in both p-type and n-type DG MOSFET are also compared in this work. In addition to this, the impact of the straggle range of Gaussian doping on the performance of silicon (Si)- and germanium (Ge)-based DG MOSFET (in terms of threshold voltage, DIBL and Ion/Ioff ratio) has also been investigated and compared.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122613310","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Influence of gate and drain bias on the bias-stress stability of flexible organic thin-film transistors 栅极和漏极偏置对柔性有机薄膜晶体管偏置应力稳定性的影响
2014 IEEE 2nd International Conference on Emerging Electronics (ICEE) Pub Date : 2014-12-01 DOI: 10.1109/ICEMELEC.2014.7151183
Sibani Bisoyi, S. P. Tiwari, U. Zschieschang, H. Klauk
{"title":"Influence of gate and drain bias on the bias-stress stability of flexible organic thin-film transistors","authors":"Sibani Bisoyi, S. P. Tiwari, U. Zschieschang, H. Klauk","doi":"10.1109/ICEMELEC.2014.7151183","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151183","url":null,"abstract":"In this paper, the influence of gate-source and drain-source bias on the bias-stress stability and lifetime of pentacene-based low-voltage (-3 V) organic thin-film transistors (TFTs) built on plastic substrate has been investigated. The 10%-current-decay lifetime is used for analyzing the influence of applied bias on the bias-stress stability of TFTs, and to compare various biasing conditions. Our results show a 3 to 4 times higher 10%-current-decay lifetime when magnitude of gate-source and drain-source voltage are equal and less than 2.5 V during bias stress, compared to that when drain-source voltage is kept at -3.0 V.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"51 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123011273","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
What decides the mobility of small molecule-based organic semiconductors in organic thin film transistors ? 在有机薄膜晶体管中,是什么决定了小分子有机半导体的迁移率?
2014 IEEE 2nd International Conference on Emerging Electronics (ICEE) Pub Date : 2014-12-01 DOI: 10.1109/ICEMELEC.2014.7151194
V. Rani, Sarita Yadav, Akanksha Sharma, Subhasis Ghosh
{"title":"What decides the mobility of small molecule-based organic semiconductors in organic thin film transistors ?","authors":"V. Rani, Sarita Yadav, Akanksha Sharma, Subhasis Ghosh","doi":"10.1109/ICEMELEC.2014.7151194","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151194","url":null,"abstract":"The design of organic molecules-based devices with higher charge carrier mobility requires an in-depth understanding of elementary processes relevant to transport of charge carriers in organic thin films. Carrier mobility is large if there is a significant overlap between the molecular orbitals. Here, the exact role of chemical structure and arrangement of molecules in their crystal structure on the performance of metal-free (H2Pc)- and metal phthalocyanines (ZnPc, CuPc and F16CuPc)-based organic thin film transistors (OEFTs) has been observed by a combined experimental and theoretical study.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"31 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127816048","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Day-ahead prediction of solar power output for grid-connected solar photovoltaic installations using Artificial Neural Networks 利用人工神经网络预测并网太阳能光伏发电装置的日前输出
2014 IEEE 2nd International Conference on Emerging Electronics (ICEE) Pub Date : 2014-12-01 DOI: 10.1109/ICEMELEC.2014.7151201
R. Ehsan, S. P. Simon, P. R. Venkateswaran
{"title":"Day-ahead prediction of solar power output for grid-connected solar photovoltaic installations using Artificial Neural Networks","authors":"R. Ehsan, S. P. Simon, P. R. Venkateswaran","doi":"10.1109/ICEMELEC.2014.7151201","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151201","url":null,"abstract":"Solar Photovoltaic (PV) systems are gaining popularity as a form of alternative energy with increased environmental awareness, renewable energy usage and concern for energy security. Lack of area-specific forecasts for the power output of grid-connected photovoltaic system hinders tapping solar power on a large scale. The objective of this paper is to estimate the profile of produced power of a grid-connected 20 kWp solar power plant in a reputed manufacturing industry located in Tiruchirappalli, India [10° 44' 42.3816\" N, 78° 47' 9.4524\" E]. An Artificial Neural Network (ANN)-based model is proposed in this paper. An experimental database of solar power output (from 7th January 2014 to 10th February 2014) has been used for training the ANN. Simulations were carried out with the Neural Network Fitting Toolbox of MATLAB software. Day-Ahead Forecasting results indicate that the proposed model performs well with great accuracy and efficiency. Statistical error analysis in terms of Mean Absolute Percentage Error (MAPE) was conducted and the best result was found to be 0.2887%. Reliable area-specific solar power production map can provide better utilization of solar energy resource and help in power system management.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129173332","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 12
Material and mechanical characterization of PECVD deposited a-SiC:H with H2 dilution H2稀释PECVD沉积a-SiC:H的材料和力学特性
2014 IEEE 2nd International Conference on Emerging Electronics (ICEE) Pub Date : 2014-12-01 DOI: 10.1109/ICEMELEC.2014.7151188
U. Adithi, S. Deshpande, K. N. Bhat
{"title":"Material and mechanical characterization of PECVD deposited a-SiC:H with H2 dilution","authors":"U. Adithi, S. Deshpande, K. N. Bhat","doi":"10.1109/ICEMELEC.2014.7151188","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151188","url":null,"abstract":"In this paper, we report optical and mechanical properties of low temperature plasma enhanced chemical vapor-deposited (PECVD) amorphous hydrogenated silicon carbide (a-SiC:H) thin films. Initial screening of this process using hydrogen-dilution was performed with a two-level, three-parameter design of experiments (DOE) with eight samples. In this process regime, it was determined that the main parameters affecting silicon carbide (SiC) deposition were the RF power and the hydrogen flow rate. Based on the DOE results, a further set of four samples was prepared to modulate deposition rate and stoichiometry. Material characterization of these samples using Fourier transform infrared spectroscopy (FTIR), X-ray photolectron spectroscopy (XPS), surface profilometry and ellipsometry is presented. Further, to determine the mechanical properties, cantilevers were fabricated and characterized using scanning electron microscopy (SEM) and laser Doppler vibrometry (LDV). Based on the resonant frequency measurement and film density, the Young's modulus for the films was determined.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121403810","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Detection of multiple trap distribution from steady state current-voltage characteristics of organic diode 有机二极管稳态电流电压特性的多陷阱分布检测
2014 IEEE 2nd International Conference on Emerging Electronics (ICEE) Pub Date : 2014-12-01 DOI: 10.1109/ICEMELEC.2014.7151136
S. M. H. Rizvi, B. Mazhari
{"title":"Detection of multiple trap distribution from steady state current-voltage characteristics of organic diode","authors":"S. M. H. Rizvi, B. Mazhari","doi":"10.1109/ICEMELEC.2014.7151136","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151136","url":null,"abstract":"Traps are commonly found in organic semiconductors and their presence distinctly distorts the current-voltage (I - V) characteristics of an organic diode. The present work describes the application of the recently proposed G(V) technique in detecting the presence of multiple trap distribution. G - V characteristics show significantly different signatures of Gaussian and exponential traps which allow easy detection of more than one type of trap distribution. Numerical simulations coupled with experimental results of Poly-(3-hexylthiophene) (P3HT) and blends of P3HT and [6,6] phenyl C61 butyric acid methyl ester (PCBM) diodes show the presence of shallow and deep traps with different distributions.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"24 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116724000","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Subthreshold Analog/RF performance estimation of doping-less DGFET for ULP applications 用于ULP应用的无掺杂DGFET的亚阈值模拟/射频性能估计
2014 IEEE 2nd International Conference on Emerging Electronics (ICEE) Pub Date : 2014-12-01 DOI: 10.1109/ICEMELEC.2014.7151211
Anup Kumar, Chitrakant Sahu, Jawar Singh
{"title":"Subthreshold Analog/RF performance estimation of doping-less DGFET for ULP applications","authors":"Anup Kumar, Chitrakant Sahu, Jawar Singh","doi":"10.1109/ICEMELEC.2014.7151211","DOIUrl":"https://doi.org/10.1109/ICEMELEC.2014.7151211","url":null,"abstract":"In this paper, we report the potential of the doping-less (DL) double gate field effect transistor (DL-DGFET), for ultra low power (ULP) subthreshold logic applications. We demonstrated that the proposed DL-DGFET do not require any doping from source to drain region and it can perform significantly better than highly doped junctionless (JL) and abrupt S/D inversion-mode (IM) DGFETs. The DL-DGFET achieves 1.8X and 2.75X cutoff frequency (fT), 1.7X and 3X maximum frequency of oscillation (fMAX) along with 10.5 and 18.6 dB improvement in intrinsic voltage gain (AVO) in comparison to conventional JL and non-underlap FETs, respectively. Simulation results revealed that the DL-DGFET alleviates the inherent trade-off between gain and bandwidth of nanodevices by 6X improvement in gain frequency product (GFP) over highly doped JL-DGFET due to significant reduction in parasitic capacitances.","PeriodicalId":186054,"journal":{"name":"2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)","volume":"21 3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114293262","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
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