Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium最新文献

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Scheduling jobs with machine-dependent processing times 使用与机器相关的处理时间调度作业
Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium Pub Date : 1996-10-14 DOI: 10.1109/IEMT.1996.559680
Yi-Feng Hung, Jui-ling Yang
{"title":"Scheduling jobs with machine-dependent processing times","authors":"Yi-Feng Hung, Jui-ling Yang","doi":"10.1109/IEMT.1996.559680","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559680","url":null,"abstract":"In semiconductor manufacturing, the rapid development of manufacturing equipment allows product processing to be achieved by machines of different generations whose processing speed may be different. In this study, we propose several heuristics to schedule independent jobs on machines with different processing speeds. The scope of this research is limited to a static and deterministic problem. The scheduling objective is to minimize two due-date-related criteria: total lateness and total tardiness, respectively.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"15 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129595730","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Yield learning model for integrated circuit package assembly 集成电路封装组装成品率学习模型
Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium Pub Date : 1996-10-14 DOI: 10.1109/IEMT.1996.559753
A. Sarwar, S. Balasubramaniam, D. Walker
{"title":"Yield learning model for integrated circuit package assembly","authors":"A. Sarwar, S. Balasubramaniam, D. Walker","doi":"10.1109/IEMT.1996.559753","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559753","url":null,"abstract":"This paper describes a model for yield learning in integrated circuit package assembly. This model provides a management tool for yield projection, resource allocation and what-if analysis. An Excel spreadsheet-based model was developed using a series of case studies of TCP, PQFP, CBGA, and PBGA packages entering manufacturing. The factors that affect yield learning rates (e.g. process complexity, production volumes, personnel experience) were identified and models successfully built to predict the yield ramp for each product. We found that a common model with a common set of factors and the same relative factor importance could be used for all package technologies.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"125 1-3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116705902","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
FASE: a scheduling environment for semiconductor fabrication FASE:用于半导体制造的调度环境
Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium Pub Date : 1996-10-14 DOI: 10.1109/IEMT.1996.559679
J. Shiu, T.-K. Hwang, Yen-Wen Huang, C. Tsai, W. Su, Y. Cheng, Shi-Chung Chang, C. Chien
{"title":"FASE: a scheduling environment for semiconductor fabrication","authors":"J. Shiu, T.-K. Hwang, Yen-Wen Huang, C. Tsai, W. Su, Y. Cheng, Shi-Chung Chang, C. Chien","doi":"10.1109/IEMT.1996.559679","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559679","url":null,"abstract":"FASE is a computer-aided scheduling environment developed for semiconductor fabrication. Its current version includes: (1) a mid-term and daily scheduler, (2) a machine variability analyzer, (3) a what-if analysis tool and (4) a friendly graphic user interface (GUI). The scheduler is extended from an optimization-based scheduler for a R&D pilot line to a mass production fab application. To identify capacity and cycle time bottlenecks, a variability analyzer is developed, which functions jointly with the scheduler. The what-if analysis tool combines GUI technique, the scheduler and the variability analyzer to answer what-if questions on capacity variation, desired output variation, etc. Test results using field data indicate that FASE provides an decision aid in addressing many issues encountered in scheduling semiconductor fabrication.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"24 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122823008","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Statistical optimization of high frequency LDMOS devices via hyper-fractionated experimental designs 基于超分馏实验设计的高频LDMOS器件统计优化
Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium Pub Date : 1996-10-14 DOI: 10.1109/IEMT.1996.559788
R. Elias, G. Ma, L. Golonka
{"title":"Statistical optimization of high frequency LDMOS devices via hyper-fractionated experimental designs","authors":"R. Elias, G. Ma, L. Golonka","doi":"10.1109/IEMT.1996.559788","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559788","url":null,"abstract":"Advanced statistical techniques are utilized to develop a multivariable device characterization of a submicron, two gigahertz laterally diffused metal oxide semiconductor (LDMOS) transistor. A twelve variable, 1/128th fractional factorial of resolution class IV is designed and executed to characterize this device in terms of threshold voltage, contact resistance, and leakages. The Motorola \"10/spl times/\" Product Development Initiative is presented and the contribution of hyper-fractionated experimental designs to this and other \"time to market\" challenges is discussed.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114131361","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Escape routing from chip scale packages 逃避芯片级封装的路由
Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium Pub Date : 1996-10-14 DOI: 10.1109/IEMT.1996.559771
E. Winkler
{"title":"Escape routing from chip scale packages","authors":"E. Winkler","doi":"10.1109/IEMT.1996.559771","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559771","url":null,"abstract":"Electronic packaging has steadily been miniaturized to reduce component weight and volume for portable applications and to enhance system speed performance. Package sizes approach the chip size in the chip size package (CSP) while retaining discrete package advantages in handling and test. In the CSP approach the ball interconnect (C5 balls) between package and mother board may be placed at pitches as low as 0.5 mm. There are, however, limitations to the number of escape vias/traces which mother boards can handle. These limits are a function of the C5 pad size and pitch, via land size and pitch, trace pitch and the number of C5 pads. In addition, features such as blind and buried vias can enhance the under-package escape routability but for PWBs these features bring a significant board cost penalty. This paper addresses escape layer count for full array CSPs and also depopulated array CSPs where C5 pads are only in outer C5 rings. For a full C5 array, using high density (0.5 mm) C5 pitch and leading edge PWB technology for the mother board (projected for the year 2000), only one signal ring can escape per PWB layer. The inner, smaller rings in this calculation with /spl sim/30% power and ground are routed to common power and ground planes. In order to succeed in full array escape within the PWB, the costly add-ons of filled, blind vias are required. With emerging high density interconnect (HDI) where via pads are in the range of 0.2 mm or less and trace pitch is about 0.1 mm, escape routing is readily achieved.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"29 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123100429","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
Next generation coating technologies for low-cost electronics manufacturing 低成本电子制造的下一代涂层技术
Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium Pub Date : 1996-10-14 DOI: 10.1109/IEMT.1996.559790
S. Bagen, G. Gibson, C. Newquist, H. Sago
{"title":"Next generation coating technologies for low-cost electronics manufacturing","authors":"S. Bagen, G. Gibson, C. Newquist, H. Sago","doi":"10.1109/IEMT.1996.559790","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559790","url":null,"abstract":"Extrusion coating and extrude-and-spin coating have been developed to significantly reduce the costs associated with the application of polymer films such as photoresists, dielectrics and color filter materials. These technologies are shown to reduce process fluid utilization by 75-95% as compared to conventional spin coating. Extrusion coating is readily scaled to accommodate increasingly larger square or rectangular substrates with high throughput. A wide variety of extrusion-coated films ranging from 300 /spl Aring/ to greater than 150 /spl mu/m thick have been demonstrated on substrates up to 600 mm in size. Typical film thickness uniformity is +/-3%. The extrusion coater system was shown to produce pinhole-free coatings with particle counts meeting or exceeding industry standards. Extrude-and-spin coating has been successfully demonstrated on 370/spl times/470 mm rectangular display glass substrates with film thickness uniformities of less than +/-3%. This technology is also being developed for processing round substrates, such as silicon wafers.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"37 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122107241","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
A thin and low thermal resistance aluminum nitride BGA package for high speed DSP devices 一种用于高速DSP器件的薄而低热阻氮化铝BGA封装
Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium Pub Date : 1996-10-14 DOI: 10.1109/IEMT.1996.559694
N. Iwase, T. Yasumoto, H. Asai, J. Monma, K. Yano, H. Hayashida
{"title":"A thin and low thermal resistance aluminum nitride BGA package for high speed DSP devices","authors":"N. Iwase, T. Yasumoto, H. Asai, J. Monma, K. Yano, H. Hayashida","doi":"10.1109/IEMT.1996.559694","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559694","url":null,"abstract":"Low thermal resistance and high TCT (temperature cycle test) reliability have been attained by thin AlN BGA package structure. High speed signal transmission for multimedia DSP (digital signal processor) has been analyzed by computer simulation. The package has 0.6 mm body thickness, which is 1/3 of ordinary ceramic packages. A low thermal resistance of 4.8 /spl deg/C/W has been attained without a heat sink and with no air cooling while mounted on a PWB having 4 conductive layers. Scattering parameters were measured up to 9 GHz and applied to 250 MHz clock signal simulation. No deterioration of signal waveforms was observed during the simulation. The effects of package thickness and package size have been discussed from the thermal resistance and TCT reliability point of view. Thicker and larger package size provided lower thermal resistance. The developed package thickness and size (35/spl times/35 mm) have been determined by taking into account the application field of mobile PCs (personal computers) and through simulation. The package thickness versus TCT reliability has been discussed, and then the TCT has been carried out under an assembled condition on a PWB, and MTTF of 1 k cycles has been derived.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"75 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124084711","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Self-aligning flip-chip assembly using eutectic gold/tin solder in different atmospheres 在不同气氛下使用共晶金/锡焊料的自对准倒装芯片组装
Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium Pub Date : 1996-10-14 DOI: 10.1109/IEMT.1996.559677
C. Kallmayer, H. Oppermann, G. Eugelmann, E. Zakel, H. Reichl
{"title":"Self-aligning flip-chip assembly using eutectic gold/tin solder in different atmospheres","authors":"C. Kallmayer, H. Oppermann, G. Eugelmann, E. Zakel, H. Reichl","doi":"10.1109/IEMT.1996.559677","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559677","url":null,"abstract":"New applications in the field of optoelectronic packaging as well as environmental concerns lead to a growing interest in fluxless assembly processes. Eutectic gold/tin solder offers the possibility of fluxless flip chip soldering on various substrate materials and substrate metallizations. It has been shown that gold/tin solder is applicable for flip chip assembly by different techniques. Using the self-alignment mechanism of the solder, cost effective flip chip assembly with high accuracy can be realized, as the process requires only coarse positioning prior to the soldering. The scope of this paper is to investigate the self-alignment capability of gold/tin solder for fluxless soldering processes in different atmospheres. During the soldering, the atmosphere determines the thickness of the oxide layer which inhibits the wetting of the pads and therefore the self-alignment. In this study, the impact of inert and reducing atmospheres on the self-alignment capability is investigated. The experiments are performed in nitrogen, active atmosphere and hydrogen. Vernier patterns on chips and substrates allow the quantification of the positioning accuracy. Comparing the results, a conclusion about the optimum atmosphere for self-aligning flip chip assembly can be drawn. As an example, the application of the choice process is shown for optoelectronic devices.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"2 4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133114582","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 22
Quantifying the benefits of cycle time reduction in semiconductor wafer fabrication 量化半导体晶圆制造周期缩短的效益
Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium Pub Date : 1996-10-14 DOI: 10.1109/IEMT.1996.559705
K. Nemoto, E. Akçalı, R. Uzsoy
{"title":"Quantifying the benefits of cycle time reduction in semiconductor wafer fabrication","authors":"K. Nemoto, E. Akçalı, R. Uzsoy","doi":"10.1109/IEMT.1996.559705","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559705","url":null,"abstract":"In recent years, semiconductor manufacturing has become extremely complex due to device size reduction. Hence the manufacturing cycle time, also called turn around time (TAT), which is defined as the time required from wafer input through probing test, becomes longer year by year. This renders the delay between process defect occurrence and detection a significant problem. On the other hand, customer demands for faster delivery are increasing because their product life cycles are getting shorter. Therefore, TAT reduction is important for semiconductor manufacturers not only to satisfy customer requirements, but also to remain competitive in their market. This paper examines the financial benefits of TAT reduction using stochastic simulation.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"5 4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131938681","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 48
Eutectic solder flip chip technology for chip scale package 芯片级封装用共晶焊料倒装技术
Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium Pub Date : 1996-10-14 DOI: 10.1109/IEMT.1996.559794
C. Takubo, N. Hirano, K. Doi, H. Tazawa, E. Hosomi, Y. Hiruta
{"title":"Eutectic solder flip chip technology for chip scale package","authors":"C. Takubo, N. Hirano, K. Doi, H. Tazawa, E. Hosomi, Y. Hiruta","doi":"10.1109/IEMT.1996.559794","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559794","url":null,"abstract":"Chip Scale Package (CSP) has been developed by applying the flip chip technology with the eutectic Sn/Pb solder bumps. The package size is only 1 mm larger than the chip size. The eutectic solder has advantages such as a good wettability to the electrodes, a strong self-alignment effect and a low melting point. So, it is quite suitable for a chip assembly onto the plastic substrate as well as the ceramic substrate. An electroplating method has been developed for the formation of the eutectic solder bumps. The barrier metals has been selected as Ti/Ni/Pd for higher barrier effect. The flip chip interconnection process has been also developed. The various kinds of the reliability of the interconnection portion were investigated using the test vehicle of the ceramic and plastic substrate. The results of the test confirmed the reliable fabrication of the CSP using the eutectic solder flip chip technology.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"65 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115188994","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
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