低成本电子制造的下一代涂层技术

S. Bagen, G. Gibson, C. Newquist, H. Sago
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引用次数: 5

摘要

挤出涂层和挤出旋转涂层的发展大大降低了与聚合物薄膜(如光刻胶、电介质和滤色材料)应用相关的成本。与传统的旋转涂层相比,这些技术可以减少75-95%的工艺流体利用率。挤压涂层很容易缩放,以适应越来越大的方形或矩形基材,具有高吞吐量。各种各样的挤压涂层薄膜,厚度从300 /spl μ m到大于150 /spl μ m,已经在尺寸达600毫米的基材上得到了证明。典型的膜厚均匀度为+/-3%。该挤出涂布机系统生产的无针孔涂层颗粒数达到或超过行业标准。在370/spl次/470 mm矩形显示玻璃基板上成功地展示了挤出旋转涂层,薄膜厚度均匀性小于+/-3%。这项技术也正在开发用于处理圆形衬底,如硅晶圆。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Next generation coating technologies for low-cost electronics manufacturing
Extrusion coating and extrude-and-spin coating have been developed to significantly reduce the costs associated with the application of polymer films such as photoresists, dielectrics and color filter materials. These technologies are shown to reduce process fluid utilization by 75-95% as compared to conventional spin coating. Extrusion coating is readily scaled to accommodate increasingly larger square or rectangular substrates with high throughput. A wide variety of extrusion-coated films ranging from 300 /spl Aring/ to greater than 150 /spl mu/m thick have been demonstrated on substrates up to 600 mm in size. Typical film thickness uniformity is +/-3%. The extrusion coater system was shown to produce pinhole-free coatings with particle counts meeting or exceeding industry standards. Extrude-and-spin coating has been successfully demonstrated on 370/spl times/470 mm rectangular display glass substrates with film thickness uniformities of less than +/-3%. This technology is also being developed for processing round substrates, such as silicon wafers.
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