{"title":"基于超分馏实验设计的高频LDMOS器件统计优化","authors":"R. Elias, G. Ma, L. Golonka","doi":"10.1109/IEMT.1996.559788","DOIUrl":null,"url":null,"abstract":"Advanced statistical techniques are utilized to develop a multivariable device characterization of a submicron, two gigahertz laterally diffused metal oxide semiconductor (LDMOS) transistor. A twelve variable, 1/128th fractional factorial of resolution class IV is designed and executed to characterize this device in terms of threshold voltage, contact resistance, and leakages. The Motorola \"10/spl times/\" Product Development Initiative is presented and the contribution of hyper-fractionated experimental designs to this and other \"time to market\" challenges is discussed.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Statistical optimization of high frequency LDMOS devices via hyper-fractionated experimental designs\",\"authors\":\"R. Elias, G. Ma, L. Golonka\",\"doi\":\"10.1109/IEMT.1996.559788\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Advanced statistical techniques are utilized to develop a multivariable device characterization of a submicron, two gigahertz laterally diffused metal oxide semiconductor (LDMOS) transistor. A twelve variable, 1/128th fractional factorial of resolution class IV is designed and executed to characterize this device in terms of threshold voltage, contact resistance, and leakages. The Motorola \\\"10/spl times/\\\" Product Development Initiative is presented and the contribution of hyper-fractionated experimental designs to this and other \\\"time to market\\\" challenges is discussed.\",\"PeriodicalId\":177653,\"journal\":{\"name\":\"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium\",\"volume\":\"4 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1996-10-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEMT.1996.559788\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEMT.1996.559788","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Statistical optimization of high frequency LDMOS devices via hyper-fractionated experimental designs
Advanced statistical techniques are utilized to develop a multivariable device characterization of a submicron, two gigahertz laterally diffused metal oxide semiconductor (LDMOS) transistor. A twelve variable, 1/128th fractional factorial of resolution class IV is designed and executed to characterize this device in terms of threshold voltage, contact resistance, and leakages. The Motorola "10/spl times/" Product Development Initiative is presented and the contribution of hyper-fractionated experimental designs to this and other "time to market" challenges is discussed.