T. Okura, M. Kanai, S. Ogata, T. Takei, H. Takakusagi
{"title":"Optimization of solder paste printability with laser inspection technique","authors":"T. Okura, M. Kanai, S. Ogata, T. Takei, H. Takakusagi","doi":"10.1109/IEMT.1995.526187","DOIUrl":"https://doi.org/10.1109/IEMT.1995.526187","url":null,"abstract":"This paper describes an evaluation technique for solder paste printability using a solder paste inspection system and optimization of printing parameters. In a Surface Mount Assembly (SMA), it is very important to evaluate printability of solder paste precisely, because printability of solder paste directly influences reflow soldering quality. We established quite reliable inspection criteria for print quantity of solder paste. So it was found that about 90% of reflow soldering defects could be reduced by prevention of printing defects. Furthermore, since package types have been varied in a SMA, high soldering quality demands stable printability for all patterns. This paper presents a printability evaluation adopted procedure based on the quality engineering (TAGUCHI method). As a result of optimizing squeegee shape and printer condition by this evaluation method, printability was improved better than 20% in the production process. And optimization of solder paste and stencil added to printer condition resulted in good printability for 0.3 mm pitch patterns on the optimum condition.","PeriodicalId":123707,"journal":{"name":"Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'","volume":"62 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114578635","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Manufacturing ownership through process re-engineering","authors":"J. Stobaugh, A. Rosentrater","doi":"10.1109/IEMT.1995.526091","DOIUrl":"https://doi.org/10.1109/IEMT.1995.526091","url":null,"abstract":"Summary form only given. This paper explains the process being used at the IBM electronic card and test facility in Austin, Texas to gain ownership and commitment through the involvement of manufacturing personnel in process re-engineering. The approach is simple and straight-forward, encompassing shared vision and values, organization, staffing, roles and responsibilities, measurements and the manufacturing process itself. Process results and customer feedback reflect the employees' enthusiastic commitment to quality and customer satisfaction.","PeriodicalId":123707,"journal":{"name":"Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'","volume":"278 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117349148","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Model-based product quantity control","authors":"V. Ramakrishnan, D. Walker","doi":"10.1109/IEMT.1995.526192","DOIUrl":"https://doi.org/10.1109/IEMT.1995.526192","url":null,"abstract":"A methodology for building Response Surface Models (RSM) for product quantity control of integrated circuits is presented. A simulation based approach is used to build the models. The work focuses on controlling the number of wafer starts devoted to each product based on in-line, in-situ and Wafer-level Electric Tests (WET). Real-time decisions are made depending on the demand for a particular performance bin.","PeriodicalId":123707,"journal":{"name":"Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'","volume":"48 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117214445","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Electrical and mechanical studies of MCM-D interconnect structure","authors":"F. Chao, R. Wu, M. Pecht","doi":"10.1109/IEMT.1995.526100","DOIUrl":"https://doi.org/10.1109/IEMT.1995.526100","url":null,"abstract":"The electrical and mechanical properties of a multilayer thin-film MCM-D interconnect are studied in this investigation. Numerical analyses are executed to calculate the electrical parameters of thin-film microstrip line and it shows that the additional delay decreases while increasing the thickness of the conductor. Environmental scanning electron microscopy (E-SEM) was utilized to characterize mechanical induced defects in signal line. Cracking on metal lines and delamination of polyimide/metal interfaces due to mismatch of coefficient of thermal expansion and the moisture absorption of the polyimide film were observed.","PeriodicalId":123707,"journal":{"name":"Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'","volume":"199 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124457696","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Alternative facility layouts for semiconductor wafer fabrication facilities","authors":"R. Hase, R. Uzsoy, C. Takoudis","doi":"10.1109/IEMT.1995.526191","DOIUrl":"https://doi.org/10.1109/IEMT.1995.526191","url":null,"abstract":"Examines the performance of several different cellular and functional layouts using simulation models of the different facility designs. The performance measure of interest is the mean time in system or cycle time of lots. Our results show that the presence of unreliable machinery causes the performance of cellular layouts to deteriorate, while the presence of significant setup times improves their performance relative to other layouts. The results also indicate that a very modest amount of additional capacity at critical workcenters results in significant improvements in the performance of functional layouts.","PeriodicalId":123707,"journal":{"name":"Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'","volume":"32 5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126164195","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"A simple and reproducible method towards fabricating defect-free and reliable solder joints","authors":"D. Xie, Y. Chan, J. Lai","doi":"10.1109/IEMT.1995.526188","DOIUrl":"https://doi.org/10.1109/IEMT.1995.526188","url":null,"abstract":"This paper describes a simple and reproducible method to obtain defect-free and reliable solder joints. That is to split the solder joints fabricated from an infrared (IR) reflow soldering process. The characteristics of split solder joints have been critically studied. It is found that the method of splitting is effective in eliminating pore formation (both gas and shrinkage pores) and inclusions in solder joints. The method is applicable to various solder pastes whether it be no-clean or water-soluble. Thermal and mechanical fatigue cycling tests show that fatigue life of the solder joints can be prolonged by more than 60% as compared to that without splitting. Fractographs illustrate that the fractured section in the fatigued joints occurs quite often at the interfaces of printed circuit board (PCB) and copper pads after splitting has been applied to the joints. This strongly testifies the solder portion has been strengthened by splitting. The proposed method is specially suitable for specimens with large pad area in each joint or where the pores or inclusions most likely appear.","PeriodicalId":123707,"journal":{"name":"Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129873700","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
V. Sankaran, B. Chartrand, D.L.H. Lillard, M. Embrechts, R. Kraft
{"title":"Automated inspection of solder joints-a neural network approach","authors":"V. Sankaran, B. Chartrand, D.L.H. Lillard, M. Embrechts, R. Kraft","doi":"10.1109/IEMT.1995.526120","DOIUrl":"https://doi.org/10.1109/IEMT.1995.526120","url":null,"abstract":"This paper describes a PC-based system for automated inspection of solder joints using neural networks. It presents extensive application of neural networks to solder joint quality data in the form of visual images. Numerous methods for data compression and feature extraction have been applied to enhance the performance of the neural networks. Up to 92 per cent accuracy in identifying solder joint defects was achieved using visual images. This discussion deals with visible light images only but all techniques may be extended equally to X-ray laminographic images as preliminary results from such applications indicate.","PeriodicalId":123707,"journal":{"name":"Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'","volume":"151 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132315246","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"LSM vision gage R&R study","authors":"W. S. Messina, L.G. Willey, K. W. Jones","doi":"10.1109/IEMT.1995.526194","DOIUrl":"https://doi.org/10.1109/IEMT.1995.526194","url":null,"abstract":"The purpose of this study is to assess whether the laser scanning microscope (LSM) is capable of measuring solder paste height. The LSM projects a scanning laser beam onto the PC board which is deflected around the solder paste deposit. The height of the paste was determined by taking the difference between the highest (top) and lowest (bottom) laser deflection points on and surrounding the paste deposit respectively.","PeriodicalId":123707,"journal":{"name":"Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'","volume":"51 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121123180","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Development of 0.5 mm thick small outline packages","authors":"Y. Song, Seung-Ho Ahn, S. Oh","doi":"10.1109/IEMT.1995.526179","DOIUrl":"https://doi.org/10.1109/IEMT.1995.526179","url":null,"abstract":"Two types of 0.5 mm thick UTSOP's (Ultra Thin Small Outline Packages) were developed, a conventional type with die pad, and a LOC(Lead on Chip) type. In both types, the die pad or the backside of the chip is exposed to the bottom of the package. In order to accomplish 0.5 mm thickness of the package, high strength alloy lead frames with 100 /spl mu/m thickness, and low-loop wire-bonding technology were used. The chip thicknesses in the conventional type, and the LOC type were 200 /spl mu/m and 300 /spl mu/m, respectively. Because, from the package structural point of view, the top half and the bottom half of the packages were unbalanced in terms of thermal expansion coefficients, the warpage of the packages was an expected problem. However, the warpage was reduced below 40 /spl mu/m by the material changes and the modification of lead frame design. Various molding compounds with different characteristics, and two kinds of lead frame materials were tried. Package reliability of the UTSOP's were evaluated.","PeriodicalId":123707,"journal":{"name":"Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128052379","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"The experience of lead users in the adoption of minienvironment technology","authors":"M. Rappa","doi":"10.1109/IEMT.1995.526126","DOIUrl":"https://doi.org/10.1109/IEMT.1995.526126","url":null,"abstract":"During the past few years, the use of minienvironment technology has rapidly emerged as an important strategy for containing cost and reducing particle contamination in semiconductor integrated circuit fabrication. However, implementation of minienvironment technology is not uniform throughout the semiconductor industry and, in particular, several well-recognized leading firms have been slow to adopt the technology. This paper discusses the experiences of several lead users of minienvironment technology based on data collected from interviews and an industry-wide survey. Generally speaking, lead users have found the technology to be quite beneficial on a number of important dimensions, including cost and contamination control. The experiences and perceptions of lead users provide a contrast to firms that have studied the technology closely, but do not have much actual experience using minienvironments. Lead users report significant cost savings and sub-Class 1 at the wafer surface, while non-users usually perceive far less benefit, particularly in terms of cost. One indication of the effectiveness of the technology is that many lead users continue to expand their investments in minienvironments. The author argues that, compared to industry leaders, lead users of minienvironments may provide greater insight into the usefulness of the technology because these firms are further along the learning curve.","PeriodicalId":123707,"journal":{"name":"Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'","volume":"58 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134024841","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}