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Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference最新文献

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Analysis of polarization of secondary electrons emitted from magnetic materials 磁性材料发射的二次电子极化分析
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797527
K. Tamura, H. Yasuda, K. Murata, K. Koike, M. Kotera
{"title":"Analysis of polarization of secondary electrons emitted from magnetic materials","authors":"K. Tamura, H. Yasuda, K. Murata, K. Koike, M. Kotera","doi":"10.1109/IMNC.1999.797527","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797527","url":null,"abstract":"The polarization phenomenon of secondary elections scattered from magnetic materials has important applications in the field of magnetic measurement, such as spin polarization scanning electron microscopy and spin polarization secondary electron spectroscopy. The study of the polarization phenomenon of secondary electrons gives a better understanding of the information obtained by those methods. Therefore, it is important to analyze secondary electron emission from the magnetic materials considering the electron spin. The energy distribution and primary energy dependence of the polarization of secondary electrons have been studied experimentally for a few decades. Here, the spin polarization of secondary electrons emitted from a permalloy material is calculated as functions of the energy and the incident angle of primary electrons. The validity of the simulation is confirmed by a comparison with experimental results.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"39 12","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"113991582","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Nano-imprint lithography for single electron tunneling devices using novel mold 单电子隧道器件的纳米压印技术
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797507
Y. Hirai, Y. Kanemaki, K. Murata, Y. Tanaka
{"title":"Nano-imprint lithography for single electron tunneling devices using novel mold","authors":"Y. Hirai, Y. Kanemaki, K. Murata, Y. Tanaka","doi":"10.1109/IMNC.1999.797507","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797507","url":null,"abstract":"A novel mold fabrication method for nano-imprint lithography is newly proposed. Utilizing anisotropic wet chemical etching, the mold formation having narrow gaps is principally confirmed, which would be useful for fabrication of tunneling barriers for single electron devices by imprinting lithography.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"53 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123529178","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Radiation damage in focused ion beam implantation 聚焦离子束注入中的辐射损伤
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797519
S. Hausmann, L. Bischoff, J. Teichert, M. Voelskow, W. Moller
{"title":"Radiation damage in focused ion beam implantation","authors":"S. Hausmann, L. Bischoff, J. Teichert, M. Voelskow, W. Moller","doi":"10.1109/IMNC.1999.797519","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797519","url":null,"abstract":"Compared to conventional ion implantation, focused ion beam (FIB) implantation works with a current density which is up to five orders of magnitude higher. This has an effect on the accumulated radiation damage during the implantation process. The present work shows how the radiation damage is influenced by the dwell-time in the case of focused ion beam synthesis (IBS) of cobalt disilicide. If the accumulated damage during implantation is not too high the use of conventional ion implantation IBS results in single-crystalline CoSi/sub 2/ layers.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114340992","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
New writing routines for SEM based e-beam lithography 基于扫描电镜的电子束光刻新书写程序
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797501
S. Dubonos, H. Raith, A. Svintsov, S. Zaitsev
{"title":"New writing routines for SEM based e-beam lithography","authors":"S. Dubonos, H. Raith, A. Svintsov, S. Zaitsev","doi":"10.1109/IMNC.1999.797501","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797501","url":null,"abstract":"The challenge of SEM based e-beam lithography is not just in copying writing routines used in dedicated e-beam lithography machines, but also in exploring new fields of application. A new writing routine for TIFF images with their 256 grey levels allows to produce 3-dimensional structures in resist, which can be used e.g. for the direct writing of computer-generated phase holograms. Another new writing routine allows a full compensation of limiting SEM performance in respect to its dynamic behaviour and field distortion. By using this method, the main restrictions of SEM based e-beam lithography can be overcome.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"300 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114579469","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Chemistry and analysis in integrated chemistry lab on chip 芯片上集成化学实验室的化学与分析
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797481
T. Kitamori
{"title":"Chemistry and analysis in integrated chemistry lab on chip","authors":"T. Kitamori","doi":"10.1109/IMNC.1999.797481","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797481","url":null,"abstract":"It is indispensable for the realization of integration of chemical systems on a small substrate to characterize and control molecular behavior in a liquid microspace from a chemical viewpoint as well as the development of microfabrication techniques. We have characterized a liquid microspace in a microchannel by large specific interface area, short molecular diffusion distance, small heat capacity and localized uniform field. Molecular transport, reaction control, and other chemical operations were realized in a microspace by using these characteristics and photothermal techniques.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"79 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117243018","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Chemically amplified electron beam positive resist with acetal protecting group 带有缩醛保护基团的化学放大电子束正极抗蚀剂
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797487
S. Saito, N. Kihara, T. Ushirogouchi, T. Nakasugi
{"title":"Chemically amplified electron beam positive resist with acetal protecting group","authors":"S. Saito, N. Kihara, T. Ushirogouchi, T. Nakasugi","doi":"10.1109/IMNC.1999.797487","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797487","url":null,"abstract":"In this paper, we discuss about the chemically amplified EB positive resist based on acetal-protected Poly(hydroxystyrene) (PHS) and investigate the influence of the photo-acid generator to resist performance.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"45 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133172966","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Microfabrication technologies and micro-flow devices for chemical and bio-chemical micro flow systems 用于化学和生化微流系统的微加工技术和微流装置
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797482
S. Shoji
{"title":"Microfabrication technologies and micro-flow devices for chemical and bio-chemical micro flow systems","authors":"S. Shoji","doi":"10.1109/IMNC.1999.797482","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797482","url":null,"abstract":"Micromachining, based on photolithography commonly used in integrated circuit technology, has been applied to miniaturize chemical and bio-chemical analysis systems. Micro/miniaturized total analysis systems (/spl mu/TAS), developed so far, can be classified into two groups. One is a MEMS-type system using pressurized flow by mechanical flow control devices, for example, microvalves and micropumps. The other uses electrically driven liquid handling without mechanical elements. Typically electroosmotic flow has been used so far. Planar capillary electrophoresis (chip CE) type systems are the common application of this method. Microfabrication technologies and micro flow control devices applied to the chemical and biochemical micro flow systems are reviewed.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130153434","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
Lithography simulator for EB/DUV intra-level mix and match 光刻模拟器的EB/DUV内电平混合和匹配
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797465
R. Inanami, T. Nakasugi, S. Sato, S. Mimotogi, S. Tanaka, K. Sugihara
{"title":"Lithography simulator for EB/DUV intra-level mix and match","authors":"R. Inanami, T. Nakasugi, S. Sato, S. Mimotogi, S. Tanaka, K. Sugihara","doi":"10.1109/IMNC.1999.797465","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797465","url":null,"abstract":"EB/DUV intra-level mix and match (ILM&M) will make possible realization of both patterning finer than is attainable with DUV lithography and throughput higher than in the case of exposure only by EB writer. In order to realize the EB/DUV-ILM&M, the following two problems must be overcome. (1) The final size of the DUV exposed pattern is changed due to the influence of the position of EB exposed pattern, because of exposure to widely distributed back-scattered electrons. (2) Patterns exposed respectively by EB and DUV are separated or overlapped, due to moving of wafers in and out of each exposure apparatus, and their different registration methods. These problems make it very difficult to fabricate electronic devices that operate satisfactorily. Therefore, simulation of the ILM&M process is a prerequisite for fruitful examination of fabrication in the presence of these problems. We developed a lithography simulator corresponding to the EB/DUV-ILM&M process.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"28 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121745299","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Design concepts of single-layer-resists for VUV lithography VUV光刻用单层抗蚀剂的设计理念
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797559
S. Kishimura, A. Katsuyama, M. Sasago, M. Shirai, M. Tsunooka
{"title":"Design concepts of single-layer-resists for VUV lithography","authors":"S. Kishimura, A. Katsuyama, M. Sasago, M. Shirai, M. Tsunooka","doi":"10.1109/IMNC.1999.797559","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797559","url":null,"abstract":"We have studied the design of single-layer-resists for VUV lithography. From the point of view of transparency, phenol resins may be used as well as methacrylate polymers in VUV lithography. The resulting high contrast is thought due to the effect of direct photodecomposition of base polymer and photo-deprotection in addition to the deprotection by acids. We are planning to investigate the polymers with higher transparency (ex. halogen-substituted phenol resins) and the polymer structure inhibiting the crosslinking.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"76 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127105948","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Microfabricated gas phase chemical analysis systems 微型气相化学分析系统
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797476
G. Frye-Mason, R. Manginell, E. Heller, C. Matzke, S. Casalnuovo, V. Hietala, R. Kottenstette, P. Lewis, C. Wong
{"title":"Microfabricated gas phase chemical analysis systems","authors":"G. Frye-Mason, R. Manginell, E. Heller, C. Matzke, S. Casalnuovo, V. Hietala, R. Kottenstette, P. Lewis, C. Wong","doi":"10.1109/IMNC.1999.797476","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797476","url":null,"abstract":"A portable, autonomous, hand-held chemical laboratory (/spl mu/ChemLab/sup TM/) is being developed for trace detection (ppb) of chemical warfare (CW) agents and explosives in real-world environments containing high concentrations of interfering compounds. Microfabrication is utilized to provide miniature, low-power components that are characterized by rapid, sensitive and selective response. Sensitivity and selectivity are enhanced using two parallel analysis channels, each containing the sequential connection of a front-end sample collector/concentrator, a gas chromatographic (GC) separator, and a surface acoustic wave (SAW) detector. Component design and fabrication and system performance are described.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"109 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114465268","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 16
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