New writing routines for SEM based e-beam lithography

Abstract

The challenge of SEM based e-beam lithography is not just in copying writing routines used in dedicated e-beam lithography machines, but also in exploring new fields of application. A new writing routine for TIFF images with their 256 grey levels allows to produce 3-dimensional structures in resist, which can be used e.g. for the direct writing of computer-generated phase holograms. Another new writing routine allows a full compensation of limiting SEM performance in respect to its dynamic behaviour and field distortion. By using this method, the main restrictions of SEM based e-beam lithography can be overcome.