基于扫描电镜的电子束光刻新书写程序

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI:10.1109/IMNC.1999.797501

S. Dubonos, H. Raith, A. Svintsov, S. Zaitsev

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引用次数: 1

摘要

基于扫描电镜的电子束光刻技术的挑战不仅在于复制专用电子束光刻机的书写程序，而且在于探索新的应用领域。一个新的写入程序TIFF图像与他们的256灰度级允许产生三维结构的抗蚀剂，这可以用于例如直接写入计算机生成的相位全息图。另一种新的写入程序允许完全补偿其动态行为和场畸变方面的限制SEM性能。利用该方法可以克服基于扫描电镜的电子束光刻的主要限制。

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New writing routines for SEM based e-beam lithography

The challenge of SEM based e-beam lithography is not just in copying writing routines used in dedicated e-beam lithography machines, but also in exploring new fields of application. A new writing routine for TIFF images with their 256 grey levels allows to produce 3-dimensional structures in resist, which can be used e.g. for the direct writing of computer-generated phase holograms. Another new writing routine allows a full compensation of limiting SEM performance in respect to its dynamic behaviour and field distortion. By using this method, the main restrictions of SEM based e-beam lithography can be overcome.

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Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference

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