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Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference最新文献

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Detection of metastable Cl/sup +/ ions in time-modulated ICP by time resolved LIF 时间分辨LIF检测时间调制ICP中亚稳Cl/sup +/离子
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797521
S. Kumagai, M. Sasaki, M. Koyanagi, K. Hane
{"title":"Detection of metastable Cl/sup +/ ions in time-modulated ICP by time resolved LIF","authors":"S. Kumagai, M. Sasaki, M. Koyanagi, K. Hane","doi":"10.1109/IMNC.1999.797521","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797521","url":null,"abstract":"Pulse time-modulated plasma etching is used to achieve high anisotropy, high etch rate, high selectivity and low charging damage by making use of the reactive plasma species composition changes. The authors have measured, for the first time, the metastable chlorine ions Cl/sup +*/ in time-modulated inductively coupled plasma by time resolved laser induced fluorescence spectroscopy.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125542612","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
GaAs photonic crystals on SiO/sub 2/ fabricated by VHF anode-coupled RIE and wafer bonding 利用VHF阳极耦合RIE和晶圆键合技术制备SiO/sub /上的GaAs光子晶体
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797457
T. Saitoh, T. Sogawa, M. Notomi, T. Tamamura, S. Kodama, T. Furuta, H. Ando
{"title":"GaAs photonic crystals on SiO/sub 2/ fabricated by VHF anode-coupled RIE and wafer bonding","authors":"T. Saitoh, T. Sogawa, M. Notomi, T. Tamamura, S. Kodama, T. Furuta, H. Ando","doi":"10.1109/IMNC.1999.797457","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797457","url":null,"abstract":"Semiconductor photonic crystals (PCs) are attracting much attention from the viewpoints of both physical interest and optoelectronic applications that take advantage of controlling optical transitions. In order to make crystals with the photonic band-gaps in the optical wavelength region, it is required to fabricate well-defined periodic structures on the order of the wavelength of light. Furthermore, a confinement structure in the vertical direction is also important in the 2-dimensional (2D) PCs. We have fabricated GaAs 2D PCs on SiO/sub 2/ which are suitable for waveguide applications in the lateral directions.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"218 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122120013","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Observation of spin-dependent tunneling current using optically pumped GaAs microtip 利用光泵浦GaAs微针尖观察自旋相关隧穿电流
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797510
R. Shinohara, K. Yamaguchi
{"title":"Observation of spin-dependent tunneling current using optically pumped GaAs microtip","authors":"R. Shinohara, K. Yamaguchi","doi":"10.1109/IMNC.1999.797510","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797510","url":null,"abstract":"The spin-polarized scanning tunneling microscope (SP-STM) using a photoexcited GaAs tip has been expected to observe magnetic domains and surface spin structures with atomic spatial resolution. Spin-polarized electrons can be generated in the GaAs conduction band by circularly polarized light pumping. We developed GaAs microtips and are trying to realize the SP-STM system. In this paper, we report the influence of surface states of the GaAs microtip on the spin-dependent tunneling current. This effect is very important to obtain high sensitivity in the SP-STM using a GaAs tip.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"56 5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124478423","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Direct detection of DNA with an integrated detector on a microfluidic chip 在微流控芯片上集成检测器直接检测DNA
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797477
W. Kuhr, C. B. Davis, S. Brazill
{"title":"Direct detection of DNA with an integrated detector on a microfluidic chip","authors":"W. Kuhr, C. B. Davis, S. Brazill","doi":"10.1109/IMNC.1999.797477","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797477","url":null,"abstract":"A microfluidic chip has been developed which allows for the direct detection of several distinct DNA targets present in a sample. The direct detection of underivatized DNA is advantageous for the analysis of very small amounts of sample, where contamination is a major concern. DNA probes can be attached in microchannels present on the chip via a biotin/avidin linkage. The sample is then introduced into the channel where an appropriate DNA target hybridizes with its complementary probe. Following hybridization of the target, an alkaline buffer is introduced to the channel to dehybridize the double-stranded DNA and flush the target downstream to a copper electrode. The dehybridized DNA is then detected electrochemically. The elution time can be used to identify the particular DNA target since the DNA probes are spatially segregated in the channel. Integrating the detector and the sensing probes on the microfluidic chip allows for an inexpensive and easily fabricated biosensor device for the precise recognition and subsequent detection of a specific complimentary DNA target for diagnosis and genetic screening.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132596436","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Analysis of resist pattern collapse by direct peeling method with AFM tip 利用原子力显微镜尖端直接剥落法分析抗蚀图案的坍塌
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797542
A. Kawai, Y. Kaneko
{"title":"Analysis of resist pattern collapse by direct peeling method with AFM tip","authors":"A. Kawai, Y. Kaneko","doi":"10.1109/IMNC.1999.797542","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797542","url":null,"abstract":"In recent years, micro fabrication techniques have become important to realize electronic micro devices such as high density memories and liquid crystal displays. Adhesion improvement of micro resist patterns has been recognized as an important problem to be solved because of pattern collapse during the development process. A great deal of effort has been made on monitoring the adhesion property, mainly by conventional methods such as SEM observation and peel tests. What seems to be lacking, however, is quantitative and direct analysis. In this regard, we have already proposed the principle of direct analysis for resist pattern adhesion, that is, direct peeling with an AFM tip (DPAT). The purpose of this study is to prove the validity of this novel analysis method experimentally. Concretely, we focus on shape dependency of resist pattern collapse in 170nm size.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"2011 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128110908","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Tip scanning dynamic SFM using piezoelectric cantilever for full wafer inspection 采用压电悬臂梁的尖端扫描动态SFM进行全晶圆检测
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797528
J. Chu, R. Maeda, T. Itoh, T. Suga
{"title":"Tip scanning dynamic SFM using piezoelectric cantilever for full wafer inspection","authors":"J. Chu, R. Maeda, T. Itoh, T. Suga","doi":"10.1109/IMNC.1999.797528","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797528","url":null,"abstract":"The dynamic scanning force microscope (DSFM) has proven itself as a versatile instrument for science and technology. It has made possible the measurement of surface structures with sizes ranging from a single atom to several micrometers. But practically, the samples to be inspected are often too big to fit the SFM sample stage of traditional SFM systems. In this report, we propose a new structure of DSFM compatible with full wafer inspection.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131728719","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Two dimensional automatic alignment of pinhole integrated with photodiode 光电二极管集成针孔二维自动对准
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797543
M. Sasaki, W. Kamada, K. Hane
{"title":"Two dimensional automatic alignment of pinhole integrated with photodiode","authors":"M. Sasaki, W. Kamada, K. Hane","doi":"10.1109/IMNC.1999.797543","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797543","url":null,"abstract":"The authors use apparatus in which a Si micromachined pinhole surrounded by photodiode cells is used for automatic alignment. When the laser beam is apart from the pinhole and incident on the photodiode cells placed around it, the relative position of the laser spot from the pinhole can be found by comparing the photocurrents obtained from four photodiode cells. Using this signal as the input of the feedback control, actuators move the pinhole so that the laser beam can pass through the pinhole. In our previous study (1998), a one dimensional version of the automatic alignment was achieved using a Si micromachined pinhole and shape memory alloy actuators. In this study, two dimensional automatic alignment is described.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114506405","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Modeling of irregular boron diffusion profiles over varied surface topologies 不同表面拓扑结构上不规则硼扩散曲线的建模
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797545
R. Rumpf, K. Suzuki
{"title":"Modeling of irregular boron diffusion profiles over varied surface topologies","authors":"R. Rumpf, K. Suzuki","doi":"10.1109/IMNC.1999.797545","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797545","url":null,"abstract":"Summary form only given. Recently, several different MEMS (Micro Electro Mechanical Systems) devices, which were designed for use in inkjet printers, capacitive pressure sensors, drug delivery devices, chemical reactors, and other similar applications, have included narrow gaps and small holes. We have found a novel technique to fabricate narrow gaps or small holes based on the high boron diffusion etch stop technique. This technique utilizes a boron diffusion anomaly in a narrow space. Such an anomaly has not been reported before and the fabricated structures are very different to what would be expected. In addition, the data from the investigation of these structures serve to point out some interesting new assumptions and suggest a mechanism and method to simulate boron diffusion profiles over a variety of surfaces. This paper describes this new boron diffusion simulator that can predict boron diffusion profiles and details the success of the simulations.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"70 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116243991","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Room temperature Coulomb-blockade observation of alkanethiol-encapsulated gold particles using AFM 用原子力显微镜观察烷基硫醇包封金颗粒的室温库仑封锁
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797469
Shujuan Huang, Gen Tsutsui, H. Sakaue, S. Shingubara, T. Takahagi
{"title":"Room temperature Coulomb-blockade observation of alkanethiol-encapsulated gold particles using AFM","authors":"Shujuan Huang, Gen Tsutsui, H. Sakaue, S. Shingubara, T. Takahagi","doi":"10.1109/IMNC.1999.797469","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797469","url":null,"abstract":"In this study, the observation of self-organized nanostructure and the electrical characterization of alkanethiol-encapsulated gold particles are carried out using atomic force microscope (AFM). The AFM observation of nanostructure of gold dots was performed in the contact mode. The I-V characteristics between AFM tip and HOPG substrate through hexadecanethiol-encapsulated gold particles was measured using a gold-coated tip.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"295 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123116075","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The advent of CD-SEM technologies for metrology on advanced photomasks 用于先进光掩膜计量的CD-SEM技术的出现
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI: 10.1109/IMNC.1999.797539
W. Ng, G. Anderson
{"title":"The advent of CD-SEM technologies for metrology on advanced photomasks","authors":"W. Ng, G. Anderson","doi":"10.1109/IMNC.1999.797539","DOIUrl":"https://doi.org/10.1109/IMNC.1999.797539","url":null,"abstract":"This paper chronicles the implementation of the low voltage CD-SEM (Critical Dimension-Scanning Electron Microscope) as a metrology tool for mask production. Accuracy and precision were investigated with the emphasis on improving both dynamic and static precision. Algorithm evaluation was focused at improving the confidence in the measurement, and its correlation with the on-wafer CD. Linearity was compared to known standards as well as absolute pitch values written by an advanced e-beam lithography tool. Another concern that was addressed was contamination due to the beam/sample interaction. Most notably comprised of elemental carbon, the dose/contamination relationship was investigated. Utilizing a KLA-Tencor starlight inspection tool, the dose required to register a surface defect was determined. Subsequent printing of the mask to a wafer, and examination of the same regions on the wafer by the CD-SEM, looked for variations in measured CD to determine whether the contamination affected the printed wafer.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"73 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128216398","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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