Detection of metastable Cl/sup +/ ions in time-modulated ICP by time resolved LIF

Abstract

Pulse time-modulated plasma etching is used to achieve high anisotropy, high etch rate, high selectivity and low charging damage by making use of the reactive plasma species composition changes. The authors have measured, for the first time, the metastable chlorine ions Cl/sup +*/ in time-modulated inductively coupled plasma by time resolved laser induced fluorescence spectroscopy.