时间分辨LIF检测时间调制ICP中亚稳Cl/sup +/离子

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI:10.1109/IMNC.1999.797521

S. Kumagai, M. Sasaki, M. Koyanagi, K. Hane

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引用次数: 0

摘要

脉冲时间调制等离子体刻蚀利用反应性等离子体物质组成变化实现了高各向异性、高刻蚀速率、高选择性和低充电损伤。本文首次用时间分辨激光诱导荧光光谱法测量了时间调制电感耦合等离子体中亚稳氯离子Cl/sup +*/。

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Detection of metastable Cl/sup +/ ions in time-modulated ICP by time resolved LIF

Pulse time-modulated plasma etching is used to achieve high anisotropy, high etch rate, high selectivity and low charging damage by making use of the reactive plasma species composition changes. The authors have measured, for the first time, the metastable chlorine ions Cl/sup +*/ in time-modulated inductively coupled plasma by time resolved laser induced fluorescence spectroscopy.

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Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference

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