{"title":"Transition Radiation of the Bunch of Nonrelativistic Particles on the Conducting Target Shaped as a Right Dihedral Angle","authors":"V. V. Syshchenko, A. I. Tarnovsky, V. A. Krivtsov","doi":"10.1134/S1027451026700904","DOIUrl":"10.1134/S1027451026700904","url":null,"abstract":"<p>The transition radiation of a charged particle in the simplest case of its incidence on the infinite perfectly conducting plane can be described using the method of images known from electrostatics. The same method allows one to find the spatial field distribution in some more complicated cases. The present paper describes the transition radiation from the bunch of nonrelativistic charged particles incident on the target consisting of two conducting half-planes that make rectangular dihedral angle (when the incidence takes the place from the inner side of the angle). The presence of interference maxima and minima in the angular distribution of the radiation makes it possible to relatively easily estimate the main characteristics of the bunch: the impact parameter of its center and the charge density form factor. The results can be used to improve the methods of diagnostics of charge particles beams.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"20 2","pages":"452 - 456"},"PeriodicalIF":0.4,"publicationDate":"2026-08-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148752359","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Ananya Sahoo, Jaspreet Singh, Soumya Shephalika Behera, V. R. Rao Medicherla
{"title":"Natural Oxidation of Fe‒Ni Alloys: Hard X-ray Photoemission Study","authors":"Ananya Sahoo, Jaspreet Singh, Soumya Shephalika Behera, V. R. Rao Medicherla","doi":"10.1134/S1027451026700801","DOIUrl":"10.1134/S1027451026700801","url":null,"abstract":"<p>The natural oxide formation on Fe<sub>1<i>−x</i></sub>Ni<sub><i>x</i></sub> (<i>x</i> = 0.60, 0.40, 0.36) random bulk alloy surfaces have been studied using Hard X-ray Photoelectron Spectroscopy (HAXPES) technique at room temperature employing a photon energy of 4 keV with a total resolution of 0.8 eV in a vacuum of about 10<sup><i>−</i>10</sup> Torr. Intentionally, the alloy surfaces were not subjected to in-situ surface cleaning, as our motive is to study the surface oxidation. HAXPES is capable of producing both surface and bulk features of the alloys. All the core levels such as 2<i>s</i>, 2<i>p</i>, 3<i>s</i>, 3<i>p</i> of both Fe and Ni were investigated and multiple features corresponding bulk and surface were observed. Alloy surfaces were found to have predominantly Fe oxides such as FeO and Fe<sub>2</sub>O<sub>3</sub> compared to Ni oxides indicating the segregation of Fe to the surface. The 3<i>p</i> core levels of Fe and Ni exhibit exchange splitting and spin orbit splitting respectively with lower surface oxide contribution due to the enhanced bulk sensitivity at higher kinetic energies. Fe 2<i>s</i> core level exhibits correlation induced multiplet features. The surface oxide increases with the Fe content in the alloy.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"20 2","pages":"362 - 366"},"PeriodicalIF":0.4,"publicationDate":"2026-08-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148752163","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Influence of the Nearest Atomic Surrounding on the Blocking Effect during Atomic Ejection from the Au (001) Surface in the 〈010〉 Azimuthal Direction","authors":"A. I. Musin, V. N. Samoilov, N. G. Ananieva","doi":"10.1134/S1027451026700965","DOIUrl":"10.1134/S1027451026700965","url":null,"abstract":"<p>The influence of the nearest atomic surrounding on the sputtering of atoms from the surface of (001) Au face in the 〈010〉 azimuthal direction toward the Wehner spot is examined. Using the molecular dynamics method, the ejection of an atom from a surface lattice site toward a lens consisting of two nearest neighbor surface atoms was calculated, taking into account varying numbers of surrounding atoms: 4 or 20 atoms from one top layer and 8 or 16 atoms from two top layers. Due to the above-surface scattering effect, as the atomic surrounding expands, the sputtering yield increases by 17 to 37%. The addition of an atom behind the two-atom lens enables strong blocking, allowing sputtered atoms to be divided into two groups based on the initial polar angle ϑ<sub>0</sub> with different emission mechanisms (two ejection cones). It is concluded that these mechanisms, absent in cascade theories of sputtering, must be taken into account for a correct analysis of single crystal sputtering.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"20 2","pages":"484 - 489"},"PeriodicalIF":0.4,"publicationDate":"2026-08-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148752165","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. V. Ilyinsky, R. A. Castro, A. A. Kononov, I. O. Timofeeva, E. B. Shadrin
{"title":"Polarization Processes in Silver Iodide Films Doped with Copper","authors":"A. V. Ilyinsky, R. A. Castro, A. A. Kononov, I. O. Timofeeva, E. B. Shadrin","doi":"10.1134/S1027451026700849","DOIUrl":"10.1134/S1027451026700849","url":null,"abstract":"<p>Using dielectric spectroscopy (DS), this study investigated the characteristics of polarization processes in copper-doped nanocrystalline silver iodide films in the region of the thermal superionic phase transition. It was found that doping with copper (5 vol %) leads to a decrease in the resonance frequency of the DS features, accompanied by an increase in the amplitude of the features in the frequency dependences of the imaginary (ε\") and real (ε') components of the complex dielectric permittivity. A power-law frequency dependence of the electrical conductivity σ was observed, and the exponent s of this dependence was shown to undergo an abrupt change at the superionic phase transition temperature <i>T</i><sub>c</sub> = 433 K. The temperature dependence of the exponent <i>s</i>(<i>T</i>) was found to correspond to two charge-transport mechanisms governing electrical conductivity: thermally activated hopping conduction at <i>T</i> < <i>T</i><sub>c</sub> and quantum-mechanical tunneling at <i>T</i> > <i>T</i><sub>c</sub>. The relaxation and energy parameters of charge-transport processes in the AgI:Cu film system were calculated, making it possible to determine a non-Debye mechanism of dielectric relaxation in the AgI:Cu system.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"20 2","pages":"409 - 416"},"PeriodicalIF":0.4,"publicationDate":"2026-08-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148752245","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Optimization of the Geometry of Clamp High-Pressure Cells for Neutron Scattering","authors":"V. I. Ermakov, E. S. Clementyev, R. A. Sadykov","doi":"10.1134/S1027451026700692","DOIUrl":"10.1134/S1027451026700692","url":null,"abstract":"<p>High-pressure cells designed for studies of condensed matter using several neutron scattering techniques, including diffraction, spectroscopy, and small-angle neutron scattering, are discussed. A key factor for an efficient neutron experiment is minimizing the self-shielding effect caused by cell materials while maintaining the required pressure and sample volume. Clamp pressure cells based on nonmagnetic high-hardness alloys with operating pressures up to 3.5 GPa are considered. Optimization of the geometry of high-pressure cells with different angular apertures of the outgoing neutron beam was carried out. The main result of this study is the identified dependence of critical pressure on the opening angle of the neutron beam scattered by the sample.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"20 2","pages":"291 - 294"},"PeriodicalIF":0.4,"publicationDate":"2026-08-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148752352","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
E. V. Yakovlev, E. A. Pesterev, V. I. Petrov, A. V. Solovyov, A. B. Markov
{"title":"Phase State Evolution of the Ti/LaB6 Multilayer System during Pulsed Electron Beam Processing","authors":"E. V. Yakovlev, E. A. Pesterev, V. I. Petrov, A. V. Solovyov, A. B. Markov","doi":"10.1134/S1027451026700461","DOIUrl":"10.1134/S1027451026700461","url":null,"abstract":"<p>In this paper, the processes of phase formation occurring in a multilayer system of alternating Ti and LaB<sub>6</sub> layers on a Ti substrate during pulsed electron beam processing are investigated using synchrotron diffraction. Various modes of electron beam processing (accelerating voltage and number of pulses) are considered sequentially, and a characteristic phase composition for each mode is established. The accelerating voltage for the threshold mode of electron beam processing, at which melting of the Ti and LaB<sub>6</sub> layers in the multilayer system begins, is determined. In this case, as a result of melting-crystallization, a transition of the LaB<sub>6</sub> layers from the initially amorphous state to the crystalline one and formation of the TiB<sub>2</sub> phase are observed. The electron beam processing parameters for the optimal mode, at which melting of all deposited Ti and LaB<sub>6</sub> layers in the multilayer system occurs, are also determined. In this mode, intensive formation of the LaB<sub>6</sub> and TiB<sub>2</sub> phases is observed. And the mode of intensive melting, in which melting occurs not only for the multilayer system, but also for a part of the substrate. This mode is characterized by a decrease in the content of the LaB<sub>6</sub> and TiB<sub>2</sub> phases to a minimum amount. It is shown that the described research method using synchrotron radiation allows one to simultaneously determine several processing modes, using which one can obtain a certain structural-phase state of the surface layer, and, consequently, the necessary properties.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"20 1","pages":"124 - 128"},"PeriodicalIF":0.4,"publicationDate":"2026-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148613660","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. P. Lasek, L. N. Kotov, M. V. Yakimov, A. V. Sitnikov, Yu. E. Kalinin
{"title":"Study of Impedance Spectra of Planar Structures [(CoFeB + SiO2)/ZnO]50/Sitall in the Frequency Range 1 Hz−1 MHz and in the Temperature Range 120−420 K","authors":"M. P. Lasek, L. N. Kotov, M. V. Yakimov, A. V. Sitnikov, Yu. E. Kalinin","doi":"10.1134/S1027451026700345","DOIUrl":"10.1134/S1027451026700345","url":null,"abstract":"<p>The paper studies the temperature and frequency dependences of the real and imaginary components of the impedance of [(CoFeB + SiO<sub>2</sub>)/ZnO]<sub>50</sub> multilayer films on sitall plates in the frequency range from 1 Hz to 1 MHz and in the temperature range from 120 to 420 K. Based on the measured specific surface electrical resistance, the multilayer films under study are divided into three groups with different types of conductivity: low, medium, and high. It is shown that at low frequencies up to 100 Hz and at temperatures above 260 K, the temperature behavior of the real part of the impedance of the planar structure multilayer film/sitall glass-ceramic is determined mainly by the behavior of the sitall plate. At high frequencies, starting from 1 kHz, the temperature behavior of the structure impedance in the entire studied temperature range of 120–420 K has the greatest difference; the higher the frequency and the lower the temperature, the greater these differences. For the planar structure multilayer film/sitall with a low composite layer conductivity, a decrease in the imaginary component of the impedance is observed with increasing temperature at frequencies above 10 kHz. An equivalent electrical circuit for the planar structure multilayer film/sitall is proposed. For effective control of the conductive and frequency properties of the planar structure multilayer film/sitall using alternating electric fields, it is proposed to use multilayer films with low conductivity.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"20 1","pages":"40 - 47"},"PeriodicalIF":0.4,"publicationDate":"2026-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148614021","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
D. B. Zolotukhin, A. A. Andronov, A. V. Kazakov, A. V. Tyunkov, Yu. G. Yushkov
{"title":"Electron Beam and Ion-Plasma Modification of Surface Roughness of YSZ-Coatings Deposited by Fore-Vacuum Plasma-Cathode Electron Source","authors":"D. B. Zolotukhin, A. A. Andronov, A. V. Kazakov, A. V. Tyunkov, Yu. G. Yushkov","doi":"10.1134/S1027451026700473","DOIUrl":"10.1134/S1027451026700473","url":null,"abstract":"<p>We present the experimental results on surface roughness modification of YSZ-films deposited from multi-component electron beam-produced plasma formed as a result of e-beam evaporation of YSZ-target and vapor e-beam ionization in helium at fore-vacuum pressures (several Pa). The surface of the films was modified either by ion flow from beam-produced plasma to the dc-biased sample or by irradiation of surface by a pulsed wide-aperture electron beam the surface of the films after the deposition. We found that <i>in-situ</i> dc bias provides the surface roughness and phase composition comparable to the initial of the YSZ-coatings, while the powerful pulsed e-beam irradiation forms numerous craters onto the coatings surface and increases the roughness parameters in several orders of magnitude.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"20 1","pages":"129 - 135"},"PeriodicalIF":0.4,"publicationDate":"2026-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148614337","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. V. Solovyov, E. V. Yakovlev, E. A. Pesterev, V. I. Petrov, A. B. Markov
{"title":"Computer Modeling of Thermal Fields for the Formation of Composite Boron-Containing Surface Alloys Using a Low-Energy High-Current Electron Beam","authors":"A. V. Solovyov, E. V. Yakovlev, E. A. Pesterev, V. I. Petrov, A. B. Markov","doi":"10.1134/S1027451026700424","DOIUrl":"10.1134/S1027451026700424","url":null,"abstract":"<p>The paper presents the results of computer modeling of melting processes in a multilayer system consisting of ten alternating layers of B (360 nm) and Ti (140 nm) on a Ti substrate under the action of a low-energy high-current electron beam (LEHCEB). Numerical studies of the influence of energy characteristics of the electron-beam effect on the thickness and lifetime of the melt of the multilayer film B/Ti–substrate Ti system are carried out. It is shown that with an increase in the energy density of the LEHCEB the thickness of the melt of the multilayer B/Ti film and its lifetime increase. Based on the modeling results, optimal modes for the formation of multilayer composite coatings are obtained. It is found that for LEHCEB energy densities of 3.5, 4.5, and 5.5 J/cm<sup>2</sup>, a coating with the following structure is formed: B-Ti surface alloy and a composite coating based on a titanium matrix with a reinforcing phase TiB<sub>2</sub>; further from the surface there are alternating Ti and B films. For the energy densities of 3.5 and 4.5 J/cm<sup>2</sup> melting of the Ti substrate does not occur; therefore, for these modes, the martensitic structure of the substrate surface is preserved. Complete melting of the multilayer B/Ti film–Ti substrate system occurs at LEHCEB energy densities greater than 8.5 J/cm<sup>2</sup>.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"20 1","pages":"100 - 104"},"PeriodicalIF":0.4,"publicationDate":"2026-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148613658","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Z. N. Blinov, L. N. Kotov, V. A. Ustyugov, P. D. Kovalev, D. V. Zavarin, Yu. E. Kalinin, A. V. Sitnikov
{"title":"Concentration and Angle Dependences of Ferromagnetic Resonance Parameters and Structure of Composite Films (CoFeZr + Zr2O3)","authors":"Z. N. Blinov, L. N. Kotov, V. A. Ustyugov, P. D. Kovalev, D. V. Zavarin, Yu. E. Kalinin, A. V. Sitnikov","doi":"10.1134/S1027451026700497","DOIUrl":"10.1134/S1027451026700497","url":null,"abstract":"<p>In this work, the concentration and angular dependences of the ferromagnetic resonance (FMR) linewidth Δ<i>B</i> and the resonance field <i>B</i><sub>r</sub> of composite films (CoFeZr + Zr<sub>2</sub>O<sub>3</sub>) with granular and granular-percolation structures are obtained in the range of total concentration of Co and Fe metals <i>x</i> = 22–54 at % and in the range of angles between the film plane and a constant magnetic field φ = 0°–90°. It is shown that the surface relief and the magnetic structure of the composite films have a significant effect on the resonance field and the resonance linewidth, especially at large angles φ. It is shown that the resonance linewidth Δ<i>B</i> and the resonance field <i>B</i><sub><i>r</i></sub> weakly depend on the metal concentration <i>x</i> and the angle φ for films with a granular structure at <i>x</i> = 22–40 at % and strongly depend on <i>x</i> and the angle φ for films with a granular-percolation structure at 49–54 at %. It was found the linewidth Δ<i>B</i> and the resonance field <i>B</i><sub>r</sub> increase with increasing angle φ for all films. The presence of two growth regions on the angular dependences of the resonance linewidth Δ<i>B</i> and the resonance field <i>B</i><sub>r</sub> is associated with the existence of granular and percolation regions in the composite films. The results of the analysis of the behavior of the concentration and angular dependences of the FMR parameters and relief and magnetic structure of the films indicate a high structural sensitivity of the FMR method in studying the electromagnetic properties of magnetic composite films. Therefore, the FMR phenomenon after improving the technique for measuring the FMR parameters can be used for the structural analysis of composite films.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"20 1","pages":"140 - 145"},"PeriodicalIF":0.4,"publicationDate":"2026-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148613996","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}