V. K. Smirnov, D. S. Kibalov, P. A. Lepshin, I. V. Zhuravlev, G. F. Smirnova
{"title":"自成型氮化硅纳米掩膜及其应用","authors":"V. K. Smirnov, D. S. Kibalov, P. A. Lepshin, I. V. Zhuravlev, G. F. Smirnova","doi":"10.1134/S1027451024701246","DOIUrl":null,"url":null,"abstract":"<p>A self-forming wave-ordered structure arises on the surface of single-crystal or amorphous silicon during its sputtering with an inclined beam of nitrogen ions. The wave-ordered structure is a solid nanomask, a dense array of silicon nitride nanostripes with a period in the range of 30–90 nm. The induced spatial coherence of the nanomask due to the formation of sharp geometric boundaries on silicon surface in the areas of ion bombardment is considered. Based on the nanomask and etching processes (wet and dry), various nanostructures are formed, which are used in different high technologies. Prototypes of solar cells, nanowire grid polarizers, and nanostructured silicon substrates for surface-enhanced Raman spectroscopy have been created. The results of a study of the initial stages of lysozyme protein crystallization on nanostructured silicon substrates are presented.</p>","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"18 6","pages":"1349 - 1358"},"PeriodicalIF":0.5000,"publicationDate":"2025-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Self-Forming Silicon Nitride Nanomask and Its Applications\",\"authors\":\"V. K. Smirnov, D. S. Kibalov, P. A. Lepshin, I. V. Zhuravlev, G. F. Smirnova\",\"doi\":\"10.1134/S1027451024701246\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>A self-forming wave-ordered structure arises on the surface of single-crystal or amorphous silicon during its sputtering with an inclined beam of nitrogen ions. The wave-ordered structure is a solid nanomask, a dense array of silicon nitride nanostripes with a period in the range of 30–90 nm. The induced spatial coherence of the nanomask due to the formation of sharp geometric boundaries on silicon surface in the areas of ion bombardment is considered. Based on the nanomask and etching processes (wet and dry), various nanostructures are formed, which are used in different high technologies. Prototypes of solar cells, nanowire grid polarizers, and nanostructured silicon substrates for surface-enhanced Raman spectroscopy have been created. The results of a study of the initial stages of lysozyme protein crystallization on nanostructured silicon substrates are presented.</p>\",\"PeriodicalId\":671,\"journal\":{\"name\":\"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques\",\"volume\":\"18 6\",\"pages\":\"1349 - 1358\"},\"PeriodicalIF\":0.5000,\"publicationDate\":\"2025-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://link.springer.com/article/10.1134/S1027451024701246\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"PHYSICS, CONDENSED MATTER\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","FirstCategoryId":"1085","ListUrlMain":"https://link.springer.com/article/10.1134/S1027451024701246","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}
Self-Forming Silicon Nitride Nanomask and Its Applications
A self-forming wave-ordered structure arises on the surface of single-crystal or amorphous silicon during its sputtering with an inclined beam of nitrogen ions. The wave-ordered structure is a solid nanomask, a dense array of silicon nitride nanostripes with a period in the range of 30–90 nm. The induced spatial coherence of the nanomask due to the formation of sharp geometric boundaries on silicon surface in the areas of ion bombardment is considered. Based on the nanomask and etching processes (wet and dry), various nanostructures are formed, which are used in different high technologies. Prototypes of solar cells, nanowire grid polarizers, and nanostructured silicon substrates for surface-enhanced Raman spectroscopy have been created. The results of a study of the initial stages of lysozyme protein crystallization on nanostructured silicon substrates are presented.
期刊介绍：
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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