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Advanced Etch Technology and Process Integration for Nanopatterning XI最新文献

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Front Matter: Volume 12056 封面:卷12056
Advanced Etch Technology and Process Integration for Nanopatterning XI Pub Date : 2022-07-12 DOI: 10.1117/12.2643344
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引用次数: 0
New era of logic technology evolution: Z-dimensional scaling 逻辑技术演进的新时代:z维缩放
Advanced Etch Technology and Process Integration for Nanopatterning XI Pub Date : 2022-06-13 DOI: 10.1117/12.2623261
Dechao Guo
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引用次数: 0
Patterning options for post-copper metallization on EUV self-aligned double patterning method 紫外光自对准双图案化后铜金属化方法的图案化选择
Advanced Etch Technology and Process Integration for Nanopatterning XI Pub Date : 2022-06-13 DOI: 10.1117/12.2615458
E. Liu, Joe Lee, Nicholas A. Joy, Y. Mignot, Angélique Raley, J. Arnold, P. Biolsi
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引用次数: 1
Etch and patterning development for 2nm node nanosheet devices 2nm节点奈米片元件的蚀刻与图案化发展
Advanced Etch Technology and Process Integration for Nanopatterning XI Pub Date : 2022-06-13 DOI: 10.1117/12.2614316
E. Miller, I. Seshadri, T. Kang, D. Metzler, Joe Lee, S. Sieg, S. Engelmann, J. Shearer, J. Arnold, N. Felix
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引用次数: 0
Advances in OPC etch modeling OPC蚀刻建模的进展
Advanced Etch Technology and Process Integration for Nanopatterning XI Pub Date : 2022-06-13 DOI: 10.1117/12.2614280
G. Fenger, Youngchan Kim, Ignat Moskalenko, Johnny Herrera, Alexander Drutsa
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引用次数: 1
VizGlow-MPS: a multi-fidelity process simulator for fast, yet accurate, semiconductor process design and optimization VizGlow-MPS:多保真工艺模拟器，用于快速，准确的半导体工艺设计和优化
Advanced Etch Technology and Process Integration for Nanopatterning XI Pub Date : 2022-06-13 DOI: 10.1117/12.2614241
D. Levko, R. Upadhyay, Kenta Suzuki, Chandrasekhar Shukla, L. Raja
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引用次数: 0
MOL patterning challenges in scaled SRAM with vertical Surrounding Gate Transistors (SGT) 垂直围栅晶体管(SGT)在SRAM中的MOL模式挑战
Advanced Etch Technology and Process Integration for Nanopatterning XI Pub Date : 2022-06-13 DOI: 10.1117/12.2614772
Z. Tao, Yisuo Li, Waikin Li, Minsoo Kim, B. Briggs, K. Devriendt, L. Teugels, F. Sebaai, C. Lorant, C. Porret, E. Rosseel, Alfonso Sepúlveda Márquez, N. Jourdan, J. Boemmels, J. Mitard, P. Matagne, E. Altamirano-Sanchez, L. Ragnarsson, Anish Dangol, D. Batuk, Gerardo Tadeo Martinez Alanis, J. Geypen, Ken'ichi Kanazawa, Testuo Izawa, M. Kakumu, K. Sakui, N. Harada
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引用次数: 2
Highly selective isotropic chemical dry etching for gate-all-around devices: nanosheet, forksheet and complementary FETs 用于栅极全能器件的高选择性各向同性化学干蚀刻:纳米片、叉片和互补场效应管
Advanced Etch Technology and Process Integration for Nanopatterning XI Pub Date : 2022-06-13 DOI: 10.1117/12.2613723
Y. Muraki, Y. Oniki, P. P. Gowda, E. Altamirano-Sanchez, H. Mertens, N. Horiguchi, F. Holsteyns, S. Kal, C. Alix, K. Kumar, A. Mosden, T. Hurd, N. Takahashi
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引用次数: 1
Pattern shape engineering 图案成型工程
Advanced Etch Technology and Process Integration for Nanopatterning XI Pub Date : 2022-06-13 DOI: 10.1117/12.2615043
Shurong Liang, Amol Gupta, S. Sherman, Kevin Anglin, K. Bai, Jong Chul Park
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引用次数: 1
Patterning challenges and opportunities in nanosheet device architectures 纳米片器件架构中的图像化挑战与机遇
Advanced Etch Technology and Process Integration for Nanopatterning XI Pub Date : 2022-06-13 DOI: 10.1117/12.2615984
N. Horiguchi, B. Briggs, B. T. Chan, S. Demuynck, Maryam Hosseini, G. Mannaert, H. Mertens, Y. Oniki, S. Subramanian, Z. Tao
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引用次数: 1
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