G. Fenger, Youngchan Kim, Ignat Moskalenko, Johnny Herrera, Alexander Drutsa
{"title":"Advances in OPC etch modeling","authors":"G. Fenger, Youngchan Kim, Ignat Moskalenko, Johnny Herrera, Alexander Drutsa","doi":"10.1117/12.2614280","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":283821,"journal":{"name":"Advanced Etch Technology and Process Integration for Nanopatterning XI","volume":"55 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Etch Technology and Process Integration for Nanopatterning XI","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2614280","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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