N. Horiguchi, B. Briggs, B. T. Chan, S. Demuynck, Maryam Hosseini, G. Mannaert, H. Mertens, Y. Oniki, S. Subramanian, Z. Tao
{"title":"Patterning challenges and opportunities in nanosheet device architectures","authors":"N. Horiguchi, B. Briggs, B. T. Chan, S. Demuynck, Maryam Hosseini, G. Mannaert, H. Mertens, Y. Oniki, S. Subramanian, Z. Tao","doi":"10.1117/12.2615984","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":283821,"journal":{"name":"Advanced Etch Technology and Process Integration for Nanopatterning XI","volume":"39 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Etch Technology and Process Integration for Nanopatterning XI","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2615984","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}