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Advanced Etch Technology and Process Integration for Nanopatterning XI最新文献

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Effect of initial conditions on uniformity of metal assisted chemical etch for ultra-high aspect ratio, taper-free silicon nanostructures 初始条件对超高宽高比无锥度硅纳米结构金属辅助化学蚀刻均匀性的影响
Advanced Etch Technology and Process Integration for Nanopatterning XI Pub Date : 2022-04-25 DOI: 10.1117/12.2604283
Akhila Mallavarapu, Mark Hrdy, Mariana Castañeda, P. Ajay, S. V. Sreenivasan
{"title":"Effect of initial conditions on uniformity of metal assisted chemical etch for ultra-high aspect ratio, taper-free silicon nanostructures","authors":"Akhila Mallavarapu, Mark Hrdy, Mariana Castañeda, P. Ajay, S. V. Sreenivasan","doi":"10.1117/12.2604283","DOIUrl":"https://doi.org/10.1117/12.2604283","url":null,"abstract":"","PeriodicalId":283821,"journal":{"name":"Advanced Etch Technology and Process Integration for Nanopatterning XI","volume":"51 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-04-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127115842","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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