Z. Tao, Yisuo Li, Waikin Li, Minsoo Kim, B. Briggs, K. Devriendt, L. Teugels, F. Sebaai, C. Lorant, C. Porret, E. Rosseel, Alfonso Sepúlveda Márquez, N. Jourdan, J. Boemmels, J. Mitard, P. Matagne, E. Altamirano-Sanchez, L. Ragnarsson, Anish Dangol, D. Batuk, Gerardo Tadeo Martinez Alanis, J. Geypen, Ken'ichi Kanazawa, Testuo Izawa, M. Kakumu, K. Sakui, N. Harada
{"title":"MOL patterning challenges in scaled SRAM with vertical Surrounding Gate Transistors (SGT)","authors":"Z. Tao, Yisuo Li, Waikin Li, Minsoo Kim, B. Briggs, K. Devriendt, L. Teugels, F. Sebaai, C. Lorant, C. Porret, E. Rosseel, Alfonso Sepúlveda Márquez, N. Jourdan, J. Boemmels, J. Mitard, P. Matagne, E. Altamirano-Sanchez, L. Ragnarsson, Anish Dangol, D. Batuk, Gerardo Tadeo Martinez Alanis, J. Geypen, Ken'ichi Kanazawa, Testuo Izawa, M. Kakumu, K. Sakui, N. Harada","doi":"10.1117/12.2614772","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":283821,"journal":{"name":"Advanced Etch Technology and Process Integration for Nanopatterning XI","volume":"97 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Etch Technology and Process Integration for Nanopatterning XI","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2614772","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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