IF 3.8 2区材料科学

Vacuum Pub Date : 2025-06-13 DOI: 10.1016/j.vacuum.2025.114504

Daria Jardas Babić , Robert Peter , Marko Perčić , Krešimir Salamon , Damjan Vengust , Tina Radošević , Matejka Podlogar , Aleš Omerzu

{"title":"Photocatalytic properties of thin ZnO films synthesised with plasma-enhanced atomic layer deposition at room temperature","authors":"Daria Jardas Babić , Robert Peter , Marko Perčić , Krešimir Salamon , Damjan Vengust , Tina Radošević , Matejka Podlogar , Aleš Omerzu","doi":"10.1016/j.vacuum.2025.114504","DOIUrl":"10.1016/j.vacuum.2025.114504","url":null,"abstract":"<div><div>The deposition of thin active layer of zinc oxide (ZnO) on thermally sensitive substrates represents a major challenge. For this purpose, atomic layer deposition (ALD) is the most suitable deposition technique. Since both the growth rate and the quality of thin films synthesised by the conventional ALD method at temperatures near the room temperature are low, the plasma-enhanced version of the method (PEALD) is used at ambient temperatures, with which we increase the chemical reactivity of the precursors. In this work, we present the structural, optical and photocatalytic properties of thin ZnO films deposited by PEALD at room temperature. We show that the properties of the films strongly depend on the applied RF power of the plasma. The films synthesised with a plasma RF power below 200 W have an amorphous structure and a weaker photocatalytic activity. The films obtained with an RF power of 200 W or more consist of nano-sized crystallites. Compared to the amorphous films, they show significantly higher photocatalytic activity.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"240 ","pages":"Article 114504"},"PeriodicalIF":3.8,"publicationDate":"2025-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144307099","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Double auxiliary anodes collaborate to deposit CrNx coatings on the inner wall of slender tube by built-in cylindrical cathodic-arc ion plating 双辅助阳极协同作用，通过内置圆柱形阴极弧离子镀在细长管内壁上沉积CrNx涂层

IF 3.8 2区材料科学

Vacuum Pub Date : 2025-06-13 DOI: 10.1016/j.vacuum.2025.114505

Benfu Wang , Huiyuan Geng , Xiubo Tian , Chunzhi Gong , Tianshi Hu , Hao Zhu , Jin Zhang , Yong Lian

{"title":"Double auxiliary anodes collaborate to deposit CrNx coatings on the inner wall of slender tube by built-in cylindrical cathodic-arc ion plating","authors":"Benfu Wang , Huiyuan Geng , Xiubo Tian , Chunzhi Gong , Tianshi Hu , Hao Zhu , Jin Zhang , Yong Lian","doi":"10.1016/j.vacuum.2025.114505","DOIUrl":"10.1016/j.vacuum.2025.114505","url":null,"abstract":"<div><div>Chromium nitride (CrNx) coatings demonstrate exceptional mechanical and tribological properties, making them ideal for protective applications in demanding industrial environments. However, uniform deposition of CrNx coatings on inner surfaces of slender tubes remains challenging due to confined spaces and difficulties in precise phase control. Here, we introduce a novel approach utilizing a double auxiliary anode and built-in cylindrical cathodic-arc ion plating to successfully deposit CrNx coatings inside tubes (40 mm diameter, 120 mm length). Systematic investigation of nitrogen flow rates revealed unexpected phase transformations, transitioning from mixed CrN + Cr<sub>2</sub>N phases to single CrN phase, then reverting to mixed phases at higher flow rates. Coatings produced at 40 sccm exhibited optimal mechanical properties with maximum hardness (17.4 GPa), while minimum wear rate (2.95 × 10<sup>−6</sup> mm<sup>3</sup>/(N·m)) was achieved at 80 sccm with pure CrN phase. Our findings demonstrate that stable deposition and precise phase control can be consistently achieved in slender tubes using this innovative technique. This advancement addresses critical stability and uniformity challenges unresolved by conventional methods, enhancing coating performance and expanding protective coating capabilities for diverse industrial applications.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"240 ","pages":"Article 114505"},"PeriodicalIF":3.8,"publicationDate":"2025-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144279574","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Study on the influence of slot structure on the arcing characteristics of vacuum arc between transverse magnetic contacts 狭缝结构对横向磁触点间真空电弧电弧特性影响的研究

IF 3.8 2区材料科学

Vacuum Pub Date : 2025-06-13 DOI: 10.1016/j.vacuum.2025.114506

Leming Wei, Shixin Xiu, Jiaxin Wang, Yantao Shen, Dejun Zhu

{"title":"Study on the influence of slot structure on the arcing characteristics of vacuum arc between transverse magnetic contacts","authors":"Leming Wei, Shixin Xiu, Jiaxin Wang, Yantao Shen, Dejun Zhu","doi":"10.1016/j.vacuum.2025.114506","DOIUrl":"10.1016/j.vacuum.2025.114506","url":null,"abstract":"<div><div>As a key switching device in power systems, vacuum circuit breakers face reduced interrupting capability due to arc erosion on contact surfaces. The dynamic behaviour of vacuum arc during arcing processes and the impact of contact surface erosion are examined by comparing two transverse magnetic field (TMF) contact structures: spiral-type TMF contact and cup-shaped TMF contact. Through numerical simulation, the regulation mechanism of slot structures on arc motion and erosion distribution is revealed. Experimental results demonstrate that spiral-type TMF contacts reduce arc constriction through arc slot crossing, yet suffer aggravated local erosion at slot edges due to arc stagnation. Cup-shaped TMF contacts exhibit higher arc constriction with more centralized erosion distribution. Thermal process simulations further indicate that slot structures disperse arc energy across slot regions, delaying the formation of high-temperature zones on opposite contact surfaces and causing arc stagnation. The introduction of preheating conditions enables earlier formation of continuous high-temperature zones on anode surfaces. The stagnation time decreased to 1.0 ms with a simultaneous rise in motion speed to 173.4 m/s, ultimately alleviating slot edge erosion. The correlation mechanism between contact structures and arc characteristics is elucidated, thereby establishing a theoretical foundation for optimizing vacuum circuit breaker contact designs.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"240 ","pages":"Article 114506"},"PeriodicalIF":3.8,"publicationDate":"2025-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144291320","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Effect of V concentration on X-ray absorption edge, opto-mechanical, and anti-corrosion properties of Ti1-xVxN thin films V浓度对Ti1-xVxN薄膜x射线吸收边、光力学和抗腐蚀性能的影响

IF 3.8 2区材料科学

Vacuum Pub Date : 2025-06-12 DOI: 10.1016/j.vacuum.2025.114496

Sanketa Jena , Mukul Gupta , Bibhu P. Swain

{"title":"Effect of V concentration on X-ray absorption edge, opto-mechanical, and anti-corrosion properties of Ti1-xVxN thin films","authors":"Sanketa Jena , Mukul Gupta , Bibhu P. Swain","doi":"10.1016/j.vacuum.2025.114496","DOIUrl":"10.1016/j.vacuum.2025.114496","url":null,"abstract":"<div><div>Ti<sub>1-x</sub>V<sub>x</sub>N thin films (∼150 nm) were synthesised via DC magnetron sputtering at room temperature for potential hard-coating and electrochemical applications. Increasing vanadium concentration led to a phonon confinement effect, evidenced by a blue shift in Raman modes. Elemental analysis via EDX and XPS showed Ti and V concentrations ranging from 7.42 to 47.37 at.% and 13.77–45.13 at.%, respectively, with near-constant nitrogen content. Ti L-edge XAS confirmed bond weakening (Ti–O, Ti–N, and Ti–V) due to oxygen vacancies, contributing to reduced hardness in high-V content. The highest hardness (15.14 GPa) and elastic modulus (161.11 GPa) were achieved in Ti<sub>0</sub>.<sub>75</sub>V<sub>0</sub>.<sub>25</sub>N and Ti<sub>0</sub>.<sub>5</sub>V<sub>0</sub>.<sub>5</sub>N films, respectively. Electrochemical measurements revealed that Ti<sub>0</sub>.<sub>5</sub>V<sub>0</sub>.<sub>5</sub>N exhibited the best performance, with a specific capacitance of 24.29 mF/cm<sup>2</sup> and a low electrode resistance of 93.13 Ω, indicating superior ion transport. VN films showed the lowest charge transfer resistance (0.61 Ω), reflecting high conductivity. Corrosion analysis showed a progressive increase in corrosion rate from 0.0002 to 0.0153 mm/year with increasing V content, indicating that while V enhances conductivity and capacitance, while compromises corrosion resistance. These findings establish an optimal V concentration window for balancing mechanical integrity, electrochemical performance, and corrosion resistance in Ti<sub>1-x</sub>V<sub>x</sub>N coatings.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"240 ","pages":"Article 114496"},"PeriodicalIF":3.8,"publicationDate":"2025-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144307101","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Role of microscale and nanoscale CeO2 particles on the microstructures, internal stress and properties in electrodeposited NiCo alloy platings 微米级和纳米级CeO2颗粒对电沉积NiCo合金镀层组织、内应力和性能的影响

IF 3.8 2区材料科学

Vacuum Pub Date : 2025-06-12 DOI: 10.1016/j.vacuum.2025.114499

Shuxin You , Xinquan Zhang , Chuanhai Jiang , Honghao Zhang

{"title":"Role of microscale and nanoscale CeO2 particles on the microstructures, internal stress and properties in electrodeposited NiCo alloy platings","authors":"Shuxin You , Xinquan Zhang , Chuanhai Jiang , Honghao Zhang","doi":"10.1016/j.vacuum.2025.114499","DOIUrl":"10.1016/j.vacuum.2025.114499","url":null,"abstract":"<div><div>In this study, a thorough investigation was undertaken to explore the effects of microscale and nanoscale CeO<sub>2</sub> particles on the characteristics of NiCo-CeO<sub>2</sub> composite platings, including their surface features, microstructure, internal stress, and overall performance. The results indicated that microscale platings had a higher content of CeO<sub>2</sub>, as well as increased surface roughness, when compared to nanoscale platings. Additionally, microscale particles were found to effectively prevent the growth of columnar crystals and refine grain structure, thus reducing the texture in microscale platings. Conversely, nanoscale particles were more efficient in inhibiting texture, which promoted a more uniform microstructure in the nanoscale platings. Incorporating CeO<sub>2</sub> particles into the alloy platings increased the internal stress within the composite plating. Moreover, the microscale platings showed greater internal stress and variation in comparison with the nanoscale ones. The addition of microscale particles enhanced the surface microhardness of the NiCo-CeO<sub>2</sub> composite platings, whereas nanoscale particles led to a more evenly distributed microhardness across the plating. Notably, the corrosion resistance of the nanoscale platings surpassed that of the microscale platings.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"240 ","pages":"Article 114499"},"PeriodicalIF":3.8,"publicationDate":"2025-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144279573","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Efficient purification of impurities from depleted uranium chips by hydrogen plasma arc melting 氢等离子体电弧熔炼净化贫铀碎片中的杂质

IF 3.8 2区材料科学

Vacuum Pub Date : 2025-06-12 DOI: 10.1016/j.vacuum.2025.114501

Yanhu Li , Cun Hu , Yuanfen Cheng , Zhen Lei , Hongya Li

引用次数: 0

Surface modification approach to improve the secondary electron emission properties of Al and Au Co-doped MgO film 采用表面改性方法改善Al和Au共掺杂MgO薄膜的二次电子发射性能

IF 3.8 2区材料科学

Vacuum Pub Date : 2025-06-11 DOI: 10.1016/j.vacuum.2025.114497

Yue Su, Jie Li, Shengli Wu, Wenbo Hu

{"title":"Surface modification approach to improve the secondary electron emission properties of Al and Au Co-doped MgO film","authors":"Yue Su, Jie Li, Shengli Wu, Wenbo Hu","doi":"10.1016/j.vacuum.2025.114497","DOIUrl":"10.1016/j.vacuum.2025.114497","url":null,"abstract":"<div><div>MgO thin films have gained significant attention because of their remarkable secondary electron emission (SEE) properties and the potential applications in the field of electron multiplication. However, the enhancement of SEE yield (SEY) is typically accompanied by a significant deterioration in the decay rate of SEY. The accelerated decay rate under prolonged electron bombardment appears to be a critical factor hindering the development of corresponding electron multipliers. In this study, we report a simple surface modification approach to improve SEE properties for Al and Au co-doped MgO thin films prepared by reactive magnetron sputtering method. This approach not only achieves high SEY but also reduces the decay rate simultaneously. Compared to the original co-doped thin films, the final composite film exhibited an increase of SEY from 5.03 to 5.34 at the incident electron energy Ep = 200eV and a decrease of decay rate from 13.3 % to 12.2 % under 2 h consistent electron bombardment. Furthermore, when implemented as the SEE layer in nine-stage discrete dynode electron multiplication system, the device with composite films featuring an Al-doped MgO surface modification exhibited a remarkable 2.5-fold gain enhancement and significantly improved stability, manifested by a reduction in gain decay rate from 14 % to 5.2 %.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"240 ","pages":"Article 114497"},"PeriodicalIF":3.8,"publicationDate":"2025-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144271490","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Experimental investigation and modeling of separation behavior for the Sb-Cu-Zn and Sb-Cu-Sn systems in vacuum distillation 真空蒸馏中Sb-Cu-Zn和Sb-Cu-Sn体系分离行为的实验研究与建模

IF 3.8 2区材料科学

Vacuum Pub Date : 2025-06-11 DOI: 10.1016/j.vacuum.2025.114498

Qihong Wen , Xiangfeng Kong , Jia Yang , Dachun Liu , Hongwei Yang

引用次数: 0

Editorial Board and Vacuum units 编辑委员会和真空单位

IF 3.8 2区材料科学

Vacuum Pub Date : 2025-06-11 DOI: 10.1016/S0042-207X(25)00467-1

引用次数: 0

Development and characterization of a large-scale high-vacuum environment simulation device with ten-kilogram-scale micron-sized lunar dust 10公斤级微米级月球尘埃大型高真空环境模拟装置的研制与表征

IF 3.8 2区材料科学

Vacuum Pub Date : 2025-06-10 DOI: 10.1016/j.vacuum.2025.114488

Lifang Li , Dingkun Gao , Huazhi Chen , Yun Chen , Jihong Yan

{"title":"Development and characterization of a large-scale high-vacuum environment simulation device with ten-kilogram-scale micron-sized lunar dust","authors":"Lifang Li , Dingkun Gao , Huazhi Chen , Yun Chen , Jihong Yan","doi":"10.1016/j.vacuum.2025.114488","DOIUrl":"10.1016/j.vacuum.2025.114488","url":null,"abstract":"<div><div>As lunar exploration missions progress, simulation chambers that accurately replicate the lunar environment are becoming essential. These chambers play a crucial role in studying the physical and chemical properties of the lunar surface, as well as in calibrating and evaluating detector reliability. However, current lunar environment simulators face significant challenges in effectively recreating the conditions of lunar dust. In response, we have developed a novel lunar environment simulation apparatus that focuses on improving vacuum performance in dusty conditions. We propose a vacuum experimental protocol specifically designed for the unique dust conditions found on the lunar surface and have validated its reliability through several experiments. Our results show that the system achieves a vacuum level of 10<sup>−5</sup> Pa under simulated kilogram-scale lunar dust conditions, meeting established standards. This work offers more realistic and reliable experimental conditions for lunar exploration, making a substantial contribution to the advancement of lunar environmental studies.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"240 ","pages":"Article 114488"},"PeriodicalIF":3.8,"publicationDate":"2025-06-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144322921","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

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