Aaman Akhtar Ahmed , Wei-Cheng Hong , Xuan Feng , Liu Jian Feng , Yi-Kai Huang , Chen-Yi Lou , Hideki Okamoto , Germar Hoffmann
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引用次数: 0
Abstract
The field of On-Surface Synthesis, which involves creating two-dimensional structures by covalently coupling simple molecules directly on surfaces, has seen remarkable advancements in the past decade, with new synthetic methods constantly emerging. The inherent constraints of working in two dimensions and the inability to use solutions for precursor exchange and byproduct removal are slowing down progress. Recent breakthroughs, such as using atomic hydrogen to remove byproducts and synthesize radicals on surfaces, have shown promise.
Drawing inspiration from traditional chemistry, we introduce the concept of protective groups to gain greater control over on-surface reactions. Specifically, we demonstrate the chemical protection of an imide group by attaching an alkyl functional group to a [5]phenacenediimide molecule. This protection strategy effectively delays the metal coordination of the imide group until the significantly higher temperature at which the alkyl group detaches. Furthermore, the volatile nature of the alkyl byproducts allows for their inherent removal, facilitates clean surfaces. Our findings successfully illustrate the potential of using protective groups as a powerful tool to further direct and refine On-Surface Synthesis.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.