Vacuum最新文献_第7页

Development and diagnostic study of the RF nitrogen atom source 射频氮原子源的开发和诊断研究

IF 3.8 2区材料科学

Vacuum Pub Date : 2024-11-09 DOI: 10.1016/j.vacuum.2024.113820

Mengting Li, Xin Xu, Wubin Wu, Shixiang Peng, Weiping Chen, Zhiyi Zhai, Qing Luo, Haiping Peng, Ailin Zhang

{"title":"Development and diagnostic study of the RF nitrogen atom source","authors":"Mengting Li, Xin Xu, Wubin Wu, Shixiang Peng, Weiping Chen, Zhiyi Zhai, Qing Luo, Haiping Peng, Ailin Zhang","doi":"10.1016/j.vacuum.2024.113820","DOIUrl":"10.1016/j.vacuum.2024.113820","url":null,"abstract":"<div><div>With the development of thin film technology, particularly the increasing demand for research on group III nitride materials, the need for N ions has significantly increased. A wider and more efficient RF nitrogen atom source specifically designed for nitride film growth has been developed. To evaluate the nitrogen atom density from the RF nitrogen source, a global model of RF nitrogen gas discharge plasma was created. This model was calibrated by measuring the emission spectrum of RF nitrogen gas discharge, and the relationships between nitrogen atom density and actual working pressure, power, and discharge chamber size were determined. It was found that the nitrogen atom density increases with increasing power and initially increases with pressure before decreasing. Finally, the nitrogen atom density was determined, achieving an 18 % nitrogen atom dissociation rate and a nitrogen atom density of 5 × 10<sup>12</sup>/cm³ at an RF power of 400 W. This density is significantly higher than that of nitrogen ions, indicating that this is a nitrogen atom source with high purity.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"231 ","pages":"Article 113820"},"PeriodicalIF":3.8,"publicationDate":"2024-11-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142659330","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Influence of the growth rate during Nb film pulsed laser deposition on the sapphire R-plane 铌薄膜脉冲激光沉积过程中的生长速率对蓝宝石 R 平面的影响

IF 3.8 2区材料科学

Vacuum Pub Date : 2024-11-09 DOI: 10.1016/j.vacuum.2024.113827

I.V. Malikov

引用次数: 0

Wide-temperature-range tribological properties of Cu-Ni-Al films with multiple oxidation states 具有多种氧化态的铜-镍-铝薄膜的宽温度范围摩擦学特性

IF 3.8 2区材料科学

Vacuum Pub Date : 2024-11-09 DOI: 10.1016/j.vacuum.2024.113823

Ziluo Cheng , Xiao Wang , Xiaona Li , Zhumin Li , Yinglin Hu , Qiao Jiang , Renwei Liu , Yuandi Hou , Min Li , Rui Zheng , Chuang Dong

{"title":"Wide-temperature-range tribological properties of Cu-Ni-Al films with multiple oxidation states","authors":"Ziluo Cheng , Xiao Wang , Xiaona Li , Zhumin Li , Yinglin Hu , Qiao Jiang , Renwei Liu , Yuandi Hou , Min Li , Rui Zheng , Chuang Dong","doi":"10.1016/j.vacuum.2024.113823","DOIUrl":"10.1016/j.vacuum.2024.113823","url":null,"abstract":"<div><div>High-temperature (HT) apparatus suffer from galling and seizure of contact interface, for which a wear-resistant film is helpful but challenging to design. In this work, the Cu-Ni-Al films prepared by magnetron sputtering provide effective wear-resistant protection for Ni-based superalloy over room temperature (RT) to 800 °C, decreasing the coefficient of friction by 45 %, 30 %, 15 % and wear rate by 97 %, 65 %, 62 % at RT, 400 °C, 600 °C, respectively, and exhibiting especially low wear rate 1.88 × 10<sup>−5</sup>mm<sup>3</sup>N<sup>−1</sup>m<sup>−1</sup> at 800 °C. Layered structure with multiple oxidation states formed during friction is the crucial, with the Cu<sub>2</sub>O-rich layer and the CuO layer serving lubrication at RT and HT, respectively. The FCC + L1<sub>2</sub> structure ensures the high-temperature carrying capacity and film-substrate adhesion. AFM investigation exhibits the microscale tribological behavior is relevance with Ni + Al content. This work provides a novel strategy for the design and preparation of wide-temperature-range wear-resistant film.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"231 ","pages":"Article 113823"},"PeriodicalIF":3.8,"publicationDate":"2024-11-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142659325","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

A new system for sample synthesis, preparation and modification combined with in-situ depth profiling using medium energy ions 利用中等能量离子进行样品合成、制备和改性以及原位深度剖析的新系统

IF 3.8 2区材料科学

Vacuum Pub Date : 2024-11-09 DOI: 10.1016/j.vacuum.2024.113824

Radek Holeňák , Dmitrii Moldarev , Eleni Ntemou , Theofanis Tsakiris , Carolin Frank , Kevin Vomschee , Svenja Lohmann , Daniel Primetzhofer

{"title":"A new system for sample synthesis, preparation and modification combined with in-situ depth profiling using medium energy ions","authors":"Radek Holeňák , Dmitrii Moldarev , Eleni Ntemou , Theofanis Tsakiris , Carolin Frank , Kevin Vomschee , Svenja Lohmann , Daniel Primetzhofer","doi":"10.1016/j.vacuum.2024.113824","DOIUrl":"10.1016/j.vacuum.2024.113824","url":null,"abstract":"<div><div>We present equipment for sample synthesis, preparation and modification enabling <em>in-situ</em> studies employing medium energy ion beams at the ion implanter facility of the Tandem Laboratory national research infrastructure at Uppsala University. The integral instrumentation enables controlled thin-film synthesis, modification and characterization applicable to study near-surface processes such as thin-film growth, phase transformation, oxidation, annealing, catalysis or ion implantation. We describe the available instrumentation with its specifications and present four demonstrative experiments with a particular focus on the acquired <em>in-situ</em> capabilities addressing 1) Evaporation and thermal alloying of thin films – nickel silicides 2) Reactive magnetron sputtering and controlled oxidization – photochromic YHO 3) Sputtering and low-energy implantation – hydrogen in tungsten and 4) Surface cleaning of sensitive systems – self-supporting silicon membranes.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"231 ","pages":"Article 113824"},"PeriodicalIF":3.8,"publicationDate":"2024-11-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142659326","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Fe-based monolithic catalysts for Fenton-like degradation of organic dyes: The important role of Fe2(OH)3Cl species 用于有机染料 Fenton 类降解的铁基整体催化剂：Fe2(OH)3Cl 物种的重要作用

IF 3.8 2区材料科学

Vacuum Pub Date : 2024-11-09 DOI: 10.1016/j.vacuum.2024.113822

Shixian Huang , Hongbo Yao , Helen J. Sun , Hanxi Xiao , Xiao Liu , Chuanbo Hu , Jianting Tang , Joe R. Zhao

引用次数: 0

Nanocubic transition metal sulfides (FeMn)S2@NC synthesized by MOFs facily for supercapacitors 用 MOFs 法合成纳米立方过渡金属硫化物 (FeMn)S2@NC 用于超级电容器

IF 3.8 2区材料科学

Vacuum Pub Date : 2024-11-08 DOI: 10.1016/j.vacuum.2024.113819

Guoqing Feng , Tiewei Zhao , Lingling Zhou , Xin Wang , Hao Ding , Feng Jiang , Huiyu Li , Yongsheng Liu , Qing Yu , Haijing Cao , Yan Xu , Yanyan Zhu

{"title":"Nanocubic transition metal sulfides (FeMn)S2@NC synthesized by MOFs facily for supercapacitors","authors":"Guoqing Feng , Tiewei Zhao , Lingling Zhou , Xin Wang , Hao Ding , Feng Jiang , Huiyu Li , Yongsheng Liu , Qing Yu , Haijing Cao , Yan Xu , Yanyan Zhu","doi":"10.1016/j.vacuum.2024.113819","DOIUrl":"10.1016/j.vacuum.2024.113819","url":null,"abstract":"<div><div>Transition metal sulfides have attracted considerable attention as supercapacitor materials due to their favorable electrochemical properties and low cost. However, challenges such as slow electrochemical kinetics and significant volume changes still persist. In this study, (FeMn)S<sub>2</sub>@NC nanocubes were synthesized by utilizing MOFs as precursors, employing a solution method to encapsulate Ppy around the periphery, followed by a one-step annealing process. The electrode prepared from (FeMn)S2@NC exhibits a high specific capacitance of 1154 F/g at 1 A/g and retains a specific capacitance of 777 F/g even at a high current density of 5 A/g. After 8000 charge-discharge cycles at 10 A/g, it still maintains a high capacity retention of 94 % and close to 100 % Coulombic efficiency. The (FeMn)S2@NC//AC capacitor exhibite excellent electrochemical performance with good rate capability and practical value 39.73F/g at 1A/g, 38.26F/g at 2A/g, 26.67F/g at 5A/g, 20.53F/g at 7A/g and 14F/g at 10A/g. Electrochemical testing at 5A/g show 93.3 % high capacity retention after 180,000 cycles.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"231 ","pages":"Article 113819"},"PeriodicalIF":3.8,"publicationDate":"2024-11-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142657370","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Construction and degradation mechanism of the magnetic CoFe1.95Y0.05O4/Ag/g-C3N4 Z-scheme heterojunction for enhanced photocatalytic activity 用于增强光催化活性的磁性 CoFe1.95Y0.05O4/Ag/g-C3N4 Z 型异质结的构建与降解机理

IF 3.8 2区材料科学

Vacuum Pub Date : 2024-11-07 DOI: 10.1016/j.vacuum.2024.113817

Y. Meng , G.X. zhang , D.W. Chen , M. Xu , Q.W. Liu , F.C. Jiao

{"title":"Construction and degradation mechanism of the magnetic CoFe1.95Y0.05O4/Ag/g-C3N4 Z-scheme heterojunction for enhanced photocatalytic activity","authors":"Y. Meng , G.X. zhang , D.W. Chen , M. Xu , Q.W. Liu , F.C. Jiao","doi":"10.1016/j.vacuum.2024.113817","DOIUrl":"10.1016/j.vacuum.2024.113817","url":null,"abstract":"<div><div>In this study, a Z-scheme heterojunction CoFe<sub>1.95</sub>Y<sub>0.05</sub>O<sub>4</sub>/Ag/g-C<sub>3</sub>N<sub>4</sub> (CFYO/ACN) magnetic nanocomposite was prepared by hydrothermal synthesis. The composite was characterised and analyzed using different characterization tools and its photocatalytic degradation activity towards methylene blue (MB) was investigated. The results showed that the CFYO/ACN photocatalyst compared to CoFe<sub>1.95</sub>Y<sub>0.05</sub>O<sub>4</sub> (CFYO) and Ag/g-C<sub>3</sub>N<sub>4</sub> (ACN), the composite CFYO/ACN had the highest degradation efficiency of MB, which was up to 97 % within 120 min, which was 1.26 and 1.09 times higher than that of ACN and CFYO, respectively. The enhancement of the catalytic performance of CFYO/ACN was attributed to the fact that the heterogeneous junction formation effectively inhibited the complexation of photogenerated carriers. In addition, five consecutive cyclic degradation experiments showed that CFYO/ACN exhibited efficient photocatalytic degradation, stable crystal structure, and easy recycling in the photodegradation process. Finally, the capture experiments confirmed that superoxide radicals (<span><math><mrow><mo>⋅</mo><msubsup><mi>O</mi><mn>2</mn><mo>−</mo></msubsup></mrow></math></span>) and hydroxyl radicals (·OH) play a major role in the degradation process. This study provides an effective strategy for the construction of efficient photocatalysts.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"231 ","pages":"Article 113817"},"PeriodicalIF":3.8,"publicationDate":"2024-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142659414","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Study on the structure evolution of (FeCoNiCu)Nx high-entropy thin film 关于 (FeCoNiCu)Nx 高熵薄膜结构演变的研究

IF 3.8 2区材料科学

Vacuum Pub Date : 2024-11-07 DOI: 10.1016/j.vacuum.2024.113815

Yantao Li , Ziyuan Luo , Hua Lan , Jun Liang , Deming Huang , Yu Ni , Donglin Ma , Xin Jiang

{"title":"Study on the structure evolution of (FeCoNiCu)Nx high-entropy thin film","authors":"Yantao Li , Ziyuan Luo , Hua Lan , Jun Liang , Deming Huang , Yu Ni , Donglin Ma , Xin Jiang","doi":"10.1016/j.vacuum.2024.113815","DOIUrl":"10.1016/j.vacuum.2024.113815","url":null,"abstract":"<div><div>In this paper, we designed a FeCoNiCu high-entropy system composed of elements with weak nitride-forming tendencies. The (FeCoNiCu)N<sub>x</sub> high-entropy films (HEFs) were fabricated using high-power pulsed magnetron sputtering (HPPMS) by adjusting the nitrogen flow rate, and the film structure and mechanical properties were systematically investigated. Upon the introduction of N atoms, the film gradually transitioned from an FCC single-phase to a simple cubic structure, accompanied by an increase in grain size. The simple cubic phase represents a multi-component phase, where N atoms are incorporated into the FeCoNiCu lattice. XPS analysis reveals that all four elements—Fe, Co, Ni, and Cu—combine with N to form weak covalent bonds. As the N content in the film increases, the hardness of the simple cubic (FeCoNiCu)N<sub>x</sub> film increased by 33 % compared to the FeCoNiCu alloy film, from 7.9 to 10.5 GPa, which is attributed to the solid solution strengthening effect and phase transition. This work offers new insights into the structural evolution of high-entropy alloy systems composed of weak nitride-forming elements.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"231 ","pages":"Article 113815"},"PeriodicalIF":3.8,"publicationDate":"2024-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142659453","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Size dependent mechanical properties and deformation mechanisms in Ti and Zr films 钛和锆薄膜中与尺寸相关的机械性能和变形机制

IF 3.8 2区材料科学

Vacuum Pub Date : 2024-11-07 DOI: 10.1016/j.vacuum.2024.113810

Zhaoqi Hou , Tao Wang , Peipei Wang , Yuhao Wu , Wanchang Sun

{"title":"Size dependent mechanical properties and deformation mechanisms in Ti and Zr films","authors":"Zhaoqi Hou , Tao Wang , Peipei Wang , Yuhao Wu , Wanchang Sun","doi":"10.1016/j.vacuum.2024.113810","DOIUrl":"10.1016/j.vacuum.2024.113810","url":null,"abstract":"<div><div>The nanometallic Ti and Zr monolayer films with various thicknesses ranging from 600 to 2200 nm were prepared by using magnetron sputtering technique. The microstructure results demonstrated that Ti films transformed from hcp to fcc at <em>t</em> ≤ 600 nm, while Zr films were grown with hcp structure of nanocolumnar grain. Moreover, the grain orientation of hcp Ti films changed from (0002) preferred orientation at <em>t</em> = 1200 nm to random orientation at larger thickness. Subsequently, the hardness and strain rate sensitivity of films were explored by nanoindentation. The Hall-Petch relationship is obviously invalid to explain the film thickness dependent hardening behaviors in Ti and Zr films, and the influence of phase structure, orientation and residual stress on nanoindentation hardness was discussed. It seems that residual stress plays an important role in the determination of hardness in present Ti and Zr films. The negative strain rate sensitivity <em>m</em> appeared during the plastic deformation of fcc Ti films, which is caused by the phase transformation. The underlying deformation mechanism of hcp Ti and Zr films was also discussed.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"231 ","pages":"Article 113810"},"PeriodicalIF":3.8,"publicationDate":"2024-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142659412","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Comparative analysis of impurity removal in aluminum, copper, and nickel by hydrogen refining 通过氢气精炼去除铝、铜和镍中杂质的比较分析

IF 3.8 2区材料科学

Vacuum Pub Date : 2024-11-07 DOI: 10.1016/j.vacuum.2024.113813

Yuchong Chen , Yubo Wang , Zaijiu Li , Yue Shen , Ming Wen , Sugun Lim , Qinglin Jin

引用次数: 0