Process parameter optimization and corrosion properties of the AlCrTiV medium entropy alloy films

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-06-18 DOI:10.1016/j.vacuum.2025.114517

Ying Liu , Zhaobing Cai , Juanjuan Hu , Lei Yan , Bingxu Wang , Le Gu

{"title":"Process parameter optimization and corrosion properties of the AlCrTiV medium entropy alloy films","authors":"Ying Liu , Zhaobing Cai , Juanjuan Hu , Lei Yan , Bingxu Wang , Le Gu","doi":"10.1016/j.vacuum.2025.114517","DOIUrl":null,"url":null,"abstract":"<div><div>In this work, based on an orthogonal experimental design, nine groups of the AlCrTiV medium-entropy alloy (MEA) films were prepared by vacuum magnetron sputtering under different deposition parameters (sputtering power, substrate temperature, and bias voltage), and the influence of deposition parameters on their corrosion property (in 3.5 wt % NaCl solution) was studied in detail. Through range analysis, we identified the optimal process parameters for achieving superior corrosion performance (sputtering power of 800 W, substrate temperature of 400 °C, bias voltage of 100 V). The research results indicate that the sputtering power has the greatest impact on the corrosion properties of the films. Specifically, corrosion resistance diminishes as power increases, with the optimal corrosion resistance observed at 800 W. After corrosion, the surfaces of the films are composed of the oxidized state and the unoxidized state of the metal, and the corrosion mechanism is pitting. The enrichment of Cr and O elements in the pitting pores may be related to the rupture and regeneration of Cr<sub>2</sub>O<sub>3</sub> in the passivation film. The XPS results suggest that enhanced corrosion resistance correlates with a higher concentration of Al<sub>2</sub>O<sub>3</sub> and Cr<sub>2</sub>O<sub>3</sub> in the dense passivation film.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"240 ","pages":"Article 114517"},"PeriodicalIF":3.8000,"publicationDate":"2025-06-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X2500507X","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}

引用次数: 0

Abstract

In this work, based on an orthogonal experimental design, nine groups of the AlCrTiV medium-entropy alloy (MEA) films were prepared by vacuum magnetron sputtering under different deposition parameters (sputtering power, substrate temperature, and bias voltage), and the influence of deposition parameters on their corrosion property (in 3.5 wt % NaCl solution) was studied in detail. Through range analysis, we identified the optimal process parameters for achieving superior corrosion performance (sputtering power of 800 W, substrate temperature of 400 °C, bias voltage of 100 V). The research results indicate that the sputtering power has the greatest impact on the corrosion properties of the films. Specifically, corrosion resistance diminishes as power increases, with the optimal corrosion resistance observed at 800 W. After corrosion, the surfaces of the films are composed of the oxidized state and the unoxidized state of the metal, and the corrosion mechanism is pitting. The enrichment of Cr and O elements in the pitting pores may be related to the rupture and regeneration of Cr₂O₃ in the passivation film. The XPS results suggest that enhanced corrosion resistance correlates with a higher concentration of Al₂O₃ and Cr₂O₃ in the dense passivation film.

查看原文本刊更多论文

AlCrTiV中熵合金膜工艺参数优化及腐蚀性能研究

采用正交实验设计，在不同沉积参数（溅射功率、衬底温度和偏置电压）下，采用真空磁控溅射法制备了9组AlCrTiV中熵合金（MEA）薄膜，并研究了沉积参数对其腐蚀性能（在3.5 wt % NaCl溶液中）的影响。通过范围分析，我们确定了获得优异腐蚀性能的最佳工艺参数（溅射功率为800 W，衬底温度为400℃，偏置电压为100 V）。研究结果表明，溅射功率对膜的腐蚀性能影响最大。具体来说，耐腐蚀性能随着功率的增加而降低，在800w时达到最佳。腐蚀后，膜的表面由金属的氧化态和未氧化态组成，腐蚀机理为点蚀。蚀孔中Cr和O元素的富集可能与钝化膜中Cr2O3的断裂和再生有关。XPS结果表明，增强的耐蚀性与致密钝化膜中Al2O3和Cr2O3的浓度有关。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.