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Enhanced efficiency of deep ultraviolet light-emitting diodes utilizing full-coverage Al reflector and highly reflective Ni/Rh p-electrode 利用全覆盖铝反射器和高反射镍/铑对电极提高深紫外发光二极管的效率
IF 1.9 4区 工程技术
Semiconductor Science and Technology Pub Date : 2024-04-11 DOI: 10.1088/1361-6641/ad3a92
Zhenxing Lv, Zhefu Liao, Shengjun Zhou
{"title":"Enhanced efficiency of deep ultraviolet light-emitting diodes utilizing full-coverage Al reflector and highly reflective Ni/Rh p-electrode","authors":"Zhenxing Lv, Zhefu Liao, Shengjun Zhou","doi":"10.1088/1361-6641/ad3a92","DOIUrl":"https://doi.org/10.1088/1361-6641/ad3a92","url":null,"abstract":"Increasing the reflection of p-side is an effective way to improve the optoelectronic performance of flip-chip light-emitting diodes (FCLEDs). Here, we propose a full-coverage Al reflector (FAR) and a highly reflective Ni/Rh p-electrode to enhance the performance of deep ultraviolet (DUV) FCLEDs. The physical mechanism for the impact of the FAR and Ni/Rh electrode on the light extraction efficiency (LEE) is discussed theoretically. Simulations demonstrate that the combination of the FAR and Ni/Rh electrode improves the LEEs of transverse electric- and transverse magnetic-polarized light by 13.62% and 27.08%, respectively. At an injection current of 100 mA, the fabricated DUV FCLEDs with FAR and Ni/Rh electrode exhibits an external quantum efficiency of 4.01% and a wall plugging efficiency of 2.92%, which are 16.85% and 13.18% higher than those of conventional DUV FCLEDs, respectively. These results support the promise of the FAR and Ni/Rh electrode for high-power DUV LED applications.","PeriodicalId":21585,"journal":{"name":"Semiconductor Science and Technology","volume":"78 1","pages":""},"PeriodicalIF":1.9,"publicationDate":"2024-04-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140608629","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Performance improvement of enhancement-mode GaN-based HEMT power devices by employing a vertical gate structure and composite interlayers* 通过采用垂直栅极结构和复合夹层提高增强型氮化镓基 HEMT 功率器件的性能*
IF 1.9 4区 工程技术
Semiconductor Science and Technology Pub Date : 2024-03-25 DOI: 10.1088/1361-6641/ad31c5
Zhonghao Sun, Jianxun Dai, Huolin Huang, Nan Sun, Jiayu Zhang, Yun Lei, Dawei Li, Kaiming Ma, Huimin Yu, Yanhong Liu, Hui Huang, Yung C Liang
{"title":"Performance improvement of enhancement-mode GaN-based HEMT power devices by employing a vertical gate structure and composite interlayers*","authors":"Zhonghao Sun, Jianxun Dai, Huolin Huang, Nan Sun, Jiayu Zhang, Yun Lei, Dawei Li, Kaiming Ma, Huimin Yu, Yanhong Liu, Hui Huang, Yung C Liang","doi":"10.1088/1361-6641/ad31c5","DOIUrl":"https://doi.org/10.1088/1361-6641/ad31c5","url":null,"abstract":"In this work, p-n junction vertical gate (JVG) and polarization junction vertical gate (PVG) structures are for the first time proposed to improve the performance of GaN-based enhancement-mode (E-mode) high electron mobility transistor (HEMT) devices. Compared with the control group featuring the vertical gate structure, a highly improved threshold voltage (<italic toggle=\"yes\">V</italic>\u0000<sub>th</sub>) and breakdown voltage (<italic toggle=\"yes\">BV</italic>) are achieved with the assistance of the extended depletion regions formed by inserting single or composite interlayers. The structure dimensions and physical parameters for device interlayers are optimized by TCAD simulation to adjust the spatial electric field distribution and hence improve the device off-state characteristics. The optimal JVG-HEMT device can reach a <italic toggle=\"yes\">V</italic>\u0000<sub>th</sub> of 3.4 V, a low on-state resistance (<italic toggle=\"yes\">R</italic>\u0000<sub>on</sub>) of 0.64 mΩ cm<sup>2</sup>, and a <italic toggle=\"yes\">BV</italic> of 1245 V, while the PVG-HEMT device exhibits a <italic toggle=\"yes\">V</italic>\u0000<sub>th</sub> of 3.7 V, an <italic toggle=\"yes\">R</italic>\u0000<sub>on</sub> of 0.65 mΩ cm<sup>2</sup>, and a <italic toggle=\"yes\">BV</italic> of 1184 V, which could be further boosted when an additional field plate design is employed. Thus, the figure-of-merit value of JVG- and PVG-HEMT devices rise to 2.4 and 2.2 GW cm<sup>−2</sup>, respectively, much higher than that for the VG-HEMT control group (1.0 GW cm<sup>−2</sup>). This work provides a novel technical approach to realize higher-performance E-mode HEMTs.","PeriodicalId":21585,"journal":{"name":"Semiconductor Science and Technology","volume":"70 1","pages":""},"PeriodicalIF":1.9,"publicationDate":"2024-03-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140314611","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Electronic transport properties of WS2 using ensemble Monte Carlo method 利用蒙特卡洛集合法研究 WS2 的电子传输特性
IF 1.9 4区 工程技术
Semiconductor Science and Technology Pub Date : 2024-03-14 DOI: 10.1088/1361-6641/ad2ec6
M Derya Alyörük
{"title":"Electronic transport properties of WS2 using ensemble Monte Carlo method","authors":"M Derya Alyörük","doi":"10.1088/1361-6641/ad2ec6","DOIUrl":"https://doi.org/10.1088/1361-6641/ad2ec6","url":null,"abstract":"The electronic transport characteristics of tungsten disulfide (WS<sub>2</sub>) sheets are studied using the ensemble Monte Carlo technique in the presence of intrinsic scattering mechanisms only. The transport properties of the material are obtained in a two-valley model where intra- and inter-valley scatterings are considered in K and Q valleys. The velocity overshoot effect is observed for some applied field values. Negative differential phenomena are seen for some values of the energy difference between K and Q valleys (<inline-formula>\u0000<tex-math><?CDATA $Delta E_mathrm{KQ}$?></tex-math>\u0000<mml:math overflow=\"scroll\"><mml:mi mathvariant=\"normal\">Δ</mml:mi><mml:msub><mml:mi>E</mml:mi><mml:mrow><mml:mi mathvariant=\"normal\">K</mml:mi><mml:mi mathvariant=\"normal\">Q</mml:mi></mml:mrow></mml:msub></mml:math>\u0000<inline-graphic xlink:href=\"sstad2ec6ieqn1.gif\" xlink:type=\"simple\"></inline-graphic>\u0000</inline-formula>), therefore <inline-formula>\u0000<tex-math><?CDATA $Delta E_mathrm{KQ}$?></tex-math>\u0000<mml:math overflow=\"scroll\"><mml:mi mathvariant=\"normal\">Δ</mml:mi><mml:msub><mml:mi>E</mml:mi><mml:mrow><mml:mi mathvariant=\"normal\">K</mml:mi><mml:mi mathvariant=\"normal\">Q</mml:mi></mml:mrow></mml:msub></mml:math>\u0000<inline-graphic xlink:href=\"sstad2ec6ieqn2.gif\" xlink:type=\"simple\"></inline-graphic>\u0000</inline-formula> and the effective mass of carriers in the Q valley has a critical role in the transport and mobility characteristics of WS<sub>2</sub>. The mobility of carriers is calculated as a function of temperature and the results are compatible with some existing theoretical and experimental predictions.","PeriodicalId":21585,"journal":{"name":"Semiconductor Science and Technology","volume":"194 1","pages":""},"PeriodicalIF":1.9,"publicationDate":"2024-03-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140314459","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Influence of halogen precursors on the growth of InSb nanostructures 卤素前驱体对 InSb 纳米结构生长的影响
IF 1.9 4区 工程技术
Semiconductor Science and Technology Pub Date : 2024-03-12 DOI: 10.1088/1361-6641/ad2bac
Alexander K Sten, Kevin M Roccapriore, Brian Squires, Chris Littler, A J Syllaios, Usha Philipose
{"title":"Influence of halogen precursors on the growth of InSb nanostructures","authors":"Alexander K Sten, Kevin M Roccapriore, Brian Squires, Chris Littler, A J Syllaios, Usha Philipose","doi":"10.1088/1361-6641/ad2bac","DOIUrl":"https://doi.org/10.1088/1361-6641/ad2bac","url":null,"abstract":"The present work highlights the role of halogen compounds in modifying the shape of the InSb nanostructures, while maintaining a high crystalline quality of the nanostructures. One-dimensional (1D) nanowires (NWs) and two-dimensional (2D) nanoplatelets (NPLs) were synthesized by ambient pressure chemical vapor deposition. Our experimental results suggest that at a critical growth temperature of 512 <sup>∘</sup>C, InSb NWs grow by the traditional vapor–liquid–solid growth mechanism when gold (Au) nanoparticles are used to initiate growth on an InSb film. The resulting NWs were found to have a cylindrical or tapered shape, were of high crystalline quality, and had stoichiometric composition. In the presence of halogen precursors, a change in morphology was observed and the resulting nanostructures were 2D NPLs and faceted NWs. Using existing models of crystal growth and concepts of volume, surface and edge energies, the experimental results are explained on the basis of chlorine atoms adsorbed on the wide or narrow facets of a nanocrystal, initiating nucleation and facilitating NPL or faceted NW formation. The incorporation of the chlorine atoms add a new degree of freedom to CVD synthesis of nanostructures and the results are promising for the controlled growth of novel 1D and 2D nanostructures for nano-electronic devices.","PeriodicalId":21585,"journal":{"name":"Semiconductor Science and Technology","volume":"107 1","pages":""},"PeriodicalIF":1.9,"publicationDate":"2024-03-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140316803","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Improved resistive switching characteristics of solution processed ZrO2/SnO2 bilayer RRAM via oxygen vacancy differential 通过氧空位差改善溶液加工 ZrO2/SnO2 双层 RRAM 的电阻开关特性
IF 1.9 4区 工程技术
Semiconductor Science and Technology Pub Date : 2024-03-08 DOI: 10.1088/1361-6641/ad2b07
Kihwan Choi, James Jungho Pak
{"title":"Improved resistive switching characteristics of solution processed ZrO2/SnO2 bilayer RRAM via oxygen vacancy differential","authors":"Kihwan Choi, James Jungho Pak","doi":"10.1088/1361-6641/ad2b07","DOIUrl":"https://doi.org/10.1088/1361-6641/ad2b07","url":null,"abstract":"In this study, a solution-processed bilayer structure ZrO<sub>2</sub>/SnO<sub>2</sub> resistive switching (RS) random access memory (RRAM) is presented for the first time. The precursors of SnO<sub>2</sub> and ZrO<sub>2</sub> are Tin(Ⅱ) acetylacetonate (Sn(AcAc)<sub>2</sub>) and zirconium acetylacetonate (Zr(C<sub>5</sub>H<sub>7</sub>O<sub>2</sub>)<sub>4</sub>), respectively. The top electrode was deposited with Ti using an E-beam evaporator, and the bottom electrode used an indium–tin–oxide glass wafer. We created three devices: SnO<sub>2</sub> single-layer, ZrO<sub>2</sub> single-layer, and ZrO<sub>2</sub>/SnO<sub>2</sub> bilayer devices, to compare RS characteristics such as the <italic toggle=\"yes\">I</italic>–<italic toggle=\"yes\">V</italic> curve and endurance properties. The SnO<sub>2</sub> and ZrO<sub>2</sub> single-layer devices showed on/off ratios of approximately 2 and 51, respectively, along with endurance switching cycles exceeding 50 and 100 DC cycles. The bilayer device attained stable RS characteristics over 120 DC endurance switching cycles and increased on/off ratio ∼2.97 × 10<sup>2</sup>. Additionally, the ZrO<sub>2</sub>/SnO<sub>2</sub> bilayer bipolar switching mechanism was explained by considering the Gibbs free energy (Δ<italic toggle=\"yes\">G</italic>\u0000<sup>o</sup>) difference in the ZrO<sub>2</sub> and SnO<sub>2</sub> layers, where the formation and rupture of conductive filaments were caused by oxygen vacancies. The disparity in the concentration of oxygen vacancies, as indicated by the Gibbs free energy difference between ZrO<sub>2</sub> (Δ<italic toggle=\"yes\">G</italic>\u0000<sup>o</sup> = −1100 kJ mol<sup>−1</sup>) and SnO<sub>2</sub> (Δ<italic toggle=\"yes\">G</italic>\u0000<sup>o</sup> = −842.91 kJ mol<sup>−1</sup>) implied that ZrO<sub>2</sub> exhibited a higher abundance of oxygen vacancies compared to SnO<sub>2</sub>, resulting in improved endurance and on/off ratio. X-ray photoelectron spectroscopy analyzed oxygen vacancies in ZrO<sub>2</sub> and SnO<sub>2</sub> thin films. The resistance switching characteristics were improved due to the bilayer structure, which combines a higher oxygen vacancy concentration in one layer with a lower oxygen vacancy concentration in the switching layer. This configuration reduces the escape of oxygen vacancies to the electrode during RS.","PeriodicalId":21585,"journal":{"name":"Semiconductor Science and Technology","volume":"21 1","pages":""},"PeriodicalIF":1.9,"publicationDate":"2024-03-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140314455","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Insights into dynamic switching behavior and electric field distribution of depletion-mode GaN HEMT with bonding pad over active layout 洞察有源布局上带有键合垫的耗尽型 GaN HEMT 的动态开关行为和电场分布
IF 1.9 4区 工程技术
Semiconductor Science and Technology Pub Date : 2024-03-08 DOI: 10.1088/1361-6641/ad2a7f
Lijian Guo, Feng Zhou, Weizong Xu, Fangfang Ren, Dong Zhou, Dunjun Chen, Rong Zhang, Youdou Zheng, Hai Lu
{"title":"Insights into dynamic switching behavior and electric field distribution of depletion-mode GaN HEMT with bonding pad over active layout","authors":"Lijian Guo, Feng Zhou, Weizong Xu, Fangfang Ren, Dong Zhou, Dunjun Chen, Rong Zhang, Youdou Zheng, Hai Lu","doi":"10.1088/1361-6641/ad2a7f","DOIUrl":"https://doi.org/10.1088/1361-6641/ad2a7f","url":null,"abstract":"Bonding pad over active (BPOA) layout, which stacks traditional horizontal structure pad electrodes vertically above the active area, is an area-effective device architecture and packaging-enabled solution for GaN-based high electron mobility transistors (HEMTs). In this work, the dynamic switching and electric field distribution of such layout, as well as associated capacitance–voltage and trapping characteristics, are comprehensively studied on D-mode GaN-on-sapphire HEMT by performing numerical simulations. In terms of different pad electrodes covering the active area, BPOA is composed of various structures such as gate-related and drain-related BPOAs (i.e. G-BPOA and D-BPOA), among which G-BPOA exhibits inferior switching characteristics due to the additional introduction of Miller capacitance that prolongs the device switching, while breakdown voltage of D-BPOA is 400–900 V lower than other BPOA counterparts due to the interplay between D-BPOA and the drain electrode. Furthermore, the effects of trap capture cross section and trap density on switching characteristics are evaluated. These results highlight the differences in electrical characteristics of various structures within the BPOA layout, and provide valuable insights into BPOA device design and performance improvement.","PeriodicalId":21585,"journal":{"name":"Semiconductor Science and Technology","volume":"72 1","pages":""},"PeriodicalIF":1.9,"publicationDate":"2024-03-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140316846","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Over 43%-power-efficiency GaInN-based photoelectric transducer on free-standing GaN substrate for optical wireless power transmission system 独立式氮化镓基底上功率效率超过 43% 的氮化镓基光电传感器,用于光无线输电系统
IF 1.9 4区 工程技术
Semiconductor Science and Technology Pub Date : 2024-03-07 DOI: 10.1088/1361-6641/ad2d62
Takahiro Fujisawa, Nan Hu, Tomoki Kojima, Takashi Egawa, Makoto Miyoshi
{"title":"Over 43%-power-efficiency GaInN-based photoelectric transducer on free-standing GaN substrate for optical wireless power transmission system","authors":"Takahiro Fujisawa, Nan Hu, Tomoki Kojima, Takashi Egawa, Makoto Miyoshi","doi":"10.1088/1361-6641/ad2d62","DOIUrl":"https://doi.org/10.1088/1361-6641/ad2d62","url":null,"abstract":"We investigated the GaInN-based photoelectric transducers (PTs) aiming at the application to optical wireless power transmission systems. A PT device structure with Ga<sub>0.9</sub>In<sub>0.1</sub>N multiple-quantum-wells (MQWs) as a light absorption layer was grown on a free-standing GaN substrate by metalorganic chemical vapor deposition and subjected to the device fabrication. The PT performance was evaluated via the two-terminal current-density vs. voltage characteristics taken under a monochromatic light illumination. The fabricated PT devices exhibited a high open-circuit voltage of approximately 2.3 V and a high shunt resistance of 41 kΩcm<sup>2</sup>, thanks to its good material qualities. In addition, its surface reflection was markedly suppressed by an adoption of a wet surface treatment and an anti-reflection coating, resulting in a high external quantum efficiency of 90% and a high short-circuit current density of 1.4 mAcm<sup>−2</sup>. Through the above investigation, a high power-conversion efficiency as great as 43.7% was achieved for the GaInN MQW PTs at a light illumination with 390 nm in wavelength and 5 mWcm<sup>−2</sup> in optical power density.","PeriodicalId":21585,"journal":{"name":"Semiconductor Science and Technology","volume":"49 1","pages":""},"PeriodicalIF":1.9,"publicationDate":"2024-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140314606","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Study on low-temperature evaporation of Ag2O-based Ag electrode and electron injection layer and their application in OLEDs 基于 Ag2O 的银电极和电子注入层的低温蒸发及其在有机发光二极管中的应用研究
IF 1.9 4区 工程技术
Semiconductor Science and Technology Pub Date : 2024-03-07 DOI: 10.1088/1361-6641/ad2d63
Yachen Xu, Jialu Gu, Lulu Zhou, Bingjia Zhao, Yangyang Zhu, Wei Shi, Bin Wei
{"title":"Study on low-temperature evaporation of Ag2O-based Ag electrode and electron injection layer and their application in OLEDs","authors":"Yachen Xu, Jialu Gu, Lulu Zhou, Bingjia Zhao, Yangyang Zhu, Wei Shi, Bin Wei","doi":"10.1088/1361-6641/ad2d63","DOIUrl":"https://doi.org/10.1088/1361-6641/ad2d63","url":null,"abstract":"Organic light-emitting diodes (OLEDs) have become one of the mainstream lighting and display technologies. The vacuum thermal evaporation is the most widely adopted method for the preparation of organic and metal materials of OLEDs. The thermal deposition of the commonly used silver (Ag) and aluminum (Al) electrodes requires high temperature and long time, which greatly increases the cost of the fabricating process. Therefore, we selected silver oxide (Ag<sub>2</sub>O) powder instead of Ag pellets as the precursor for evaporating Ag electrodes. Compared to Ag pellets and Al wires, Ag<sub>2</sub>O-based Ag electrode need lower evaporation temperature and shorter preheating time. In addition, the agglomeration phenomenon on the surface of the Ag<sub>2</sub>O-based Ag film is prevented, which also increases the carrier concentration of Ag electrode. Moreover, by doping bathophenanthroline (Bphen) in Ag<sub>2</sub>O powders, the phenanthroline-metal (Bphen-Ag) complexes with higher electron mobility and stronger electron injecting ability can be achieved. We applied Ag<sub>2</sub>O-based Ag electrode and 10 wt.% Ag<sub>2</sub>O-based Ag:Bphen as electron injection layer to achieve high-efficiency red phosphorescent inverted OLEDs, with the maximum current efficiency, external quantum efficiency, and power efficiency of 17.79 cd A<sup>−1</sup>, 20.71%, and 12.14 lm W<sup>−1</sup>, respectively. This method provides a new strategy for preparing highly efficient inverted red OLED devices.","PeriodicalId":21585,"journal":{"name":"Semiconductor Science and Technology","volume":"53 1","pages":""},"PeriodicalIF":1.9,"publicationDate":"2024-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140314454","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Understanding the effects of annealing induced structural transformations on the UVC absorbance and other optical properties of RF sputter deposited Ga2O3 thin films 了解退火诱导的结构转变对射频溅射沉积 Ga2O3 薄膜的紫外线吸收率和其他光学特性的影响
IF 1.9 4区 工程技术
Semiconductor Science and Technology Pub Date : 2024-03-04 DOI: 10.1088/1361-6641/ad2b0b
Keerthana C S, Anjana S Nair, Sreepriya K, Jiya James, Santhosh Kumar, N V Unnikrishnan, Saritha A C
{"title":"Understanding the effects of annealing induced structural transformations on the UVC absorbance and other optical properties of RF sputter deposited Ga2O3 thin films","authors":"Keerthana C S, Anjana S Nair, Sreepriya K, Jiya James, Santhosh Kumar, N V Unnikrishnan, Saritha A C","doi":"10.1088/1361-6641/ad2b0b","DOIUrl":"https://doi.org/10.1088/1361-6641/ad2b0b","url":null,"abstract":"Gallium oxide (Ga<sub>2</sub>O<sub>3</sub>) is a transparent material with high absorption in the UVC region of the electromagnetic spectrum and hence is a very important candidate in the field of short wavelength optical device fabrication. A proper understanding of the different optical parameters is necessary for developing more efficient coatings and devices. In this work, changes in the optical behavior of Ga<sub>2</sub>O<sub>3</sub> thin films due to post-deposition annealing (at temperatures 300 °C–900 °C) are discussed in detail. Structural, surface morphological and compositional modifications of the films are identified using the x-ray diffractometer, scanning electron microscopy and x-ray photoelectron spectrometer techniques, respectively. At 900 °C, a highly stable monoclinic <italic toggle=\"yes\">β</italic> phase of Ga<sub>2</sub>O<sub>3</sub> is obtained. The optical transmittance spectra acquired using UV–Vis spectroscopy indicate an improved UVC absorbance of the <italic toggle=\"yes\">β</italic>-Ga<sub>2</sub>O<sub>3</sub> films with an excellent visible transmittance (&gt;80%). The structural transformation from amorphous to crystalline <italic toggle=\"yes\">β</italic>-Ga<sub>2</sub>O<sub>3</sub> phase and the associated reduction in defect density is found to modify other optical attributes, like the bandgap energy, Urbach energy, dispersion parameters, etc.","PeriodicalId":21585,"journal":{"name":"Semiconductor Science and Technology","volume":"45 1","pages":""},"PeriodicalIF":1.9,"publicationDate":"2024-03-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140314431","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The superiority of the photocatalytic and antibacterial performance of mechanochemically synthesized CdS nanoparticles over solvothermal-prepared ones 机械化学合成的 CdS 纳米粒子的光催化和抗菌性能优于溶热制备的 CdS 纳米粒子
IF 1.9 4区 工程技术
Semiconductor Science and Technology Pub Date : 2024-02-28 DOI: 10.1088/1361-6641/ad2b08
Gairat Burashev, Batukhan Tatykayev, Matej Baláž, Natalya Khan, Ardak Jumagazieva, Zhanar Iskakbayeva, Anar Seysembekova, Saparbek Tugelbay, Nurshat Turgynbay, Almagul Niyazbayeva, Aleksandr Ilin, Mukhambetkali Burkitbayev, Zhandos Shalabayev
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