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The 14th International Symposium on Sputtering and Plasma Processes (ISSP2017) 第十四届溅射与等离子体工艺国际研讨会(ISSP2017)
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/jvsj2.60.517
Y. Yamada
{"title":"The 14th International Symposium on Sputtering and Plasma Processes (ISSP2017)","authors":"Y. Yamada","doi":"10.3131/jvsj2.60.517","DOIUrl":"https://doi.org/10.3131/jvsj2.60.517","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"13 1","pages":"517-518"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75755413","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
表面処理したアルミニウム合金のガス放出特性—開発した測定装置の性能評価とガス放出速度測定—;表面処理したアルミニウム合金のガス放出特性—開発した測定装置の性能評価とガス放出速度測定—;Outgassing Properties of Aluminum Alloy with Surface Treatment —Performance Assessment of Developed Measurement System and Outgassing Rate Measurement— 表面处理铝合金的气体释放特性-所开发的测量设备性能评价及气体释放速度测量-;表面处理铝合金的气体释放特性-所开发的测量设备性能评价及气体释放速度测量-;Outgassing Properties of Aluminum Alloy with Surface Treatment - Performance Assessment of DevelopedMeasurement System and Outgassing Rate Measurement
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.450
Naoki Ogawa, Koji Yokoyama, Hidenobu Teraoka, Takashi Ishii, K. Harima, M. Goto, Ryouji Kittaka
{"title":"表面処理したアルミニウム合金のガス放出特性—開発した測定装置の性能評価とガス放出速度測定—;表面処理したアルミニウム合金のガス放出特性—開発した測定装置の性能評価とガス放出速度測定—;Outgassing Properties of Aluminum Alloy with Surface Treatment —Performance Assessment of Developed Measurement System and Outgassing Rate Measurement—","authors":"Naoki Ogawa, Koji Yokoyama, Hidenobu Teraoka, Takashi Ishii, K. Harima, M. Goto, Ryouji Kittaka","doi":"10.3131/JVSJ2.60.450","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.450","url":null,"abstract":"Hiroshima 720  2104, Japan ( Received November 27, 2016, Accepted August 20, 2017 ) We developed an outgassing measurement system which can measure by two methods ``Switching Between Two Pumping Paths method'' and ``Throughput method''. As a result of calibrating the two vacuum gauges on the upstream side of the sample ‰ow path and the blank ‰ow path, we obtained the calibration factor of 9.33 × 10 － 1 and 9.68 × 10 － 1 which the quantitative accuracy ( conˆdence level 95 ) is less than 14  . The ultimate pressure after baking at 150 ° C for 64 hours reached 5.0 × 10 － 8 Pa. As a result, the detection lower limit of the system was 5 × 10 － 12 Pa m 3 s － 1 . For an aluminum alloy sample exposed to an atmosphere of RH 50  , the outgassing rate after 20 hours was","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"79 1","pages":"450-456"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80001292","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
International Vacuum Congress (IVC-20)の会議報告電子材料・プロセス(EMP)/先進半導体とディスプレイデバイス(ASDD)/真空科学技術(VST) International Vacuum Congress (IVC-20)会议报告电子材料与工艺(EMP)/先进半导体与显示器件(ASDD)/真空科学技术(VST)
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.26
肇 吉田
{"title":"International Vacuum Congress (IVC-20)の会議報告電子材料・プロセス(EMP)/先進半導体とディスプレイデバイス(ASDD)/真空科学技術(VST)","authors":"肇 吉田","doi":"10.3131/JVSJ2.60.26","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.26","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"4 1","pages":"26-26"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"72693991","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Comparison of Plasma Ion Deposition Processes at Industrial Scale 工业规模等离子体离子沉积工艺的比较
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.362
Satoshi Hirota, R. Cremer, Tetsuya Takahashi
{"title":"Comparison of Plasma Ion Deposition Processes at Industrial Scale","authors":"Satoshi Hirota, R. Cremer, Tetsuya Takahashi","doi":"10.3131/JVSJ2.60.362","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.362","url":null,"abstract":"A relatively new industrial sputtering technology based on High Power Impulse Magnetron Sputtering (HiPIMS) is demonstrated. HiPIMS is a magnetron discharge process like conventional dc magnetron sputtering (DCMS). However, momentarily input power is approximately ten times higher in magnitude. In this study HiPIMS discharge is characterized by Optical Emission Spectroscopy (OES), and compared with DCMS and cathodic arc (CA). The result shows that the HiPIMS provides the high ionization degree of the sputtered metal species. The degree of Ti ionization is found to be increased as the pulse frequency of HiPIMS is decreased, which enables to adjust the sputter plasma properties ranging from lowmetal ionization to highmetal ionization by controlling the pulse frequency. This expands an opportunity to tailor the properties of sputtered thin ˆlms.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"15 1","pages":"362-364"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"72900809","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
イリジウム被覆型プローブの開発;イリジウム被覆型プローブの開発;Development of an Iridium-coated Probe 铱覆盖型探针的开发;铱覆盖型探针的开发;Development of an Iridium-coated Probe
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.92
Koichi Miyazono, T. Yorita, Masayuki Yamauchi, Yoshihiro Masui, H. Toyota, Masaki Koike, Takeshi Tanaka
{"title":"イリジウム被覆型プローブの開発;イリジウム被覆型プローブの開発;Development of an Iridium-coated Probe","authors":"Koichi Miyazono, T. Yorita, Masayuki Yamauchi, Yoshihiro Masui, H. Toyota, Masaki Koike, Takeshi Tanaka","doi":"10.3131/JVSJ2.60.92","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.92","url":null,"abstract":"Development of an Iridium-coated Probe Koichi MIYAZONO1, Toshitaka YORITA1, Masayuki YAMAUCHI2, Yoshihiro MASUI2, Hiroshi TOYOTA2, Masaki KOIKE2 and Takeshi TANAKA2 1MIURA CORPORATION, 39 Minami-Senda-Higashi, Naka-ku, Hiroshima-shi, Hiroshima 7300054, Japan 2Department of Electronics and Computer Engineering, Hiroshima Institute of Technology, 211 Miyake, Saeki-ku, Hiroshima-shi, Hiroshima 7315193, Japan","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"30 1","pages":"92-95"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73344091","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
吸引プラズマエッチング法を用いたSiO 2 ダイアフラム構造作製技術の開発;吸引プラズマエッチング法を用いたSiO 2 ダイアフラム構造作製技術の開発;Development of Simple Fabrication Method of SiO 2 Diaphragm Using Inward Plasma Etching 利用吸引等离子体蚀刻法开发SiO二代溢出结构制备技术;利用吸引等离子体蚀刻法开发SiO二代溢出结构制备技术;Development of Simple Fabrication Method of SiO 2 Diaphragm Using Inward Plasma Etching
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.148
Ryo Kanou, Hiroshi Suga, Shun'ichiro Shimbori, Satoshi Takahashi, Toshitaka Kubo, Atsushi Ando, Tetsuo Shimizu, Junko Miyawaki
{"title":"吸引プラズマエッチング法を用いたSiO 2 ダイアフラム構造作製技術の開発;吸引プラズマエッチング法を用いたSiO 2 ダイアフラム構造作製技術の開発;Development of Simple Fabrication Method of SiO 2 Diaphragm Using Inward Plasma Etching","authors":"Ryo Kanou, Hiroshi Suga, Shun'ichiro Shimbori, Satoshi Takahashi, Toshitaka Kubo, Atsushi Ando, Tetsuo Shimizu, Junko Miyawaki","doi":"10.3131/JVSJ2.60.148","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.148","url":null,"abstract":"Development of Simple Fabrication Method of SiO2 Diaphragm Using Inward Plasma Etching Ryo KANOU1,3, Hiroshi SUGA1, Shun'ichiro SHIMBORI2, Satoshi TAKAHASHI2, Toshitaka KUBO3, Atsushi ANDO3, Tetsuo SHIMIZU3 and Jun MIYAWAKI3 1Department of Engineering, Chiba Institute of Technology, 2171 Tsudanuma, Narashino-shi, Chiba 2750016, Japan 2Sanyu Co., Ltd., 2434 Ishinazaka-cho, Hitachi-shi, Ibaraki 3191225, Japan 3National Institute of Advanced Industrial Science and Technology, 111 Higashi, Tsukuba-shi, Ibaraki 3058565, Japan","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"25 2 1","pages":"148-152"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84598083","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Microstructure Formation on Polytetrafluoroethylene (PTFE) and Perfluoroalkoxy (PFA) Bulk Plates by a Magnetron Enhanced Reactive Ion Etching System 磁控管增强反应离子蚀刻系统在聚四氟乙烯(PTFE)和全氟烷氧基(PFA)体板上的微结构形成
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.176
H. Nabesawa, T. Hitobo, T. Asaji, T. Abe, M. Seki
{"title":"Microstructure Formation on Polytetrafluoroethylene (PTFE) and Perfluoroalkoxy (PFA) Bulk Plates by a Magnetron Enhanced Reactive Ion Etching System","authors":"H. Nabesawa, T. Hitobo, T. Asaji, T. Abe, M. Seki","doi":"10.3131/JVSJ2.60.176","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.176","url":null,"abstract":"The etching characteristics of polytetra‰uoroethylene (PTFE) and per‰uoroalkoxy (PFA) bulk plates were studied in a magnetron enhanced reactive ion etching (M-RIE) system. The etch rates of the plates for oxygen plasma were investigated under the pressure range 0.1–2.0 Pa, and were found to strongly correlate with the self-bias voltage. The plates presented smooth surface in the 0.1–1.0 Pa pressure range, and rough surfaces at 1.5 Pa and 2.0 Pa. The roughness was introduced by a micromask sputtered from the chamber material. The titanium etching mask exhibited lower etch rates for oxygen plasma than aluminum and silicon dioxide. Finally, using the dry-etched titanium mask in low-pressure oxygen plasma, we fabricated a 5- m m pitch line-and-space structure on a PTFE plate and a 4- m m square pillar array on a PFA plate.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"65 1","pages":"176-181"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91134683","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Development of a UHV-compatible Low-energy Electron Gun using the Photoelectric Effect 利用光电效应研制兼容特高压的低能电子枪
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.467
H. Sawa, Mao Anzai, T. Konishi, T. Tachibana, T. Hirayama
{"title":"Development of a UHV-compatible Low-energy Electron Gun using the Photoelectric Effect","authors":"H. Sawa, Mao Anzai, T. Konishi, T. Tachibana, T. Hirayama","doi":"10.3131/JVSJ2.60.467","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.467","url":null,"abstract":"We developed a low-energy (  100 eV) electron gun that uses the photoelectric eŠect, and demonstrated its capability for the study of electronic excitation processes at the surfaces of solids. A LaB 6 (100) single crystal was used as a photocathode and a laser diode ( E photon ＝ 2.62 eV) was used as a light source. The electron gun was compatible with ultra-high vacuum (UHV) con-ditions due to its low outgassing. An energy width of 0.11 eV was obtained without an energy selector, and the maximum current was 38 nA. The energy width of the emitted electrons and the work function of the photocathode were estimated from the relation between the photoelectron energy distribution and the cathode temperature. Using the electron gun, we successfully observed the electron-stimulated desorption of metastable Ne atoms from a solid Ne","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"1 1","pages":"467-470"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91332640","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
電子ビームの生成とその応用技術;電子ビームの生成とその応用技術;Electron Beam Production and Its Application Technology 电子束的产生及其应用技术;电子束的产生及其应用技术;Electron Beam生产与Its Application Technology
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.35
Junzo Ishikawa
{"title":"電子ビームの生成とその応用技術;電子ビームの生成とその応用技術;Electron Beam Production and Its Application Technology","authors":"Junzo Ishikawa","doi":"10.3131/JVSJ2.60.35","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.35","url":null,"abstract":"電子は全ての物質の構成要素であり無尽蔵に存在し,かつ 質量が最も小さな荷電粒子である.そのため電子ビームは容 易に発生させることができ,また電界や磁界を利用してそれ を自由に操ることができる.従来真空中への電子の発生法は 熱電子放出現象を利用したものがほとんどであったが,最 近,新しい電子の発生法としてミクロンサイズの電界放出微 小電子源を多数集積して電子ビームを発生しそれを応用する 新しい分野ができ,真空ナノエレクトロニクス分野と呼ばれ ている. 電子ビームと高周波との相互作用と電子ビームの弾道性を 利用すると,半導体素子では発生が難しい GHz オーダーの 超高周波で kW~MW 級の大電力電子管(速度変調管,進 行波管,マグネトロン,ジャイロトロン)が実現できる.特 にマグネトロンは電子レンジ用高周波電源として我々の暮ら しに大いに役立っている. 高エネルギー電子ビームを固体に照射すると,多くは固体 原子とほとんど相互作用せず通過するが,一部は固体原子の 原子核と衝突して運動方向を大きく変え,また,同じ質量の 固体原子中の電子と衝突してエネルギー交換する.これらの 衝突により,固体物質との間に熱エネルギーの伝達や種々の 物理的,化学的現象を生じる.固体に高エネルギー密度の熱 エネルギーが伝達されると,固体物質は溶融や蒸発が起きる ので,従来からそれを利用した種々の応用が行われている. 電子のエネルギーの一部は X 線の発生や電子の励起に費や される.固体原子中の電子の励起により,高分子材料の炭素 結合の鎖を切ったり結合したりする現象や,微生物の DNA を破壊する現象が生じる. 電子ビームは真空槽内で利用されるばかりでなく,薄いチ タン箔を通して真空外の大気中に取り出して種々の材料に電 子ビーム照射を行う応用が最近増えてきている. 本稿では,新しい電子ビームの生成法と,電子ビームを固 体材料に照射した場合に生じる現象を説明し,それ利用した 最近の応用技術について述べる.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"4 1","pages":"35-39"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89883112","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
J-PARC RCS入射ビーム荷電変換用薄膜の昇温脱離特性;J-PARC RCS入射ビーム荷電変換用薄膜の昇温脱離特性;Thermal Desorption Characteristics of Several Charge Stripper Carbon Films for J-PARC RCS J-PARC RCS入射光束带电转换用薄膜的升温剥离特性;J-PARC RCS入射光束带电转换用薄膜的升温剥离特性;Thermal Desorption Characteristics of Several Charge Stripper Carbon Films for J-PARC RCS
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.484
J. Kamiya, M. Kinsho, Y. Yamazaki, M. Yoshimoto, T. Yanagibashi
{"title":"J-PARC RCS入射ビーム荷電変換用薄膜の昇温脱離特性;J-PARC RCS入射ビーム荷電変換用薄膜の昇温脱離特性;Thermal Desorption Characteristics of Several Charge Stripper Carbon Films for J-PARC RCS","authors":"J. Kamiya, M. Kinsho, Y. Yamazaki, M. Yoshimoto, T. Yanagibashi","doi":"10.3131/JVSJ2.60.484","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.484","url":null,"abstract":"Thermal Desorption Characteristics of Several Charge Stripper Carbon Films for J-PARC RCS Junichiro KAMIYA1, Michikazu KINSHO1, Yoshio YAMAZAKI1, Masahiro YOSHIMOTO1 and Toru YANAGIBASHI2 1J-PARC center, Japan Atomic Energy Agency, 24 Shirakata, Tokai-mura, Naka-gun, Ibaraki 3191195, Japan 2 Nippon Advanced Technology Co. Ltd., 312945 Hirahara, Muramatsu, Tokai-mura, Naka-gun, Ibaraki 3191112, Japan","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"9 10 1","pages":"484-489"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76059422","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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