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大電力パルススパッタ小特集に寄せて;大電力パルススパッタ小特集に寄せて;Preface to the Special Issue for the High Power Impulse/Pulsed Magnetron Sputtering 大功率脉冲小特集寄;大功率脉冲小特集寄;Preface to the Special Issue for the High Power Impulse/Pulsed Magnetron Sputtering
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.339
T. Nakano
{"title":"大電力パルススパッタ小特集に寄せて;大電力パルススパッタ小特集に寄せて;Preface to the Special Issue for the High Power Impulse/Pulsed Magnetron Sputtering","authors":"T. Nakano","doi":"10.3131/JVSJ2.60.339","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.339","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"19 1","pages":"339-340"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82354107","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
X線照射下におけるフィールドエミッタアレイの動作特性評価装置;X線照射下におけるフィールドエミッタアレイの動作特性評価装置;System for Evaluation of Electron Emission Properties of Field Emitter Arrays under X-ray Irradiation X射线照射下的场发射器阵列操作特性评估设备;X射线照射下的场发射器阵列操作特性评估设备;Electron Emission Properties of Field Emitter Arrays under X-ray System for Evaluationirradiation
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.328
Yasuhito Gotoh, Hiroshi Tsuji, Masayoshi Nagao, Masafumi Akiyoshi, Ikuji Takagi
{"title":"X線照射下におけるフィールドエミッタアレイの動作特性評価装置;X線照射下におけるフィールドエミッタアレイの動作特性評価装置;System for Evaluation of Electron Emission Properties of Field Emitter Arrays under X-ray Irradiation","authors":"Yasuhito Gotoh, Hiroshi Tsuji, Masayoshi Nagao, Masafumi Akiyoshi, Ikuji Takagi","doi":"10.3131/JVSJ2.60.328","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.328","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"1 1","pages":"328-333"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78133600","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Problem-Solving Exercise for Basic Understanding of Vacuum Science and Technology (2) 真空科学与技术基础知识解题练习(二)
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/jvsj2.60.212
K. Shibata
{"title":"Problem-Solving Exercise for Basic Understanding of Vacuum Science and Technology (2)","authors":"K. Shibata","doi":"10.3131/jvsj2.60.212","DOIUrl":"https://doi.org/10.3131/jvsj2.60.212","url":null,"abstract":"ProblemSolving Exercise for Basic Understanding of Vacuum Science and Technology (2) Kyo SHIBATA1,2,3 1High Energy Accelerator Research Organization (KEK), 11 Oho, Tsukuba-shi, Ibaraki 3050801, Japan 2SOKENDAI (The Graduate University for Advanced Studies), 11 Oho, Tsukuba-shi, Ibaraki 3050801, Japan 3Vacuum Society of Japan, Education Committee, 358 Shiba-koen, Minato-ku, Tokyo 1050011, Japan","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"7 1","pages":"212-219"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79023519","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
イリジウム被覆型プローブの開発;イリジウム被覆型プローブの開発;Development of an Iridium-coated Probe 铱覆盖型探针的开发;铱覆盖型探针的开发;Development of an Iridium-coated Probe
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.92
Koichi Miyazono, T. Yorita, Masayuki Yamauchi, Yoshihiro Masui, H. Toyota, Masaki Koike, Takeshi Tanaka
{"title":"イリジウム被覆型プローブの開発;イリジウム被覆型プローブの開発;Development of an Iridium-coated Probe","authors":"Koichi Miyazono, T. Yorita, Masayuki Yamauchi, Yoshihiro Masui, H. Toyota, Masaki Koike, Takeshi Tanaka","doi":"10.3131/JVSJ2.60.92","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.92","url":null,"abstract":"Development of an Iridium-coated Probe Koichi MIYAZONO1, Toshitaka YORITA1, Masayuki YAMAUCHI2, Yoshihiro MASUI2, Hiroshi TOYOTA2, Masaki KOIKE2 and Takeshi TANAKA2 1MIURA CORPORATION, 39 Minami-Senda-Higashi, Naka-ku, Hiroshima-shi, Hiroshima 7300054, Japan 2Department of Electronics and Computer Engineering, Hiroshima Institute of Technology, 211 Miyake, Saeki-ku, Hiroshima-shi, Hiroshima 7315193, Japan","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"30 1","pages":"92-95"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73344091","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
表面処理したアルミニウム合金のガス放出特性—開発した測定装置の性能評価とガス放出速度測定—;表面処理したアルミニウム合金のガス放出特性—開発した測定装置の性能評価とガス放出速度測定—;Outgassing Properties of Aluminum Alloy with Surface Treatment —Performance Assessment of Developed Measurement System and Outgassing Rate Measurement— 表面处理铝合金的气体释放特性-所开发的测量设备性能评价及气体释放速度测量-;表面处理铝合金的气体释放特性-所开发的测量设备性能评价及气体释放速度测量-;Outgassing Properties of Aluminum Alloy with Surface Treatment - Performance Assessment of DevelopedMeasurement System and Outgassing Rate Measurement
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.450
Naoki Ogawa, Koji Yokoyama, Hidenobu Teraoka, Takashi Ishii, K. Harima, M. Goto, Ryouji Kittaka
{"title":"表面処理したアルミニウム合金のガス放出特性—開発した測定装置の性能評価とガス放出速度測定—;表面処理したアルミニウム合金のガス放出特性—開発した測定装置の性能評価とガス放出速度測定—;Outgassing Properties of Aluminum Alloy with Surface Treatment —Performance Assessment of Developed Measurement System and Outgassing Rate Measurement—","authors":"Naoki Ogawa, Koji Yokoyama, Hidenobu Teraoka, Takashi Ishii, K. Harima, M. Goto, Ryouji Kittaka","doi":"10.3131/JVSJ2.60.450","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.450","url":null,"abstract":"Hiroshima 720  2104, Japan ( Received November 27, 2016, Accepted August 20, 2017 ) We developed an outgassing measurement system which can measure by two methods ``Switching Between Two Pumping Paths method'' and ``Throughput method''. As a result of calibrating the two vacuum gauges on the upstream side of the sample ‰ow path and the blank ‰ow path, we obtained the calibration factor of 9.33 × 10 － 1 and 9.68 × 10 － 1 which the quantitative accuracy ( conˆdence level 95 ) is less than 14  . The ultimate pressure after baking at 150 ° C for 64 hours reached 5.0 × 10 － 8 Pa. As a result, the detection lower limit of the system was 5 × 10 － 12 Pa m 3 s － 1 . For an aluminum alloy sample exposed to an atmosphere of RH 50  , the outgassing rate after 20 hours was","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"79 1","pages":"450-456"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80001292","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Ultra-high Sensitivity Flat Image Pick-up Tube with Field Emitter Array 带场发射阵列的超高灵敏度平面摄像管
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.18
M. Nanba
{"title":"Ultra-high Sensitivity Flat Image Pick-up Tube with Field Emitter Array","authors":"M. Nanba","doi":"10.3131/JVSJ2.60.18","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.18","url":null,"abstract":"A 640×480 pixel ˆeld emitter array (FEA) image sensor with a highgain avalanche rushing amorphous photoconductor (HARP) target was fabricated and tested as a step toward the development of ultrahighsensitivity compact image sensors for highdeˆnition TV cameras. Experiments showed that the prototype sensor could obtain clear images with little noise under illumination on a level equivalent to moonlight, with su‹cient resolution while consuming far less power than current ultrahighsensitivity pickup tubes. Furthermore, various technologies which were suitable for practical image sensor have been developed.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"81 1","pages":"18-23"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90858752","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
J-PARC RCS入射ビーム荷電変換用薄膜の昇温脱離特性;J-PARC RCS入射ビーム荷電変換用薄膜の昇温脱離特性;Thermal Desorption Characteristics of Several Charge Stripper Carbon Films for J-PARC RCS J-PARC RCS入射光束带电转换用薄膜的升温剥离特性;J-PARC RCS入射光束带电转换用薄膜的升温剥离特性;Thermal Desorption Characteristics of Several Charge Stripper Carbon Films for J-PARC RCS
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.484
J. Kamiya, M. Kinsho, Y. Yamazaki, M. Yoshimoto, T. Yanagibashi
{"title":"J-PARC RCS入射ビーム荷電変換用薄膜の昇温脱離特性;J-PARC RCS入射ビーム荷電変換用薄膜の昇温脱離特性;Thermal Desorption Characteristics of Several Charge Stripper Carbon Films for J-PARC RCS","authors":"J. Kamiya, M. Kinsho, Y. Yamazaki, M. Yoshimoto, T. Yanagibashi","doi":"10.3131/JVSJ2.60.484","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.484","url":null,"abstract":"Thermal Desorption Characteristics of Several Charge Stripper Carbon Films for J-PARC RCS Junichiro KAMIYA1, Michikazu KINSHO1, Yoshio YAMAZAKI1, Masahiro YOSHIMOTO1 and Toru YANAGIBASHI2 1J-PARC center, Japan Atomic Energy Agency, 24 Shirakata, Tokai-mura, Naka-gun, Ibaraki 3191195, Japan 2 Nippon Advanced Technology Co. Ltd., 312945 Hirahara, Muramatsu, Tokai-mura, Naka-gun, Ibaraki 3191112, Japan","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"9 10 1","pages":"484-489"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76059422","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Microstructure Formation on Polytetrafluoroethylene (PTFE) and Perfluoroalkoxy (PFA) Bulk Plates by a Magnetron Enhanced Reactive Ion Etching System 磁控管增强反应离子蚀刻系统在聚四氟乙烯(PTFE)和全氟烷氧基(PFA)体板上的微结构形成
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.176
H. Nabesawa, T. Hitobo, T. Asaji, T. Abe, M. Seki
{"title":"Microstructure Formation on Polytetrafluoroethylene (PTFE) and Perfluoroalkoxy (PFA) Bulk Plates by a Magnetron Enhanced Reactive Ion Etching System","authors":"H. Nabesawa, T. Hitobo, T. Asaji, T. Abe, M. Seki","doi":"10.3131/JVSJ2.60.176","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.176","url":null,"abstract":"The etching characteristics of polytetra‰uoroethylene (PTFE) and per‰uoroalkoxy (PFA) bulk plates were studied in a magnetron enhanced reactive ion etching (M-RIE) system. The etch rates of the plates for oxygen plasma were investigated under the pressure range 0.1–2.0 Pa, and were found to strongly correlate with the self-bias voltage. The plates presented smooth surface in the 0.1–1.0 Pa pressure range, and rough surfaces at 1.5 Pa and 2.0 Pa. The roughness was introduced by a micromask sputtered from the chamber material. The titanium etching mask exhibited lower etch rates for oxygen plasma than aluminum and silicon dioxide. Finally, using the dry-etched titanium mask in low-pressure oxygen plasma, we fabricated a 5- m m pitch line-and-space structure on a PTFE plate and a 4- m m square pillar array on a PFA plate.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"65 1","pages":"176-181"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91134683","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
“Review on New Developments of Ultrahigh Vacuum Technology” by Nagamitsu Yoshimura “超高真空技术新发展综述”，作者Nagamitsu Yoshimura
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.412
K. Nakayama
{"title":"“Review on New Developments of Ultrahigh Vacuum Technology” by Nagamitsu Yoshimura","authors":"K. Nakayama","doi":"10.3131/JVSJ2.60.412","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.412","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"65 1","pages":"412-413"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76858954","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
電子ビームの生成とその応用技術;電子ビームの生成とその応用技術;Electron Beam Production and Its Application Technology 电子束的产生及其应用技术;电子束的产生及其应用技术;Electron Beam生产与Its Application Technology
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.35
Junzo Ishikawa
{"title":"電子ビームの生成とその応用技術;電子ビームの生成とその応用技術;Electron Beam Production and Its Application Technology","authors":"Junzo Ishikawa","doi":"10.3131/JVSJ2.60.35","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.35","url":null,"abstract":"電子は全ての物質の構成要素であり無尽蔵に存在し,かつ 質量が最も小さな荷電粒子である.そのため電子ビームは容 易に発生させることができ,また電界や磁界を利用してそれ を自由に操ることができる.従来真空中への電子の発生法は 熱電子放出現象を利用したものがほとんどであったが,最 近,新しい電子の発生法としてミクロンサイズの電界放出微 小電子源を多数集積して電子ビームを発生しそれを応用する 新しい分野ができ,真空ナノエレクトロニクス分野と呼ばれ ている. 電子ビームと高周波との相互作用と電子ビームの弾道性を 利用すると,半導体素子では発生が難しい GHz オーダーの 超高周波で kW~MW 級の大電力電子管(速度変調管,進 行波管,マグネトロン,ジャイロトロン)が実現できる.特 にマグネトロンは電子レンジ用高周波電源として我々の暮ら しに大いに役立っている. 高エネルギー電子ビームを固体に照射すると,多くは固体 原子とほとんど相互作用せず通過するが,一部は固体原子の 原子核と衝突して運動方向を大きく変え,また,同じ質量の 固体原子中の電子と衝突してエネルギー交換する.これらの 衝突により,固体物質との間に熱エネルギーの伝達や種々の 物理的,化学的現象を生じる.固体に高エネルギー密度の熱 エネルギーが伝達されると,固体物質は溶融や蒸発が起きる ので,従来からそれを利用した種々の応用が行われている. 電子のエネルギーの一部は X 線の発生や電子の励起に費や される.固体原子中の電子の励起により,高分子材料の炭素 結合の鎖を切ったり結合したりする現象や,微生物の DNA を破壊する現象が生じる. 電子ビームは真空槽内で利用されるばかりでなく,薄いチ タン箔を通して真空外の大気中に取り出して種々の材料に電 子ビーム照射を行う応用が最近増えてきている. 本稿では,新しい電子ビームの生成法と,電子ビームを固 体材料に照射した場合に生じる現象を説明し,それ利用した 最近の応用技術について述べる.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"4 1","pages":"35-39"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89883112","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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