17th International Reliability Physics Symposium最新文献

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The Influence of Plastic Encapsulants and Passivation Layers on the Corrosion of Thin Aluminium Films Subjected to Humidity Stress 塑料封装剂和钝化层对湿应力作用下铝薄膜腐蚀的影响
17th International Reliability Physics Symposium Pub Date : 1979-04-24 DOI: 10.1109/IRPS.1979.362878
S. Sim, R. Lawson
{"title":"The Influence of Plastic Encapsulants and Passivation Layers on the Corrosion of Thin Aluminium Films Subjected to Humidity Stress","authors":"S. Sim, R. Lawson","doi":"10.1109/IRPS.1979.362878","DOIUrl":"https://doi.org/10.1109/IRPS.1979.362878","url":null,"abstract":"The study of moisture induced aluminium corrosion in the presence of passivation layers and plastic encapsulants has shown that the corrosion rate is determined by the surface conductivity of the water layer that forms on the die surface. The surface conductivity is determined by the external environment and the adhesion of the layer in contact with the die surface (which together control the water film), the impurities that enter the water film from the plastic or passivation layer and the applied bias. The impurities can accelerate the corrosion rate by breaking down protective oxides on the aluminium but they also can delay the onset of severe corrosion by forming space charges that limit the electrolytic currents that can flow. Silicone and silicone-epoxy resins give the best protection against corrosion when used alone followed by epoxy anhydride and epoxy novolac resins in that order. With the best passivation layer used, 1.8% phosphorous content CVD silicon dioxide, the lifetime was dependent on the choice of plastic encapsulant. The lifetime was only independent of the type of plastic encapsulant for die passivation layers containing high levels of impurity. The temperature dependence of the anodic and cathodic aluminium corrosion mechanisms is independent of the nature of the impurities found in a plastic encapsulated component and can be described by an activation energy of about 0.75 ev.","PeriodicalId":161068,"journal":{"name":"17th International Reliability Physics Symposium","volume":"47 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1979-04-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128422885","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 28
Reliability Aspects of 0.5μm and 1.0μm Gate Low Noise GaAs FETs 0.5μm和1.0μm栅极低噪声GaAs场效应管的可靠性
17th International Reliability Physics Symposium Pub Date : 1979-04-24 DOI: 10.1109/IRPS.1979.362884
C. Huang, F. Kwan, S.Y. Wang, P. Galle, J. Barrera
{"title":"Reliability Aspects of 0.5μm and 1.0μm Gate Low Noise GaAs FETs","authors":"C. Huang, F. Kwan, S.Y. Wang, P. Galle, J. Barrera","doi":"10.1109/IRPS.1979.362884","DOIUrl":"https://doi.org/10.1109/IRPS.1979.362884","url":null,"abstract":"Reliability of GaAs FETs is an important concern and there are many change modes that can be considered failures. Catastrophic events, which make a unit unusable and the drift of various DC and RF parameters, are examples of some fairly obvious types of failures. Other long term phenomena, while not so obvious, can also be considered potential failure mechanisms. Two phenomena in this latter category are changes in Schottky gate characteristics and intermetallic reactions that can eventually cause loss of gate control. This paper presents results in both problem areas. Specifically, an explanation and solution will be given to the potential reliability problem of electrostatic discharge created changes in Schottky gate reverse leakage currents. These changes vary in degree from just discernable creation of a resistive reverse current to catastrophic eruption of gate metal, GaAs channel and source contact metal. Secondly, a very stable Al to Au metallization system will be described that allows excellent high temperature stability and low RF resistance connections without harmful intermetallic reactions.","PeriodicalId":161068,"journal":{"name":"17th International Reliability Physics Symposium","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1979-04-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130888182","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
On the Reliability of Power GaAs FETs 功率GaAs场效应管的可靠性研究
17th International Reliability Physics Symposium Pub Date : 1979-04-24 DOI: 10.1109/IRPS.1979.362885
I. Drukier, J. Silcox
{"title":"On the Reliability of Power GaAs FETs","authors":"I. Drukier, J. Silcox","doi":"10.1109/IRPS.1979.362885","DOIUrl":"https://doi.org/10.1109/IRPS.1979.362885","url":null,"abstract":"Accelerated life tests on power GaAs FETs have shown these devices to be reliable components. At operating temperatures of 125°C a MTTF of mid 106 hours is predicted. The activation energy of this process is 1.85ev with ¿n = 0.7. Failures are related to electromigration in the gate fingers.","PeriodicalId":161068,"journal":{"name":"17th International Reliability Physics Symposium","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1979-04-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126542748","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 19
Measurement of Alpha Particle Radioactivtiy in IC Device Packages IC器件封装中α粒子放射性的测量
17th International Reliability Physics Symposium Pub Date : 1979-04-24 DOI: 10.1109/IRPS.1979.362865
E. S. Meieran, P. Engel, T. May
{"title":"Measurement of Alpha Particle Radioactivtiy in IC Device Packages","authors":"E. S. Meieran, P. Engel, T. May","doi":"10.1109/IRPS.1979.362865","DOIUrl":"https://doi.org/10.1109/IRPS.1979.362865","url":null,"abstract":"Alpha particle radioactivity in package materials has been shown to cause soft errors in semiconductor devices. The particles are emitted by uranium and thorium decay sequence radioactive isotopes present as trace impurities in the raw materials used to make the package component parts. Chemical and radiation analys s techniques were correlated to alpha particle fluxes, which range in value from 10 to 100 ¿/cm2-hr. for hermetic seal glasses, through 0.1 to 1 ¿/cm2-hr. for alumina, to less than 0.1 ¿/cm2-hr. for silicon, gold plating, and metal lids. Details of measurment techniques as well as specific package component radioactivity data are presented.","PeriodicalId":161068,"journal":{"name":"17th International Reliability Physics Symposium","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1979-04-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116002252","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 17
Conductive Anodic Filaments in Reinforced Polymeric Dielectrics: Formation and Prevention 增强聚合物介质中的导电阳极细丝:形成与预防
17th International Reliability Physics Symposium Pub Date : 1979-04-24 DOI: 10.1109/IRPS.1979.362871
D. J. Lando, J. Mitchell, T. Welsher
{"title":"Conductive Anodic Filaments in Reinforced Polymeric Dielectrics: Formation and Prevention","authors":"D. J. Lando, J. Mitchell, T. Welsher","doi":"10.1109/IRPS.1979.362871","DOIUrl":"https://doi.org/10.1109/IRPS.1979.362871","url":null,"abstract":"The purpose of this paper is to report on a mode of failure observed during the life testing of epoxy-glass printed-circuit boards (PCB). Upon exposure to elevated humidity, circuits maintained under a dc bias have been observed(I-3) to develop either permanent or intermittent loss of insulation resistance. Visual examination has shown that this characteristic electrical behavior is accompanied by the formation of growths emanating from the positively biased conductors (anodes) and growing along the reinforcing glass fibers. We refer to these growths as conductive anodic filaments (CAF). In another paper presented at this meeting3, Lahti et al. have reported that this failure mode, which occurs at high humidity, is often nearly temperature independent. This failure mode is also of great concern since current trends in PCB applications, especially in the telecommunication field, involve operation in more humid environments, such as outdoor installations. Further, the trend toward lower power dissipation by components, which results in a low operating temperature, will also tend to make the operating humidity of the PCBs higher. In addition, the increased use of light-weight, water penneable housings is aggravating the situation. These trends have begun relatively recently and therefore, even though the number of field failures so far attributed to CAF is small, the situation is potentially serious. This paper addresses the following questions: 1. What material characteristics of PCB substrates make them susceptible to this mode of failure? 2. What is the mechanism of failure? 3.","PeriodicalId":161068,"journal":{"name":"17th International Reliability Physics Symposium","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1979-04-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125656660","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 81
Autoclave vs. 85°C/85% R. H. Testing - A Comparison 高压灭菌器与85°C/85% rh测试-比较
17th International Reliability Physics Symposium Pub Date : 1979-04-01 DOI: 10.1109/IRPS.1979.362883
William J. McGarvey
{"title":"Autoclave vs. 85°C/85% R. H. Testing - A Comparison","authors":"William J. McGarvey","doi":"10.1109/IRPS.1979.362883","DOIUrl":"https://doi.org/10.1109/IRPS.1979.362883","url":null,"abstract":"The wide use of plastic encapsulated MOS-LSI integrated circuits (IC) has aroused much concern regarding moisture integrity testing. This paper discusses the results of both unbiased autoclave testing and 85°C/85% R.H. testing. Comparisons are made based on failure rate data, and a heuristic acceleration factor is determined.","PeriodicalId":161068,"journal":{"name":"17th International Reliability Physics Symposium","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1979-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122543013","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
The Chemistry of Failure Analysis 失效分析的化学原理
17th International Reliability Physics Symposium Pub Date : 1979-04-01 DOI: 10.1109/IRPS.1979.362894
M. Jacques
{"title":"The Chemistry of Failure Analysis","authors":"M. Jacques","doi":"10.1109/IRPS.1979.362894","DOIUrl":"https://doi.org/10.1109/IRPS.1979.362894","url":null,"abstract":"This paper discusses the chemistry of failure analysis in sufficient detail to serve as a practical guide for the failure analyst. It includes a discussion of the chemistry of plastic composition formulation. This discussion is preparatory to the main body of the paper which covers the chemistry and mechanics of decapsulation and, also, an explanation of the principles of chemical etch of semiconductor building blocks and interconnect materials. Included in the paper is a general procedure of decapsulation and several examples are contained in Table 1. Source materials are cited that will provide additional information on actual decapsulation procedures for thermoplastics and single and composite thermo-setting encapsulation systems. The list of chemicals employed in failure analysis has evolved over the years into a rather impressive list of toxic and extremely dangerous organic and inorganic chemicals. These chemicals when mixed in the proper proportions and used in appropriate environmental conditions are capable of selectively removing plastic encapsulations and semiconductor building blocks to uncover semiconductor failure mechanisms. The safe use of these chemicals and others that may be presented in the future can and will provide the analyst with an excellent tool for determining the precise cause of failure.","PeriodicalId":161068,"journal":{"name":"17th International Reliability Physics Symposium","volume":"58 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1979-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114554603","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
Analysis of Accelerated Temperature Cycle Test Data Containing Different Failure Modes 含不同失效模式的加速温度循环试验数据分析
17th International Reliability Physics Symposium Pub Date : 1979-04-01 DOI: 10.1109/IRPS.1979.362900
G. A. Dodson
{"title":"Analysis of Accelerated Temperature Cycle Test Data Containing Different Failure Modes","authors":"G. A. Dodson","doi":"10.1109/IRPS.1979.362900","DOIUrl":"https://doi.org/10.1109/IRPS.1979.362900","url":null,"abstract":"This paper addresses the problem of separating out the failure distribution of each kind of failure observed in accelerated temperature-cycle aging of one assembly lot of a 16-lead molded DIP package. A failure distribution is established for each of five kinds of failure (i.e., failure modes) and at each of two different temperature-cycle aging conditions. From these separate and independent distributions, the distribution parameters and an acceleration factor are determined for each failure mode. The data are analyzed by use of the hazard plotting technique developed by Nelson.1 The necessary algorithms for hazard plotting are developed to handle data of the type obtained in this experiment. Two characteristics of the data that the algorithms take into consideration are first, it is grouped data (i.e., the number of failures within a time interval is the measured quantity) and second, the failures are effectively \"non-interfering\" (i.e., the occurrence of a failure for one failure mode does not interfere with either the aging or observation of other failure modes). In addition, it is further developed so that the results can be plotted on any of several standard probability papers (normal, log-normal, Weibull, etc.). The analysis of these aging data shows that there is wide variation in the acceleration factors, median lives and dispersions (sigmas) for the different failure modes. It further shows that these parameter differences account for much of the bimodal structure of the total or composite failure distribution.","PeriodicalId":161068,"journal":{"name":"17th International Reliability Physics Symposium","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1979-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130988712","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
The use of Microfluorescence Analysis for Process Control in the Semiconductor Manufacturing Industry 微荧光分析在半导体制造业过程控制中的应用
17th International Reliability Physics Symposium Pub Date : 1979-04-01 DOI: 10.1109/IRPS.1979.362892
H. A. Froot
{"title":"The use of Microfluorescence Analysis for Process Control in the Semiconductor Manufacturing Industry","authors":"H. A. Froot","doi":"10.1109/IRPS.1979.362892","DOIUrl":"https://doi.org/10.1109/IRPS.1979.362892","url":null,"abstract":"A new method has been developed for the rapid, non-destructive, in situ detection and identification of sub-micron organic particulate contaminants. The equipment, its operation, and its application to the process control of a semiconductor manufacturing operation are discussed.","PeriodicalId":161068,"journal":{"name":"17th International Reliability Physics Symposium","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1979-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114458958","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Diagnosis of Hybrid Microelectronics using Transmission Acoustic Microscopy 透射声显微镜诊断混合微电子
17th International Reliability Physics Symposium Pub Date : 1979-04-01 DOI: 10.1109/IRPS.1979.362890
C. S. Tsai, Chin C. Lee, Jung K. Wang
{"title":"Diagnosis of Hybrid Microelectronics using Transmission Acoustic Microscopy","authors":"C. S. Tsai, Chin C. Lee, Jung K. Wang","doi":"10.1109/IRPS.1979.362890","DOIUrl":"https://doi.org/10.1109/IRPS.1979.362890","url":null,"abstract":"This paper reports further progress we have made most recently on nondestructive diagnosis of hybrid microelectronic components using a 150 MHz transmission scanning acoustic microscope. Acoustic imaging of defects in production-line thin-film circuits, thick-film circuits, and multilayer chip capacitors was carried out. Contrary to the optical micrographs, the acoustic micrographs recorded show a high degree of contrast. A large differential acoustic attenuation (typically 30 db) and thus a high degree of nonuniformity was observed in the multilayer structures. For a thick-film resistor circuit the contrast in the acoustic micrograph was found to be a sensitive function of the resistance value. A simple method has also been established to determine both the defect location (in depth) and the defect type. We conclude that transmission acoustic microscopy is a highly useful and unique technique for failure analysis and quality control of hybrid microelectronics.","PeriodicalId":161068,"journal":{"name":"17th International Reliability Physics Symposium","volume":"90 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1979-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128827959","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
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