{"title":"微荧光分析在半导体制造业过程控制中的应用","authors":"H. A. Froot","doi":"10.1109/IRPS.1979.362892","DOIUrl":null,"url":null,"abstract":"A new method has been developed for the rapid, non-destructive, in situ detection and identification of sub-micron organic particulate contaminants. The equipment, its operation, and its application to the process control of a semiconductor manufacturing operation are discussed.","PeriodicalId":161068,"journal":{"name":"17th International Reliability Physics Symposium","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1979-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"The use of Microfluorescence Analysis for Process Control in the Semiconductor Manufacturing Industry\",\"authors\":\"H. A. Froot\",\"doi\":\"10.1109/IRPS.1979.362892\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A new method has been developed for the rapid, non-destructive, in situ detection and identification of sub-micron organic particulate contaminants. The equipment, its operation, and its application to the process control of a semiconductor manufacturing operation are discussed.\",\"PeriodicalId\":161068,\"journal\":{\"name\":\"17th International Reliability Physics Symposium\",\"volume\":\"27 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1979-04-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"17th International Reliability Physics Symposium\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IRPS.1979.362892\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"17th International Reliability Physics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS.1979.362892","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The use of Microfluorescence Analysis for Process Control in the Semiconductor Manufacturing Industry
A new method has been developed for the rapid, non-destructive, in situ detection and identification of sub-micron organic particulate contaminants. The equipment, its operation, and its application to the process control of a semiconductor manufacturing operation are discussed.