1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023)最新文献_第10页

Laser beam carrier injection technique for CMOS LSI failure analysis using an OBIC: light-induced state transition (LIST) method 基于OBIC的激光载流子注入技术用于CMOS LSI失效分析:光致态跃迁(LIST)方法

1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023) Pub Date : 1997-10-06 DOI: 10.1109/ISSM.1997.664592

Y. Kohno, M. Shimizu, K. Kitamura, A. Nishikawa, C. Odani, N. Miura

引用次数: 5

Effective multi-stage test equipment capacity allocation for semiconductor fabrication yield enhancement 提高半导体制造良率的有效多级测试设备容量分配

1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023) Pub Date : 1997-10-06 DOI: 10.1109/ISSM.1997.664628

K.D. Chen, R. Akella, I. Emami, M. McIntyre

引用次数: 2

Diluted wet oxidation: a novel technique for ultra thin gate oxide formation 稀释湿氧化:超薄栅氧化形成的新技术

1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023) Pub Date : 1997-10-06 DOI: 10.1109/ISSM.1997.664621

Y. Tanabe, Y. Nakatsuka, S. Sakai, T. Miyazaki, T. Nagahama

引用次数: 3

Market and technology outlook into the year 2000 [semiconductor manufacturing] 进入2000年的市场与技术展望[半导体制造业]

1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023) Pub Date : 1997-10-06 DOI: 10.1109/ISSM.1997.664478

T. Makimoto

引用次数: 1

Managing overall equipment effectiveness [OEE] to optimize factory performance 管理整体设备效率，优化工厂绩效

1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023) Pub Date : 1997-10-06 DOI: 10.1109/ISSM.1997.664488

T. Pomorski

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引用次数: 37

A tight flow control for job-shop fabrication lines with finite buffers 有限缓冲作业车间生产线的严密流量控制

1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023) Pub Date : 1997-10-06 DOI: 10.1109/ISSM.1997.664532

H. Toba

引用次数: 3

Integrated test facility (ITF)-automation testing to support Intel's manufacturing output 集成测试设施(ITF)-自动化测试，以支持英特尔的制造输出

1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023) Pub Date : 1900-01-01 DOI: 10.1109/ISSM.1997.664526

J. Bisgrove, R. Dayao, B. Houser, T. Jones, J. Mayes, M. McGinnis, M. Schmidt, G. Skyles, B. K. Tan

引用次数: 4