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MOCVD Synthesis of Terbium Oxide Films and their Optical Properties† 氧化铽薄膜的MOCVD合成及其光学性能研究
Chemical Vapor Deposition Pub Date : 2015-04-24 DOI: 10.1002/cvde.201507153
Svetlana V. Belaya, Vladimir V. Bakovets, Igor P. Asanov, Ilya V. Korolkov, Veronika S. Sulyaeva
{"title":"MOCVD Synthesis of Terbium Oxide Films and their Optical Properties†","authors":"Svetlana V. Belaya,&nbsp;Vladimir V. Bakovets,&nbsp;Igor P. Asanov,&nbsp;Ilya V. Korolkov,&nbsp;Veronika S. Sulyaeva","doi":"10.1002/cvde.201507153","DOIUrl":"10.1002/cvde.201507153","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>Terbium oxide films are deposited on silicon substrates by metal-organic (MO)CVD from a vapor of Tb(thd)<sub>3</sub> in argon. Terbium sesquioxide (C-form) is realized in this process. Annealing of the films in air at 800 °C, followed by cooling in air, leads to the formation of Tb<sub>4</sub>O<sub>7</sub>. The Ar ion-etching of the annealed films causes a reduction of Tb<sup>4+</sup> to Tb<sup>3+</sup>. Optical <i>E<sub>g</sub></i> is estimated, photoluminescence spectra are investigated, and refractive indexes and dielectric constants are measured for terbium oxide films before and after annealing in air.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 4-5-6","pages":"150-155"},"PeriodicalIF":0.0,"publicationDate":"2015-04-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507153","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51322654","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 17
Synthesis of Carbon Nanotubes from Propane 以丙烷为原料合成碳纳米管
Chemical Vapor Deposition Pub Date : 2015-04-09 DOI: 10.1002/cvde.201404329
Mariusz Zdrojek, Jan Sobieski, Anna Duzynska, Ewa Zbydniewska, Wlodek Strupinski, Jacek Ratajczak, Jarosław Judek
{"title":"Synthesis of Carbon Nanotubes from Propane","authors":"Mariusz Zdrojek,&nbsp;Jan Sobieski,&nbsp;Anna Duzynska,&nbsp;Ewa Zbydniewska,&nbsp;Wlodek Strupinski,&nbsp;Jacek Ratajczak,&nbsp;Jarosław Judek","doi":"10.1002/cvde.201404329","DOIUrl":"10.1002/cvde.201404329","url":null,"abstract":"<p>Growth of high quality CNTs using pure propane is demonstrated over a range of growth temperatures (600–1100 °C). SWCNT and MWCNT volumes in the grown material can by tuned using the growth temperature. The SEM image shows CNTs grown at 900 °C with both SWCNTs and MWCNTs visible. Increasing temperature yields higher depositions of disordered carbon material besides NTs.\u0000\u0000 <figure>\u0000 <div><picture>\u0000 <source></source></picture><p></p>\u0000 </div>\u0000 </figure></p>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 4-5-6","pages":"94-98"},"PeriodicalIF":0.0,"publicationDate":"2015-04-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201404329","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51320497","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
Effects of Synthesis Parameters on Silicon Nanopowders Produced by CO2 Laser-Driven Pyrolysis of Silane† 合成参数对硅烷激光热解制备纳米硅粉体的影响
Chemical Vapor Deposition Pub Date : 2015-04-07 DOI: 10.1002/cvde.201407148
Junli Kong, Xuegeng Li, Pingrong Yu, Dong Wang, Sen Zhang, Ziqi Xu
{"title":"Effects of Synthesis Parameters on Silicon Nanopowders Produced by CO2 Laser-Driven Pyrolysis of Silane†","authors":"Junli Kong,&nbsp;Xuegeng Li,&nbsp;Pingrong Yu,&nbsp;Dong Wang,&nbsp;Sen Zhang,&nbsp;Ziqi Xu","doi":"10.1002/cvde.201407148","DOIUrl":"10.1002/cvde.201407148","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>A well-designed and assembled apparatus for producing silicon nanoparticles by CO<sub>2</sub> laser-driven pyrolysis of SiH<sub>4</sub> is shown. The effects of process parameters (chamber pressure, laser power, gas composition) on the nano-silicon characteristics (average particle size, size distribution and shape) are systematically investigated. The produced silicon nanopowders are characterized and analyzed, demonstrating the produced particles are much smaller and much more uniform in size than the commercial products and those previously reported. The impressive productivity and yield are also discussed. This research allows a better understanding of the influences of processing parameters on silicon nanopowders, shows a controllable way of producing the desired powders, and paves the way to commercialization.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 4-5-6","pages":"133-139"},"PeriodicalIF":0.0,"publicationDate":"2015-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201407148","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51322303","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
ITO-induced Columnar Polycrystalline Silicon Thin Films by CVD ito诱导柱状多晶硅薄膜的CVD研究
Chemical Vapor Deposition Pub Date : 2015-03-12 DOI: 10.1002/cvde.201407138
Jun Du, Xin Gu, Huaqiang Fu, Haizhi Guo, Jiao Liu, Qi Wu, Jianguo Zou
{"title":"ITO-induced Columnar Polycrystalline Silicon Thin Films by CVD","authors":"Jun Du,&nbsp;Xin Gu,&nbsp;Huaqiang Fu,&nbsp;Haizhi Guo,&nbsp;Jiao Liu,&nbsp;Qi Wu,&nbsp;Jianguo Zou","doi":"10.1002/cvde.201407138","DOIUrl":"10.1002/cvde.201407138","url":null,"abstract":"<div>\u0000 \u0000 \u0000 <section>\u0000 \u0000 <p>CVD is used to prepare indium tin oxide (ITO)-induced polycrystalline silicon thin films with SiH<sub>4</sub> as the precursor. The growth of columnar polycrystalline silicon is shown. The sheet resistance (<i>R</i><sub>□</sub>) of ITO-induced Si thin films ranges from about 167.3 to 466.2 Ω/sq. Light absorption increases, as does the detected transmittance, by about 18.4% − 30.5% for wavelengths less than 500 − 700 nm.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 4-5-6","pages":"140-144"},"PeriodicalIF":0.0,"publicationDate":"2015-03-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201407138","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51321794","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Cover image from I. Parkin and co-workers (Chem. Vap. Deposition 2015, 21, 21) 封面图片来自I.Parkin及其同事（Chem.Vap.Deposition 2015，21，21）
Chemical Vapor Deposition Pub Date : 2015-03-03 DOI: 10.1002/cvde.201571231
{"title":"Cover image from I. Parkin and co-workers (Chem. Vap. Deposition 2015, 21, 21)","authors":"","doi":"10.1002/cvde.201571231","DOIUrl":"https://doi.org/10.1002/cvde.201571231","url":null,"abstract":"<p>The image depicts the AACVD grown Fe<sub>2</sub>TiO<sub>5</sub> film excited by UV light. The exctiation of an electron from the valence to the conduction band alludes to the photocatalytic properties of the material.\u0000\u0000 <figure>\u0000 <div><picture>\u0000 <source></source></picture><p></p>\u0000 </div>\u0000 </figure></p>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 1-2-3","pages":""},"PeriodicalIF":0.0,"publicationDate":"2015-03-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201571231","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"72136747","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Chem. Vap. Deposition (1–2–3/2015) 化学。Vap。沉积（2015年1月2日-3月）
Chemical Vapor Deposition Pub Date : 2015-03-03 DOI: 10.1002/cvde.201571233
{"title":"Chem. Vap. Deposition (1–2–3/2015)","authors":"","doi":"10.1002/cvde.201571233","DOIUrl":"https://doi.org/10.1002/cvde.201571233","url":null,"abstract":"","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 1-2-3","pages":"1-3"},"PeriodicalIF":0.0,"publicationDate":"2015-03-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201571233","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"72136761","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Chem. Vap. Deposition (1–2–3/2015) 化学。Vap。沉积（2015年1月2日-3月）
Chemical Vapor Deposition Pub Date : 2015-03-03 DOI: 10.1002/cvde.201571232
{"title":"Chem. Vap. Deposition (1–2–3/2015)","authors":"","doi":"10.1002/cvde.201571232","DOIUrl":"https://doi.org/10.1002/cvde.201571232","url":null,"abstract":"","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 1-2-3","pages":""},"PeriodicalIF":0.0,"publicationDate":"2015-03-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201571232","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"72136746","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
CFD Simulations of Hydrodynamics of Conical Spouted Bed Nuclear Fuel Coaters† 锥形喷淋床核燃料涂布机流体力学的CFD模拟
Chemical Vapor Deposition Pub Date : 2015-03-02 DOI: 10.1002/cvde.201407150
Senem Şentürk Lüle, Uner Colak, Murat Koksal, Gorkem Kulah
{"title":"CFD Simulations of Hydrodynamics of Conical Spouted Bed Nuclear Fuel Coaters†","authors":"Senem Şentürk Lüle,&nbsp;Uner Colak,&nbsp;Murat Koksal,&nbsp;Gorkem Kulah","doi":"10.1002/cvde.201407150","DOIUrl":"10.1002/cvde.201407150","url":null,"abstract":"<div>\u0000 \u0000 \u0000 <section>\u0000 \u0000 <p>The ability of the two fluid method (TFM) to predict the gas-solid flow phenomenon in conical spouted beds operated with high density (6050 kg m<sup>−3</sup>) particles simulating the nuclear fuel coating conditions is investigated. The effects of geometric and operational factors, such as conical angle and static bed height, are also assessed. The results show that TFM predicts the time-averaged bed pressure drop quite well. The qualitative variation of the particle velocity, solids volume fraction, and axial particle flux with axial height are captured by the simulations. The simulated trends observed in the investigation of the effects of static bed height and conical angle on the particle velocity, solids volume fraction, and axial particle flux agree well with those of the experimental measurements.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 4-5-6","pages":"122-132"},"PeriodicalIF":0.0,"publicationDate":"2015-03-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201407150","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51322426","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 17
Titanium Dioxide Thin Films Deposited by Electric Field-Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties** 电场辅助CVD沉积二氧化钛薄膜:对抗菌和光催化性能的影响**
Chemical Vapor Deposition Pub Date : 2015-01-07 DOI: 10.1002/cvde.201407145
Luz Romero, Clara Piccirillo, Paula M. L. Castro, Christopher Bowman, Michael E. A. Warwick, Russell Binions
{"title":"Titanium Dioxide Thin Films Deposited by Electric Field-Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties**","authors":"Luz Romero,&nbsp;Clara Piccirillo,&nbsp;Paula M. L. Castro,&nbsp;Christopher Bowman,&nbsp;Michael E. A. Warwick,&nbsp;Russell Binions","doi":"10.1002/cvde.201407145","DOIUrl":"10.1002/cvde.201407145","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>Thin films of anatase titanium dioxide are deposited on fluorine-doped tin oxide (FTO) glass substrates utilizing the electric field-assisted aerosol (EA)CVD reaction of titanium isopropoxide in toluene at 450 °C. The as-deposited films are characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy (RS), and UV-vis spectroscopy. The photoactivity and antibacterial activity of the films are also assessed. The characterization analysis reveals that the use of an electric field affects the film microstructure, its preferential orientation, and the functional properties. XRD of the anatase films reveals that the application of electric fields causes a change in the preferential orientation of the films from (101) to (004) or (211) planes, depending on the strength of the applied field during the deposition.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 1-2-3","pages":"63-70"},"PeriodicalIF":0.0,"publicationDate":"2015-01-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201407145","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51321825","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 18
AACVD of Molybdenum Sulfide and Oxide Thin Films From Molybdenum(V)-based Single-source Precursors** 钼(V)基单源前驱体制备硫化钼和氧化钼薄膜的AACVD研究**
Chemical Vapor Deposition Pub Date : 2015-01-07 DOI: 10.1002/cvde.201407135
Nicky Savjani, Jack R. Brent, Paul O'Brien
{"title":"AACVD of Molybdenum Sulfide and Oxide Thin Films From Molybdenum(V)-based Single-source Precursors**","authors":"Nicky Savjani,&nbsp;Jack R. Brent,&nbsp;Paul O'Brien","doi":"10.1002/cvde.201407135","DOIUrl":"10.1002/cvde.201407135","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>The decomposition of Mo<sub>2</sub>O<sub>3</sub>(S<sub>2</sub>CNEt<sub>2</sub>) <sub>4</sub> (<b>1</b>) and Mo<sub>2</sub>O<sub>3</sub>(S<sub>2</sub>COEt)<sub>4</sub> (<b>2</b>) single-source precursors (SSPs) via aerosol-assisted (AA<sup>−</sup>) CVD onto glass substrates is reported. The films grown from <b>2</b> are achieved at a lower temperature than <b>1</b> (300 and 425 °C, respectively), potentially attributable to the Chugaev elimination mechanism. Raman spectroscopy (RS) and scanning electron microscopy (SEM) show the composition of the films to be variable; films that are grown from the AACVD reaction of <b>1</b> are found to be of pure MoS<sub>2</sub> nanoplates, whereas those grown from <b>2</b> consist of MoO<sub>3</sub> microparticles and MoO<sub>2</sub> noncrystalline films, together with various nanostructures of MoS<sub>2</sub>, depending on deposition temperature. The decomposition processes of the SSPs are assessed to determine why these variations in thin films are seen.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 1-2-3","pages":"71-77"},"PeriodicalIF":0.0,"publicationDate":"2015-01-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201407135","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51321144","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 21
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