Chemical Vapor Deposition最新文献_第10页

Aluminizing of Nickel Alloys by CVD. The Effect of HCl Flow† 镍合金的CVD渗铝。HCl流量的影响

Chemical Vapor Deposition Pub Date : 2014-02-21 DOI: 10.1002/cvde.201307090

Bartek Wierzba, Katarzyna Tkacz-Śmiech, Andrzej Nowotnik, Kamil Dychtoń

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引用次数: 4

Combinatorial Atmospheric Pressure CVD of a Composite TiO2/SnO2 Thin Film† 复合TiO2/SnO2薄膜的组合常压CVD研究

Chemical Vapor Deposition Pub Date : 2014-02-21 DOI: 10.1002/cvde.201307081

Sanjayan Sathasivam, Andreas Kafizas, Sapna Ponja, Nicholas Chadwick, Davinder S. Bhachu, Salem M. Bawaked, Abdullah Y. Obaid, Shaeel Al-Thabaiti, Sulaiman N. Basahel, Claire J. Carmalt, Ivan P. Parkin

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引用次数: 13

Characterization of Al2O3 Thin Films Fabricated at Low Temperature via Atomic Layer Deposition on PEN Substrates† PEN衬底上低温原子层沉积Al2O3薄膜的表征

Chemical Vapor Deposition Pub Date : 2014-02-21 DOI: 10.1002/cvde.201307082

Kyung-Hyun Choi, Kamran Ali, Chang Young Kim, Nauman Malik Muhammad

引用次数: 10

Chem. Vap. Deposition (10–11–12/2013)

Chemical Vapor Deposition Pub Date : 2013-12-11 DOI: 10.1002/cvde.201371013

引用次数: 0

Cover image from I. P. Parkin and co-workers (Chem Vap. Deposition 2013, 19, 355) 封面图片来自i.p. Parkin和同事(Chem Vap)。沉积学报，2013,19,355)

Chemical Vapor Deposition Pub Date : 2013-12-11 DOI: 10.1002/cvde.201371011

引用次数: 0

Chem. Vap. Deposition (10–11–12/2013)

Chemical Vapor Deposition Pub Date : 2013-12-11 DOI: 10.1002/cvde.201371012

引用次数: 0

Potential of Hexyl Acrylate Monomer as an Initiator in Photo-initiated CVD† 丙烯酸己酯单体作为光引发CVD引发剂的潜力

Chemical Vapor Deposition Pub Date : 2013-11-20 DOI: 10.1002/cvde.201304322

Aravind Suresh, Daniel Anastasio, Daniel D. Burkey

引用次数: 11

Design Strategies for Reduced-scale Surface Composition Gradients via CVD Copolymerization† 基于CVD共聚的小尺度表面组成梯度的设计策略

Chemical Vapor Deposition Pub Date : 2013-11-18 DOI: 10.1002/cvde.201307057

Yaseen Elkasabi, Aftin M. Ross, Jonathan Oh, Michael P. Hoepfner, H. Scott Fogler, Joerg Lahann, Paul H. Krebsbach

引用次数: 2

Facile and Fast Deposition of Amorphous TiO2 Film under Atmospheric Pressure and at Room Temperature, and its High Photocatalytic Activity under UV-C Light† 常压和室温下易快速沉积非晶TiO2薄膜及其UV-C光催化活性

Chemical Vapor Deposition Pub Date : 2013-11-18 DOI: 10.1002/cvde.201307088

Zhi-Guang Sun, Xiao-Song Li, Xiaobing Zhu, Xiao-Qing Deng, Da-Lei Chang, Ai-Min Zhu

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引用次数: 23

Substrate-thickness Dependence of Hydrogenated Microcrystalline Silicon Nucleation Rate on Amorphous Silicon Layer† 非晶硅层对氢化微晶硅成核速率的影响

Chemical Vapor Deposition Pub Date : 2013-11-12 DOI: 10.1002/cvde.201307003

Zewen Zuo, Guanglei Cui, Yu Wang, Junzhuan Wang, Lin Pu, Yi Shi

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引用次数: 3