Christoph Loho, Azad J. Darbandi, Ruzica Djenadic, Oliver Clemens, Horst Hahn
{"title":"co2 -激光闪蒸作为新型CVD前驱体递送系统用于功能薄膜生长","authors":"Christoph Loho, Azad J. Darbandi, Ruzica Djenadic, Oliver Clemens, Horst Hahn","doi":"10.1002/cvde.201307089","DOIUrl":null,"url":null,"abstract":"<div>\n \n <section>\n \n <p>A novel approach for functional thin film deposition using laser flash evaporation as the precursor delivery system is reported. In this newly established CO<sub>2</sub>-laser-assisted (LA)CVD, solid precursors with low volatility are non-selectively sublimated by absorption of infrared laser radiation. Thus, the method allows for the highly controlled growth of multicomponent thin films with desired composition and stoichiometry over the entire growth period. Thin film microstructural features, such as the morphology, density, and thickness of the films can be adjusted by tuning the process parameters. These features, characterized by means of scanning electron microscopy (SEM), X-ray diffraction (XRD), and Raman spectroscopy (RS), are discussed for LiCoO<sub>2</sub> thin films. Additional analyses include X-ray photoelectron spectroscopy (XPS), inductively coupled plasma optical emission spectrometry (ICP-OES), cyclic voltammetry (CV), and galvanostatic cycling.</p>\n </section>\n </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"20 4-5-6","pages":"152-160"},"PeriodicalIF":0.0000,"publicationDate":"2014-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201307089","citationCount":"11","resultStr":"{\"title\":\"CO2-Laser Flash Evaporation as Novel CVD Precursor Delivery System for Functional Thin Film Growth†\",\"authors\":\"Christoph Loho, Azad J. Darbandi, Ruzica Djenadic, Oliver Clemens, Horst Hahn\",\"doi\":\"10.1002/cvde.201307089\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div>\\n \\n <section>\\n \\n <p>A novel approach for functional thin film deposition using laser flash evaporation as the precursor delivery system is reported. In this newly established CO<sub>2</sub>-laser-assisted (LA)CVD, solid precursors with low volatility are non-selectively sublimated by absorption of infrared laser radiation. Thus, the method allows for the highly controlled growth of multicomponent thin films with desired composition and stoichiometry over the entire growth period. Thin film microstructural features, such as the morphology, density, and thickness of the films can be adjusted by tuning the process parameters. These features, characterized by means of scanning electron microscopy (SEM), X-ray diffraction (XRD), and Raman spectroscopy (RS), are discussed for LiCoO<sub>2</sub> thin films. Additional analyses include X-ray photoelectron spectroscopy (XPS), inductively coupled plasma optical emission spectrometry (ICP-OES), cyclic voltammetry (CV), and galvanostatic cycling.</p>\\n </section>\\n </div>\",\"PeriodicalId\":10093,\"journal\":{\"name\":\"Chemical Vapor Deposition\",\"volume\":\"20 4-5-6\",\"pages\":\"152-160\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-05-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1002/cvde.201307089\",\"citationCount\":\"11\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Chemical Vapor Deposition\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/cvde.201307089\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Chemical Vapor Deposition","FirstCategoryId":"1085","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/cvde.201307089","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
CO2-Laser Flash Evaporation as Novel CVD Precursor Delivery System for Functional Thin Film Growth†
A novel approach for functional thin film deposition using laser flash evaporation as the precursor delivery system is reported. In this newly established CO2-laser-assisted (LA)CVD, solid precursors with low volatility are non-selectively sublimated by absorption of infrared laser radiation. Thus, the method allows for the highly controlled growth of multicomponent thin films with desired composition and stoichiometry over the entire growth period. Thin film microstructural features, such as the morphology, density, and thickness of the films can be adjusted by tuning the process parameters. These features, characterized by means of scanning electron microscopy (SEM), X-ray diffraction (XRD), and Raman spectroscopy (RS), are discussed for LiCoO2 thin films. Additional analyses include X-ray photoelectron spectroscopy (XPS), inductively coupled plasma optical emission spectrometry (ICP-OES), cyclic voltammetry (CV), and galvanostatic cycling.
期刊介绍:
Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.