co2 -激光闪蒸作为新型CVD前驱体递送系统用于功能薄膜生长

Christoph Loho, Azad J. Darbandi, Ruzica Djenadic, Oliver Clemens, Horst Hahn
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引用次数: 11

摘要

报道了一种利用激光闪蒸作为前驱体输送系统的功能薄膜沉积新方法。在这个新建立的co2激光辅助(LA)CVD中,具有低挥发性的固体前驱体通过红外激光辐射的吸收而非选择性升华。因此,该方法允许在整个生长期间高度控制具有所需成分和化学计量的多组分薄膜的生长。薄膜的微观结构特征,如薄膜的形态、密度和厚度可以通过调整工艺参数来调整。利用扫描电镜(SEM)、x射线衍射(XRD)和拉曼光谱(RS)对LiCoO2薄膜的这些特征进行了表征。其他分析包括x射线光电子能谱(XPS)、电感耦合等离子体光学发射光谱(ICP-OES)、循环伏安法(CV)和恒流循环。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
CO2-Laser Flash Evaporation as Novel CVD Precursor Delivery System for Functional Thin Film Growth†

A novel approach for functional thin film deposition using laser flash evaporation as the precursor delivery system is reported. In this newly established CO2-laser-assisted (LA)CVD, solid precursors with low volatility are non-selectively sublimated by absorption of infrared laser radiation. Thus, the method allows for the highly controlled growth of multicomponent thin films with desired composition and stoichiometry over the entire growth period. Thin film microstructural features, such as the morphology, density, and thickness of the films can be adjusted by tuning the process parameters. These features, characterized by means of scanning electron microscopy (SEM), X-ray diffraction (XRD), and Raman spectroscopy (RS), are discussed for LiCoO2 thin films. Additional analyses include X-ray photoelectron spectroscopy (XPS), inductively coupled plasma optical emission spectrometry (ICP-OES), cyclic voltammetry (CV), and galvanostatic cycling.

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来源期刊
Chemical Vapor Deposition
Chemical Vapor Deposition 工程技术-材料科学:膜
自引率
0.00%
发文量
0
审稿时长
>12 weeks
期刊介绍: Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
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