Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
发文信息
历年影响因子
历年发表
2012年
64
2013年
68
2014年
63
2015年
59
2016年
1
2017年
0
2018年
0
2019年
0
2020年
0
2021年
0
2022年
0
投稿信息
出版周期:
Bimonthly
出版国家(地区):
GERMANY
审稿时长:
>12 weeks
出版商:
John Wiley & Sons Ltd.
编辑部地址:
WILEY-V C H VERLAG GMBH, PO BOX 10 11 61, WEINHEIM, GERMANY, D-69451