Titanium Dioxide Thin Films Deposited by Electric Field-Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties**

Chemical Vapor Deposition Pub Date : 2015-01-07 DOI:10.1002/cvde.201407145

Luz Romero, Clara Piccirillo, Paula M. L. Castro, Christopher Bowman, Michael E. A. Warwick, Russell Binions

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引用次数: 18

Abstract

Thin films of anatase titanium dioxide are deposited on fluorine-doped tin oxide (FTO) glass substrates utilizing the electric field-assisted aerosol (EA)CVD reaction of titanium isopropoxide in toluene at 450 °C. The as-deposited films are characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy (RS), and UV-vis spectroscopy. The photoactivity and antibacterial activity of the films are also assessed. The characterization analysis reveals that the use of an electric field affects the film microstructure, its preferential orientation, and the functional properties. XRD of the anatase films reveals that the application of electric fields causes a change in the preferential orientation of the films from (101) to (004) or (211) planes, depending on the strength of the applied field during the deposition.

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电场辅助CVD沉积二氧化钛薄膜:对抗菌和光催化性能的影响**

利用电场辅助气溶胶(EA)CVD反应，在450°C的甲苯中，在掺氟氧化锡(FTO)玻璃衬底上沉积了锐钛矿型二氧化钛薄膜。采用扫描电子显微镜(SEM)、x射线衍射(XRD)、拉曼光谱(RS)和紫外可见光谱对沉积膜进行了表征。并对膜的光活性和抗菌活性进行了评价。表征分析表明，电场的使用影响了薄膜的微观结构、择优取向和功能性能。对锐钛矿薄膜的XRD分析表明，电场的作用使薄膜的择优取向从(101)面转变为(004)面或(211)面，这取决于在沉积过程中施加电场的强度。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Chemical Vapor Deposition 工程技术-材料科学：膜

自引率

0.00%

发文量

审稿时长

>12 weeks

期刊介绍： Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.