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Guest Editorial: Special Issue on Electrical Discharges in Vacuum
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2024-12-09 DOI: 10.1109/TPS.2024.3487346
Yasunori Tanaka;Eiji Kaneko;Akiko Kumada;Hiroki Kojima;Yuki Inada;Yasushi Yamano
{"title":"Guest Editorial: Special Issue on Electrical Discharges in Vacuum","authors":"Yasunori Tanaka;Eiji Kaneko;Akiko Kumada;Hiroki Kojima;Yuki Inada;Yasushi Yamano","doi":"10.1109/TPS.2024.3487346","DOIUrl":"https://doi.org/10.1109/TPS.2024.3487346","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 9","pages":"4362-4364"},"PeriodicalIF":1.3,"publicationDate":"2024-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10786897","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142797896","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Blank Page 空白页
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2024-12-09 DOI: 10.1109/TPS.2024.3506373
{"title":"Blank Page","authors":"","doi":"10.1109/TPS.2024.3506373","DOIUrl":"https://doi.org/10.1109/TPS.2024.3506373","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 9","pages":"C4-C4"},"PeriodicalIF":1.3,"publicationDate":"2024-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10786896","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142798016","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Member ad suite
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2024-12-09 DOI: 10.1109/TPS.2024.3511216
{"title":"Member ad suite","authors":"","doi":"10.1109/TPS.2024.3511216","DOIUrl":"https://doi.org/10.1109/TPS.2024.3511216","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 9","pages":"4231-4231"},"PeriodicalIF":1.3,"publicationDate":"2024-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10786873","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142810529","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IEEE Access
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2024-12-09 DOI: 10.1109/TPS.2024.3511218
{"title":"IEEE Access","authors":"","doi":"10.1109/TPS.2024.3511218","DOIUrl":"https://doi.org/10.1109/TPS.2024.3511218","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 9","pages":"4232-4232"},"PeriodicalIF":1.3,"publicationDate":"2024-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10786892","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142810541","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IEEE Sensors Council
IF 4.3 2区 综合性期刊
IEEE Sensors Journal Pub Date : 2024-11-27 DOI: 10.1109/JSEN.2024.3498799
{"title":"IEEE Sensors Council","authors":"","doi":"10.1109/JSEN.2024.3498799","DOIUrl":"https://doi.org/10.1109/JSEN.2024.3498799","url":null,"abstract":"","PeriodicalId":447,"journal":{"name":"IEEE Sensors Journal","volume":"24 23","pages":"C3-C3"},"PeriodicalIF":4.3,"publicationDate":"2024-11-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10769972","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142753836","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"综合性期刊","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Pulsed Electromagnetic Field-Assisting Reduced Graphene Oxide-Incorporated Nanofibers for Osteogenic Differentiation of Human Dental Pulp Stem Cells 用于人牙髓干细胞成骨分化的脉冲电磁场辅助还原石墨烯氧化物纳米纤维
IF 1.8
IEEE Open Journal of Nanotechnology Pub Date : 2024-11-27 DOI: 10.1109/OJNANO.2024.3494770
Juo Lee;Sungmin Lee;Iksong Byun;Myung Chul Lee;Jungsil Kim;Hoon Seonwoo
{"title":"Pulsed Electromagnetic Field-Assisting Reduced Graphene Oxide-Incorporated Nanofibers for Osteogenic Differentiation of Human Dental Pulp Stem Cells","authors":"Juo Lee;Sungmin Lee;Iksong Byun;Myung Chul Lee;Jungsil Kim;Hoon Seonwoo","doi":"10.1109/OJNANO.2024.3494770","DOIUrl":"https://doi.org/10.1109/OJNANO.2024.3494770","url":null,"abstract":"In bone tissue engineering, various approaches have been investigated to enhance osteogenic regeneration. Previous studies have predominantly employed scaffolds with aligned structures or reduced graphene oxide (RGO) to facilitate bone regeneration. However, current scaffold designs face limitations in combining structural guidance with effective electromagnetic stimulation. Additionally, delivering localized stimulation within scaffolds remains a challenge in maximizing the potential of these materials for bone regeneration. To address these limitations and strengthen previous approaches, this study presents a novel strategy in tissue engineering for enhanced osteogenic differentiation. RGO-incorporated nanofibers (RGO-NFs) were fabricated via electrospinning a 10% polycaprolactone (PCL) solution with RGO concentrations varying. The random fibers were deposited on a planar surface, while the aligned fibers were deposited on a rotating drum. The morphology and orientation of the fibers were confirmed through electron microscopy. X-ray diffraction spectrometry was employed to confirm the integration of RGO and PCL. All groups demonstrated optimal cell adhesion and viability. RGO-NFs exhibited higher osteogenesis-related protein expression than PCL-only scaffolds, further enhanced by pulsed electromagnetic field (PEMF) application. The application of PEMF stimulation within aligned RGO-NFs presents a potentially more efficient alternative to existing methods, offering a novel, non-invasive therapeutic strategy for bone defect regeneration.","PeriodicalId":446,"journal":{"name":"IEEE Open Journal of Nanotechnology","volume":"5 ","pages":"124-133"},"PeriodicalIF":1.8,"publicationDate":"2024-11-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10769987","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142736342","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
2024 Index IEEE Transactions on Semiconductor Manufacturing Vol. 37 2024 Index IEEE Transactions on Semiconductor Manufacturing Vol.
IF 2.3 3区 工程技术
IEEE Transactions on Semiconductor Manufacturing Pub Date : 2024-11-26 DOI: 10.1109/TSM.2024.3506312
{"title":"2024 Index IEEE Transactions on Semiconductor Manufacturing Vol. 37","authors":"","doi":"10.1109/TSM.2024.3506312","DOIUrl":"https://doi.org/10.1109/TSM.2024.3506312","url":null,"abstract":"","PeriodicalId":451,"journal":{"name":"IEEE Transactions on Semiconductor Manufacturing","volume":"37 4","pages":"649-667"},"PeriodicalIF":2.3,"publicationDate":"2024-11-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10768858","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142713825","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The Final Design of the Plasma–Material Interaction Chamber for the Material Plasma Exposure eXperiment
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2024-11-25 DOI: 10.1109/TPS.2024.3492816
Adam M. Aaron;G. Ted Boyd;Aravind Shanmugasundaram;Vivek Rao;Jonathan Perry;David Irick;Theodore M. Biewer;M. Aftab Hussain
{"title":"The Final Design of the Plasma–Material Interaction Chamber for the Material Plasma Exposure eXperiment","authors":"Adam M. Aaron;G. Ted Boyd;Aravind Shanmugasundaram;Vivek Rao;Jonathan Perry;David Irick;Theodore M. Biewer;M. Aftab Hussain","doi":"10.1109/TPS.2024.3492816","DOIUrl":"https://doi.org/10.1109/TPS.2024.3492816","url":null,"abstract":"The Material Plasma Exposure eXperiment (MPEX) is a steady-state linear plasma device designed to expose neutron-irradiated materials to fusion divertor prototypic plasma conditions to perform plasma-material interaction (PMI) studies. The MPEX device will be capable of ion fluxes of 1025 m−2s−1, power fluxes up to 40 MW/m2, ion fluences up to 1031 m−2, and operation at steady state for up to 106 s with magnetic fields up to 2.5 T. PMIs occur when the plasma directly impinges upon a surface. In the case of MPEX, this occurs primarily at the MPEX target. Observation of interaction using a variety of instruments is required. A PMI chamber was designed to enable these observations using currently envisioned diagnostics and to accommodate future instruments. The design includes 59 plasma-facing ports, 10 of which explicitly point at the target, and an additional 10 ports that can be used to assess the vacuum space in the chamber. The entire vacuum chamber is water-cooled and will experience sustained heat from plasma radiated power, microwaves, and neutral gas thermal loads. Because of the method of fabrication, this chamber has undergone significant manufacturability testing. The chamber includes provisions for chamber, plasma, and target diagnostics such as a residual gas analyzer, Thomson scattering lasers, and both visible and IR cameras. The design effort included operational testing of the autocoupler to ensure vacuum integrity and included machining and welding studies to verify that the tolerances required by the diagnostics could be held. Provisions have also been included to eventually accommodate a water-cooled target dump, an irradiated sample recovery module, and any other hardware needed to support future target designs and diagnostics.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 9","pages":"4103-4107"},"PeriodicalIF":1.3,"publicationDate":"2024-11-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142797988","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Call for Nominations for Editor-in-Chief: IEEE Transactions on Semiconductor Manufacturing 征集主编提名：IEEE 半导体制造学报
IF 2.3 3区 工程技术
IEEE Transactions on Semiconductor Manufacturing Pub Date : 2024-11-22 DOI: 10.1109/TSM.2024.3490742
{"title":"Call for Nominations for Editor-in-Chief: IEEE Transactions on Semiconductor Manufacturing","authors":"","doi":"10.1109/TSM.2024.3490742","DOIUrl":"https://doi.org/10.1109/TSM.2024.3490742","url":null,"abstract":"","PeriodicalId":451,"journal":{"name":"IEEE Transactions on Semiconductor Manufacturing","volume":"37 4","pages":"647-647"},"PeriodicalIF":2.3,"publicationDate":"2024-11-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10766045","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142694657","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Special Section Call for Papers: Bridging the Data Gap in Photovoltaics with Synthetic Data Generation 特别章节征稿：通过合成数据生成弥补光伏领域的数据差距
IF 2.3 3区 工程技术
IEEE Transactions on Semiconductor Manufacturing Pub Date : 2024-11-22 DOI: 10.1109/TSM.2024.3455875
{"title":"Special Section Call for Papers: Bridging the Data Gap in Photovoltaics with Synthetic Data Generation","authors":"","doi":"10.1109/TSM.2024.3455875","DOIUrl":"https://doi.org/10.1109/TSM.2024.3455875","url":null,"abstract":"","PeriodicalId":451,"journal":{"name":"IEEE Transactions on Semiconductor Manufacturing","volume":"37 4","pages":"645-646"},"PeriodicalIF":2.3,"publicationDate":"2024-11-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10765976","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142694678","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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