Plasma Chemistry and Plasma Processing最新文献

筛选
英文 中文
H2 Production from NH3 in a BaTiO3 Moderated Ferroelectric Packed-Bed Plasma Reactor BaTiO3慢化铁电填充床等离子体反应器中NH3制氢研究
IF 3.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2023-11-23 DOI: 10.1007/s11090-023-10427-7
M. Ruiz-Martín, S. Marín-Meana, A. Megías-Sánchez, M. Oliva-Ramírez, J. Cotrino, A. R. González-Elipe, A. Gómez-Ramírez
{"title":"H2 Production from NH3 in a BaTiO3 Moderated Ferroelectric Packed-Bed Plasma Reactor","authors":"M. Ruiz-Martín,&nbsp;S. Marín-Meana,&nbsp;A. Megías-Sánchez,&nbsp;M. Oliva-Ramírez,&nbsp;J. Cotrino,&nbsp;A. R. González-Elipe,&nbsp;A. Gómez-Ramírez","doi":"10.1007/s11090-023-10427-7","DOIUrl":"10.1007/s11090-023-10427-7","url":null,"abstract":"<div><p>Plasma decomposition reactions are used for various gas phase chemical processes including the decomposition of ammonia. In this work we show that pure ammonia can be effectively decomposed at atmospheric pressure and ambient temperature using a packed-bed plasma reactor moderated with BaTiO<sub>3</sub> ferroelectric pellets without catalyst. The decomposition rate and energy efficiency of this ferroelectric barrier discharge reactor have been monitored as a function of applied voltage (up to a maximum value of 2.5 kV) and flow rate. For each operating condition reaction efficiencies have been correlated with the parameters defining the electrical response of the reactor. It is found that plasma current and volume inside the reactor and hence the energy efficiency of the process and the decomposition rate vary with the applied voltage and the flow of ammonia (a maximum decomposition rate of 14% and an energy efficiency of 150 LH<sub>2</sub>/kWh has been determined under optimized operation conditions). The role of back reactions (i.e. N<sub>2</sub> + 3H<sub>2</sub> → 2NH<sub>3</sub>) in decreasing reactor performance is another key effect affecting the overall efficiency for the ammonia decomposition. The possibilities of ferroelectric barrier discharge reactors to induce the decomposition of ammonia and the importance of keeping the operating temperature below the Curie temperature of the ferroelectric material are highlighted.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":3.6,"publicationDate":"2023-11-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s11090-023-10427-7.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138473084","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Plasma Sterilization for Bacterial Inactivation: Studies on Probable Mechanisms and Biochemical Actions 血浆灭菌灭活细菌:可能的机制和生化作用的研究
IF 3.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2023-11-20 DOI: 10.1007/s11090-023-10429-5
Tejal Barkhade, Kushagra Nigam, G. Ravi, Seema Rawat, S. K. Nema
{"title":"Plasma Sterilization for Bacterial Inactivation: Studies on Probable Mechanisms and Biochemical Actions","authors":"Tejal Barkhade, Kushagra Nigam, G. Ravi, Seema Rawat, S. K. Nema","doi":"10.1007/s11090-023-10429-5","DOIUrl":"https://doi.org/10.1007/s11090-023-10429-5","url":null,"abstract":"<p>The underlying mechanisms and biochemical actions responsible for inactivation of pathogenic gram-positive <i>Staphylococcus aureus</i> (<i>S. aureus</i>) and gram-negative <i>Salmonella abony</i> (<i>S. abony</i>) bacteria upon exposure to sub-atmospheric plasma has been investigated. Reduction in colony forming units of the bacteria is established in 60 min and 40 min for <i>S. aureus </i>and <i>S. abony</i> respectively via 6-log reduction curves. The percentage change in reactive oxygen species, such as <sup>•</sup>OH and H<sub>2</sub>O<sub>2</sub> formed on bacterial membrane during plasma exposure are analysed using spectroflurometer. <i>S. aureus</i> exhibited a significant increase of 324.23% and 1554.84% in <sup>•</sup>OH and H<sub>2</sub>O<sub>2</sub> radicals respectively. Whereas, 98.14% and 54.49% increase in <sup>•</sup>OH and H<sub>2</sub>O<sub>2</sub> radicals respectively was observed in <i>S. abony</i>. The oxidation and degradation of DNA is analysed using an ultra violet visible spectrophotometer. The leakage of proteins, lipids, and nucleic acid molecules due to plasma exposure is studied by Attenuated Total Reflectance Fourier-transform infrared spectroscopy (ATR-FTIR). The alteration of secondary protein structure on the cell membrane is observed using Circular Dichroism. Upon exposure to plasma, <i>S. aureus </i>shows a secondary protein structural transition from α-helix (2.4%), β-sheet (78.3%) mixture to modified β-sheet structure (0% α-helix, 79.1% β-sheet). Whereas, <i>S.abony</i> shows a transition from α-helix (1%), β-sheet (64.9%) mixture to modified β-sheet structure (0% α-helix, 74.5% β-sheet). The bacterial morphological study (swelling/shrinking) done using Field Emission Scanning Electron Microscopy (FE-SEM) reveals the deformation of cell membrane. Above findings pave the way for a better understanding of the processes of antimicrobial inactivation strategies when the plasma sterilization process is employed.</p>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":3.6,"publicationDate":"2023-11-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138534198","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
CO2/CH4 Glow Discharge Plasma. Part II: Study of Plasma Catalysis Interaction Mechanisms on CeO2 CO2/CH4辉光放电等离子体。第二部分:等离子体催化氧化铈相互作用机理的研究
IF 3.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2023-11-17 DOI: 10.1007/s11090-023-10419-7
Carolina A. Garcia-Soto, Edmond Baratte, Tiago Silva, Vasco Guerra, Vasile I. Parvulescu, Olivier Guaitella
{"title":"CO2/CH4 Glow Discharge Plasma. Part II: Study of Plasma Catalysis Interaction Mechanisms on CeO2","authors":"Carolina A. Garcia-Soto, Edmond Baratte, Tiago Silva, Vasco Guerra, Vasile I. Parvulescu, Olivier Guaitella","doi":"10.1007/s11090-023-10419-7","DOIUrl":"https://doi.org/10.1007/s11090-023-10419-7","url":null,"abstract":"<p><i>In situ</i> FTIR transmission experiments for <span>(hbox {CO}_2)</span> and <span>(hbox {CO}_2)</span>–<span>(hbox {CH}_4)</span> plasma were performed for a fundamental study of surface plasma interaction with cerium oxide (<span>(hbox {CeO}_2)</span>) as catalytic surface. Utilizing a DC glow discharge plasma reactor at low pressure, it was observed that <span>(hbox {CO}_2)</span> gas adsorbs in the surface forming tridentate carbonates and hydrogen carbonates. When <span>(hbox {CO}_2)</span>–<span>(hbox {CH}_4)</span> plasma is ignited, formate species were formed while carbonate species disappeared from the surface. The <span>(hbox {CeO}_2)</span> pellet has also been placed downstream the plasma in order to observe the role of the gas composition at the exit of <span>(hbox {CO}_2)</span>–<span>(hbox {CH}_4)</span> plasma on <span>(hbox {CeO}_2)</span> without any heating or strong electric field. In addition, the effect of water was investigated in several surface phenomena. OH groups play an important role in the reaction with tridentate carbonates to generate formates under plasma. The gas phase chemistry of the <span>(hbox {CO}_2)</span>–<span>(hbox {CH}_4)</span> plasma used here has been described in details in the part I of this work. The conclusions drawn on the gas phase contribute to the understanding of the observed phenomena on <span>(hbox {CeO}_2)</span>. These results enlighten the complex mechanisms occurring during <span>(hbox {CO}_2)</span>–<span>(hbox {CH}_4)</span> plasma reactions on surfaces that could help in the improvement of <span>(hbox {CO}_2)</span> recycling.</p>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":3.6,"publicationDate":"2023-11-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138534195","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Study of Plasma Particle Distribution and Electron Temperature in Cylindrical Magnetron Sputtering 圆柱磁控溅射中等离子体粒子分布和电子温度的研究
IF 3.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2023-11-17 DOI: 10.1007/s11090-023-10425-9
Yuwei Fu, Peng Ji, Mengsha He, Peijun Huang, Guobin Huang, Weihua Huang
{"title":"Study of Plasma Particle Distribution and Electron Temperature in Cylindrical Magnetron Sputtering","authors":"Yuwei Fu, Peng Ji, Mengsha He, Peijun Huang, Guobin Huang, Weihua Huang","doi":"10.1007/s11090-023-10425-9","DOIUrl":"https://doi.org/10.1007/s11090-023-10425-9","url":null,"abstract":"<p>The plasma density and electron temperature are governed and influenced by the high-power pulsed magnetron sputtering parameters (e.g., operating voltage, pulse width, and working gas pressure), which are critical factors in determining the quality of high-power pulsed magnetron sputtering deposited films. This article proposes a vertical cylindrical magnetron sputtering plasma model based on the equivalent magnetic charge model to study the particle spatiotemporal and electron temperature distribution in high-power pulse magnetron sputtering. The results show that the electron converges in the highest magnetic field region in high-power pulsed magnetron sputtering during the increase of argon pressure from 3 to 7 Pa. The electron density distribution width ratio decreases from 80 to 64%, reducing target utilization. At the same time, for every 1 Pa increase in pressure, the average electron temperature in the discharge region is reduced by about 2 eV, which is inversely proportional to the pressure. As the voltage increases to 1000 V, the electric field intensity increases to 2 × 10<sup>5</sup> V/m, and the distribution of sputtered particles tends to be closer to the electrode, and the cathode dark zone changes from 2 to 1 mm. The increase in voltage has little effect on the shape of the plasma particle density distribution, but the electron temperature near the electrode increases to 19 eV at high voltages. The study reveals the change of plasma particles during the magnetron sputtering process, which is of guidance for magnetron sputtering.</p>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":3.6,"publicationDate":"2023-11-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138543334","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Continuous Production of High-Concentration Nitrated Water with Catalytic Concentrated High-Intensity Electric Field Process at Ambient Conditions 环境条件下催化浓缩强电场法连续生产高浓度硝化水
IF 3.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2023-11-15 DOI: 10.1007/s11090-023-10423-x
Yuancai Lv, Ling Chen, Nan Zhou, Leilei Dai, Yanling Cheng, Yiwei Ma, Juer Liu, Kirk Cobb, Paul Chen, Roger Ruan
{"title":"Continuous Production of High-Concentration Nitrated Water with Catalytic Concentrated High-Intensity Electric Field Process at Ambient Conditions","authors":"Yuancai Lv, Ling Chen, Nan Zhou, Leilei Dai, Yanling Cheng, Yiwei Ma, Juer Liu, Kirk Cobb, Paul Chen, Roger Ruan","doi":"10.1007/s11090-023-10423-x","DOIUrl":"https://doi.org/10.1007/s11090-023-10423-x","url":null,"abstract":"<p>Considering the potential environmental issues caused by the Haber–Bosch nitrogen fixation process, developing green technology for nitrogen fixation has become a heated topic. In this work, a modified “concentrated high-intensity electric field” (CHIEF) non-thermal plasma system was developed, by combining photocatalysis and electrodialysis for the continuous production of high-concentration nitrated water using air and water. The main system design factors, including: voltage, duty cycle, gas flow rate, N<sub>2</sub>/O<sub>2</sub> ratio, and reactor parameters, show significant impacts on the nitrogen fixation, and the composition in the resulting nitrated water. Under high voltage in the CHIEF system, N<sub>2</sub> and O<sub>2</sub> were excited, and generated various reactive nitrogen and oxygen species, resulting in the <i>in-situ</i> reaction with water. These reactions led to the formation of NH<sub>4</sub><sup>+</sup>, NO<sub>2</sub><sup>−</sup> and NO<sub>3</sub><sup>−</sup> (ammonium, nitrite, and nitrate ions) in the solution via a series of reactions in the gas phase, gas–liquid interface, and liquid phase. Due to the rapid in situ reaction, the highest nitrogen species yield rate reached 48.28 μmol/min, which was much higher than other reports. The best (least) energy consumption was 23.5 MJ/mol of Nitrogen. In addition, photocatalysis mediated by TiO<sub>2</sub> under UV exposure, greatly promoted the conversion of nitrite to nitrate, because of the generation of ·OH and ·O<sub>2</sub><sup>−</sup> species. Furthermore, the electrodialysis concentration was able to efficiently decrease the conductivity in the CHIEF system, and enriched the nitrate concentration over dozens of times. This enabled the CHIEF system to continuously achieve high-level nitrogen fixation in an efficient manner.</p>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":3.6,"publicationDate":"2023-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138534175","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Spatial-frequency-resolved schlieren sensor for turbulence visualization in arc discharge 用于电弧放电湍流显示的空间频率分辨纹线传感器
3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2023-11-14 DOI: 10.1007/s11090-023-10415-x
Yuki Inada, Ryo Kikuchi, Yuichi Hirano, Yusuke Maede, Yasunori Tanaka, Yusuke Nakano, Masaya Shigeta, Takayasu Fujino, Akiko Kumada
{"title":"Spatial-frequency-resolved schlieren sensor for turbulence visualization in arc discharge","authors":"Yuki Inada, Ryo Kikuchi, Yuichi Hirano, Yusuke Maede, Yasunori Tanaka, Yusuke Nakano, Masaya Shigeta, Takayasu Fujino, Akiko Kumada","doi":"10.1007/s11090-023-10415-x","DOIUrl":"https://doi.org/10.1007/s11090-023-10415-x","url":null,"abstract":"","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2023-11-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134902343","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Gas–Liquid Chemical Reactions with Nanosecond Pulses: Role of Frequency and Pulse Delivery Modes 纳秒脉冲的气液化学反应:频率和脉冲传递模式的作用
IF 3.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2023-11-14 DOI: 10.1007/s11090-023-10420-0
Radha Krishna Murthy Bulusu, Nina Mihajlov, Christopher W. Patterson, Robert J. Wandell, Bruce R. Locke
{"title":"Gas–Liquid Chemical Reactions with Nanosecond Pulses: Role of Frequency and Pulse Delivery Modes","authors":"Radha Krishna Murthy Bulusu,&nbsp;Nina Mihajlov,&nbsp;Christopher W. Patterson,&nbsp;Robert J. Wandell,&nbsp;Bruce R. Locke","doi":"10.1007/s11090-023-10420-0","DOIUrl":"10.1007/s11090-023-10420-0","url":null,"abstract":"<div><p>The effects of changes in the mode of delivery of nanosecond pulses in a gas–liquid plasma reactor on the formation of hydrogen peroxide, H<sub>2</sub>O<sub>2</sub>, and, as an indicator for ·OH radicals, the decoloration of methylene blue, MB, were determined for pulse delivery by (a) increasing frequency with uniform pulses (5–50 kHz), (b) variation of the time between bursts of pulses (burst period), (c) changing the inner burst frequency (1 over the time between the pulses in the burst), and (d) variation of number of pulses in a burst (N-cycles). H<sub>2</sub>O<sub>2</sub> peroxide formation was not affected by the method of pulse delivery in the range of parameters studied here and all data followed an approximately linear increase in H<sub>2</sub>O<sub>2</sub> production rate with discharge power. In contrast, the MB decoloration rate was affected by the burst modes. In terms of discharge power, the MB decoloration rate was highest for the uniform pulse mode; however, the linear trend in increase of MB decoloration with power when the burst period was varied, suggest that at higher power the burst mode may be more effective than the uniform pulsing. Consideration of the per pulse decoloration with energy per pulse and with number of pulses suggest that the burst mode can affect reactions differently from applying a uniform pulse.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":3.6,"publicationDate":"2023-11-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134953585","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Synthesis of Gold NPs-Containing Thin Films from Metal Salt Injection in Ar or Ar–NH3 DBDs 在Ar或Ar - nh3 DBDs中注入金属盐合成含金nps薄膜
IF 3.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2023-11-11 DOI: 10.1007/s11090-023-10400-4
Alexandre Perdrau, Noémi Barros, Rocío Rincón, Hervé Glénat, Stéphanie Truong, Sarra Gam Derouich, Xiaonan Sun, Philippe Decorse, Sophie Nowak, Béatrice Plujat, Souad Ammar, Jean-Pascal Borra, Fiorenza Fanelli, Françoise Massines
{"title":"Synthesis of Gold NPs-Containing Thin Films from Metal Salt Injection in Ar or Ar–NH3 DBDs","authors":"Alexandre Perdrau,&nbsp;Noémi Barros,&nbsp;Rocío Rincón,&nbsp;Hervé Glénat,&nbsp;Stéphanie Truong,&nbsp;Sarra Gam Derouich,&nbsp;Xiaonan Sun,&nbsp;Philippe Decorse,&nbsp;Sophie Nowak,&nbsp;Béatrice Plujat,&nbsp;Souad Ammar,&nbsp;Jean-Pascal Borra,&nbsp;Fiorenza Fanelli,&nbsp;Françoise Massines","doi":"10.1007/s11090-023-10400-4","DOIUrl":"10.1007/s11090-023-10400-4","url":null,"abstract":"<div><p>This study focuses on metal/polymer nanocomposite thin films made by atmospheric pressure Plasma-Enhanced Chemical Vapor Deposition. The aerosol of isopropanol-dissolved tetrachloroauric acid (HAuCl<sub>4</sub>:3H<sub>2</sub>O gold salt) is injected in a dielectric barrier discharge to synthesize plasmonic nanocomposite thin films. Argon is used as carrier gas with or without 133 ppm addition of ammonia (NH<sub>3</sub>) to respectively get or not a Penning mixture. Results show that NH<sub>3</sub> largely influences the salt reduction and thin film properties. According to the aerosol characterization, the size distribution at the plasma entrance supports that isopropanol mainly evaporates before injection in the plasma. The salt initially dissolved in each droplet precipitates during evaporation before injection as solid nanoparticles of about 30 nm diameter with eventual traces of solvent. Then, the nanocomposite thins film are studied. Optical properties, as plasmonic resonance, are characterized by UV–visible absorption spectroscopy. The chemical composition is analyzed using X-ray photoelectron spectroscopy and Raman spectroscopy, complemented by X-ray diffraction analysis as well as chemical mapping obtained by Energy dispersive spectroscopy coupled to scanning electron microscopy (SEM) operating in Scanning Transmission Electron Microscopy mode. Additionally, the morphology of the deposits is investigated by atomic force microscopy and SEM, highlighting the influence of NH<sub>3</sub> gas on the film nature and therefore its role in the overall deposition process. Finally, optical emission spectroscopy of the plasma gives clue to better understand the effect of NH<sub>3</sub>. The overall results show that the salt nanoparticles are reduced in the plasma phase leading to non-aggregated metal Au NPs embedded in a carbon-based matrix formed by isopropanol polymerization. The presence of NH<sub>3</sub> in the plasma unambiguously decreases the salt reduction and affects the thin film properties, consequently changing their plasmonic response related to the size, concentration, and composition of the embedded NPs.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":3.6,"publicationDate":"2023-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135041603","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Recent Trends in Plasma-Assisted CO2 Methanation: A Critical Review of Recent Studies 血浆辅助CO2甲烷化的最新趋势:对最近研究的重要回顾
IF 3.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2023-11-08 DOI: 10.1007/s11090-023-10417-9
Sana Ullah, Yuan Gao, Liguang Dou, Yadi Liu, Tao Shao, Yunxia Yang, Anthony B. Murphy
{"title":"Recent Trends in Plasma-Assisted CO2 Methanation: A Critical Review of Recent Studies","authors":"Sana Ullah,&nbsp;Yuan Gao,&nbsp;Liguang Dou,&nbsp;Yadi Liu,&nbsp;Tao Shao,&nbsp;Yunxia Yang,&nbsp;Anthony B. Murphy","doi":"10.1007/s11090-023-10417-9","DOIUrl":"10.1007/s11090-023-10417-9","url":null,"abstract":"<div><p>In recent years, enormous efforts have been devoted to alleviating global energy demand and the climate crisis. This has instigated the search for alternative energy sources with a reduced carbon footprint. Catalytic hydrogenation of CO<sub>2</sub> to CH<sub>4</sub>, known as the methanation reaction, is a pathway to utilise CO<sub>2</sub> and renewable hydrogen simultaneously. However, owing to the high stability of CO<sub>2</sub> and thermodynamic limitations at higher temperatures, the methanation process is energy intensive. Non-thermal plasma technology has recently emerged as a promising approach to lowering the activation temperature of CO<sub>2</sub>. The application of a plasma coupled with catalytic materials allows the methanation reaction to occur at or near ambient conditions, with dielectric barrier discharges providing superior performance. The review considers the various catalytic materials applied for plasma-assisted catalytic CO<sub>2</sub> methanation and assesses CO<sub>2</sub> conversion, CH<sub>4</sub> yield and fuel production efficiency obtained. The importance of reactor designs and process parameters are discussed in detail. The possible reaction pathways are considered based on in-situ and other diagnostics and modelling studies. Finally, a perspective on current barriers and opportunities for advances in non-thermal plasma technology for CO<sub>2</sub> methanation is presented.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":3.6,"publicationDate":"2023-11-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s11090-023-10417-9.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135390069","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Self-Consistent State-to-State Kinetic Modeling of CO2 Cold Plasmas: Insights on the Role of Electronically Excited States CO2冷等离子体的自洽状态对状态动力学建模:电子激发态作用的见解
3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2023-11-08 DOI: 10.1007/s11090-023-10407-x
L. D. Pietanza, G. Colonna, M. Capitelli
{"title":"Self-Consistent State-to-State Kinetic Modeling of CO2 Cold Plasmas: Insights on the Role of Electronically Excited States","authors":"L. D. Pietanza, G. Colonna, M. Capitelli","doi":"10.1007/s11090-023-10407-x","DOIUrl":"https://doi.org/10.1007/s11090-023-10407-x","url":null,"abstract":"Abstract This study focuses on the role of CO 2 and CO electronically excited states in the kinetics of CO 2 cold non-equilibrium plasma discharges by means of a state-to-state OD kinetic model based on the simultaneous and self-consistent solution of the electron Boltzmann equation and the master equations describing the vibrationally and electronically excited state kinetics and the plasma composition. A new CO 2 dissociation model based on the use of the Biagi electron impact excitation cross sections, considered as fully dissociative, of several CO 2 electronic excited states, in the energy range from 6.5 to 25 eV, is tested and compared with the results obtained by using the Phelps database in typical glow and microwave discharge conditions. Moreover, a refinement of the kinetics of the $$mathrm{CO}left({mathrm{a}}^{3}Pi right)$$ <mml:math xmlns:mml=\"http://www.w3.org/1998/Math/MathML\"> <mml:mrow> <mml:mi>CO</mml:mi> <mml:mfenced> <mml:msup> <mml:mrow> <mml:mi>a</mml:mi> </mml:mrow> <mml:mn>3</mml:mn> </mml:msup> <mml:mi>Π</mml:mi> </mml:mfenced> </mml:mrow> </mml:math> excited state is proposed by including new production and loss terms and the effect of the change of its time evolution density on the eedf, the electron temperature, the CO 2 and CO vibrational distribution functions, electron impact and vibrational induced dissociation rates is investigated. Finally, the contribution of the $$mathrm{CO}left({mathrm{a}}^{3}Pi right)$$ <mml:math xmlns:mml=\"http://www.w3.org/1998/Math/MathML\"> <mml:mrow> <mml:mi>CO</mml:mi> <mml:mfenced> <mml:msup> <mml:mrow> <mml:mi>a</mml:mi> </mml:mrow> <mml:mn>3</mml:mn> </mml:msup> <mml:mi>Π</mml:mi> </mml:mfenced> </mml:mrow> </mml:math> state to CO 2 dissociation is examined in terms of production and recombination (or back-reaction) processes both in microwave and glow discharge conditions.","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2023-11-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135390220","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
相关产品
×
本文献相关产品
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信