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The Role of Gas-Liquid Interface in Controlling the Reactivity of Air Dielectric Barrier Discharge Plasma Activated Water 气液界面在控制空气介质阻挡放电等离子活化水反应性中的作用
IF 2.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2024-09-10 DOI: 10.1007/s11090-024-10508-1
Zhenyu Zhou, Zhihua Qi, Xu Zhao, Dongping Liu, Weiyuan Ni
{"title":"The Role of Gas-Liquid Interface in Controlling the Reactivity of Air Dielectric Barrier Discharge Plasma Activated Water","authors":"Zhenyu Zhou,&nbsp;Zhihua Qi,&nbsp;Xu Zhao,&nbsp;Dongping Liu,&nbsp;Weiyuan Ni","doi":"10.1007/s11090-024-10508-1","DOIUrl":"10.1007/s11090-024-10508-1","url":null,"abstract":"<div><p>Plasma activated water (PAW) has been prepared using atmospheric pressure air dielectric barrier discharge with the bubbling method. This study aims to elucidate the crucial role of gas-liquid interface in determining the physicochemical properties and biological reactivity of PAW, as well as describe the process of mass transfer for reactive oxygen and nitrogen species (RONS) during the PAW generation. Gas-liquid interfacial area is regulated by varying the airflow rate. When the airflow rate increases from 0.5 to 16.0 SLM, the concentrations of <span>(:text{N}{text{O}}_{text{2}}^{text{-}})</span>, <span>(:text{N}{text{O}}_{text{3}}^{text{-}})</span>, <span>(:{text{O}}_{text{3}})</span> and activated oxygen in PAW increase significantly, and the water-activated time for complete <i>E. coli</i> inactivation can be shortened from more than 320 s to 40 s. The numerical simulation result shows that when the airflow rate increases from 0.5 to 16.0 SLM, the gas-liquid interfacial area increases from 0.014 to 0.3 m<sup>2</sup>/600 mL. The analysis shows that the dependence of the chemical reactivity and the biological reactivity on the interface area is mainly attributed to the change of the mass flux with the interface area.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 6","pages":"2137 - 2152"},"PeriodicalIF":2.6,"publicationDate":"2024-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142205536","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Oxidation of Organic Compounds in Cooking Fumes by Combining Nonthermal Plasma with Mn/HZSM-5 Catalysts 非热等离子体与 Mn/HZSM-5 催化剂相结合氧化烹饪油烟中的有机化合物
IF 2.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2024-09-03 DOI: 10.1007/s11090-024-10505-4
Tian Chang, Mingyan Xiao, Yaqi Wang, Karen Leus, Qingcai Chen, Zhenxing Shen, Chuanyi Wang, Nathalie De Geyter, Rino Morent
{"title":"Oxidation of Organic Compounds in Cooking Fumes by Combining Nonthermal Plasma with Mn/HZSM-5 Catalysts","authors":"Tian Chang,&nbsp;Mingyan Xiao,&nbsp;Yaqi Wang,&nbsp;Karen Leus,&nbsp;Qingcai Chen,&nbsp;Zhenxing Shen,&nbsp;Chuanyi Wang,&nbsp;Nathalie De Geyter,&nbsp;Rino Morent","doi":"10.1007/s11090-024-10505-4","DOIUrl":"10.1007/s11090-024-10505-4","url":null,"abstract":"<div><p>Nonthermal plasma (NTP) is an efficient treatment technology for cooking fumes (CFs). However, its practical implementation is hindered due to the low mineralization rate of CFs and high generation of by-products. In this study, a hybrid system coupling NTP and Mn/HZSM-5 catalysts was developed for the deep oxidation of CFs. These catalysts exhibited a remarkable synergistic effect together with NTP in improving the efficiency of CFs removal. When the specific energy density was 282 J·L<sup>− 1</sup>, the hybrid system had stable reactivity, and the CFs removal efficiency and CO<sub>2</sub> yield were 100% and 78.4%, respectively, which were 10% and 61% higher than the values achieved with the NTP system alone. The Mn/HZSM-5 catalysts were also discovered to inhibit the production of O<sub>3</sub> and NO<sub>2</sub> to a large extent and to achieve a removal efficiency level at &gt; 80%. The Mn/HZSM-5 catalysts’ high Mn<sup>4+</sup>/Mn ratio and the relatively large amount of chemisorbed oxygen on the catalyst surface engendered their remarkable performance. On the basis of the detected active species and organic products, the reaction mechanism governing the destruction of CFs by the NTP-Mn/HZSM-5 catalyst system was also discussed.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 6","pages":"2119 - 2135"},"PeriodicalIF":2.6,"publicationDate":"2024-09-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142205542","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Ammonia Synthesis via Membrane Dielectric-Barrier Discharge Reactor Integrated with Metal Catalyst 通过集成金属催化剂的膜介质阻挡放电反应器合成氨
IF 2.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2024-09-03 DOI: 10.1007/s11090-024-10502-7
Visal Veng, Saleh Ahmat Ibrahim, Benard Tabu, Ephraim Simasiku, Joshua Landis, John Hunter Mack, Fanglin Che, Juan Pablo Trelles
{"title":"Ammonia Synthesis via Membrane Dielectric-Barrier Discharge Reactor Integrated with Metal Catalyst","authors":"Visal Veng,&nbsp;Saleh Ahmat Ibrahim,&nbsp;Benard Tabu,&nbsp;Ephraim Simasiku,&nbsp;Joshua Landis,&nbsp;John Hunter Mack,&nbsp;Fanglin Che,&nbsp;Juan Pablo Trelles","doi":"10.1007/s11090-024-10502-7","DOIUrl":"10.1007/s11090-024-10502-7","url":null,"abstract":"<div><p>The synthesis of ammonia using non-thermal plasma can present distinct advantages for distributed stand-alone operations powered by electricity from renewable energy sources. We present the synthesis of ammonia from nitrogen and hydrogen using a membrane Dielectric-Barrier Discharge (mDBD) reactor integrated with metal catalyst. The reactor used a porous alumina membrane as a dielectric-barrier and as a distributor of H<sub>2</sub>, a configuration that leads to greater NH<sub>3</sub> production than using pre-mixed N<sub>2</sub> and H<sub>2</sub>. The membrane is surrounded by catalyst powder held by glass wool as porous dielectric support filling the plasma region. We evaluated nickel, cobalt, and bimetallic nickel-cobalt as catalysts due to their predicted lower activation energy under non-thermal plasma conditions as determined through Density Functional Theory (DFT) calculations. The catalysts were loaded at 5% by weight on alumina powder. The performance of the catalytic mDBD reactor was assessed using electrical, optical, and spectroscopic diagnostics, as well as Fourier-Transform Infrared spectroscopy. Experimental results showed that the glass wool support suppresses microdischarges, generally leading to greater ammonia production. The Ni-Co/Al<sub>2</sub>O<sub>3</sub> catalyst produced the greatest energy yield of 0.87 g-NH<sub>3</sub>/kWh, compared to a maximum of 0.82 and 0.78 g-NH<sub>3</sub>/kWh for the Co/Al<sub>2</sub>O<sub>3</sub> and Ni/Al<sub>2</sub>O<sub>3</sub> catalysts, respectively. Although the differences in performance among the three metal catalysts are small, they corroborate the predictions by DFT. Moreover, the maximum energy yield for bare Al<sub>2</sub>O<sub>3</sub> (no metal catalyst) with dielectric support was 0.38 g-NH<sub>3</sub>/kWh, for mDBD operation with no metal catalyst or dielectric support was 0.28 g-NH<sub>3</sub>/kWh, and for standard DBD operation (no membrane, dielectric support, or catalyst) was 0.08 g-NH<sub>3</sub>/kWh, i.e., 2.1, 3.1, and 11 times lower, respectively, than the maximum energy yield for the Ni-Co/Al<sub>2</sub>O<sub>3</sub> catalyst with dielectric support. The study shows that the integration of dielectric membrane and metal catalyst is an effective approach at enhancing ammonia production in a DBD reactor.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 6","pages":"2031 - 2055"},"PeriodicalIF":2.6,"publicationDate":"2024-09-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142205329","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Enhancement of W Nanoparticles Synthesis by Injecting H2 in a Magnetron Sputtering Gas Aggregation Cluster Source Operated in Ar 在氩气环境下运行的磁控溅射气体聚集簇源中注入 H2,提高 W 纳米粒子的合成效率
IF 2.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2024-09-03 DOI: 10.1007/s11090-024-10499-z
Tomy Acsente, Silviu Daniel Stoica, Cristina Craciun, Bogdana Mitu, Gheorghe Dinescu
{"title":"Enhancement of W Nanoparticles Synthesis by Injecting H2 in a Magnetron Sputtering Gas Aggregation Cluster Source Operated in Ar","authors":"Tomy Acsente,&nbsp;Silviu Daniel Stoica,&nbsp;Cristina Craciun,&nbsp;Bogdana Mitu,&nbsp;Gheorghe Dinescu","doi":"10.1007/s11090-024-10499-z","DOIUrl":"10.1007/s11090-024-10499-z","url":null,"abstract":"<div><p>Synthesis of W nanoparticles by magnetron sputtering combined with gas aggregation operated in Ar suffers from a continuous decrease of the synthesis rate, ceasing in a finite time interval, in the range of minutes to tens of minutes. Experimentally, we noticed that adding small amounts of H<sub>2</sub> to Ar (5–20%) increases the synthesis rate, which remains constant over time, at a value dependent on the amount of injected hydrogen. Mass spectrometry investigations revealed, in the hydrogen presence, a dominance of the ArH<sup>+</sup> ions over the Ar<sup>+</sup> ones, associated also with an increased number of W<sup>+</sup> and WH<sup>+</sup> species in plasma, sustaining a substantial increase in the nucleation rate.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 6","pages":"2233 - 2246"},"PeriodicalIF":2.6,"publicationDate":"2024-09-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s11090-024-10499-z.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142205541","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Reaction Pathways and Energy Consumption in NH3 Decomposition for H2 Production by Low Temperature, Atmospheric Pressure Plasma 低温常压等离子体分解 NH3 产生 H2 的反应途径和能耗
IF 2.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2024-08-28 DOI: 10.1007/s11090-024-10501-8
Brian N. Bayer, Aditya Bhan, Peter J. Bruggeman
{"title":"Reaction Pathways and Energy Consumption in NH3 Decomposition for H2 Production by Low Temperature, Atmospheric Pressure Plasma","authors":"Brian N. Bayer,&nbsp;Aditya Bhan,&nbsp;Peter J. Bruggeman","doi":"10.1007/s11090-024-10501-8","DOIUrl":"10.1007/s11090-024-10501-8","url":null,"abstract":"<div><p>Pathways for NH<sub>3</sub> decomposition to N<sub>2</sub> and N<sub>2</sub>H<sub>4</sub> by atmospheric pressure nonthermal plasma are analyzed using a combination of molecular beam mass spectrometry measurements and zero-dimensional kinetic modeling. Experimental measurements show that NH<sub>3</sub> conversion and selectivity towards N<sub>2</sub> formation scale monotonically with the specific energy input into the plasma with ~ 100% selectivity to N<sub>2</sub> formation achieved at specific energy inputs above 0.12 J cm<sup>−3</sup> (3.1 eV (molecule NH<sub>3</sub>)<sup>−1</sup>). The kinetic model recovers these trends, although it underpredicts N<sub>2</sub> selectivity at low specific energy input. These discrepancies can be explained by the underestimation of reaction rate coefficients for reactions that consume N<sub>2</sub>H<sub>x</sub> species in collisions with H radicals and/or radial nonuniformities in power deposition, gas temperature, and species concentrations that are not represented by the plug flow approximation used in the model. The kinetic model shows that N<sub>2</sub> formation proceeds through N<sub>2</sub>H<sub>x</sub> decomposition pathways rather than NH<sub>x</sub> decomposition pathways in low temperature, atmospheric pressure plasma. Higher selectivity toward N<sub>2</sub> production can be achieved by operating at higher NH<sub>3</sub> conversion and with a higher gas temperature. The high energy cost of NH<sub>3</sub> decomposition by atmospheric pressure nonthermal plasma found in this work (25–50 eV (molecule NH<sub>3</sub> converted)<sup>−1</sup>; 17–33 eV (molecule H<sub>2</sub> formed)<sup>−1</sup>) is a result of the energy requirement for electron-impact dissociation of NH<sub>3</sub> and the significant re-formation of NH<sub>3</sub> by three-body recombination reactions between NH<sub>2</sub> and H.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 6","pages":"2101 - 2118"},"PeriodicalIF":2.6,"publicationDate":"2024-08-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142205539","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Capture and Conversion of CO2 from Ambient Air Using Ionic Liquid-Plasma Combination 利用离子液体-等离子体组合捕获和转化环境空气中的二氧化碳
IF 2.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2024-08-27 DOI: 10.1007/s11090-024-10500-9
Sukma Wahyu Fitriani, Takamasa Okumura, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani, Pankaj Attri
{"title":"Capture and Conversion of CO2 from Ambient Air Using Ionic Liquid-Plasma Combination","authors":"Sukma Wahyu Fitriani,&nbsp;Takamasa Okumura,&nbsp;Kunihiro Kamataki,&nbsp;Kazunori Koga,&nbsp;Masaharu Shiratani,&nbsp;Pankaj Attri","doi":"10.1007/s11090-024-10500-9","DOIUrl":"10.1007/s11090-024-10500-9","url":null,"abstract":"<div><p>Climate change is considered one of the main challenges in this century, and CO<sub>2</sub> emissions significantly cause it. Integrating CO<sub>2</sub> capture, storage, and conversion is proposed to solve this problem. 1-Butyl-3-methylimidazolium chloride ([Bmim]Cl) ionic liquid was employed to capture and store CO<sub>2</sub> from the air and subsequently converted into CO using non-thermal plasma. Moreover, we also tested the CO<sub>2</sub> capture and storage capacity of water from different sources, e.g., Milli-Q, deionized water, and tap water. [Bmim]Cl solution captured CO<sub>2</sub> from the air and then converted to CO after 24 h using plasma. In comparison with water (Milli-Q water, deionized water, and tap water), CO production was increased by 28.31% in the presence of water (Milli-Q water, deionized water, and tap water) + [Bmim]Cl. It suggests that this method could be a promising way to capture, store, and convert CO<sub>2</sub> from air at atmospheric pressure and room temperature as an effort to reduce carbon emission.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 6","pages":"2153 - 2162"},"PeriodicalIF":2.6,"publicationDate":"2024-08-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142205540","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor 在电感耦合等离子体反应器中使用多通道光学发射光谱和扫描浮动谐波探针监测光刻胶蚀刻的蚀刻速率均匀性
IF 2.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2024-08-18 DOI: 10.1007/s11090-024-10498-0
Sanghun Lee, Sanghee Han, Jaehyeon Kim, Minsung Jeon, Heeyeop Chae
{"title":"Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor","authors":"Sanghun Lee,&nbsp;Sanghee Han,&nbsp;Jaehyeon Kim,&nbsp;Minsung Jeon,&nbsp;Heeyeop Chae","doi":"10.1007/s11090-024-10498-0","DOIUrl":"10.1007/s11090-024-10498-0","url":null,"abstract":"<div><p>The etch rate uniformity in photoresist etching was monitored using multi-channel optical emission spectroscopy (OES) and a spatially resolved etch rate model incorporating radical and ion etching characteristics. The F radical densities at various locations were estimated using 8-channel OES and applied to a radical-spontaneous etch rate model to examine the impact of radicals on the etch rate. The ion fluxes were measured using a scanning floating harmonic probe for an ion-enhanced etch rate model to investigate the effect of ions on the etch rate. A combined etch rate model was proposed to explain the effects on both radical and ion etching characteristics, and the etch rates and etch rate uniformities predicted by the model were quantitatively compared with the measured values. The calculated R-squared score (R<sup>2</sup>) and the mean absolute percentage error (MAPE) of the etch rates predicted by the model were 0.99 and 1.3%, respectively. The etch rate uniformities predicted by the model showed good accuracy with R<sup>2</sup> of 0.99 and MAPE of 12.0% compared to the measured values, and the combined etch rate model also successfully predicted the distribution of the etch rate. This study demonstrates that multi-channel OES and the developed model can quantitatively predict the etch rate distribution of plasma etching processes.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 6","pages":"2247 - 2262"},"PeriodicalIF":2.6,"publicationDate":"2024-08-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142226337","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Plasma Catalytic Non-Oxidative Conversion of Methane into Hydrogen and Light Hydrocarbons 等离子体催化甲烷非氧化转化为氢和轻烃
IF 2.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2024-08-17 DOI: 10.1007/s11090-024-10497-1
Yonggang Gang, Yanhui Long, Kaiyi Wang, Yilin Zhang, Xuping Ren, Hao Zhang, Xiaodong Li
{"title":"Plasma Catalytic Non-Oxidative Conversion of Methane into Hydrogen and Light Hydrocarbons","authors":"Yonggang Gang,&nbsp;Yanhui Long,&nbsp;Kaiyi Wang,&nbsp;Yilin Zhang,&nbsp;Xuping Ren,&nbsp;Hao Zhang,&nbsp;Xiaodong Li","doi":"10.1007/s11090-024-10497-1","DOIUrl":"10.1007/s11090-024-10497-1","url":null,"abstract":"<div><p>Recently, direct non-oxidative conversion of methane (NOCM) into hydrogen and light hydrocarbons has garnered considerable attention. In our work, we employed a dielectric barrier discharge (DBD) plasma over a GaN/SBA15 catalyst for NOCM. Adding catalyst to plasma remarkably promotes the conversion of CH<sub>4</sub>, resulting in a significant improvement, for instance, from 27.8 to 39.2%. A systematic investigation of plasma performance at different discharge powers with and without catalyst was conducted. In the case of plasma + 15wt% GaN/SBA15, CH<sub>4</sub> conversion reaches an impressive 79.4%. However, it exhibits the lowest selectivity of 14.4% for C<sub>2</sub>+, while achieving the highest selectivity for hydrogen at 48.9%. Several characterization methods, including XRD, SEM, BET, XPS, and TPO-MS, were used to study the mechanism of the reaction. Plasma electrons and ions can effectively interact with activated CH3 radicals, promoting their adsorption onto Ga sites on the catalyst surface. Simultaneously, hydrogen atoms adsorb onto neighboring N atoms, rapidly delocalizing to produce H<sub>2</sub>, and the delocalization of hydrogen atoms in C species leads to the formation of species like CxHy. This study highlights the potential of plasma catalysis in significantly improving CH<sub>4</sub> conversion at lower temperatures and atmospheric pressure.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 6","pages":"2011 - 2029"},"PeriodicalIF":2.6,"publicationDate":"2024-08-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142205543","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Numerical Simulation of the Ionic Composition and Ionization Phenomena in the Positive Column of a Millisecond DC-Pulsed Glow-Type Discharge in Atmospheric Pressure Air with a Water-Cathode 带水阴极的大气压空气中毫秒直流脉冲辉光型放电正柱中离子成分和电离现象的数值模拟
IF 2.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2024-08-11 DOI: 10.1007/s11090-024-10496-2
M. G. Ferreyra, E. Cejas, B. Santamaría, J. C. Chamorro, B. J. Goméz, L. Prevosto
{"title":"Numerical Simulation of the Ionic Composition and Ionization Phenomena in the Positive Column of a Millisecond DC-Pulsed Glow-Type Discharge in Atmospheric Pressure Air with a Water-Cathode","authors":"M. G. Ferreyra,&nbsp;E. Cejas,&nbsp;B. Santamaría,&nbsp;J. C. Chamorro,&nbsp;B. J. Goméz,&nbsp;L. Prevosto","doi":"10.1007/s11090-024-10496-2","DOIUrl":"10.1007/s11090-024-10496-2","url":null,"abstract":"<div><p>A numerical investigation of a glow-type discharge in humid air with a water-cathode is reported. A complete block of chemical reactions that self-consistently describes the ionic composition of the plasma is considered. A water molar fraction up to 20% is examined. The electric field strength, emission discharge radius, as well as the OH (A → X) band emission in the positive column was also measured for discharge currents up to 155 mA. The model shows a non-thermal plasma with lower gas temperatures (around 3500 K) than those typically obtained in similar discharges but operating with metal electrodes in dry air. The gas temperature is almost unaffected by the discharge current. The vibrational relaxation through N<sub>2</sub>–H<sub>2</sub>O collisions is the main gas heating mechanism. The thermal diffusion due to enhanced thermal conductivity by water vapor is the primary cooling mechanism. The electron temperature is around 1 eV to ensure that the electron losses (mainly by dissociative recombination of NO<sup>+</sup>) are compensated by ionization phenomena. The NO<sup>+</sup> is the dominant ion, mainly formed by electron-impact ionization of NO molecules. An electron number density close to 10<sup>19</sup> m<sup>−3</sup> is obtained. For the upper water fraction, the electron-impact ionization of O<sub>2</sub> molecules, followed by a quick conversion to NO<sup>+</sup>, also plays a role. The concentration of OH is ~ 10<sup>22</sup> m<sup>−3</sup>. A comparison between the model results and the experimental data suggests that the molar fraction of water in the plasma is around 20% for the conditions considered.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 6","pages":"2199 - 2231"},"PeriodicalIF":2.6,"publicationDate":"2024-08-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141948039","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Ar-O2 Plasma-Induced Grafting of Quaternary Ammonium on Polyvinyl Chloride Surface to Improve its Antimicrobial Properties Ar-O2 等离子体诱导季铵在聚氯乙烯表面接枝以改善其抗菌性能
IF 2.6 3区 物理与天体物理
Plasma Chemistry and Plasma Processing Pub Date : 2024-07-30 DOI: 10.1007/s11090-024-10495-3
Sui Siyuan, Ni Guohua, Sun Hongmei, Kong Ling, Sun Tao
{"title":"Ar-O2 Plasma-Induced Grafting of Quaternary Ammonium on Polyvinyl Chloride Surface to Improve its Antimicrobial Properties","authors":"Sui Siyuan,&nbsp;Ni Guohua,&nbsp;Sun Hongmei,&nbsp;Kong Ling,&nbsp;Sun Tao","doi":"10.1007/s11090-024-10495-3","DOIUrl":"10.1007/s11090-024-10495-3","url":null,"abstract":"<div><p>In this paper, a novel method is presented to enhance the antimicrobial properties of polyvinyl chloride (PVC) via plasma-induced grafting of quaternary ammonium (QA). The results show that the content of oxygen-containing functional groups on PVC surface is significantly increased after Ar-O<sub>2</sub> plasma treatment, beneficially enhancing the thickness and adhesion of QA coating. Plasma treatment time critically affects the morphology of PVC surface, which is closely related to the number, depth and diameter of pit on the surface. With the increase of pits size, the PVC surface forms ridge-like protrusions. The coating formed by grafting QA maintains the morphology characteristics of plasma-treated PVC surface. Results of antibacterial test show that specimens have the best antibacterial activity when there are a high and sharp ridge-like structure of QA coating on the plasma-treated PVC surface.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 5","pages":"1951 - 1969"},"PeriodicalIF":2.6,"publicationDate":"2024-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141871053","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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