Metastable Helium Atom Creation Dynamics in High-Voltage Pulsed Discharge with Transverse Magnetic Field Effects

IF 2.6 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL

Plasma Chemistry and Plasma Processing Pub Date : 2024-05-28 DOI:10.1007/s11090-024-10478-4

K. M. Rabadanov, N. A. Ashurbekov, K. O. Iminov, G. Sh. Shakhsinov, M. Z. Zakaryaeva, A. A. Murtazaeva

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Abstract

In this work, we investigate the effect of an external transverse weak magnetic field on the creation of metastable helium atoms and excited helium molecules in a high-voltage pulsed discharge in helium at medium pressure. A two-dimensional fluid model is used to describe a high-voltage pulsed discharge in helium in the external transverse weak magnetic field. The dynamics of discharge development in the high-voltage pulsed discharge in helium at a pressure of 30 Torr in the presence and absence of the magnetic field is studied. The effect of the external magnetic field on the behavior of the density of charged particles, metastable helium atoms, and excited helium molecules in the high-voltage pulsed helium discharge has been investigated. It is shown that in the discharge region, the density of metastable atoms decreases when a transverse magnetic field is applied, which is a consequence of an increase in the frequency of stepwise ionization.

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具有横向磁场效应的高压脉冲放电中氦原子的可迁移生成动力学

在这项工作中，我们研究了外部横向弱磁场对中压氦气高压脉冲放电中析出的氦原子和激发的氦分子的影响。采用二维流体模型来描述外部横向弱磁场中氦气高压脉冲放电。研究了压力为 30 托的氦中高压脉冲放电在磁场存在和不存在的情况下的放电发展动力学。研究了外部磁场对高压脉冲氦放电中带电粒子、氦原子和受激氦分子密度行为的影响。研究表明，在放电区，当施加横向磁场时，可移动原子的密度会降低，这是阶跃电离频率增加的结果。

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来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.