{"title":"Analog/RF and Distortion Characteristics of Recessed Superjunction AlGaN/GaN HEMTs","authors":"Nahida Banu, Chandrima Mondal, Abhijit Biswas","doi":"10.1049/cds2/7803942","DOIUrl":"https://doi.org/10.1049/cds2/7803942","url":null,"abstract":"<p>In this work, we investigate the impact of the recessed height of the i-gallium nitride (GaN) layer on the performance of superjunction AlGaN/GaN high electron mobility transistors (HEMTs). The recessed height (<i>h</i>) of the superjunction layer is systematically varied from 0 to 30 nm while keeping all other device dimensions and biasing conditions constant. The results demonstrate significant enhancements in both DC and analog/RF characteristics with increasing recessed height. At a recessed height of 30 nm, the ON-state current increases by 45.65%, transconductance rises by 35.38%, and ON-state resistance decreases by 34.56% compared to the nonrecessed structure. Although the breakdown voltage (BV) decreases by 5%, the highest figure of merit (FOM) is achieved at the maximum recessed height. The threshold voltage shifts to positive values for recessed heights exceeding 25 nm, confirming enhancement-mode operation. A maximum cutoff frequency of 505 GHz is found at <i>h</i> = 30 nm, which is only 377 GHz for the device without recessing the superjunction region. The other RF performance parameters, including cutoff frequency, maximum oscillation frequency, and transit frequency product, attain significantly higher values at the maximum recessed height. The intrinsic voltage gain and gain product terms show their maximum for <i>h</i> = 0 nm. While intermodulation distortion (IMD<sub>3</sub>) rises marginally, the total harmonic distortion (THD) reduces by 23 dB, highlighting the device’s suitability for low-distortion analog and RF applications at <i>h</i> = 30 nm. Overall, the 30 nm recessed superjunction HEMT is a promising candidate for advanced analog and RF circuits by combining its enhancement-mode operation and superior analog/RF performance.</p>","PeriodicalId":50386,"journal":{"name":"Iet Circuits Devices & Systems","volume":"2026 1","pages":""},"PeriodicalIF":1.8,"publicationDate":"2026-07-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1049/cds2/7803942","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148616194","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Analog/RF and Distortion Characteristics of Recessed Superjunction AlGaN/GaN HEMTs","authors":"Nahida Banu, Chandrima Mondal, Abhijit Biswas","doi":"10.1049/cds2/7803942","DOIUrl":"https://doi.org/10.1049/cds2/7803942","url":null,"abstract":"<p>In this work, we investigate the impact of the recessed height of the i-gallium nitride (GaN) layer on the performance of superjunction AlGaN/GaN high electron mobility transistors (HEMTs). The recessed height (<i>h</i>) of the superjunction layer is systematically varied from 0 to 30 nm while keeping all other device dimensions and biasing conditions constant. The results demonstrate significant enhancements in both DC and analog/RF characteristics with increasing recessed height. At a recessed height of 30 nm, the ON-state current increases by 45.65%, transconductance rises by 35.38%, and ON-state resistance decreases by 34.56% compared to the nonrecessed structure. Although the breakdown voltage (BV) decreases by 5%, the highest figure of merit (FOM) is achieved at the maximum recessed height. The threshold voltage shifts to positive values for recessed heights exceeding 25 nm, confirming enhancement-mode operation. A maximum cutoff frequency of 505 GHz is found at <i>h</i> = 30 nm, which is only 377 GHz for the device without recessing the superjunction region. The other RF performance parameters, including cutoff frequency, maximum oscillation frequency, and transit frequency product, attain significantly higher values at the maximum recessed height. The intrinsic voltage gain and gain product terms show their maximum for <i>h</i> = 0 nm. While intermodulation distortion (IMD<sub>3</sub>) rises marginally, the total harmonic distortion (THD) reduces by 23 dB, highlighting the device’s suitability for low-distortion analog and RF applications at <i>h</i> = 30 nm. Overall, the 30 nm recessed superjunction HEMT is a promising candidate for advanced analog and RF circuits by combining its enhancement-mode operation and superior analog/RF performance.</p>","PeriodicalId":50386,"journal":{"name":"Iet Circuits Devices & Systems","volume":"2026 1","pages":""},"PeriodicalIF":1.8,"publicationDate":"2026-07-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1049/cds2/7803942","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148616312","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
I. Rama Satya Nageswara Rao, Srinivasa Rao Karumuri
{"title":"Design and Performance Analysis of Dielectrically Modulated Diagonal Tunneling TFET for Label Free Sensing","authors":"I. Rama Satya Nageswara Rao, Srinivasa Rao Karumuri","doi":"10.1049/cds2/3745152","DOIUrl":"10.1049/cds2/3745152","url":null,"abstract":"<p>This paper presents a novel architecture the diagonal tunneling dielectrically modulated tunnel field effect transistor (DT-DMTFET) for label-free biosensing applications. The study employs TCAD (Silvaco TCAD) simulations to comprehensively analyze the behavior of the DT-DMTFET biosensor focusing on key parameters such as drain current, sub-threshold slope, surface potential, and the <i>I</i><sub>on</sub>/<i>I</i><sub>off</sub> ratio. The paper extensively examines the physics of transduction mechanisms for lateral tunneling (LT), vertical tunneling (VT), and diagonal tunneling (DT)–based DMTFETs, considering device electrostatics and transport mechanisms. Simulations include variations in dielectric constants, cavity length and cavity thickness, while incorporating gate and cavity engineering techniques to enhance biosensor performance. The paper quantitatively assesses the transduction efficiency of sensor devices particularly focusing on current sensitivity. The DT-DMTFET exhibits a sensitivity of 4.6 × 10<sup>3</sup> Ω/volt and observed the sensitivities of 1.7 × 10<sup>2</sup> Ω/volt and 3.1 × 10<sup>3</sup> Ω/volt in LT-DMTFET and VT-DMTFET, respectively. Optimal sensitivity for DT-DMTFET is observed at gate voltages of 3–4 V, contrasting with 2 V and 4 V for VT-DMTFET and LT-DMTFET, respectively. Detailed studies on device design aspects identify relevant structural parameters, optimizing the sensing performance of DT-DMTFET. A comprehensive performance comparison establishes that DT-DMTFETs offer over 45% and 100% improvements in current sensitivity compared to their vertical and LT-based counterparts, respectively, across a range of biomolecule sample specifications.</p>","PeriodicalId":50386,"journal":{"name":"Iet Circuits Devices & Systems","volume":"2026 1","pages":""},"PeriodicalIF":1.8,"publicationDate":"2026-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1049/cds2/3745152","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148466792","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
I. Rama Satya Nageswara Rao, Srinivasa Rao Karumuri
{"title":"Design and Performance Analysis of Dielectrically Modulated Diagonal Tunneling TFET for Label Free Sensing","authors":"I. Rama Satya Nageswara Rao, Srinivasa Rao Karumuri","doi":"10.1049/cds2/3745152","DOIUrl":"https://doi.org/10.1049/cds2/3745152","url":null,"abstract":"<p>This paper presents a novel architecture the diagonal tunneling dielectrically modulated tunnel field effect transistor (DT-DMTFET) for label-free biosensing applications. The study employs TCAD (Silvaco TCAD) simulations to comprehensively analyze the behavior of the DT-DMTFET biosensor focusing on key parameters such as drain current, sub-threshold slope, surface potential, and the <i>I</i><sub>on</sub>/<i>I</i><sub>off</sub> ratio. The paper extensively examines the physics of transduction mechanisms for lateral tunneling (LT), vertical tunneling (VT), and diagonal tunneling (DT)–based DMTFETs, considering device electrostatics and transport mechanisms. Simulations include variations in dielectric constants, cavity length and cavity thickness, while incorporating gate and cavity engineering techniques to enhance biosensor performance. The paper quantitatively assesses the transduction efficiency of sensor devices particularly focusing on current sensitivity. The DT-DMTFET exhibits a sensitivity of 4.6 × 10<sup>3</sup> Ω/volt and observed the sensitivities of 1.7 × 10<sup>2</sup> Ω/volt and 3.1 × 10<sup>3</sup> Ω/volt in LT-DMTFET and VT-DMTFET, respectively. Optimal sensitivity for DT-DMTFET is observed at gate voltages of 3–4 V, contrasting with 2 V and 4 V for VT-DMTFET and LT-DMTFET, respectively. Detailed studies on device design aspects identify relevant structural parameters, optimizing the sensing performance of DT-DMTFET. A comprehensive performance comparison establishes that DT-DMTFETs offer over 45% and 100% improvements in current sensitivity compared to their vertical and LT-based counterparts, respectively, across a range of biomolecule sample specifications.</p>","PeriodicalId":50386,"journal":{"name":"Iet Circuits Devices & Systems","volume":"2026 1","pages":""},"PeriodicalIF":1.8,"publicationDate":"2026-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1049/cds2/3745152","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148466793","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pedram Beyranvand, Behrouz Heidari, Ashkan Horri, Mohammad Bagher Tavakoli
{"title":"Design of Ternary Analog-to-Digital Converter Based on Graphene-MoS2 Heterostructure","authors":"Pedram Beyranvand, Behrouz Heidari, Ashkan Horri, Mohammad Bagher Tavakoli","doi":"10.1049/cds2/7817923","DOIUrl":"https://doi.org/10.1049/cds2/7817923","url":null,"abstract":"<p>This paper presents a 2-bit ternary pipelined analog-to-digital converter (ADC) featuring nine quantization levels, implemented using a Dirac source field-effect transistor (DS-FET). The proposed DS-FET is based on graphene-MoS<sub>2</sub> heterostructure, that utilizes modulation of the graphene source’s density of states (DOSs) to generate intermediate electronic states. These states enable the realization of three discrete logic levels, which form the foundation of ternary logic operations. By precisely tuning the doping concentration within the graphene source region, the ternary quantizer can be achieved. By using a two-stage pipelined ADC and employing the quantizer in each stage, ternary ADC is implemented. Simulation results show a differential nonlinearity (DNL) ranging from −0.23 to 0.101 LSB and an integral nonlinearity (INL) between −0.09 and 0.1723 LSB, which satisfy the specifications for 2-bit resolution at an operating voltage of 1.2 V. The proposed design uses only 15 transistors, significantly fewer than the 48 transistors in comparable designs, demonstrating its suitability for VLSI applications. Moreover, the proposed ADC achieves a power-delay product (PDP) of 0.021 pJ, outperforming existing counterparts. The impact of process, temperature, and supply voltage variations on the proposed method is investigated, and their effects on ADC performance are analyzed. Overall, the results confirm that graphene-MoS<sub>2</sub> heterostructures offer a promising platform for scalable and energy-efficient ternary ADC design, contributing to the advancement of atomic-scale nanoelectronic devices.</p>","PeriodicalId":50386,"journal":{"name":"Iet Circuits Devices & Systems","volume":"2026 1","pages":""},"PeriodicalIF":1.8,"publicationDate":"2026-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1049/cds2/7817923","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148381041","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Zohreh Roustaie, Melina Kehtarmanesh, Ali Asghar Orouji
{"title":"Modified Effective Carrier Density in SOI-MESFET With an Asymmetric Dielectric Trapdoor","authors":"Zohreh Roustaie, Melina Kehtarmanesh, Ali Asghar Orouji","doi":"10.1049/cds2/7890777","DOIUrl":"https://doi.org/10.1049/cds2/7890777","url":null,"abstract":"<p>In this paper, a new silicon-on-insulator-metal semiconductor field effect transistor (SOI-MESFET) is introduced with improved DC and RF characteristics compared to conventional SOI-MESFETs (C-SOI-MESFETs). The main idea in this paper is based on modifying the carrier density by using two dielectric pieces in the channel, which resembles an asymmetric dielectric trapdoor (ADT). We call the proposed structure an ADT-SOI-MESFET. The important frequency parameters of the proposed structure, such as cut-off frequency (<i>f</i><sub>T</sub>), maximum oscillation frequency (<i>f</i><sub>max</sub>), and maximum available gain (MAG) improved by 38.8%, 7.7%, and 11.7% in comparison with the C-SOI-MESFET, respectively. Also, the breakdown voltage and the minimum noise figure (<i>F</i><sub>min</sub>) are improved. The proposed structure is a good choice for high-voltage, high-power, and high-frequency applications.</p>","PeriodicalId":50386,"journal":{"name":"Iet Circuits Devices & Systems","volume":"2026 1","pages":""},"PeriodicalIF":1.8,"publicationDate":"2026-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1049/cds2/7890777","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148381040","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pedram Beyranvand, Behrouz Heidari, Ashkan Horri, Mohammad Bagher Tavakoli
{"title":"Design of Ternary Analog-to-Digital Converter Based on Graphene-MoS2 Heterostructure","authors":"Pedram Beyranvand, Behrouz Heidari, Ashkan Horri, Mohammad Bagher Tavakoli","doi":"10.1049/cds2/7817923","DOIUrl":"10.1049/cds2/7817923","url":null,"abstract":"<p>This paper presents a 2-bit ternary pipelined analog-to-digital converter (ADC) featuring nine quantization levels, implemented using a Dirac source field-effect transistor (DS-FET). The proposed DS-FET is based on graphene-MoS<sub>2</sub> heterostructure, that utilizes modulation of the graphene source’s density of states (DOSs) to generate intermediate electronic states. These states enable the realization of three discrete logic levels, which form the foundation of ternary logic operations. By precisely tuning the doping concentration within the graphene source region, the ternary quantizer can be achieved. By using a two-stage pipelined ADC and employing the quantizer in each stage, ternary ADC is implemented. Simulation results show a differential nonlinearity (DNL) ranging from −0.23 to 0.101 LSB and an integral nonlinearity (INL) between −0.09 and 0.1723 LSB, which satisfy the specifications for 2-bit resolution at an operating voltage of 1.2 V. The proposed design uses only 15 transistors, significantly fewer than the 48 transistors in comparable designs, demonstrating its suitability for VLSI applications. Moreover, the proposed ADC achieves a power-delay product (PDP) of 0.021 pJ, outperforming existing counterparts. The impact of process, temperature, and supply voltage variations on the proposed method is investigated, and their effects on ADC performance are analyzed. Overall, the results confirm that graphene-MoS<sub>2</sub> heterostructures offer a promising platform for scalable and energy-efficient ternary ADC design, contributing to the advancement of atomic-scale nanoelectronic devices.</p>","PeriodicalId":50386,"journal":{"name":"Iet Circuits Devices & Systems","volume":"2026 1","pages":""},"PeriodicalIF":1.8,"publicationDate":"2026-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1049/cds2/7817923","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148381038","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Zohreh Roustaie, Melina Kehtarmanesh, Ali Asghar Orouji
{"title":"Modified Effective Carrier Density in SOI-MESFET With an Asymmetric Dielectric Trapdoor","authors":"Zohreh Roustaie, Melina Kehtarmanesh, Ali Asghar Orouji","doi":"10.1049/cds2/7890777","DOIUrl":"10.1049/cds2/7890777","url":null,"abstract":"<p>In this paper, a new silicon-on-insulator-metal semiconductor field effect transistor (SOI-MESFET) is introduced with improved DC and RF characteristics compared to conventional SOI-MESFETs (C-SOI-MESFETs). The main idea in this paper is based on modifying the carrier density by using two dielectric pieces in the channel, which resembles an asymmetric dielectric trapdoor (ADT). We call the proposed structure an ADT-SOI-MESFET. The important frequency parameters of the proposed structure, such as cut-off frequency (<i>f</i><sub>T</sub>), maximum oscillation frequency (<i>f</i><sub>max</sub>), and maximum available gain (MAG) improved by 38.8%, 7.7%, and 11.7% in comparison with the C-SOI-MESFET, respectively. Also, the breakdown voltage and the minimum noise figure (<i>F</i><sub>min</sub>) are improved. The proposed structure is a good choice for high-voltage, high-power, and high-frequency applications.</p>","PeriodicalId":50386,"journal":{"name":"Iet Circuits Devices & Systems","volume":"2026 1","pages":""},"PeriodicalIF":1.8,"publicationDate":"2026-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1049/cds2/7890777","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148381039","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"A Comprehensive Review of Fundamental DC/DC Converters: Performance Analysis, Design Considerations, and Applications","authors":"Elias Shokati-Asl, Shanli Samienezhad","doi":"10.1049/cds2/9964230","DOIUrl":"https://doi.org/10.1049/cds2/9964230","url":null,"abstract":"<p>Nonisolated direct current (DC)–DC converters serve as critical building blocks in modern power management systems. The choice of the optimal topology among numerous options has a direct impact on the efficiency, size, and final cost of the system. This study presents a comprehensive and critical comparative analysis of five fundamental topologies—buck, boost, buck–boost, Ćuk, and SEPIC—in order to provide a clear framework for their selection based on application requirements. The analysis covers the performance of converters in both continuous conduction mode (CCM) and discontinuous conduction mode (DCM). The evaluation is carried out based on a set of key performance indicators, including critical inductance, output voltage ripple (OVR), voltage and current stresses on switches and diodes, and the continuity nature of input/output current. The results highlight inherent trade-offs among key design parameters of different converter topologies; specifically, fourth-order converters, such as Ćuk and SEPIC, exhibit higher switch voltage stress than buck converters for the same voltage gain, indicating a compromise between improved ripple performance and increased component ratings. Ultimately, this study leads to the presentation of a topology selection guide that enables design engineers to consciously choose the most optimal converter according to specific application requirements, such as the need for low input current ripple or structural simplicity. This work serves as a practical and unified reference for power electronics system designers.</p>","PeriodicalId":50386,"journal":{"name":"Iet Circuits Devices & Systems","volume":"2026 1","pages":""},"PeriodicalIF":1.8,"publicationDate":"2026-06-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1049/cds2/9964230","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148381180","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Mitigating Gate Resistance in 180 nm CMOS High-Frequency LC-VCOs: Enhanced Performance and Simulation-Model Validation","authors":"Bhanu Teja Pula, Rizwan Shaik Peerla, Arindam Mal, Bibhu Datta Sahoo","doi":"10.1049/cds2/5399291","DOIUrl":"10.1049/cds2/5399291","url":null,"abstract":"<p>This article presents a detailed analysis of the impact of gate resistance in the inductor-capacitor (LC)-voltage-controlled oscillator (VCO) core. A design guideline centered on the multifinger MOSFET in higher technology nodes (≥90 nm) is proposed to improve the swing and phase noise (PN) of the VCO. As proof of concept, a high-frequency LC-VCO operating from 6.8 to 8.2 GHz using a 5-bit binary-weighted switched capacitor control is realized in UMC 180 nm CMOS. A PN of −108.64 dBc/Hz is achieved at 1 MHz offset for the 7.2 GHz band. The VCO has a tuning range (TR) of 18.66% and a figure-of-merit (FoM) of 177.5 dB, consuming 6.7 mW of power when operating from a 1.8 V supply and occupying a 0.2 mm<sup>2</sup> area.</p>","PeriodicalId":50386,"journal":{"name":"Iet Circuits Devices & Systems","volume":"2026 1","pages":""},"PeriodicalIF":1.8,"publicationDate":"2026-06-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1049/cds2/5399291","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148381177","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}