IEEE Transactions on Device and Materials Reliability最新文献

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2024 Index IEEE Transactions on Device and Materials Reliability Vol. 24 器件与材料可靠性学报,第24卷
IF 2.5 3区 工程技术
IEEE Transactions on Device and Materials Reliability Pub Date : 2025-01-14 DOI: 10.1109/TDMR.2025.3528093
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引用次数: 0
TechRxiv: Share Your Preprint Research with the World! techxiv:与世界分享你的预印本研究!
IF 2.5 3区 工程技术
IEEE Transactions on Device and Materials Reliability Pub Date : 2024-12-23 DOI: 10.1109/TDMR.2024.3520737
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引用次数: 0
IEEE Transactions on Device and Materials Reliability Publication Information IEEE器件与材料可靠性学报
IF 2.5 3区 工程技术
IEEE Transactions on Device and Materials Reliability Pub Date : 2024-12-23 DOI: 10.1109/TDMR.2024.3516717
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引用次数: 0
TDMR December 2024 Editorial TDMR 2024年12月社论
IF 2.5 3区 工程技术
IEEE Transactions on Device and Materials Reliability Pub Date : 2024-12-23 DOI: 10.1109/TDMR.2024.3508312
Edmundo Gutierrez
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引用次数: 0
IEEE Transactions on Device and Materials Reliability Information for Authors IEEE器件与材料可靠性信息学报
IF 2.5 3区 工程技术
IEEE Transactions on Device and Materials Reliability Pub Date : 2024-12-23 DOI: 10.1109/TDMR.2024.3516718
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引用次数: 0
Blank Page 空白页
IF 2.5 3区 工程技术
IEEE Transactions on Device and Materials Reliability Pub Date : 2024-12-23 DOI: 10.1109/TDMR.2024.3516719
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引用次数: 0
Editorial on EOS EOS评论
IF 2.5 3区 工程技术
IEEE Transactions on Device and Materials Reliability Pub Date : 2024-12-23 DOI: 10.1109/TDMR.2024.3507412
Ming-Dou Ker
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引用次数: 0
Call for Nominations for Editor-in-Chief 征集总编辑提名
IF 2.5 3区 工程技术
IEEE Transactions on Device and Materials Reliability Pub Date : 2024-12-23 DOI: 10.1109/TDMR.2024.3513737
{"title":"Call for Nominations for Editor-in-Chief","authors":"","doi":"10.1109/TDMR.2024.3513737","DOIUrl":"https://doi.org/10.1109/TDMR.2024.3513737","url":null,"abstract":"","PeriodicalId":448,"journal":{"name":"IEEE Transactions on Device and Materials Reliability","volume":"24 4","pages":"663-663"},"PeriodicalIF":2.5,"publicationDate":"2024-12-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10812200","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142875145","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Radiation Hardened Domino Logic-Based Schmitt Trigger Circuit With Improved Noise Immunity 基于增强抗噪性的抗辐射Domino逻辑Schmitt触发电路
IF 2.5 3区 工程技术
IEEE Transactions on Device and Materials Reliability Pub Date : 2024-11-12 DOI: 10.1109/TDMR.2024.3496821
Aryan Kannaujiya;Shubham Singh;Ambika Prasad Shah;Daniele Rossi
{"title":"Radiation Hardened Domino Logic-Based Schmitt Trigger Circuit With Improved Noise Immunity","authors":"Aryan Kannaujiya;Shubham Singh;Ambika Prasad Shah;Daniele Rossi","doi":"10.1109/TDMR.2024.3496821","DOIUrl":"https://doi.org/10.1109/TDMR.2024.3496821","url":null,"abstract":"This work presents enhanced hysteresis width for noise-immune radiation-hardened Schmitt trigger circuits. A dual-mode Domino-based Schmitt trigger (DST) circuit is employed for dual purposes owing to the inclusion of a control module that functions as both a domino logic and a Schmitt trigger circuit. For various ST circuits, key performance metrics including hysteresis width, power consumption, latency, process variation, and critical charge at sensitive nodes are determined. The findings demonstrate that, in comparison to other reference circuits, the DST has improved performance metrics. The proposed DST has \u0000<inline-formula> <tex-math>$3.89times $ </tex-math></inline-formula>\u0000, \u0000<inline-formula> <tex-math>$1.58times $ </tex-math></inline-formula>\u0000, and \u0000<inline-formula> <tex-math>$1.03times $ </tex-math></inline-formula>\u0000 lower dynamic power, leakage power, and propagation delay, respectively in comparison to conventional ST. The hysteresis width of DST is \u0000<inline-formula> <tex-math>$1.32times $ </tex-math></inline-formula>\u0000 higher than conventional ST which makes it more practical for a noisy environment. All the simulation work has been handled by the Cadence virtuoso tool using UMC 40nm technology.","PeriodicalId":448,"journal":{"name":"IEEE Transactions on Device and Materials Reliability","volume":"24 4","pages":"602-609"},"PeriodicalIF":2.5,"publicationDate":"2024-11-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142875148","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Trap Location and Stress Degradation Analysis of GaN High Electron Mobility Transistors Based on the Transient Current Method 基于瞬态电流法的氮化镓高电子迁移率晶体管陷阱定位与应力退化分析
IF 2.5 3区 工程技术
IEEE Transactions on Device and Materials Reliability Pub Date : 2024-11-11 DOI: 10.1109/TDMR.2024.3495987
Qian Wen;Lixing Zhou;Xianwei Meng;Shiwei Feng;Yamin Zhang
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引用次数: 0
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