27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium最新文献

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Achieving higher margins by solving the mobile flash test challenge 通过解决移动flash测试挑战获得更高的利润
27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium Pub Date : 2002-11-07 DOI: 10.1109/IEMT.2002.1032789
T. Trexler
{"title":"Achieving higher margins by solving the mobile flash test challenge","authors":"T. Trexler","doi":"10.1109/IEMT.2002.1032789","DOIUrl":"https://doi.org/10.1109/IEMT.2002.1032789","url":null,"abstract":"Manufacturers of flash memory are just beginning to realize the challenges that come with testing these devices. Given the low output current of sub-2 V devices, a significant issue is their limited ability to drive a capacitive load created by the test environment itself-due to high impedance. When it comes to speed test, the result can be that the test equipment characterizes the device as performing more slowly than it actually will perform in the application environment. A more accurate test method for low-power flash memory can be achieved by placing a unity gain follower circuit (buffer) as close to possible to the device under test, the capacitive load of the test environment can be all but eliminated from what the device sees and has to drive. This allows the device to be tested as it will eventually be used in the target application, giving a more accurate reading of the device's true capability, thus producing better yield and profitability.","PeriodicalId":340284,"journal":{"name":"27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium","volume":"47 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123431791","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A two-step process for achieving an open test-development environment 实现开放测试开发环境的两步过程
27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium Pub Date : 2002-11-07 DOI: 10.1109/IEMT.2002.1032788
H. Lam
{"title":"A two-step process for achieving an open test-development environment","authors":"H. Lam","doi":"10.1109/IEMT.2002.1032788","DOIUrl":"https://doi.org/10.1109/IEMT.2002.1032788","url":null,"abstract":"For many of today's most advanced ICs and system-on-chip (SoC) devices, test costs have risen to as much as 50% of the total manufacturing cost. A major component of test cost is the time and resources required for test-program development. There are time-proven methods and test-development tools - both in-house and commercial - for translating a semiconductor device's functional events and scan patterns (from EDA) into test programs for specific, targeted automated test equipment (ATE) platforms. However, in the face of increasing device complexity and new manufacturing requirements, methodologies and tool flows have begun to break down. This paper details the demands on test-development engineers that are created by today's complex semiconductor devices, and outlines the set of solutions necessary to help speed these devices to market. Finally, this paper identifies areas to which the industry needs to apply additional work and resources.","PeriodicalId":340284,"journal":{"name":"27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium","volume":"168 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130092484","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Ball shear versus ball pull test methods for evaluating interfacial failures in area array packages 评估区域阵列封装中界面失效的球剪切与球拉力试验方法
27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium Pub Date : 2002-11-07 DOI: 10.1109/IEMT.2002.1032754
R. Coyle, A. Serafino, P. Solan
{"title":"Ball shear versus ball pull test methods for evaluating interfacial failures in area array packages","authors":"R. Coyle, A. Serafino, P. Solan","doi":"10.1109/IEMT.2002.1032754","DOIUrl":"https://doi.org/10.1109/IEMT.2002.1032754","url":null,"abstract":"In this investigation, a ball pull (tensile) test is investigated as an alternative to the ball shear test for evaluating the solder joint integrity of area array packages. The relative effectiveness of the pull and shear methods is compared using BGA packages with documented susceptibility to brittle interfacial failure during accelerated temperature cycling tests or isothermal aging. Accelerated temperature cycling is used typically to measure long term solder joint attachment reliability in various use environments and isothermal aging is used to measure susceptibility to degradation following high temperature storage. The shear and pull tests are conducted on packages in the as received condition and after thermal preconditioning. Metallographic failure analysis and scanning electron microscopy with energy dispersive X-ray analyses are used to characterize the solder joints and fracture modes. The ball shear and ball pull results are compared and discussed in terms of the ability to predict susceptibility to interfacial failures in area array packages.","PeriodicalId":340284,"journal":{"name":"27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130819200","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 15
Optimizing wire bonding processes for maximum factory portability 优化焊线工艺,最大限度地提高工厂的可移植性
27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium Pub Date : 2002-11-07 DOI: 10.1109/IEMT.2002.1032774
G. Gillotti, R. Cathcart
{"title":"Optimizing wire bonding processes for maximum factory portability","authors":"G. Gillotti, R. Cathcart","doi":"10.1109/IEMT.2002.1032774","DOIUrl":"https://doi.org/10.1109/IEMT.2002.1032774","url":null,"abstract":"In today's market of finer pitch high-end semiconductor devices, wire bonder set-up time could become too long and expensive without factory specific tools and processes. Reducing set-up time reduces cost and increases efficiency by allowing higher machine utilization. One of the keys to improving machine set-up time is bonder-to-bonder portability. To meet this challenge, wire-bonding equipment is designed and tested for factory interface and process portability. This paper discusses the critical areas of wire bonder equipment and process recipe development that lead to better utilization of factory resources by creating more portable processes. The use of so-called machine \"personality\" parameters and the effect of capillary and wire dimensional tolerances are also discussed.","PeriodicalId":340284,"journal":{"name":"27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium","volume":"17 4","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132934630","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Improving yield, productivity, and quality in test assembly and packaging through direct part marking and unit level traceability 通过直接零件标记和单元级可追溯性,提高测试装配和包装的产量、生产率和质量
27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium Pub Date : 2002-11-07 DOI: 10.1109/IEMT.2002.1032743
J. Agapakis, L. Figarella
{"title":"Improving yield, productivity, and quality in test assembly and packaging through direct part marking and unit level traceability","authors":"J. Agapakis, L. Figarella","doi":"10.1109/IEMT.2002.1032743","DOIUrl":"https://doi.org/10.1109/IEMT.2002.1032743","url":null,"abstract":"Identifying and tracking individual devices throughout test, assembly and packaging using directly marked 2D data matrix symbols is a viable application and the basis of several SEMI traceability standards. Recently, it has been utilized more extensively in high-volume manufacturing. Advancements such as package-less strip designs make traceability challenges more acute and lead to the development of new methodologies for assembly and test, such as strip testing and mapping. In these applications, 2D symbology marked on lead frames, strips or individual devices provides unit level traceability, prevents mixed lots, and allows defect tracking - ultimately improving yield, productivity and quality. This paper highlights the basic advantages of directly marked 2D data matrix symbols versus conventional 1D bar codes. It describes representative traceability applications in test, assembly and packaging, and the benefits derived from implementation in each business case. A system-level methodology for implementing unit level traceability is presented, including the four basic elements: symbol marking, mark verification, symbol reading and communication of results. Finally, recognizing that a variety of options are often required for effective implementation and integration in a production line, it addresses alternative reading and verification systems ranging from board-level products to intelligent cameras and hand-held readers.","PeriodicalId":340284,"journal":{"name":"27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134485487","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Chip-in-polymer: volumetric packaging solution using PCB technology 聚合物芯片:采用PCB技术的体积封装解决方案
27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium Pub Date : 2002-11-07 DOI: 10.1109/IEMT.2002.1032721
E. Jung, D. Wojakowski, A. Neumann, C. Landesberger, A. Ostmann, R. Aschenbrenner, H. Reichl
{"title":"Chip-in-polymer: volumetric packaging solution using PCB technology","authors":"E. Jung, D. Wojakowski, A. Neumann, C. Landesberger, A. Ostmann, R. Aschenbrenner, H. Reichl","doi":"10.1109/IEMT.2002.1032721","DOIUrl":"https://doi.org/10.1109/IEMT.2002.1032721","url":null,"abstract":"The new challenge is to incorporate not only passive components, but as well active circuitry (ICs) and the necessary thermal management. Ultra thin chips (i.e. silicon dies thinned down to <50/spl mu/m total thickness) lend themselves to reach these goals. Chips with that thickness can be embedded in the dielectric layers of modern laminate PCBs. Micro via technology allows one to contact the embedded chip to the outer faces of the system circuitry. As an ultimate goal for microsystem. integration, the embedding of optical and fluidic system components can be envisioned. This paper presents the first attempts to embed thin silicon dies in to polymeric system carriers. The aspects of embedding and making the electrical contact as well as the thermal management are highlighted. To reach the goal of a vertically stackable \"box-of-bricks\" type of ultra thin (UT) package, thin silicon chips are embedded and interconnected on a peripheral UT BGA utilizing low cost technologies derived from the PCB manufacturing industry.","PeriodicalId":340284,"journal":{"name":"27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115232952","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 10
Flux technology for lead-free alloys and its impact on cleaning 无铅合金焊剂技术及其对清洗的影响
27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium Pub Date : 2002-11-07 DOI: 10.1109/IEMT.2002.1032772
N. Lee, M. Bixenman
{"title":"Flux technology for lead-free alloys and its impact on cleaning","authors":"N. Lee, M. Bixenman","doi":"10.1109/IEMT.2002.1032772","DOIUrl":"https://doi.org/10.1109/IEMT.2002.1032772","url":null,"abstract":"Flux technology for lead-free alloys differs considerably from that for eutectic Sn/Pb solder systems, mainly for soldering and cleaning purpose. For most of the lead-free solders, paste handling is not an issue. Although dust has not settled yet, it becomes clear that the flux needed should have higher flux capacity, higher oxygen barrier capability, and higher thermal stability. Halide-containing fluxes may prevail, due to the high flux efficiency per unit flux volume. The oxygen barrier capability can be reduced if an inert reflow atmosphere is available. RMA flux, no-clean flux with high solid content, and water washable systems exhibit a greater prospect to be upgraded for lead-free applications. For 58Bi/42Sn solder, flux with low activation temperature is needed. For Sn/Zn/Bi solders, the demand on flux capacity and oxygen barrier capability is even greater than other lead-free solder systems. In addition, the fluxes should be stable enough to retard the reaction with Zn. Cleaning flux residue of lead-free solder pastes is more challenging than that of Sn/Pb systems. The cleanability decreases from no-clean soft-residue fluxes to water washable fluxes to no-clean hard residue fluxes. Improvement in cleanability may link to improvement in thermal stability of fluxes.","PeriodicalId":340284,"journal":{"name":"27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium","volume":"15 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122651972","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
PATCHWORK smart power thick-film hybrids for automotive under hood applications 用于汽车引擎盖下应用的PATCHWORK智能功率厚膜混合动力车
27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium Pub Date : 2002-11-07 DOI: 10.1109/IEMT.2002.1032719
P.K. Wilczek
{"title":"PATCHWORK smart power thick-film hybrids for automotive under hood applications","authors":"P.K. Wilczek","doi":"10.1109/IEMT.2002.1032719","DOIUrl":"https://doi.org/10.1109/IEMT.2002.1032719","url":null,"abstract":"PATCHWORK provides a high degree of integration combining logic and power on one ceramic substrate to respond to customer-specific circuits with acceptable engineering costs and short periods of development. The hybrids are reliable and high-temperature resistant and can be manufactured at a fair market price. The introduction of PATCHWORK combines Ag/Pd/Pt, copper and gold conductors, high temperature solder, window framing design and efficient thermal properties. With these advances in thick film technology many high volume opportunities are open in automotive applications.","PeriodicalId":340284,"journal":{"name":"27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122672352","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Investigation of 3-D embedded inductors using Monte Carlo analysis 三维嵌入式电感的蒙特卡罗分析研究
27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium Pub Date : 2002-11-07 DOI: 10.1109/IEMT.2002.1032764
Seogoo Lee, Jongseong Choi, G. S. May, I. Yun
{"title":"Investigation of 3-D embedded inductors using Monte Carlo analysis","authors":"Seogoo Lee, Jongseong Choi, G. S. May, I. Yun","doi":"10.1109/IEMT.2002.1032764","DOIUrl":"https://doi.org/10.1109/IEMT.2002.1032764","url":null,"abstract":"The statistical analysis of 3D solenoid inductors manufactured in a multilayer low-temperature cofired ceramic (LTCC) process is presented. A set of integrated inductor structures is fabricated, and their scattering parameters are measured for a range of frequencies from 50 MHz to 5 GHz. Using optimized equivalent circuits obtained from HSPICE, mean and absolute deviation is calculated for each component of each device model. Monte Carlo analysis for the inductor structures is then performed using HSPICE. Using a comparison of the Monte Carlo results and measured data, it is determined that for even a small number of sample structures, the statistical variation of the component values provides an accurate representation of the overall inductor performance.","PeriodicalId":340284,"journal":{"name":"27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium","volume":"3 9","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"120901644","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Silicon thinning and stacked packages 硅变薄和堆叠封装
27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium Pub Date : 2002-11-07 DOI: 10.1109/IEMT.2002.1032722
D. New
{"title":"Silicon thinning and stacked packages","authors":"D. New","doi":"10.1109/IEMT.2002.1032722","DOIUrl":"https://doi.org/10.1109/IEMT.2002.1032722","url":null,"abstract":"The market demand of mobile electronic appliances is for smaller, lightweight physical characteristics with greater functionality. This demand contributes to advances in packaging technology that require semiconductor devices to be thinner to meet size and high thermal reliability constraints. Even though the active layer of most devices amounts for only 5-10 microns (with some devices needing about 20 microns to assure functionality of the device), the current thickness for new technologies such as ICs for smart card applications are around 150 microns. Based on current developments, the thickness of thinned wafers will start to approach 50 microns in the next couple of years. Therefore, it is not surprising that silicon thinning and stress relief have become important issues in the backend and assembly areas of semiconductor component manufacturers. Disco Corporation are developing new processes and pursuing industry initiatives to provide solutions to address these issues.","PeriodicalId":340284,"journal":{"name":"27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium","volume":"78 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116481652","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
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