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IEEE/LEOS International Conference on Optical MEMs最新文献

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Design for reliability of high voltage, high density interconnects for MOEMS mirror drive electrodes 为MOEMS镜像驱动电极设计高电压、高密度互连的可靠性
IEEE/LEOS International Conference on Optical MEMs Pub Date : 2002-11-07 DOI: 10.1109/OMEMS.2002.1031423
A. Jazairy, J.H. Smith, S. Nasiri, J. Bryzek, A. Flannery, M. Novack, R. Sprague, D. Skurnik
{"title":"Design for reliability of high voltage, high density interconnects for MOEMS mirror drive electrodes","authors":"A. Jazairy, J.H. Smith, S. Nasiri, J. Bryzek, A. Flannery, M. Novack, R. Sprague, D. Skurnik","doi":"10.1109/OMEMS.2002.1031423","DOIUrl":"https://doi.org/10.1109/OMEMS.2002.1031423","url":null,"abstract":"Reports on the design of high density interconnects for direct-drive electrodes in a 1200 mirror array. We analyze reliability issues for this passive approach and demonstrate the promise of an active, integrated solution.","PeriodicalId":285115,"journal":{"name":"IEEE/LEOS International Conference on Optical MEMs","volume":"289 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122479529","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
MEMS applications of laser-induced ultra-shallow and ultraheavy boron-doping of silicon above the solid-solubility MEMS应用激光诱导超浅和超重硼掺杂以上硅的固溶性
IEEE/LEOS International Conference on Optical MEMs Pub Date : 2002-11-07 DOI: 10.1109/OMEMS.2002.1031477
G. Kerrien, K. Kakushima, T. Sarnet, J. Boulmer, D. Débarre, D. Bouchier, A. Bosseboeuf, T. Bourouina
{"title":"MEMS applications of laser-induced ultra-shallow and ultraheavy boron-doping of silicon above the solid-solubility","authors":"G. Kerrien, K. Kakushima, T. Sarnet, J. Boulmer, D. Débarre, D. Bouchier, A. Bosseboeuf, T. Bourouina","doi":"10.1109/OMEMS.2002.1031477","DOIUrl":"https://doi.org/10.1109/OMEMS.2002.1031477","url":null,"abstract":"We investigate applications of laser-induced boron-doping of silicon as a new technology which offers number of unique and very promising applications to MEMS: (i) it is proven that doping levels up to 3.10/sup 21/ at/cm/sup 3/ can be produced, that is 10 times more than the maximum levels, which are usually limited by the solid solubility 3-6.10/sup 20/ at/cm/sup 3/) in conventional techniques; (ii) the measured doping profiles have also shown boxlike junctions with depths down to 20 nm; (iii) the high doping levels show high selectivity to TMAH and KOH etching solutions; (iv) the high doping levels also lead to very high mechanical tensile stress up to 3 GPa. Among the impact of these reported data on future MEMS developments, one can propose for instance to take advantage of the very high mechanical stress to manufacture high frequency resonators. Such resonators are expected to have high quality factors as well, due to the crystalline nature of silicon.","PeriodicalId":285115,"journal":{"name":"IEEE/LEOS International Conference on Optical MEMs","volume":"67 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122017379","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
MEMS reflective type variable optical attenuator using off-axis misalignment 利用离轴失调的MEMS反射型可变光衰减器
IEEE/LEOS International Conference on Optical MEMs Pub Date : 2002-11-07 DOI: 10.1109/OMEMS.2002.1031440
Che-Heung Kim, N. Park, Yong-Kweon Kim
{"title":"MEMS reflective type variable optical attenuator using off-axis misalignment","authors":"Che-Heung Kim, N. Park, Yong-Kweon Kim","doi":"10.1109/OMEMS.2002.1031440","DOIUrl":"https://doi.org/10.1109/OMEMS.2002.1031440","url":null,"abstract":"This paper proposes a reflective type microelectromechanical system variable optical attenuator (MEMS VOA) which uses 45 degree tilted vertical movable mirror fabricated by a deep reactive ion etching (DRIE). The optical attenuation is generated by an optical axis offset controlled by the vertical mirror. Fibers are aligned passively on the vertical grooves which are formed at the same plane with the control actuator.","PeriodicalId":285115,"journal":{"name":"IEEE/LEOS International Conference on Optical MEMs","volume":"45 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128304033","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 34
Multidirectional asymmetrical microlens-array light control plastic films for high performance reflective liquid crystal displays 用于高性能反射液晶显示器的多向非对称微透镜阵列光控塑料薄膜
IEEE/LEOS International Conference on Optical MEMs Pub Date : 2002-11-07 DOI: 10.1109/OMEMS.2002.1031450
H. Shieh, Y. Chiu, Yi-Pai Huang, Fu‐Jen Ko
{"title":"Multidirectional asymmetrical microlens-array light control plastic films for high performance reflective liquid crystal displays","authors":"H. Shieh, Y. Chiu, Yi-Pai Huang, Fu‐Jen Ko","doi":"10.1109/OMEMS.2002.1031450","DOIUrl":"https://doi.org/10.1109/OMEMS.2002.1031450","url":null,"abstract":"Multidirectional asymmetrical microlens array light control films were developed to enhance image quality of reflective LCDs. Significant gain in both brightness and contrast ratio has been demonstrated without visible surface diffusion, Moire patterns and parallax.","PeriodicalId":285115,"journal":{"name":"IEEE/LEOS International Conference on Optical MEMs","volume":"53 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124223509","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Comparison of MEMS variable optical attenuator designs MEMS可变光衰减器设计的比较
IEEE/LEOS International Conference on Optical MEMs Pub Date : 2002-11-07 DOI: 10.1109/OMEMS.2002.1031505
C. Marxer, B. de Jong, N. de Rooif
{"title":"Comparison of MEMS variable optical attenuator designs","authors":"C. Marxer, B. de Jong, N. de Rooif","doi":"10.1109/OMEMS.2002.1031505","DOIUrl":"https://doi.org/10.1109/OMEMS.2002.1031505","url":null,"abstract":"Two micro electro mechanical systems (MEMS) - based electrical variable optical attenuator (eVOA) designs are discussed and compared with respect to polarization dependent loss (PDL) and wavelength dependent loss (WDL) characteristics. The first design is based on a shutter, whereas the second device works in reflection, where the movement of a mirror creates misalignment losses by steering the beam away from the core of the output fiber. The reflective-based design shows better PDL values typically below 0.1 dB at 10 dB attenuation. PDL values of the shutter-based design are 3.4 times higher, i.e. 0.5 dB around 10 dB. On the other hand the shutter design has less wavelength dependent loss.","PeriodicalId":285115,"journal":{"name":"IEEE/LEOS International Conference on Optical MEMs","volume":"89 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124229670","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 28
Single Si crystal 1024 ch MEMS mirror based on terraced electrodes and a high-aspect ratio torsion spring for 3-D cross-connect switch 基于阶梯电极和高纵横比扭力弹簧的单晶1024ch MEMS反射镜
IEEE/LEOS International Conference on Optical MEMs Pub Date : 2002-11-07 DOI: 10.1109/OMEMS.2002.1031419
R. Sawada, J. Yamaguchi, Eiji Higurashi, A. Shimizu, Tsuyoshi Yamamoto, Nohuyuki Takeuchi, Yuji Uenishi
{"title":"Single Si crystal 1024 ch MEMS mirror based on terraced electrodes and a high-aspect ratio torsion spring for 3-D cross-connect switch","authors":"R. Sawada, J. Yamaguchi, Eiji Higurashi, A. Shimizu, Tsuyoshi Yamamoto, Nohuyuki Takeuchi, Yuji Uenishi","doi":"10.1109/OMEMS.2002.1031419","DOIUrl":"https://doi.org/10.1109/OMEMS.2002.1031419","url":null,"abstract":"Packaged large scale 1024 ch (32/spl times/32) mirror array switch module is presented for an optical cross-connect utilizing two-axis mirrors for beam steering. Besides being small, only 170/spl times/130 mm in size, the mirror array features a highly stable switching characteristics because of a tough mirror support and high-aspect-ratio torsion spring, very small warpage of ten nanometer order, and low applied voltage.","PeriodicalId":285115,"journal":{"name":"IEEE/LEOS International Conference on Optical MEMs","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130905800","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 30
Tunable chromatic dispersion compensators using MEMS Gires-Tournois interferometers 利用MEMS光栅- tournois干涉仪的可调谐色散补偿器
IEEE/LEOS International Conference on Optical MEMs Pub Date : 2002-11-07 DOI: 10.1109/OMEMS.2002.1031502
K. Yu, O. Solgaard
{"title":"Tunable chromatic dispersion compensators using MEMS Gires-Tournois interferometers","authors":"K. Yu, O. Solgaard","doi":"10.1109/OMEMS.2002.1031502","DOIUrl":"https://doi.org/10.1109/OMEMS.2002.1031502","url":null,"abstract":"In this paper, we report on a FIR (finite impulse response) dispersion compensator made using optical MEMS (micro-electro-mechanical systems) technology. An array of micromirrors is used in a Gires-Tournois (GT) interferometer to obtain the desired dispersion value of the device. This type of device had earlier been shown to function as an optical WDM interleaver/deinterleaver. The proposed device has a periodic transfer function in the frequency domain with a well-defined free spectral range (FSR). Because of the large number of channels in dense WDM systems, periodic filters are advantageous to avoid the need for unique filters for each WDM channel.","PeriodicalId":285115,"journal":{"name":"IEEE/LEOS International Conference on Optical MEMs","volume":"88 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132447784","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 10
Optical characteristics of a micromachined VOA using successive partial transmission in a silicon optical leaker 在硅光泄漏器中使用连续部分传输的微机械VOA的光学特性
IEEE/LEOS International Conference on Optical MEMs Pub Date : 2002-11-07 DOI: 10.1109/OMEMS.2002.1031438
Sungsik Yun, Young Yun Kim, Ho Nam Kown, Won Hyo Kim, Jong Hyan Lee, Yeong-Gyu Lee, Sungcheon Jung
{"title":"Optical characteristics of a micromachined VOA using successive partial transmission in a silicon optical leaker","authors":"Sungsik Yun, Young Yun Kim, Ho Nam Kown, Won Hyo Kim, Jong Hyan Lee, Yeong-Gyu Lee, Sungcheon Jung","doi":"10.1109/OMEMS.2002.1031438","DOIUrl":"https://doi.org/10.1109/OMEMS.2002.1031438","url":null,"abstract":"Presents a new micromachined VOA with a wedge-shaped silicon optical leaker blocking and successively dissipating optical signal. This device features large attenuation range of -38 B, return loss of -40 dB and low cost owing to no troublesome sidewall metallization.","PeriodicalId":285115,"journal":{"name":"IEEE/LEOS International Conference on Optical MEMs","volume":"508 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131407367","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 11
Development of a multi-channel 2/spl times/2 optical switch 多通道2/ sp1倍/2光开关的研制
IEEE/LEOS International Conference on Optical MEMs Pub Date : 2002-11-07 DOI: 10.1109/OMEMS.2002.1031492
Y. Kato, T. Norimatsu, O. Imaki, T. Sasaki, K. Kondo, K. Mori
{"title":"Development of a multi-channel 2/spl times/2 optical switch","authors":"Y. Kato, T. Norimatsu, O. Imaki, T. Sasaki, K. Kondo, K. Mori","doi":"10.1109/OMEMS.2002.1031492","DOIUrl":"https://doi.org/10.1109/OMEMS.2002.1031492","url":null,"abstract":"There has been a rapid increase in the demand for small-scale optical switches (1/spl times/2, or 2/spl times/2) which are employed in OADM or protection systems. Although we have made a study of matrix switches (larger than 4/spl times/4) before, we are now engaged on a novel 2/spl times/2 optical switch that is suitable for expanding the number of channels. We have designed and fabricated four-channel 2/spl times/2 optical switch, in which mirrors and V-grooves are formed by anisotropically etching with one mask. The measured insertion loss was minimum of 1.1dB (through port) and 2.1 dB (reflected port) in the case of active fiber alignment.","PeriodicalId":285115,"journal":{"name":"IEEE/LEOS International Conference on Optical MEMs","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115489167","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Using extended BELST process in fabricating vertical comb actuator for optical application 应用扩展BELST工艺制造光学用垂直梳状驱动器
IEEE/LEOS International Conference on Optical MEMs Pub Date : 2002-11-07 DOI: 10.1109/OMEMS.2002.1031479
J. Hsieh, C. Chu, J. Tsai, Weileun Fng
{"title":"Using extended BELST process in fabricating vertical comb actuator for optical application","authors":"J. Hsieh, C. Chu, J. Tsai, Weileun Fng","doi":"10.1109/OMEMS.2002.1031479","DOIUrl":"https://doi.org/10.1109/OMEMS.2002.1031479","url":null,"abstract":"Angular motion plays a crucial role in optical applications such as switching and scanning. The angular motion is available using electrostatic actuation such as parallel plate, lateral comb, and vertical comb. Among them the vertical comb actuator (VCA) is regarded as the most promising approach to provide large angular motion. Recently, the High-Aspect-Ratio Micromachining (HARM) process has demonstrated its importance in offering even larger angular motion as well as extremely large stiffness microstructures. However, these approaches may suffer from alignment and bonding problems. An improved HARM process, the BELST (Boron Etch-stop assisted Lateral Silicon Etching), using a [111] silicon wafer is proposed in this study to fabricate a vertical comb drive actuator. Moreover, a large yet stiff mirror and a thin torsional spring are also available through this process within three masks. Thus the optical performance is improved and the driving voltage is reduced.","PeriodicalId":285115,"journal":{"name":"IEEE/LEOS International Conference on Optical MEMs","volume":"47 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123621210","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
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