{"title":"MEMS reflective type variable optical attenuator using off-axis misalignment","authors":"Che-Heung Kim, N. Park, Yong-Kweon Kim","doi":"10.1109/OMEMS.2002.1031440","DOIUrl":null,"url":null,"abstract":"This paper proposes a reflective type microelectromechanical system variable optical attenuator (MEMS VOA) which uses 45 degree tilted vertical movable mirror fabricated by a deep reactive ion etching (DRIE). The optical attenuation is generated by an optical axis offset controlled by the vertical mirror. Fibers are aligned passively on the vertical grooves which are formed at the same plane with the control actuator.","PeriodicalId":285115,"journal":{"name":"IEEE/LEOS International Conference on Optical MEMs","volume":"45 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"34","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/LEOS International Conference on Optical MEMs","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/OMEMS.2002.1031440","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 34
Abstract
This paper proposes a reflective type microelectromechanical system variable optical attenuator (MEMS VOA) which uses 45 degree tilted vertical movable mirror fabricated by a deep reactive ion etching (DRIE). The optical attenuation is generated by an optical axis offset controlled by the vertical mirror. Fibers are aligned passively on the vertical grooves which are formed at the same plane with the control actuator.