Sungsik Yun, Young Yun Kim, Ho Nam Kown, Won Hyo Kim, Jong Hyan Lee, Yeong-Gyu Lee, Sungcheon Jung
{"title":"在硅光泄漏器中使用连续部分传输的微机械VOA的光学特性","authors":"Sungsik Yun, Young Yun Kim, Ho Nam Kown, Won Hyo Kim, Jong Hyan Lee, Yeong-Gyu Lee, Sungcheon Jung","doi":"10.1109/OMEMS.2002.1031438","DOIUrl":null,"url":null,"abstract":"Presents a new micromachined VOA with a wedge-shaped silicon optical leaker blocking and successively dissipating optical signal. This device features large attenuation range of -38 B, return loss of -40 dB and low cost owing to no troublesome sidewall metallization.","PeriodicalId":285115,"journal":{"name":"IEEE/LEOS International Conference on Optical MEMs","volume":"508 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"11","resultStr":"{\"title\":\"Optical characteristics of a micromachined VOA using successive partial transmission in a silicon optical leaker\",\"authors\":\"Sungsik Yun, Young Yun Kim, Ho Nam Kown, Won Hyo Kim, Jong Hyan Lee, Yeong-Gyu Lee, Sungcheon Jung\",\"doi\":\"10.1109/OMEMS.2002.1031438\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Presents a new micromachined VOA with a wedge-shaped silicon optical leaker blocking and successively dissipating optical signal. This device features large attenuation range of -38 B, return loss of -40 dB and low cost owing to no troublesome sidewall metallization.\",\"PeriodicalId\":285115,\"journal\":{\"name\":\"IEEE/LEOS International Conference on Optical MEMs\",\"volume\":\"508 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-11-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"11\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE/LEOS International Conference on Optical MEMs\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/OMEMS.2002.1031438\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/LEOS International Conference on Optical MEMs","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/OMEMS.2002.1031438","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Optical characteristics of a micromachined VOA using successive partial transmission in a silicon optical leaker
Presents a new micromachined VOA with a wedge-shaped silicon optical leaker blocking and successively dissipating optical signal. This device features large attenuation range of -38 B, return loss of -40 dB and low cost owing to no troublesome sidewall metallization.