2019 3rd International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech)最新文献_第4页

Two Stream Deep Convolutional Neural Network for Eye State Recognition and Blink Detection 基于双流深度卷积神经网络的眼睛状态识别与眨眼检测

2019 3rd International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech) Pub Date : 2019-08-01 DOI: 10.1109/IEMENTech48150.2019.8981102

Ritabrata Sanyal, K. Chakrabarty

{"title":"Two Stream Deep Convolutional Neural Network for Eye State Recognition and Blink Detection","authors":"Ritabrata Sanyal, K. Chakrabarty","doi":"10.1109/IEMENTech48150.2019.8981102","DOIUrl":"https://doi.org/10.1109/IEMENTech48150.2019.8981102","url":null,"abstract":"Eye state recognition and blink detection has been an important research problem in various fields like driver fatigue and drowsiness measurement, dry eye detection, video spoofing detection, psychological status analysis and many others. Hence an automated eye state classification and blink detection algorithm which is robust to a variety of conditions is required for this purpose. To this end, we propose a novel approach towards detection of eye blinks from a video stream by classifying the eye state of every frame as open or closed. First the eyes are localized from a frame with robust state-of-the-art facial landmark detectors. Then binary masks of the eyes are computed to capture and focus on how much the eyes are open. We propose a novel two stream convolutional neural network model which is jointly trained with the extracted eye patches, their masks as inputs and the corresponding eye state as output. With the eye state predicted by our network for every frame, we model a Finite State Machine to check for blinks by comparing number of consecutive frames with eyes closed against average human blink duration. Extensive experimentation has been done on a various number of popular benchmark datasets both for eye state classification and blink detection. Our proposed eye state classifier achieves a 3.2% and 3.86% improvement over the state-of-the-art in terms of accuracy and equal error rate (EER). The blink detector achieves a 1–2 % improvement over the state-of-the-art in terms of precision and recall. Hence our algorithm outperforms the existing methods for eye state classification and blink detection to the best of our knowledge.","PeriodicalId":243805,"journal":{"name":"2019 3rd International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech)","volume":"82 3","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"120858684","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 12

Design of Low Power circuit with CMOS Logic using adiabatic technique 用绝热技术设计低功耗CMOS逻辑电路

2019 3rd International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech) Pub Date : 2019-08-01 DOI: 10.1109/IEMENTech48150.2019.8981316

Saurav Dixit, R. Khatri, D. Mishra

引用次数: 0

FPGA Based Advance Parking Lot System 基于FPGA的高级停车场系统

2019 3rd International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech) Pub Date : 2019-08-01 DOI: 10.1109/IEMENTech48150.2019.8981086

Parul Vamney, D. K. Mishra, R. Khatri

引用次数: 0

Design of FPGA based phase reconfiguration technique 基于FPGA的相位重构技术设计

2019 3rd International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech) Pub Date : 2019-08-01 DOI: 10.1109/IEMENTech48150.2019.8981037

Atiya Usmani, Eram Taslima, S. Khan

引用次数: 1

2019 3rd International Conference on Electronics, Materials Engineering & Nano-Technology 2019第三届电子、材料工程与纳米技术国际会议

2019 3rd International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech) Pub Date : 2019-08-01 DOI: 10.1109/iementech48150.2019.8981003

引用次数: 0

Suppression of Higher Order modes in Wearable Microstrip Antenna using Tuning fork shaped Resonator for Integration in WBAN 利用音叉谐振器抑制可穿戴微带天线的高阶模态

2019 3rd International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech) Pub Date : 2019-08-01 DOI: 10.1109/IEMENTech48150.2019.8981396

Srijita Chakraborty, Mrinmoy Chakraborty, N. Pathak

引用次数: 0

Free Space Optic communication using Optical AM, OOK-NRZ and OOK-RZ Modulation Techniques 利用光调幅、OOK-NRZ和OOK-RZ调制技术的自由空间光通信

2019 3rd International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech) Pub Date : 2019-08-01 DOI: 10.1109/IEMENTech48150.2019.8981373

Sagupha Parween, A. Tripathy

引用次数: 3

[Copyright notice] (版权)

2019 3rd International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech) Pub Date : 2019-08-01 DOI: 10.1109/iementech48150.2019.8981201

引用次数: 0

Dependence of Threshold Voltage Shift on Material Composition for Si-Sir-Ge» Heterostructure p-MOSFET si - si - ge»异质结构p-MOSFET中阈值电压漂移对材料组成的影响

2019 3rd International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech) Pub Date : 2019-08-01 DOI: 10.1109/IEMENTech48150.2019.8981047

S. Mukhopadhyay, P. Halder, A. Deyasi

引用次数: 0

Comparative Study of Sextupole and Quadrupole Magnetic Field in an ECR-PE Sputtering System ECR-PE溅射系统中六极与四极磁场的比较研究

2019 3rd International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech) Pub Date : 2019-08-01 DOI: 10.1109/IEMENTech48150.2019.8981042

S. Mukherjee, Shubham Majee, Suman Kundu, S. Kundu, S. Karmakar, G. S. Taki

{"title":"Comparative Study of Sextupole and Quadrupole Magnetic Field in an ECR-PE Sputtering System","authors":"S. Mukherjee, Shubham Majee, Suman Kundu, S. Kundu, S. Karmakar, G. S. Taki","doi":"10.1109/IEMENTech48150.2019.8981042","DOIUrl":"https://doi.org/10.1109/IEMENTech48150.2019.8981042","url":null,"abstract":"In the era of nanotechnology, VLSI industry employs various deposition methods and techniques to develop various sensors & devices, utilized in numerous applications. The commonly used deposition methods e.g., ALD, MBE, Vacuum Evaporation, CVD, PLD, Sputtering etc. are mostly dedicated for specific sets of deposition. Some of the methods are even extremely sophisticated, expensive or lack precision. Electron Cyclotron Resonance Plasma Enhanced (ECR-PE) multipurpose nano-film deposition system is one such unique apparatus that is in-house designed & developed to deposit high quality thin films of various metals and non-metals. Both, Plasma Enhanced Chemical Vapour Deposition (PE-CVD) arrangement and Sputter deposition arrangement is designed in the same plasma reactor considering permanent magnets. Although, the PE-CVD setup is already developed and made operational using a permanent magnet return yoke structure, the fabrication of the sputtering setup is yet to be carried out for its accommodation in the system. In this study, two annular permanent magnet assembly consisting of six (sextupole) and four (quadrupole) dipole magnets have been designed and simulated to study magnetic field distribution inside reactor for the sputter deposition arrangement.","PeriodicalId":243805,"journal":{"name":"2019 3rd International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech)","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117189364","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0