Thin Solid Films最新文献_第6页

Si-decorated photoanodes for dye sensitised solar cells 染料敏化太阳能电池用硅修饰光阳极

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-03-08 DOI: 10.1016/j.tsf.2025.140652

E.V. Tekshina , A.S. Steparuk , R.A. Irgashev , V.Y. Nesterov , D.V. Shuleiko , M.A. Teplonogova , D.A. Krupanova , V.V. Emets , V.N. Andreev , V.A. Grinberg , S.A. Kozyukhin

{"title":"Si-decorated photoanodes for dye sensitised solar cells","authors":"E.V. Tekshina , A.S. Steparuk , R.A. Irgashev , V.Y. Nesterov , D.V. Shuleiko , M.A. Teplonogova , D.A. Krupanova , V.V. Emets , V.N. Andreev , V.A. Grinberg , S.A. Kozyukhin","doi":"10.1016/j.tsf.2025.140652","DOIUrl":"10.1016/j.tsf.2025.140652","url":null,"abstract":"<div><div>In this work, modification of nanocrystalline TiO<sub>2</sub> photoanodes consisting of 20 nm diameter spheres for dye-sensitized solar cells (DSSCs), by introducing silicon nanoparticles (Si-NPs) of different sizes, larger than TiO<sub>2</sub> particles, obtained by two different pulsed laser technologies: mesoporous silicon ablation and micron-sized silicon powder fragmentation was studied. The distribution of various types of particles in the functional layer of the photoanode was obtained using scanning electron microscopy and energy-dispersive X-ray analysis. The effect of Si-NP size on photovoltaic properties was demonstrated. Dye-sensitized photoanodes modified with mezo Si-NPs demonstrated 17 % increase in short-circuit current (<em>j<sub>sc</sub></em>) and increased energy conversion efficiency due to reduced electron recombination and improved charge collection compared to unmodified TiO<sub>2</sub>. Thus, the obtained results on modification of the surface of TiO<sub>2</sub> photoanodes with Si-NPs have potential for improving the efficiency and stability of DSSCs.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"817 ","pages":"Article 140652"},"PeriodicalIF":2.0,"publicationDate":"2025-03-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143643098","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

OPPROMUS: A software tool to analyze optical properties of flat multilayer systems with arbitrarily shaped nanoscale inclusions OPPROMUS：用于分析具有任意形状纳米级夹杂物的平面多层体系光学特性的软件工具

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-03-08 DOI: 10.1016/j.tsf.2025.140649

Roman Petrus, Niklas Nilius

{"title":"OPPROMUS: A software tool to analyze optical properties of flat multilayer systems with arbitrarily shaped nanoscale inclusions","authors":"Roman Petrus, Niklas Nilius","doi":"10.1016/j.tsf.2025.140649","DOIUrl":"10.1016/j.tsf.2025.140649","url":null,"abstract":"<div><div>This article presents a simulation program to conveniently analyze optical transmission, reflection and absorption spectra. It enables the visualization of large optical datasets, the calculation of optical spectra of complex multilayer systems and the iterative optimization of such systems to adapt their properties to measured optical data. The mathematical framework is based on the transfer-matrix method combined with the Maxwell-Garnett and Bruggeman formalisms for structurally inhomogeneous samples. The quality of the simulations is evaluated by the root-mean square error, that can be systematically minimized by adapting the properties of the model, for instance the number/thickness of optical layers and the geometry/filling factor of the inclusions.</div><div>The capabilities of the software are demonstrated at the example of a large optical dataset acquired during Cu oxidation at a well-defined temperature and oxygen pressure. The reaction is monitored in situ by recording transmission spectra of the thin-film sample with high time resolution. As the oxidization proceeds, the transmittance increases first, as metallic Cu transforms to dielectric Cu<sub>2</sub>O with 2.15 eV band gap, but then decreases again due to deeper oxidation to CuO (gap size 1.35 eV). The resulting transmission spectra are relatively complex, as Cu oxidation does not follow a layer-by-layer scheme but proceeds along grain boundaries in the initial film. The software still enables excellent modelling of the experimental data, thus providing unique insights into the mechanisms of Cu oxidation. In general, our simulation program opens versatile pathways to study time-dependent processes that systematically alter the optical response of samples, e.g. deposition and growth phenomena, chemical reactions and magnetic reorganizations.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"816 ","pages":"Article 140649"},"PeriodicalIF":2.0,"publicationDate":"2025-03-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143631863","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Improving the wear resistance and scratch adhesion strength of TiAlN coatings via Al incorporation 通过Al的掺入提高TiAlN涂层的耐磨性和划伤附着力

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-03-08 DOI: 10.1016/j.tsf.2025.140650

Rumana Akhter , Avi Bendavid , Paul Munroe

{"title":"Improving the wear resistance and scratch adhesion strength of TiAlN coatings via Al incorporation","authors":"Rumana Akhter , Avi Bendavid , Paul Munroe","doi":"10.1016/j.tsf.2025.140650","DOIUrl":"10.1016/j.tsf.2025.140650","url":null,"abstract":"<div><div>The inclusion of Al into the binary TiN crystal structure may impose a significant influence on the tribological properties of titanium aluminium nitride (TiAlN) coatings. In this study, a suite of TiAlN coatings, with different Al concentrations, were deposited onto tool steel substrates through variation in the composition of the Ti-Al cathode using the cathodic arc evaporation process. The primary objective of this investigation was to explore the wear and scratch response of TiAlN coatings, in particular, the underlying deformation mechanisms of these coatings under cyclical or progressive loading. The maximum nanohardness (∼ 34.5 GPa) was realised in the film containing the lowest Al concentration (∼ 20 at. %), which was attributed to Hall-Petch effects, as well as the effects of solid solution hardening. The wear resistance of these coatings exhibits an inverse relationship with the Al content and was noted to be consistent with the hardness and modulus of these coatings. Enhanced scratch adhesion strength, as defined by higher L<sub>C1</sub>, L<sub>C2</sub> and CPR values, was also observed for the TiAlN coating with the lowest Al concentration (∼ 20 at. %), consistent with its higher H/E<sub>r</sub> and H<sup>3</sup>/E<sub>r</sub><sup>2</sup> ratios, promoting good resistance against adhesive and cohesive failures. In addition, the failure modes under progressive loading were found to be influenced by the geometry and density of macroparticles, arising from the deposition process, accompanied by the residual stresses of the coatings and the hierarchical architecture of these thin film systems.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"816 ","pages":"Article 140650"},"PeriodicalIF":2.0,"publicationDate":"2025-03-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143631861","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Thick graded interfaces increase wear resistance in Ti/TiN nanolayered thin films 厚梯度界面提高了 Ti/TiN 纳米层状薄膜的耐磨性

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-03-08 DOI: 10.1016/j.tsf.2025.140653

Justin Y. Cheng , Ashlie Hamilton , Michael Odlyzko , Mauricio De Leo , J. Kevin Baldwin , Nathan A. Mara

{"title":"Thick graded interfaces increase wear resistance in Ti/TiN nanolayered thin films","authors":"Justin Y. Cheng , Ashlie Hamilton , Michael Odlyzko , Mauricio De Leo , J. Kevin Baldwin , Nathan A. Mara","doi":"10.1016/j.tsf.2025.140653","DOIUrl":"10.1016/j.tsf.2025.140653","url":null,"abstract":"<div><div>Multilayered composites with nanoscale layer thickness incorporating titanium and titanium nitride (Ti/TiN) are used as a model system to study the effects of heterophase interface structure on elastic and plastic deformation, as well as wear behavior. In this work, hardness, modulus, and wear rate under dry reciprocating sliding contact are quantified as a function of Ti-TiN heterophase interfacial nitrogen gradient thickness for Ti/TiN multilayers with 10–80 nm layer thickness. Hardness and modulus are found to be inversely proportional to layer thickness and independent of interface gradient for most specimens. Wear rate is found to be inversely proportional to interface gradient thickness at constant layer thickness, demonstrating that control of nanoscale interface structure is a valid approach to enhancing wear behavior. The materials studied in this work wear comparably or slower than other Ti- and TiN-based composites in the literature, providing a promising avenue for engineering wear-resistant materials for use in industrially relevant applications.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"816 ","pages":"Article 140653"},"PeriodicalIF":2.0,"publicationDate":"2025-03-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143631865","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

N,S co-doping of VO2 films with enhancing luminous transmittance and investigation of phase transition N，S共掺杂提高透光率的VO2薄膜及其相变研究

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-03-02 DOI: 10.1016/j.tsf.2025.140639

Lele Fan , Chen Chen , Lei Zhu , Qinfang Zhang

引用次数: 0

Mechanistic insights into the formation of phase pure V2O5 2D nanostructures: Advanced fourier transform-raman spectroscopy analysis 纯相V2O5二维纳米结构形成的机理：先进的傅立叶变换-拉曼光谱分析

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-02-28 DOI: 10.1016/j.tsf.2025.140642

Shrivathsa V S , Shounak De , Shubhava Shetty , Deekshitha K , Yuvaraj A R , Jayarama A , Shriganesh Prabhu , Richard Pinto

{"title":"Mechanistic insights into the formation of phase pure V2O5 2D nanostructures: Advanced fourier transform-raman spectroscopy analysis","authors":"Shrivathsa V S , Shounak De , Shubhava Shetty , Deekshitha K , Yuvaraj A R , Jayarama A , Shriganesh Prabhu , Richard Pinto","doi":"10.1016/j.tsf.2025.140642","DOIUrl":"10.1016/j.tsf.2025.140642","url":null,"abstract":"<div><div>Vanadium Pentoxide (V₂O₅) thin films and 2-Dimensional nanostructures have gained significant attention for their unique properties and diverse applications in gas sensing, energy storage, catalysis, and electrochromic devices. Despite their potential, a comprehensive understanding of their growth dynamics remains limited. This study offers a detailed exploration of the synthesis and properties of phase-pure V₂O₅ thin films and their nanostructures using a combination of solution combustion synthesis and spray pyrolysis deposition. The Aqueous Combustion Mixtures (ACM) were prepared using ammonium metavanadate and urea as precursor solutions, which were used to deposit V<sub>2</sub>O<sub>5</sub> using the spray pyrolysis technique at temperatures ranging from 200°C to 550°C. Advanced characterization techniques, including Field Emission Scanning Electron Microscopy, X-Ray Diffraction, and Fourier Transform Raman Spectroscopy, were employed to analyze the films. The results revealed that films synthesized at 400°C exhibited exceptional crystallinity, microstructural integrity, and phase purity. At higher temperatures, a meta-stable β-V₂O₅ phase was also observed. This research bridges a critical gap in the existing literature by enhancing the understanding of the growth mechanisms of V₂O₅ thin films and their nanostructures, thereby facilitating the optimized formation of high-quality V₂O₅ nanostructures for advanced technological applications.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"815 ","pages":"Article 140642"},"PeriodicalIF":2.0,"publicationDate":"2025-02-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143549153","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Microstructure and oxidation behavior of Alx(CrFeCoCuNi)100–x composition spread thin film Alx(CrFeCoCuNi) 100-x组分扩散薄膜的微观结构和氧化行为

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-02-28 DOI: 10.1016/j.tsf.2025.140645

Xiaoyi Liu, Pei Yuwen, Ruixin Pan, Chungen Zhou

引用次数: 0

The encaging of cobalt interconnect lines with an ordered amino-based self-assembled monolayer for electromigration mitigation using an all-wet electroless process 采用全湿化学工艺，用有序的氨基自组装单层包裹钴互连线，以减轻电迁移

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-02-28 DOI: 10.1016/j.tsf.2025.140644

Jau-Shiung Fang , Wei Lee , Yi-Lung Cheng , Chih-I Lin , Giin-Shan Chen

{"title":"The encaging of cobalt interconnect lines with an ordered amino-based self-assembled monolayer for electromigration mitigation using an all-wet electroless process","authors":"Jau-Shiung Fang , Wei Lee , Yi-Lung Cheng , Chih-I Lin , Giin-Shan Chen","doi":"10.1016/j.tsf.2025.140644","DOIUrl":"10.1016/j.tsf.2025.140644","url":null,"abstract":"<div><div>A self-assembled monolayer (SAM) encaging Cu interconnects as a barrier layer has been well developed to enhance thermal stability and electromigration (EM) reliability for interconnect metallization. However, the SAM-encapsulated and associated electromigration behaviors of interconnects of Co, an interconnecting material for sub-10-nm technology nodes, have yet to be evaluated. In this study, an all-wet electroless trench-filling process is presented to fabricate interconnect lines of SAM-encapsulated Co for the evaluation of their EM characteristics, using unsealed Co lines as a control. Empirical data obtained from accelerated bias-stressing tests, including EM failure lifetimes, current-density scaling factors, and activation energies, consistently show that electromigration reliability of the Co lines is markedly enhanced by the SAM encapsulation. The mechanical properties measured by nanoscratch testing reveal that the enhancement of adhesion between Co and SiO<sub>2</sub> through the SAM encapsulation strongly contributes to the superior EM mitigation by preventing interfacial diffusion. The adhesion strength and Joule-heating data of the Co and Co(SAM) lines are provided for the discussion of the difference in their electromigration performance and failure mechanism. Correlations between mechanical properties and EM characteristics of the electrolessly-plated Co as an interconnect material are also given.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"815 ","pages":"Article 140644"},"PeriodicalIF":2.0,"publicationDate":"2025-02-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143549152","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Enhanced self-cleaning efficiency of photovoltaic solar panels using Ti|TiOx|TiO2 nanofilms from pulsed direct current magnetron sputtering plasma 利用脉冲直流磁控溅射等离子体制备Ti|TiOx|TiO2纳米膜，提高光伏太阳能电池板的自清洁效率

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-02-28 DOI: 10.1016/j.tsf.2025.140641

Maurício Marlon Mazur , Emerson Luís Alberti , Kleber Franke Portella , Mariana D'Orey Gaivão Portella Bragança , Viviane Teleginski Mazur , Sidnei Antônio Pianaro

{"title":"Enhanced self-cleaning efficiency of photovoltaic solar panels using Ti|TiOx|TiO2 nanofilms from pulsed direct current magnetron sputtering plasma","authors":"Maurício Marlon Mazur , Emerson Luís Alberti , Kleber Franke Portella , Mariana D'Orey Gaivão Portella Bragança , Viviane Teleginski Mazur , Sidnei Antônio Pianaro","doi":"10.1016/j.tsf.2025.140641","DOIUrl":"10.1016/j.tsf.2025.140641","url":null,"abstract":"<div><div>Self-cleaning Ti|TiO<sub>x</sub>|TiO<sub>2</sub> nanofilms thermally annealed at 400 °C were generated on soda-lime glass for application on photovoltaic solar panel glass surfaces using the pulsed direc current magnetron sputtering plasma. Parameters such as deposition time, atmosphere, target type and distance from substrate were optimized. The properties depended on the deposition time (10 to 300 s), with average growth rates of (0.46 ± 0.05) nm/s. Sheet resistivity decreased from 10<sup>7</sup> Ω.□<sup>-1</sup> for the 10 s, to 25 Ω.□ <sup>-1</sup> for the 300 s, due to a metallic interface between stoichiometric and non-stoichiometric oxides. The nanofilms were hydrophilic, with contact angles< 45°. For depositions up to 120 s, the nanofilms did not interfere with direct light transmittance and produced a self-cleaning effect, resulting in an average transmittance of (92 ± 1)% after 1 year of field exposure on the floating solar photovoltaic island FPV-SC, Paraná, Brazil, compared to (79 ± 7)% for the reference sample.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"815 ","pages":"Article 140641"},"PeriodicalIF":2.0,"publicationDate":"2025-02-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143563585","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Simulation of the stress distribution in diamond coatings applied by chemical vapor deposition on martensitic stainless steel X46Cr13 with a deterministic surface microstructure 具有确定表面微观结构的马氏体不锈钢X46Cr13化学气相沉积金刚石涂层应力分布模拟

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-02-28 DOI: 10.1016/j.tsf.2025.140646

Richard Börner , Thomas Helmreich , Maximilian Göltz , Nithin Kumar Bandaru , Philipp Steinert , Ingo Schaarschmidt , Stefan Rosiwal , Andreas Schubert

{"title":"Simulation of the stress distribution in diamond coatings applied by chemical vapor deposition on martensitic stainless steel X46Cr13 with a deterministic surface microstructure","authors":"Richard Börner , Thomas Helmreich , Maximilian Göltz , Nithin Kumar Bandaru , Philipp Steinert , Ingo Schaarschmidt , Stefan Rosiwal , Andreas Schubert","doi":"10.1016/j.tsf.2025.140646","DOIUrl":"10.1016/j.tsf.2025.140646","url":null,"abstract":"<div><div>Diamond coatings are widely used in tribology for their exceptional mechanical, thermal, and chemical properties. Combining these advantages with the versatility of steel, the most common technical metal, presents challenges such as graphite formation, carbon diffusion, and residual stresses from thermal expansion mismatches during high-temperature coating processes.</div><div>To address these, an intermediate layer is applied, and stress management techniques are employed. One method involves machining deterministic microstructures on the steel substrate using ultrasonic vibration superimposed machining. Polycrystalline diamond coatings are then applied to martensitic stainless steel X46Cr13 with a titanium nitride (TiN) intermediate layer using chemical vapor deposition as application technique for both coatings.</div><div>Finite element analysis in Abaqus simulates stress generation during cooling, incorporating material data from dilatometer measurements. Simulations explore variations in diamond coating thickness, structural heights, and distances, assessing their impact on hydrostatic stresses.</div><div>Results, validated by Raman measurements, reveal compressive residual stresses across all cases, with a maximum of -7 GPa on nearly flat surfaces and values closer to zero for rougher surfaces. This confirms that microstructured substrates significantly reduce residual stresses. The model is most accurate when the diamond coating thickness equals or is up to three times the structural height.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"815 ","pages":"Article 140646"},"PeriodicalIF":2.0,"publicationDate":"2025-02-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143549038","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0