Thin Solid Films最新文献_第6页

An improved bulge test methodology to characterize non-buckled and buckled thin films 一种改进的膨胀试验方法，用于表征非屈曲和屈曲薄膜

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-07-11 DOI: 10.1016/j.tsf.2025.140737

R.F.M. Martens, T. Bertens, O. van der Sluis, M.G.D. Geers, J.P.M. Hoefnagels

{"title":"An improved bulge test methodology to characterize non-buckled and buckled thin films","authors":"R.F.M. Martens, T. Bertens, O. van der Sluis, M.G.D. Geers, J.P.M. Hoefnagels","doi":"10.1016/j.tsf.2025.140737","DOIUrl":"10.1016/j.tsf.2025.140737","url":null,"abstract":"<div><div>The bulge test is a well-known and powerful method to characterize the mechanical behavior of thin films by etching the film into a free-standing membrane and loading it with a pressure while monitoring the deflection of the bulge apex. In the conventional bulge test, where the deflection is measured at a single point, the well-established bulge equations are used to convert the pressure-deflection relation into a stress–strain response. Yet, this ‘1D’ bulge test has limitations (related to setup drift, pressure variations, multi-layer stacks, sag of the reference state, etc.) that reduce the accuracy, especially for thin films, and make the test too slow for large-scale batch testing in industry. Moreover, the ‘1D’ bulge test is unsuited for membranes that buckled under compressive residual stress. Previously, the authors developed a ‘3D’ bulge test method for buckled membranes by measuring the full 3D displacement field through Digital Height Correlation (DHC) of a height pattern applied to the membrane. While this method is accurate, it is cumbersome and requires expertise. Here, an improved and straightforward ‘2D’ bulge test method is proposed. This technique measures full height profile of the inflated membrane, from which the curvature is obtained, hence ‘2D’, without the need for a pattern or DHC. Moreover, the bulge equations are recast to not depend on the reference state, making it faster, more accurate. Moreover, the ‘2D’ method is made suitable for buckled membranes, by exploiting mechanics insights in the ripple regime. Finite element simulations-based virtual experiments were used to validate the method and to optimize its accuracy. Subsequently, both circular and rectangular ultra-thin membranes were manufactured, for which it was demonstrated that their mechanical properties could be accurately measured. Furthermore, the methodology has also been applied to characterize ultra-thin buckled membranes.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140737"},"PeriodicalIF":2.0,"publicationDate":"2025-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144656538","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Effects of UV ns laser annealing on the electrical and microstructural properties of indium-based transparent conductive oxides UV - ns激光退火对铟基透明导电氧化物电学和微结构性能的影响

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-07-11 DOI: 10.1016/j.tsf.2025.140743

A. Münzer , M. Weittenhiller , M. Bivour , F. Meyer , S.W. Glunz

{"title":"Effects of UV ns laser annealing on the electrical and microstructural properties of indium-based transparent conductive oxides","authors":"A. Münzer , M. Weittenhiller , M. Bivour , F. Meyer , S.W. Glunz","doi":"10.1016/j.tsf.2025.140743","DOIUrl":"10.1016/j.tsf.2025.140743","url":null,"abstract":"<div><div>This paper investigates layer-selective laser annealing of thin transparent conductive oxides (TCO) for heat-sensitive substrates. UV nanosecond laser pulses are shown to be selectively absorbed in the layer, permanently altering microstructural and electrical properties of two different TCO thin films with minimal impact on the underlying solar cell structure. With increasing laser pulse fluence and repetitions the sheet resistance <em>R</em><sub>sh</sub> is continuously reduced for both TCOs. Hall- and X-ray diffraction (XRD) measurements reveal different annealing mechanisms, depending on the as-deposited properties of the films. An amorphous fluorine-doped indium oxide exhibits a dominating increase in carrier mobility due to induced crystallization. In contrast, for a polycrystalline tin-doped indium oxide, the reduced <em>R</em><sub>sh</sub> originates from an increased carrier concentration due to the creation of oxygen vacancies. In this case, laser annealing reduces <em>R</em><sub>sh</sub> to 90 ± 20 Ω/sq, thereby outperforming conventional thermal treatments (<em>R</em><sub>sh</sub> of 167 ± 8 Ω/sq). This advantage may be related to the short laser processing time, which could minimize depassivation of grain boundaries or defect formation in the TCOs. XRD and scanning electron microscopy analysis indicate structural and possibly stoichiometric gradients in the TCO thin films, suggesting surface-near modification in the range of several nanometers.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140743"},"PeriodicalIF":2.0,"publicationDate":"2025-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144656535","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Surface morphology’s role in water freezing onset: A study of graphene on ruthenium thin films produced with two different methods 表面形态在水冻结开始中的作用：石墨烯在两种不同方法制备的钌薄膜上的研究

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-07-09 DOI: 10.1016/j.tsf.2025.140736

Espen Werdal Selfors , Amjad Al Taleb , Lena Nadine Majer , Sander Smink , Peter James Thomas , Naureen Akhtar , José María Castilla , Carlos Prieto , Daniel Farías , Jochen Mannhart , Wolfgang Braun , Bodil Holst

{"title":"Surface morphology’s role in water freezing onset: A study of graphene on ruthenium thin films produced with two different methods","authors":"Espen Werdal Selfors , Amjad Al Taleb , Lena Nadine Majer , Sander Smink , Peter James Thomas , Naureen Akhtar , José María Castilla , Carlos Prieto , Daniel Farías , Jochen Mannhart , Wolfgang Braun , Bodil Holst","doi":"10.1016/j.tsf.2025.140736","DOIUrl":"10.1016/j.tsf.2025.140736","url":null,"abstract":"<div><div>Ice formation strongly impacts on human activities in large parts of the world. Fundamental understanding of the icing properties of surfaces, with the aim of designing coatings and structures with anti-icing properties, is therefore an important research field. Optically transparent anti-icing solutions are needed for applications such as windshields on cars, sensor windows for long-time monitoring and camera lenses. Graphene is particularly attractive in this context because it is nearly transparent and robust. However, up until now little work has been done on the anti-icing properties of graphene and functionalized graphene. Here we present a study of the anti-icing properties of a range of graphene samples deposited on ruthenium films of varying thickness grown on sapphire. Both physical vapor deposition (200nm) and an alternative coating technique known as thermal laser epitaxy (15nm) were used for fabricating the ruthenium films. We show that the freezing onset for one of the graphene coatings grown with the alternative method is superior to previously published results on the freezing onset of graphene and fluorinated graphene. We also show that one can achieve similar results on a very high-quality bare sapphire surface. Our results obtained on surfaces with pits with curvatures estimated in the nanometer range indicate an insensitivity to chemical differences. This is in agreement with existing theory which proposes that the freezing onset is similar for all types of surfaces, as long as they display pits within a given radius of curvature range, differing only when surfaces become very rough or very smooth relative to the critical radius for ice nucleation.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140736"},"PeriodicalIF":2.0,"publicationDate":"2025-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144696444","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Electrical control of magnetoresistance and magneto-tunable photosensitivity across organic magnetic tunnel junctions 有机磁性隧道结的磁阻和磁可调光敏度的电气控制

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-07-07 DOI: 10.1016/j.tsf.2025.140734

Pamulapati Soujanya , P. Dey , Apurba Pal , Nitish Ghosh , Debajit Deb

{"title":"Electrical control of magnetoresistance and magneto-tunable photosensitivity across organic magnetic tunnel junctions","authors":"Pamulapati Soujanya , P. Dey , Apurba Pal , Nitish Ghosh , Debajit Deb","doi":"10.1016/j.tsf.2025.140734","DOIUrl":"10.1016/j.tsf.2025.140734","url":null,"abstract":"<div><div>We have investigated magnetoresistance (MR) response across Indium Tin Oxide/Nickel Ferrite (NiFe<sub>2</sub>O<sub>4</sub>)/Tris-(8-hydroxyquinoline)aluminum (Alq<sub>3</sub>)/Cobalt (Co)/Gold (Au) organic magnetic tunnel junction (MTJ) devices. Existence of NiFe<sub>2</sub>O<sub>4</sub> Fermi level (E<span><math><msub><mrow></mrow><mrow><mi>F</mi></mrow></msub></math></span>) within the lowest unoccupied molecular orbital-highest occupied molecular orbital optical gap of Alq<sub>3</sub> organic semiconductor indicates that carrier tunneling is the predominant transport mechanism across the device. Increase of bias dependent MR is attributed to larger spin dependent scattering at density of states (majority spin at E<span><math><msub><mrow></mrow><mrow><mi>F</mi></mrow></msub></math></span>) for Co. Sharp rise of MR at high fields is attributed to spin flip scattering at NiFe<sub>2</sub>O<sub>4</sub>/Alq<sub>3</sub> interface defect states of the device. Lower photosensitivity of the device with magnetic field is observed due to higher scattering of dissociated photoelectrons at majority density of states of Co. Electrical control of MR in these MTJ devices can be employed for low power spintronic memory applications.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140734"},"PeriodicalIF":2.0,"publicationDate":"2025-07-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144579453","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Water droplet erosion behavior of physical vapor deposition deposited TiN, CrN and multilayer Ti/TiAlN coatings: A comparative study 物理气相沉积TiN、CrN和多层Ti/TiAlN涂层的水滴侵蚀行为比较研究

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-07-06 DOI: 10.1016/j.tsf.2025.140742

Wei Wang , Jian Chen , Kun He , Xiaoying Cao , Xiu-Fang Gong , Chunmei Tang , Zhen-Bing Cai

{"title":"Water droplet erosion behavior of physical vapor deposition deposited TiN, CrN and multilayer Ti/TiAlN coatings: A comparative study","authors":"Wei Wang , Jian Chen , Kun He , Xiaoying Cao , Xiu-Fang Gong , Chunmei Tang , Zhen-Bing Cai","doi":"10.1016/j.tsf.2025.140742","DOIUrl":"10.1016/j.tsf.2025.140742","url":null,"abstract":"<div><div>Water droplet erosion (WDE) poses a significant threat to the final stage blades of steam and gas turbines. In an effort to mitigate this issue, coatings of TiN, CrN, and multilayer Ti/TiAlN were applied onto Ti6Al4V substrates using physical vapor deposition (PVD). The study aimed to investigate the microstructures, mechanical properties, and WDE resistance of these coatings, as well as their interrelationships. Results revealed correlations between the microstructures and mechanical properties (hardness, elastic modulus, toughness, and adhesion strength) with WDE performance. The hardness values of TiN, CrN, and multilayer Ti/TiAlN coatings were measured at 28.1 GPa, 22.2 GPa, and 26.9 GPa, respectively. The corresponding elastic moduli were 421.7 GPa, 346.5 GPa, and 369.7 GPa, respectively. In comparison to the TiN and CrN coatings, the adhesion strength of the multilayer Ti/TiAlN coatings increased by 19.7 % and 41.6 %, respectively. An interesting finding was that higher hardness did not necessarily improve WDE resistance. It was observed that in multilayer Ti/TiAlN coatings, the ductile Ti layer absorbed and dissipated energy generated by water droplet impact, while the interface between the Ti and TiAlN layers dispersed tensile and crack tip stresses, thus impeding crack propagation and exhibiting superior resistance to WDE. The excellent WDE performance of multilayer Ti/TiAlN coatings is attributed to the combined effect of their microstructure, high hardness, toughness, adhesion strength, and load capacity.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140742"},"PeriodicalIF":2.0,"publicationDate":"2025-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144614387","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Long-term stability and reusability of surface enhanced Raman scattering substrates using Ag nanoparticle chains capped with a thin dielectric layer 银纳米颗粒链覆盖薄介电层表面增强拉曼散射衬底的长期稳定性和可重用性

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-07-05 DOI: 10.1016/j.tsf.2025.140731

Emmanuel de los Santos Vázquez , Maxime Bayle , Frédéric Pailloux , Sophie Rousselet , David Babonneau , Bernard Humbert , Sophie Camelio

引用次数: 0

Antibacterial efficacy of ultrafast laser-induced periodic structures on SUS304 surfaces with Ag and Cu coatings 超快激光诱导周期结构对镀银和镀铜SUS304表面的抗菌效果

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-07-04 DOI: 10.1016/j.tsf.2025.140740

Jyun-Jhih Wang , Ya-Zhen Xu , Chun-Ming Chen , Yu-Chung Lin , Chien-Jung Huang , Ying-Hong Lin , Hsuan-Kai Lin

{"title":"Antibacterial efficacy of ultrafast laser-induced periodic structures on SUS304 surfaces with Ag and Cu coatings","authors":"Jyun-Jhih Wang , Ya-Zhen Xu , Chun-Ming Chen , Yu-Chung Lin , Chien-Jung Huang , Ying-Hong Lin , Hsuan-Kai Lin","doi":"10.1016/j.tsf.2025.140740","DOIUrl":"10.1016/j.tsf.2025.140740","url":null,"abstract":"<div><div>SUS304 substrates are processed using a picosecond UV laser at various laser fluences to produce laser-induced periodic surface structures (LIPSSs). Thin Ag and Cu films with a thickness of 15 nm are deposited on both the original SUS304 substrate and the SUS304+LIPSS substrates. The morphologies, crystal structures, and element segregations of the SUS304 and SUS304+LIPSSs specimens are systematically examined and compared. The LIPSS period (Λ), surface wettability, surface roughness, and antibacterial properties of the various samples against <em>Escherichia coli, Staphylococcus aureus</em>, and <em>Pseudomonas aeruginosa</em> are also examined. No elemental segregation or phase transitions of the SUS304 surface are observed after picosecond UV laser irradiation. However, LIPSSs are observed at laser fluences of 6.63, 7.96, and 8.84 J/cm<sup>2</sup>. The surface ripples on the SUS304+LPSS samples are perpendicular to the direction of the electric field (E) of the laser. The surface roughness (Ra), ripple period (Λ), and contact angle (CA) increase with increasing laser fluence. All of the coated samples show an antibacterial efficiency of 100 % against <em>E. coli, S. aureus</em>, and <em>P. aeruginosa</em> after 24 h. In addition, the SUS304+LIPSSs samples with Ag and Cu coatings limit the growth and proliferation of all three bacteria. The Ag-coated samples show a better ROS accumulation, and hence a greater cytotoxicity effect than the Cu-coated samples for all three bacteria. Overall, the results indicate that UV picosecond laser irradiation enables good control over the surface properties of the SUS304 substrate and has strong potential for enhancing the antibacterial performance and supporting further surface engineering improvements.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140740"},"PeriodicalIF":2.0,"publicationDate":"2025-07-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144623638","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Mechanism of thermally grown oxide formation in LaMgAl11O19 thermal barrier coating system: effect of NiCrAlY pre-oxidation LaMgAl11O19热障涂层体系中热生长氧化物形成机理：NiCrAlY预氧化的影响

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-07-04 DOI: 10.1016/j.tsf.2025.140741

Mohammad Mehdi Khorramirad , Mohammad Reza Rahimipour , Seyed Mohammad Mahdi Hadavi , Kourosh Shirvani

{"title":"Mechanism of thermally grown oxide formation in LaMgAl11O19 thermal barrier coating system: effect of NiCrAlY pre-oxidation","authors":"Mohammad Mehdi Khorramirad , Mohammad Reza Rahimipour , Seyed Mohammad Mahdi Hadavi , Kourosh Shirvani","doi":"10.1016/j.tsf.2025.140741","DOIUrl":"10.1016/j.tsf.2025.140741","url":null,"abstract":"<div><div>In this study, an approach is introduced to enhance the performance of lanthanum magnesium hexaaluminate (LaMgAl₁₁O₁₉ or LaMA)-based thermal barrier coatings (TBCs) through the application of a pre-oxidation treatment to the NiCrAlY bond coat. The pre-oxidation process results in the formation of a continuous and protective alumina (Al₂O₃) layer, which significantly improves the adhesion and durability of the TBC system. The key aspect of this work lies in the discovery of a unique thermally grown oxide (TGO) formation mechanism in the INC-738/Pre-oxidized-NiCrAlY/LaMgAl₁₁O₁₉ (IPNL) system. This mechanism combines aspects of both conventional yttria-stabilized zirconia (YSZ)-based systems and non-pre-oxidized LaMA-based systems. This mechanism leads to a dramatic increase in thermal cycling lifetime, from 58 cycles in the non-pre-oxidized LaMA-based system to >109 cycles in the IPNL system. These findings demonstrate the effectiveness of pre-oxidation as a strategy to improve the performance of LaMA-based TBC systems and provide insights into the mechanisms governing TGO formation and growth.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140741"},"PeriodicalIF":2.0,"publicationDate":"2025-07-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144580077","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Plasma-enhanced thermal atomic layer deposition of nickel oxide and nickel carbide thin films 等离子体增强氧化镍和碳化镍薄膜的热原子层沉积

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-07-02 DOI: 10.1016/j.tsf.2025.140738

Holden Paulette , Evan Hathaway , Agra Wickramagedara , Roberto Gonzalez-Rodriguez , Jeffery L. Coffer , Yuankun Lin , Jingbiao Cui

{"title":"Plasma-enhanced thermal atomic layer deposition of nickel oxide and nickel carbide thin films","authors":"Holden Paulette , Evan Hathaway , Agra Wickramagedara , Roberto Gonzalez-Rodriguez , Jeffery L. Coffer , Yuankun Lin , Jingbiao Cui","doi":"10.1016/j.tsf.2025.140738","DOIUrl":"10.1016/j.tsf.2025.140738","url":null,"abstract":"<div><div>Nickel oxide (NiO<sub>x</sub>) and nickel carbide (Ni<sub>3</sub>C) thin films were deposited using a plasma-enhanced thermal-atomic layer deposition (PET-ALD) process. Bis(N, N’-di‑tert-butylacetamidinate)Nickel (II) Ni(Bu-MeAMD)<sub>2</sub> and water are co-reactants in the growth of the thin films along with a remote nitrogen plasma. Plasma power was found to play a key role in material growth. The growth rate, crystal structure, surface morphology, and optical properties of NiO<sub>x</sub> films were characterized by various methods such as atomic force microscopy (AFM), transmission electron microscopy (TEM), X-ray diffraction (XRD), UV–Vis absorption, and spectroscopic ellipsometry. The NiO<sub>x</sub> films were deposited with crystal orientation changes from (111) domination to a mixture of (111) with (200) and (220) as the plasma power was increased from 0 to 35 W, and Ni<sub>3</sub>C film was formed with plasma power from 50 to 100 W. As the plasma power was further increased from 100 W up to 250 W, a mixture of Ni<sub>3</sub>C and Ni was deposited. While the NiO<sub>x</sub> films grown by the PET-ALD process show similar structure and optical properties, a significantly improved growth rate per cycle and shorter cycle times were observed compared to traditional thermal ALD methods. This approach shows promise for NiO<sub>x</sub> and Ni<sub>3</sub>C film applications and sheds light on the fast deposition of other electronic materials with PET-ALD.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140738"},"PeriodicalIF":2.0,"publicationDate":"2025-07-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144563336","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Structural studies of charge-ordered BaBiO3 nanopillars in thin films deposited by pulsed laser deposition 脉冲激光沉积薄膜中电荷有序铋纳米柱的结构研究

IF 2 4区材料科学

Thin Solid Films Pub Date : 2025-07-01 DOI: 10.1016/j.tsf.2025.140739

K V Shilna , P K Joshi , K J Thomas

引用次数: 0